Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
11/2007
11/21/2007CN101075085A 图案形成方法 Pattern forming method
11/21/2007CN100350565C Surface treatment method, semiconductor device, method of fabricating semiconductor device, and treatment apparatus
11/21/2007CN100350326C Reticle and optical characteristic measuring method
11/21/2007CN100349932C Amorphous perfluorinated polymers
11/20/2007US7298458 Optical error minimization in a semiconductor manufacturing apparatus
11/20/2007US7298435 Method of depositing liquid material to manufacture color filter
11/20/2007US7297895 Apparatus for removal of minute particles from a surface using thermophoresis to prevent particle redeposition
11/20/2007US7297468 Applying photosensitive resin; development, etching, transferring patern
11/20/2007US7297450 Optical proximity correction method
11/15/2007WO2007129890A1 Anti-reflection coating for euv mask
11/15/2007WO2007019456A3 Semiconductor substrate process using an optically writable carbon-containing mask
11/15/2007WO2001089196A3 Method for controlling calibration and image sharpening of printing plates having integral photomask layer
11/15/2007US20070266365 Integrated Circuit Design Meethod, Design Assistance Program and Integrated Circuit Design System Using Such Integrated Circuit Design Method
11/15/2007US20070266364 Method and System for Context-Specific Mask Writing
11/15/2007US20070264736 Array substrates for use in liquid crystal displays and fabrication methods thereof
11/15/2007US20070264585 Photomask having half-tone phase shift portion
11/15/2007US20070264584 Pattern arrangement method of semiconductor device
11/15/2007US20070264583 Mask Blank Manufacturing Method
11/15/2007US20070264582 Double-decker mask-pellicle assembly
11/15/2007US20070264581 Patterning masks and methods
11/15/2007US20070263194 Method of exposing a wafer to a light, and reticle, reticle assembly and exposing apparatus for performing the same
11/15/2007US20070262272 Semiconductor mask correcting device and semiconductor mask correcting method
11/14/2007EP1853971A1 Mask blanks
11/14/2007CN101073142A Reflective photomask blank, reflective photomask, and method for manufacturing semiconductor device using same
11/14/2007CN101073084A System and method for analyzing photomask geometries
11/14/2007CN101073034A Method for imprint lithography at constant temperature
11/14/2007CN101073033A Method of housing large pellicle
11/14/2007CN101071824A Semiconductor device, method of fabricating the same, and patterning mask utilizied by the method
11/14/2007CN101071262A Apparatus and method for inspecting mask for use in fabricating an integrated circuit device
11/14/2007CN101071183A Corrugated pattern forming sheet and method for manufacturing the same, and method for manufacturing antireflector, retardation plate, original process sheet plate, and optical element
11/13/2007US7295304 Mask defect inspecting method, semiconductor device manufacturing method, mask defect inspecting apparatus, defect influence map generating method, and computer program product
11/13/2007US7295301 Dual stage defect region identification and defect detection method and apparatus
11/13/2007US7294534 Interconnect layout method
11/13/2007US7294438 Patterning a layer formed on a topmost layer of a reflective multilayer film, especially by the use of an oxygen-containing plasma process, and removing the reaction product produced following patterning and deposited on the surface of the film which is exposed as a result of the patterning;
11/13/2007US7294437 Systems for modeling a transmitted electromagnetic field through a mask, to design a mask, and to create a library of corrections including edge corrections, edge-to-edge corrections, and corner corrections
11/08/2007WO2007127407A2 Active mask lithography
11/08/2007WO2007127197A2 Mask structure for manufacture of trench type semiconductor device
11/08/2007WO2007125853A1 Measuring and inspecting method, measuring and inspecting apparatus, exposing method, device manufacturing method and device manufacturing apparatus
11/08/2007WO2007081059A3 Reflective-type mask blank for euv lithography
11/08/2007US20070260419 Image Plane Measurement Method, Exposure Method, Device Manufacturing Method, and Exposure Apparatus
11/08/2007US20070259290 Measuring and/or inspecting method, measuring and/or inspecting apparatus, exposure method, device manufacturing method, and device manufacturing apparatus
11/08/2007US20070259289 Thin film transistor array panel, manufacturing method thereof, and mask therefor
11/08/2007US20070259280 Photomask, exposure control method and method of manufacturing a semiconductor device
11/08/2007US20070259276 Photoresists; etching; semiconductor integrated circuit, charge-coupled device, color fiter, liquid crystal display device, magnetic head
11/08/2007US20070259275 Anti-reflection coating for an EUV mask
11/08/2007US20070259273 Positive Resist Composition and Method of Forming Resist Pattern
11/08/2007US20070258636 Method for inspecting pattern defect occured on patterns formed on a substrate
11/08/2007US20070258635 Apparatus and method for inspecting mask for use in fabricating an integrated circuit device
11/08/2007US20070258071 Advanced exposure techniques for programmable lithography
11/08/2007US20070258061 System and method for using a two part cover and a box for protecting a reticle
11/07/2007EP1852401A1 Moulded part made of glass or glass ceramics and method for their manufacture
