Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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06/25/2008 | CN101204851A Optical modeling apparatus |
06/25/2008 | CN101204708A Recovery cup cleaning method and substrate treatment apparatus |
06/25/2008 | CN100397555C Variable surface hot plate for improved bake uniformity of substrates |
06/25/2008 | CN100397404C Measuring method and correction method for illumination irregularity of exposure device |
06/25/2008 | CN100397403C Method for verification of resolution enhancement techniques and optical proximity correction in lithography |
06/24/2008 | US7392168 Method of compensating for etch effects in photolithographic processing |
06/24/2008 | US7390618 Manufacturing method of microstructure, manufacturing method and manufacturing device of electronic device |
06/24/2008 | US7390596 Reflection type mask blank and reflection type mask and production methods for them |
06/19/2008 | WO2008072706A1 Reflective mask blank for euv lithography, and substrate with function film for the mask blank |
06/19/2008 | WO2008071324A1 Apparatus for measurement of structures on photolithographic masks |
06/19/2008 | WO2008071295A1 Calibrating method for a mask writer |
06/19/2008 | WO2008071269A1 Apparatus and method for mask metrology |
06/19/2008 | WO2008071268A1 Device and method for measuring lithography masks |
06/19/2008 | WO2008071069A1 Manufacturing method of printing plate |
06/19/2008 | WO2008045520A3 Imprint lithography apparatus and methods |
06/19/2008 | WO2008024480A3 Method for cleaning diffraction gratings |
06/19/2008 | US20080148218 Mask data generation method, mask formation method, pattern formation method |
06/19/2008 | US20080148207 Semiconductor integrated circuit device featuring processed minimum circuit pattern, and design method therefor |
06/19/2008 | US20080148198 Hotspot totalization method, pattern correction method, and program |
06/19/2008 | US20080145772 Pigment Dispersion Composition for Producing Color Filter and Color Filter For Color Imaging Device Produced Using the Same |
06/19/2008 | US20080145771 Phase-shift mask and method of forming the same |
06/19/2008 | US20080145770 Recycling of large-size photomask substrate |
06/19/2008 | US20080145769 Entry acceptance unit takes measured dimension of transfer pattern; calculations of triaxial vector components at every position; flare electric field vector by polarization ratio of exposure tool; light intensity by adding electric field vector and flare, calculate sum of squares of triaxial components |
06/19/2008 | US20080145768 Form a mixing-generation resist film on mask; bake film to form mixing layer at interface between mask and film; developer solution of tetramethylammonium hydroxide; fine resist pattern by shrinking technique; suppress spot-like defects at low cost; semiconductor device |
06/19/2008 | US20080145767 Method of data encoding, compression, and transmission enabling maskless lithography |
06/19/2008 | US20080143991 Exposure apparatus and device manufacturing method |
06/19/2008 | US20080143983 Methods and apparatus for multi-exposure patterning |
06/19/2008 | US20080142681 Focus control method |
06/19/2008 | US20080142051 Recovery cup cleaning method and substrate treatment apparatus |
06/19/2008 | DE102007055540A1 Verfahren zum Korrigieren von Photomaskendefekten A method of correcting the photomask defects |
06/19/2008 | DE102006059432A1 Device for measuring lithography masks, has adjustment module by which reticle carrier is moved in order to bring it into pre-determined position in relation to measuring objective |
06/18/2008 | EP1933205A1 Method of producing optimized setpoint data in a maskless lithography system and apparatus therefore. |
06/18/2008 | EP1933204A2 Recycling of large-size photomask substrate |
06/18/2008 | EP1932058A1 Model-based sraf insertion |
06/18/2008 | EP1060443B1 Improved modulator design for pattern generator |
06/18/2008 | CN101203806A Methods and devices for characterizing polarization of illumination system |
06/18/2008 | CN101202286A Array substrate, display device, and method for manufacturing the array substrate |
06/18/2008 | CN101201874A OPC verification using auto-windowed regions |
06/18/2008 | CN101201541A Method for forming organic layer pattern, organic layer pattern prepared by the same and organic memory devices comprising the pattern |
06/18/2008 | CN101201539A Pattern mask for forming microlens, image sensor and fabricating method thereof |
06/18/2008 | CN101201538A Soft template with alignment mark |
06/18/2008 | CN101201537A Checking device for grey mask, manufacture method and pattern transprinting method thereof |
06/17/2008 | US7388943 Method for adjusting gap between two objects and exposure method using the same, gap adjusting apparatus, and exposure apparatus |
06/17/2008 | US7388659 Particle inspection apparatus and method, exposure apparatus, and device manufacturing method |
06/17/2008 | US7388653 Exposure mask and method for divisional exposure |
06/17/2008 | US7388650 Lithographic apparatus and device manufacturing method |
06/17/2008 | US7387965 Reference pattern for creating a defect recognition level, method of fabricating the same and method of inspecting defects using the same |
06/17/2008 | US7387867 Manufacturing method of semiconductor integrated circuit device |
06/17/2008 | US7387855 Anti-ESD photomask blank |
06/17/2008 | US7387854 first mask is an isolated line pattern and dummy patterns, second pattern is positioned to completely cover the isolated line pattern on the wafer; remove the dummy patterns |
06/17/2008 | US7387853 Use of a planarizing layer to improve multilayer performance in ultraviolet masks |
06/12/2008 | WO2008049844B1 High resolution imaging process using an in-situ image modifying layer |
06/12/2008 | US20080140365 Simulation method, simulation system, and method of modifying mask pattern |
