G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
12/2007
12/13/2007	US20070287073 Lithography systems and methods
12/13/2007	US20070285745 Customizable display system
12/13/2007	US20070285728 Inspection apparatus, inspection method and manufacturing method of mask for exposure, and mask for exposure
12/13/2007	US20070285647 Support structure for temporarily supporting a substrate
12/13/2007	US20070285635 Exposure apparatus, removal method, and device manufacturing method
12/13/2007	DE4413821B4 Phasenschiebemaske und Verfahren zu deren Herstellung Phase-shifting mask and a process for their preparation
12/13/2007	DE102007021743A1 Masken und Verfahren zum Strukturieren Masks and method for structuring
12/12/2007	EP1864952A1 Crystallized glass, and method for producing crystallized glass
12/12/2007	EP1428073B1 In-situ balancing for phase-shifting mask
12/12/2007	CN200989993Y Long mask plate for double-exposure
12/12/2007	CN101086613A Reticle, semiconductor chip and method of manufacturing semiconductor device
12/12/2007	CN101086612A Protection film components containing vessel and manufacturing method thereof
12/12/2007	CN101085699A Crystallized glass and method for producing crystallized glass
12/12/2007	CN101085698A Crystallized glass and method for producing crystallized glass
12/12/2007	CN100355035C Semiconductor wafer, method of manufacturing the same, and method of manufacturing a semiconductor device
12/12/2007	CN100354753C Extreme ultraviolet mask with improved absorber
12/11/2007	US7308673 Method and apparatus for correcting 3D mask effects
12/11/2007	US7307712 Method of detecting mask defects, a computer program and reference substrate
12/11/2007	US7307698 Exposure apparatus and device manufacturing method
12/11/2007	US7306882 Quartz substrate with a partially dug main surface covered with a Cr film; dug portion has an undercut so that Cr film partially serves as an eaves; a subopening exposes an end of the dug portion; allows an eaves to be directly, accurately measured
12/11/2007	US7306881 Method and system of lithography using masks having gray-tone features
12/11/2007	US7306680 Method of cleaning by removing particles from surfaces, a cleaning apparatus and a lithographic projection apparatus
12/06/2007	WO2007139225A1 Surface inspection device
12/06/2007	WO2007138747A1 Resist film peeling method, mask blank manufacturing method and transfer mask manufacturing method
12/06/2007	WO2007138683A1 Protective film
12/06/2007	WO2007137821A1 Production of micro- and nanopore mass arrangements by self-organization of nanoparticles and sublimation technology
12/06/2007	US20070283313 Mask pattern generating method
12/06/2007	US20070281849 Crystallized glass, and method for producing crystallized glass
12/06/2007	US20070281223 Electrooptic device and electronic device including the same
12/06/2007	US20070281222 Method of correcting opaque defect of photomask using atomic force microscope fine processing device
12/06/2007	US20070281221 Stencil mask
12/06/2007	US20070281218 Dummy Phase Shapes To Reduce Sensitivity Of Critical Gates To Regions Of High Pattern Density
12/06/2007	US20070280664 Focusing apparatus, focusing method, and inspection apparatus
12/06/2007	US20070278559 Semiconductor memory device
12/06/2007	US20070278278 Light Beam Bonding
12/06/2007	US20070278179 Radiation sensitive self-assembled monolayers and uses thereof
12/06/2007	DE102006025121A1 Darstellung von Mikro- und Nanoporen-Massenanordnungen durch Selbstorganisation von Nanopartikeln und Sublimationstechnik Representation of micro- and nano-pores mass arrangements by self-assembly of nanoparticles and sublimation
12/06/2007	DE102006024741A1 Semiconductor device manufacturing method, involves providing semiconductor substrate available with surface, and layer pile comprising conductive layer on substrate surface
12/05/2007	EP1863071A1 Shot shape measuring method, mask
12/05/2007	EP1861802A1 Locating sub-resolution assist features in semiconductor device fabrication
12/05/2007	CN101082781A Tracing system
12/05/2007	CN101082768A Photomask blank and photomask making method
12/05/2007	CN100353495C Method of forming light resist pattern by using reflect nearby effect
12/04/2007	US7304730 Inspection apparatus having two sensors, method for inspecting an object, and a method for manufacturing a photolithography mask
12/04/2007	US7304721 Method for dynamically monitoring a reticle
12/04/2007	US7304720 System for using a two part cover for protecting a reticle
12/04/2007	US7304323 Test mask structure
12/04/2007	US7304001 Fabrication methods of semiconductor integrated circuit device and photomask
12/04/2007	US7303859 Photoresist, photolithography method using the same, and method for producing photoresist
12/04/2007	US7303845 Generating mask pattern data from design data under first condition, generating first corrected pattern data by applying optical proximity correction tofirst mask pattern data, generating second mask pattern data from design data under second condition, generating second corrected pattern, comparing
12/04/2007	US7303844 Marking system for a semiconductor wafer to identify problems in mask layers
12/04/2007	US7303843 Faster wafer fabrication without wasting exposure area; simultaneous evaluation
12/04/2007	US7303841 Repair of photolithography masks by sub-wavelength artificial grating technology