11/07/2007EP1852239A2 Method for creating a three dimensional freeform surface with haptically and/or optically observable microstructures
11/07/2007CN100347816C Mask data correction method, photomask, optical image prediction method
11/07/2007CN100347593C Method for fabricating a liquid crystal display device
11/06/2007US7293249 Contrast based resolution enhancement for photolithographic processing
11/06/2007US7292327 Circuit-pattern inspection apparatus
11/06/2007US7291425 Contact layouts; phase shifting; rotation ; photolithography; integrated circuits
11/06/2007US7290487 Method for producing flexo printing forms by means of laser direct engraving
11/01/2007WO2007123263A1 Reflective mask blank for euv lithography
11/01/2007WO2007044557A3 System, masks, and methods for photomasks optimized with approximate and accurate merit functions
11/01/2007WO2007005204A3 System and method for critical dimension reduction and pitch reduction
11/01/2007US20070254452 Mask structure for manufacture of trench type semiconductor device
11/01/2007US20070254219 Photomask, method for producing the same, and method for forming pattern using the photomask
11/01/2007US20070254218 Phase shifting mask capable of reducing the optical proximity effect and method for preparing semiconductor devices using the same
11/01/2007US20070254217 Method and apparatus for solving mask precipitated defect issue
10/2007
10/31/2007EP1850177A2 Litographic pellicle
10/31/2007EP1850176A2 Pattern Defect Inspection Method, Photomask Manufacturing Method, and Display Device Substrate Manufacturing Method
10/31/2007EP1414722A4 Reticle protection and transport
10/31/2007DE10327613B4 Verfahren zur Bildung einer Öffnung auf einer alternierenden Phasenmaske A method for forming an opening on an alternating phase mask
10/31/2007DE102004010002B4 Maskenhalter zum Halten einer lithografischen Reflexionsmaske und Verfahren Mask holder for holding a lithographic reflection mask and method
10/31/2007CN101065647A Phase-shift mask providing balanced light intensity through different phase-shift apertures and method for forming such phase-shift mask
10/31/2007CN101063828A Exposure apparatus
10/31/2007CN101063827A Exposure apparatus inspection method
10/31/2007CN101063822A Methods and systems for improving boundary contrast
10/31/2007CN101063808A Method of forming a mask layout and layout formed by the same
10/31/2007CN101063807A Sun sensor optical mask and manufacturing method therefor
10/31/2007CN101063806A Method and apparatus for solving mask precipitated defect issue
10/31/2007CN101063805A 光掩膜盒 Photomasks box
10/31/2007CN101063779A Liquid crystal display device and method of manufacturing the same
10/31/2007CN100345677C Methods and systems for providing an image on an organic product
10/30/2007US7290242 Pattern generation on a semiconductor surface
10/30/2007US7289658 Removal of relatively unimportant shapes from a set of shapes
10/30/2007US7289657 Method of inspecting photo-mask
10/30/2007US7289231 Apparatus and method for determining physical properties of a mask blank
10/30/2007US7288366 photolithography mask; a tri-tone partially transmitting phase shift reticle used to form dual damascene openings
10/30/2007US7288345 Photosensitive colored composition and color filter
10/30/2007US7288344 Accommodating diffraction in the printing of features on a substrate
10/30/2007US7288300 Fullerenes to increase radiation resistance in polymer-based pellicles
10/30/2007US7288299 Fullerenes to increase radiation resistance in polymer-based pellicles
10/30/2007US7288008 Nonlithographic method of defining geometries for plasma and/or ion implantation treatments on a semiconductor wafer
10/25/2007WO2007119860A1 Processing method of glass substrate, and highly flat and highly smooth glass substrate
10/25/2007US20070250805 System and method for examining mask pattern fidelity
10/25/2007US20070249169 Mask and method of manufacturing liquid crystal display device using the same
10/25/2007US20070248919 Lithographic pellicle
10/25/2007US20070248917 Exposing a photoresist to near-field light through photomask using polarized exposure light having an electrical field component parallel to the first direction to form a latent image in the photoresist only in discrete regions at which the second slit opening crosses the light the light shield portion
10/25/2007US20070248909 Photosensitive Composition for Use in Producing Printing Plate, and Photosensitive Printing Original Plate Laminate and Printing Plate Using the Photosensitive Composition
10/25/2007US20070248899 Pattern decomposition and optical proximity correction method for double exposure when forming photomasks
10/25/2007US20070248898 Targets for alignment of semiconductor masks
10/25/2007US20070248897 Chemically-resistant, transition metal siliconitride for photomask patterns of smaller geometries, particularly as a light-shielding film material required to carry out photolithography using exposure light having a wavelength of < 250 nm (ArF excimer laser); high electrical conductivity
10/25/2007US20070248896 SU-8; octafunctional epoxidized novolac, solvent, photopolymerization initiator; dialkyl phthalate, malonate, sebacate, and/or adipate plasticizer; and adhesion promoter of glycidoxypropanetrimethoxysilane, mercaptopropyltrimethoxysilane, and/or aminopropyltrimethoxysilanel; noncracking; larger wafer
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