06/12/2008 | US20080138745 Polyamic acids; spin coating, etching; heat resistance; photoresists |
06/12/2008 | US20080138723 inclining an ink-jet head having multi nozzles at a predetermined angle, moving the head in a lengthwise direction of the color filter that is divided into multi working regions, ejecting color ink into pixels, moving ink-jet head to another adjacent working region, ejecting color ink; uniform thickness |
06/12/2008 | US20080138722 Exposure mask, its manufacture method, pattern transfer method, pattern forming method, and SRAM manufacture method |
06/12/2008 | US20080138721 correcting flatness, a step of correcting surface unevenness wherein the substrate surface is polished by means of a polishing pad ( unwoven fabric impregnated with a resin ) with preferred hardness , then finishing surface roughness to provide a substrate having a high-accuracy surface profile |
06/12/2008 | US20080138720 Method of arranging mask patterns and apparatus using the method |
06/12/2008 | US20080138719 Method of arranging mask patterns and apparatus using the method |
06/12/2008 | US20080138588 Generating an assist feature of a lithography mask by providing a layout for a material layer of a semiconductor device, the layout including a pattern for one feature of the semiconductor device; in the pattern for the feature where the assist feature extends completely through the pattern |
06/12/2008 | US20080137207 Pattern mask for forming microlens, image sensor and fabricating method thereof |
06/12/2008 | US20080137049 Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicle |
06/12/2008 | US20080136043 Multilayer Wiring Structure, Semiconductor Device, Pattern Transfer Mask and Method for Manufacturing Multilayer Wiring Structure |
06/12/2008 | US20080135784 Patterning compositions, masks, and methods |
06/12/2008 | DE10141497B4 Verfahren zum Herstellen einer Maskenanordnung A method of manufacturing a mask assembly |
06/11/2008 | EP1929373A1 Dense opc |
06/11/2008 | EP1060442B1 Pattern generator with improved address resolution |
06/11/2008 | CN101196690A Production method for shading mask plate and its application |
06/11/2008 | CN101196683A Optical short distance amending method |
06/11/2008 | CN101196682A Mask plate territory for manufacturing connecting pore and its design method |
06/11/2008 | CN101196681A Detecting device, detecting method, manufacturing method and pattern transferring method for photomask |
06/11/2008 | CN101196680A Detecting device, detecting method, manufacturing method and pattern transferring method for photomask |
06/11/2008 | CN101195118A Cleaning method and cleaning apparatus |
06/11/2008 | CN100394548C Method for preparing polycrystalline silicon layer and light shield |
06/11/2008 | CN100394304C Calibration method for photoetching |
06/10/2008 | US7386830 Method for designing an illumination light source, method for designing a mask pattern, method for manufacturing a photomask, method for manufacturing a semiconductor device and a computer program product |
06/10/2008 | US7386829 Method of fabricating a photomask |
06/10/2008 | US7385677 Lithographic apparatus and device manufacturing method that limits a portion of a patterning device used to pattern a beam |
06/10/2008 | US7385676 Mask set having separate masks to form different regions of integrated circuit chips, exposure system including the mask set with an aperture device, and method of using the mask set to expose a semiconductor wafer |
06/10/2008 | US7384725 System and method for fabricating contact holes |
06/10/2008 | US7384715 photolithography structure comprising substrates, multilayer mirrors, phase shifting layers, intensity balancer layers and capping layers, used to form semiconductor integrated circuit chips |
06/10/2008 | US7384714 Anti-reflective sidewall coated alternating phase shift mask and fabrication method |
06/10/2008 | US7384713 Exposure mask blank manufacturing method and exposure mask manufacturing method |
06/10/2008 | US7384712 Transferring pattern to substrate; holes surrounded by sheilding zones; forming semiconductors |
06/10/2008 | US7384711 Stencil mask having main and auxiliary strut and method of forming the same |
06/10/2008 | US7384710 Method of forming exposure mask pattern, exposure mask pattern, and method of producing semiconductor device |
06/05/2008 | WO2008067237A1 Resolution enhancement in optical lithography via absorbance-modulation enabled multiple exposures |
06/05/2008 | WO2008065973A1 Method for finishing surface of preliminary polished glass substrate |
06/05/2008 | US20080134131 Simulation model making method |
06/05/2008 | US20080131821 Dual layer workpiece masking and manufacturing process |
06/05/2008 | US20080131795 Method for adjusting lithographic mask flatness using thermally induced pellicle stress |
06/05/2008 | US20080131794 Optical member comprising OD-doped silica glass |
06/05/2008 | US20080131793 Method for forming hard mask patterns having a fine pitch and method for forming a semiconductor device using the same |
06/05/2008 | US20080131792 Method of Correcting Photomask Defect |
06/05/2008 | US20080131791 patterns comprising moldings formed on the flexible substrates and adjustment markings having a refractive index, formed on the moldings |
06/05/2008 | US20080131790 Structure Design and Fabrication on Photomask For Contact Hole Manufacturing Process Window Enhancement |
06/05/2008 | US20080131789 Method for photomask fabrication utilizing a carbon hard mask |
06/05/2008 | US20080131788 Method to automatically repair trim photomask design rule violations for alternating phase shift lithography |
06/05/2008 | US20080130982 Pattern inspection apparatus and method |
06/05/2008 | US20080128634 Method and apparatus for surface potential reflection electron mask lithography |