Patents
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
06/2008
06/25/2008CN101204851A Optical modeling apparatus
06/25/2008CN101204708A Recovery cup cleaning method and substrate treatment apparatus
06/25/2008CN100397555C Variable surface hot plate for improved bake uniformity of substrates
06/25/2008CN100397404C Measuring method and correction method for illumination irregularity of exposure device
06/25/2008CN100397403C Method for verification of resolution enhancement techniques and optical proximity correction in lithography
06/24/2008US7392168 Method of compensating for etch effects in photolithographic processing
06/24/2008US7390618 Manufacturing method of microstructure, manufacturing method and manufacturing device of electronic device
06/24/2008US7390596 Reflection type mask blank and reflection type mask and production methods for them
06/19/2008WO2008072706A1 Reflective mask blank for euv lithography, and substrate with function film for the mask blank
06/19/2008WO2008071324A1 Apparatus for measurement of structures on photolithographic masks
06/19/2008WO2008071295A1 Calibrating method for a mask writer
06/19/2008WO2008071269A1 Apparatus and method for mask metrology
06/19/2008WO2008071268A1 Device and method for measuring lithography masks
06/19/2008WO2008071069A1 Manufacturing method of printing plate
06/19/2008WO2008045520A3 Imprint lithography apparatus and methods
06/19/2008WO2008024480A3 Method for cleaning diffraction gratings
06/19/2008US20080148218 Mask data generation method, mask formation method, pattern formation method
06/19/2008US20080148207 Semiconductor integrated circuit device featuring processed minimum circuit pattern, and design method therefor
06/19/2008US20080148198 Hotspot totalization method, pattern correction method, and program
06/19/2008US20080145772 Pigment Dispersion Composition for Producing Color Filter and Color Filter For Color Imaging Device Produced Using the Same
06/19/2008US20080145771 Phase-shift mask and method of forming the same
06/19/2008US20080145770 Recycling of large-size photomask substrate
06/19/2008US20080145769 Entry acceptance unit takes measured dimension of transfer pattern; calculations of triaxial vector components at every position; flare electric field vector by polarization ratio of exposure tool; light intensity by adding electric field vector and flare, calculate sum of squares of triaxial components
06/19/2008US20080145768 Form a mixing-generation resist film on mask; bake film to form mixing layer at interface between mask and film; developer solution of tetramethylammonium hydroxide; fine resist pattern by shrinking technique; suppress spot-like defects at low cost; semiconductor device
06/19/2008US20080145767 Method of data encoding, compression, and transmission enabling maskless lithography
06/19/2008US20080143991 Exposure apparatus and device manufacturing method
06/19/2008US20080143983 Methods and apparatus for multi-exposure patterning
06/19/2008US20080142681 Focus control method
06/19/2008US20080142051 Recovery cup cleaning method and substrate treatment apparatus
06/19/2008DE102007055540A1 Verfahren zum Korrigieren von Photomaskendefekten A method of correcting the photomask defects
06/19/2008DE102006059432A1 Device for measuring lithography masks, has adjustment module by which reticle carrier is moved in order to bring it into pre-determined position in relation to measuring objective
06/18/2008EP1933205A1 Method of producing optimized setpoint data in a maskless lithography system and apparatus therefore.
06/18/2008EP1933204A2 Recycling of large-size photomask substrate
06/18/2008EP1932058A1 Model-based sraf insertion
06/18/2008EP1060443B1 Improved modulator design for pattern generator
06/18/2008CN101203806A Methods and devices for characterizing polarization of illumination system
06/18/2008CN101202286A Array substrate, display device, and method for manufacturing the array substrate
06/18/2008CN101201874A OPC verification using auto-windowed regions
06/18/2008CN101201541A Method for forming organic layer pattern, organic layer pattern prepared by the same and organic memory devices comprising the pattern
06/18/2008CN101201539A Pattern mask for forming microlens, image sensor and fabricating method thereof
06/18/2008CN101201538A Soft template with alignment mark
06/18/2008CN101201537A Checking device for grey mask, manufacture method and pattern transprinting method thereof
06/17/2008US7388943 Method for adjusting gap between two objects and exposure method using the same, gap adjusting apparatus, and exposure apparatus
06/17/2008US7388659 Particle inspection apparatus and method, exposure apparatus, and device manufacturing method
06/17/2008US7388653 Exposure mask and method for divisional exposure
06/17/2008US7388650 Lithographic apparatus and device manufacturing method
06/17/2008US7387965 Reference pattern for creating a defect recognition level, method of fabricating the same and method of inspecting defects using the same
06/17/2008US7387867 Manufacturing method of semiconductor integrated circuit device
06/17/2008US7387855 Anti-ESD photomask blank
06/17/2008US7387854 first mask is an isolated line pattern and dummy patterns, second pattern is positioned to completely cover the isolated line pattern on the wafer; remove the dummy patterns
06/17/2008US7387853 Use of a planarizing layer to improve multilayer performance in ultraviolet masks
06/12/2008WO2008049844B1 High resolution imaging process using an in-situ image modifying layer
06/12/2008US20080140365 Simulation method, simulation system, and method of modifying mask pattern
