| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 06/26/2007 | US7235350 Alumina insulation for coating implantable components and other microminiature devices |
| 06/26/2007 | US7235348 Water soluble negative tone photoresist |
| 06/26/2007 | US7235346 flexible, metallic support, adhesive layer, photopolymerizable layer which can be developed in organic media which comprises at least one elastomeric binder, ethylenically unsaturated monomers, a photoinitiator or photoinitiator system and plasticizer, transparent substrate layer, and protective film |
| 06/26/2007 | US7234196 Tool for removing particles from reticle |
| 06/21/2007 | WO2007070349A1 Improved method for etching photolithographic substrates |
| 06/21/2007 | WO2007069480A1 Aligner and aligning method |
| 06/21/2007 | WO2007069417A1 Reflection-type mask blank for euv lithography, and substrate with electrically conductive film for the mask blank |
| 06/21/2007 | WO2007068617A1 Method for making a reflection lithographic mask and mask obtained by said method |
| 06/21/2007 | WO2007068614A1 Reflection lithography mask and method for making same |
| 06/21/2007 | US20070142617 Polymer for hard mask of semiconductor device and composition containing the same |
| 06/21/2007 | US20070141483 Near-field exposure photoresist and fine pattern forming method using the same |
| 06/21/2007 | US20070141482 mask for crystallizing silicon capable of decreasing the disadvantageous effects of a boundary on a poly silicon thin film formed from overlapping irradiation of a laser beam, thereby improving electrical characteristics of the silicon |
| 06/21/2007 | US20070141481 photoresists with varying transmissive areas; halftones |
| 06/21/2007 | US20070141480 including a first pattern portion having a first minimum dimension and a second pattern portion having a second minimum dimension includes a first exposure step of performing exposure using a Levenson-type mask and a second exposure step of performing exposure using a half tone-type mask |
| 06/21/2007 | US20070141479 mask pattern includes a main pattern to be transferred through exposure and an auxiliary pattern that diffracts exposing light and is not transferred through the exposure; can improve contrast in forming a pattern in an arbitrary shape |
| 06/21/2007 | US20070141478 sequential lateral solidification (SLS) with two laser irradiations using a mask for patterning the laser beam so as to increase the grain length |
| 06/21/2007 | US20070141477 Optical proximity correction method, optical proximity correction mask and conductive line structure |
| 06/21/2007 | US20070141476 More accurate and physical method to account for lithographic and etch contributions in OPC models |
| 06/20/2007 | EP1798595A1 Fabrication mehod for photomask, fabrication method for device and monitoring method for photomask |
| 06/20/2007 | CN1983036A Binary sinusoidal sub-wavelength gratings as alignment marks |
| 06/20/2007 | CN1983028A Mask blank and method for manufacturing transfer mask |
| 06/20/2007 | CN1983027A Color filter mask layout |
| 06/20/2007 | CN1983026A Polymer for hardmask of semiconductor device and composition containing the same |
| 06/20/2007 | CN1983025A Fabrication method for photomask, fabrication method for device and monitoring method for photomask |
| 06/20/2007 | CN1983024A Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask |
| 06/20/2007 | CN1983023A Method and system for detecting corrugation defect and manufacturing method of photomask |
| 06/20/2007 | CN1983022A Method for generating chopper and light-transmitting belt GDSII data |
| 06/20/2007 | CN1983003A Manufacturing method of dsplay device and mold therefor |
| 06/20/2007 | CN1982924A Color optical filter and its production |
| 06/20/2007 | CN1322546C Design of pivture, optical mask and photoetching colloid figure, and method for making smiconductor device |
| 06/20/2007 | CN1322351C Crystallizer and crystallizing method |
| 06/19/2007 | US7234130 Long range corrections in integrated circuit layout designs |
| 06/19/2007 | US7233887 Method of photomask correction and its optimization using localized frequency analysis |
| 06/19/2007 | US7232995 Method of removing particle of photomask using atomic force microscope |
| 06/19/2007 | US7232631 Silicon oxide on silicon substrate; controlling thickness; doping with boron, phorphosus |
| 06/19/2007 | US7232630 Increasing intensity in an aerial image from openings on the complementary mask that are below threshold so that opening meets or exceeds threshold; improving effectiveness of critical openings that are otherwise too small to print |
| 06/19/2007 | US7232629 Method of forming and testing a phase shift mask |