11/2007
11/29/2007	WO2007135379A2 Method and unit for micro-structuring a moving substrate
11/29/2007	WO2007135377A1 Method and tool for patterning thin films on moving substrates
11/29/2007	US20070275320 Chemically Amplified Photorestist Composition, Laminated Product, and Connection Element
11/29/2007	US20070275312 Semiconductor device
11/29/2007	US20070275311 a method of manufacturing a display includes defining larger-dimension patterns of a photoresist layer using a first photomask and a proximity exposure machine, and defining smaller-dimension patterns of the same photoresist layer using a second photomask and a stepper exposure machine; efficiency
11/29/2007	US20070275310 Method for determining an acceptable reticle tolerance for a reticle used to produce an integrated circuit layout
11/29/2007	US20070275309 Patterning A Single Integrated Circuit Layer Using Multiple Masks And Multiple Masking Layers
11/29/2007	US20070275308 photomasks; etch resistance; oxidation resistance
11/29/2007	US20070273855 Patterning Systems Using Protomasks Including Shadowing Elements Therein
11/29/2007	US20070273029 Photo mask set for forming multi-layered interconnection lines and semiconductor device fabricated using the same
11/29/2007	US20070271958 Method of Molding Silica Glass
11/29/2007	DE10221648B4 Verfahren zur Erzeugung eines Maskensatzes für die Lithografie umfassend zumindest eine Maske sowie Verfahren zur Abbildung von Strukturen eines vorgegebenen Layouts in eine gemeinsame Belichtungsebene A method for generating a mask set for lithography comprising at least one mask and method for imaging structures of a given layout in a common exposure level
11/28/2007	EP1860500A2 Phase shift mask blank, phase shift mask, and pattern transfer method
11/28/2007	EP1860499A2 Process for making a printing form
11/28/2007	EP1326902B1 Degradable, amorphous, fluoroacrylate polymers
11/28/2007	CN101080671A Phase shift mask, phase shift mask manufacturing method, and semiconductor element manufacturing method
11/28/2007	CN101080670A Method for patterning surface modification
11/28/2007	CN101079385A Device and a method and mask for forming a device
11/28/2007	CN101078694A System for forming high resolution image
11/28/2007	CN100351704C Attaching a pellicle frame to a reticle
11/27/2007	US7302651 Technology migration for integrated circuits with radical design restrictions
11/27/2007	US7302376 Device modeling for proximity effects
11/27/2007	US7302111 Graphics engine for high precision lithography
11/27/2007	US7302090 Method and device for determining the properties of an integrated circuit
11/27/2007	US7301649 System for scatterometric measurements and applications
11/27/2007	US7300746 Illuminating photoresist layer on wafer using a photomask comprising line-type opaque patterns defining floodlighting portions for forming patterns and phase-shifting regions being arranged between opaque patterns; developing the illuminated photoresist
11/27/2007	US7300724 capping structure may include alternating layers of a capping material, e.g., ruthenium, and a material with a lower EUV absorption coefficient, e.g., silicon
11/22/2007	WO2007132698A1 Reticle case
11/22/2007	WO2007131792A1 Process for immersion exposure of a substrate
11/22/2007	WO2007084999A3 Digital mold texturizing methods, materials and substrates
11/22/2007	WO2006107356A3 Method of adding fabrication monitors to integrated circuit chips
11/22/2007	US20070269726 Phase-shift mask, manufacturing method thereof and manufacturing method of semiconductor element
11/22/2007	US20070269725 Light control material for displaying color, information, and images
11/22/2007	US20070269724 Method and process for immersion exposure of a substrate
11/22/2007	US20070269723 Near-zero phase shift
11/22/2007	US20070269722 Transparent film, attenuate film, and opaque film; etch selectivity; halftones
11/22/2007	US20070269721 partially etching a carbon layer through a pattern in a photoresist silicon layer in an oxygen plasma, the oxygen ions in the plasma react with silicon in the photoresist to form a surface layer of silica on the photoresist and etching the remaining carbon layer in a hydrogen ion plasma; process control
11/22/2007	US20070267579 Photomask correction method using composite charged particle beam, and device used in the correction method
11/22/2007	DE112006000129T5 Verfahren zum Reparieren einer alternierenden Phasenverschiebungsmaske A method of repairing an alternating phase shift mask
11/22/2007	DE102006022722A1 Verfahren zur Herstellung eines Pressbleches oder eines Endlosbandes A method for producing a press plate or an endless belt
11/21/2007	EP1857876A1 Method of forming a phase shift mask
11/21/2007	EP1856575A2 Merging sub-resolution assist features of a photolithographic mask
11/21/2007	CN101075094A Method for producing COB-DRAM bit line with nitrogen-oxygen-nitrogen SAC structure
11/21/2007	CN101075093A Method for producing COB DRAM bit line for preventing it from collapse
11/21/2007	CN101075088A Protection film assembly and device for stripping protection film assembly
11/21/2007	CN101075087A Semiconductor device and method of designing the semiconductor device
11/21/2007	CN101075086A 光掩模和曝光方法 Photomask and exposure method

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