06/12/2008US20080138745 Polyamic acids; spin coating, etching; heat resistance; photoresists
06/12/2008US20080138723 inclining an ink-jet head having multi nozzles at a predetermined angle, moving the head in a lengthwise direction of the color filter that is divided into multi working regions, ejecting color ink into pixels, moving ink-jet head to another adjacent working region, ejecting color ink; uniform thickness
06/12/2008US20080138722 Exposure mask, its manufacture method, pattern transfer method, pattern forming method, and SRAM manufacture method
06/12/2008US20080138721 correcting flatness, a step of correcting surface unevenness wherein the substrate surface is polished by means of a polishing pad ( unwoven fabric impregnated with a resin ) with preferred hardness , then finishing surface roughness to provide a substrate having a high-accuracy surface profile
06/12/2008US20080138720 Method of arranging mask patterns and apparatus using the method
06/12/2008US20080138719 Method of arranging mask patterns and apparatus using the method
06/12/2008US20080138588 Generating an assist feature of a lithography mask by providing a layout for a material layer of a semiconductor device, the layout including a pattern for one feature of the semiconductor device; in the pattern for the feature where the assist feature extends completely through the pattern
06/12/2008US20080137207 Pattern mask for forming microlens, image sensor and fabricating method thereof
06/12/2008US20080137049 Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicle
06/12/2008US20080136043 Multilayer Wiring Structure, Semiconductor Device, Pattern Transfer Mask and Method for Manufacturing Multilayer Wiring Structure
06/12/2008US20080135784 Patterning compositions, masks, and methods
06/12/2008DE10141497B4 Verfahren zum Herstellen einer Maskenanordnung A method of manufacturing a mask assembly
06/11/2008EP1929373A1 Dense opc
06/11/2008EP1060442B1 Pattern generator with improved address resolution
06/11/2008CN101196690A Production method for shading mask plate and its application
06/11/2008CN101196683A Optical short distance amending method
06/11/2008CN101196682A Mask plate territory for manufacturing connecting pore and its design method
06/11/2008CN101196681A Detecting device, detecting method, manufacturing method and pattern transferring method for photomask
06/11/2008CN101196680A Detecting device, detecting method, manufacturing method and pattern transferring method for photomask
06/11/2008CN101195118A Cleaning method and cleaning apparatus
06/11/2008CN100394548C Method for preparing polycrystalline silicon layer and light shield
06/11/2008CN100394304C Calibration method for photoetching
06/10/2008US7386830 Method for designing an illumination light source, method for designing a mask pattern, method for manufacturing a photomask, method for manufacturing a semiconductor device and a computer program product
06/10/2008US7386829 Method of fabricating a photomask
06/10/2008US7385677 Lithographic apparatus and device manufacturing method that limits a portion of a patterning device used to pattern a beam
06/10/2008US7385676 Mask set having separate masks to form different regions of integrated circuit chips, exposure system including the mask set with an aperture device, and method of using the mask set to expose a semiconductor wafer
06/10/2008US7384725 System and method for fabricating contact holes
06/10/2008US7384715 photolithography structure comprising substrates, multilayer mirrors, phase shifting layers, intensity balancer layers and capping layers, used to form semiconductor integrated circuit chips
06/10/2008US7384714 Anti-reflective sidewall coated alternating phase shift mask and fabrication method
06/10/2008US7384713 Exposure mask blank manufacturing method and exposure mask manufacturing method
06/10/2008US7384712 Transferring pattern to substrate; holes surrounded by sheilding zones; forming semiconductors
06/10/2008US7384711 Stencil mask having main and auxiliary strut and method of forming the same
06/10/2008US7384710 Method of forming exposure mask pattern, exposure mask pattern, and method of producing semiconductor device
06/05/2008WO2008067237A1 Resolution enhancement in optical lithography via absorbance-modulation enabled multiple exposures
06/05/2008WO2008065973A1 Method for finishing surface of preliminary polished glass substrate
06/05/2008US20080134131 Simulation model making method
06/05/2008US20080131821 Dual layer workpiece masking and manufacturing process
06/05/2008US20080131795 Method for adjusting lithographic mask flatness using thermally induced pellicle stress
06/05/2008US20080131794 Optical member comprising OD-doped silica glass
06/05/2008US20080131793 Method for forming hard mask patterns having a fine pitch and method for forming a semiconductor device using the same
06/05/2008US20080131792 Method of Correcting Photomask Defect
06/05/2008US20080131791 patterns comprising moldings formed on the flexible substrates and adjustment markings having a refractive index, formed on the moldings
06/05/2008US20080131790 Structure Design and Fabrication on Photomask For Contact Hole Manufacturing Process Window Enhancement
06/05/2008US20080131789 Method for photomask fabrication utilizing a carbon hard mask
06/05/2008US20080131788 Method to automatically repair trim photomask design rule violations for alternating phase shift lithography
06/05/2008US20080130982 Pattern inspection apparatus and method
06/05/2008US20080128634 Method and apparatus for surface potential reflection electron mask lithography
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