| 06/19/2007 | US7232499 Method of preparing plastic materials to allow lamination of a pre-press color proof |
| 06/14/2007 | WO2007035166A3 Methods and systems for pattern generation based on multiple forms of design data |
| 06/14/2007 | US20070134568 Halftone type phase shift mask blank and halftone type phase shift mask |
| 06/14/2007 | US20070134567 Mask and method of manufacturing display device using the same |
| 06/14/2007 | US20070134566 Titania-doped quartz glass and making method, EUV lithographic member and photomask substrate |
| 06/14/2007 | US20070134564 Method of manufacturing semiconductor device, mask and semiconductor device |
| 06/14/2007 | US20070134563 Photomask and method of manufacturing semiconductor device |
| 06/14/2007 | US20070134562 Fabrication method for photomask, fabrication method for device and monitoring method for photomask |
| 06/14/2007 | US20070134561 Systems and methods for reducing edge effects |
| 06/14/2007 | US20070134560 Lithography system using a programmable electro-wetting mask |
| 06/14/2007 | US20070133873 Document management method and apparatus |
| 06/14/2007 | US20070132068 Large-sized substrate and method of producing the same |
| 06/14/2007 | US20070131246 Substrate processing method and substrate processing apparatus |
| 06/14/2007 | US20070131244 Method and apparatus for removing minute particles from a surface |
| 06/13/2007 | EP1795506A1 Titania-doped quartz glass and making method, euv lithographic member and photomask substrate |
| 06/13/2007 | CN1980841A Glass substrate storage case, glass substrate exchange device, glass substrate management device, glass substrate distribution method, seal member, and seal structure using the seal member |
| 06/13/2007 | CN1321440C Forming method of contact hole and manufacturing method of semiconductor device |
| 06/13/2007 | CN1321352C Lithographic antireflective hardmask compositions and uses thereof |
| 06/12/2007 | US7231629 Feature optimization using enhanced interference mapping lithography |
| 06/12/2007 | US7231628 Method and system for context-specific mask inspection |
| 06/12/2007 | US7229932 Method and structure for fabricating a halftone mask for the manufacture of semiconductor wafers |
| 06/12/2007 | US7229725 Heating the photomask blank to dehydrate the resist, cooling the blank in a nitrogen-purged environment to room temperature, such that the resist has a level of exposure sensitivity approximate to the resist as when initially applied onto the blank; and patterning an image into the photoresist |
| 06/12/2007 | US7229724 Optical transmission pattern; etching edges; on radiation transparent substrate |
| 06/12/2007 | US7229723 Method for forming an opening in a light-absorbing layer on a mask |
| 06/12/2007 | US7229722 Alternating phase shift mask design for high performance circuitry |
| 06/12/2007 | US7229721 comprises preparing a photo mask including a unit drawing pattern, finding a dimensional variation relating to the photo mask; judging quality of the photo mask by comparing the actual and allowable deteriorated amount of the exposure latitude |
| 06/12/2007 | CA2264843C Phase mask for machining optical fibers, and its fabrication method |
| 06/07/2007 | WO2007064386A1 Technique for separating a mold from solidified imprinting material |
| 06/07/2007 | WO2007063021A1 Extreme ultraviolet photolithography mask, with absorbent cavities |
| 06/07/2007 | WO2007062963A1 Oxime ester photoinitiators |
| 06/07/2007 | US20070130558 Methods and systems for pattern generation based on multiple forms of design data |
| 06/07/2007 | US20070128557 Phototool coating |
| 06/07/2007 | US20070128556 Method of manufacturing semiconductor integrated circuit devices |
| 06/07/2007 | US20070128552 Manufacturing method of pattern formed body and pattern formed body manufacturing apparatus |
| 06/07/2007 | US20070128528 Mask blank and photomask having antireflective properties |
| 06/07/2007 | US20070128527 A wafer for a circuit having a transparent substrate with a pattern light-reducing layer having sidewalls with openings to expose non-patterned regions and having an angle of < 90 degrees improve intensity balance of an image-formed by light-transmitted through the mask |
| 06/07/2007 | US20070128526 Photolithography; semiconductors |
| 06/07/2007 | US20070128525 Sub-resolution assist features for photolithography with trim ends |
| 06/07/2007 | US20070128524 Method of arranging mask patterns |
| 06/07/2007 | US20070127806 Pattern inspection apparatus |
| 06/07/2007 | US20070127037 Position sensor, method for detecting horizontal and vertical position, alignment apparatus including position sensor, and method for horizontal and vertical alignment |
| 06/07/2007 | US20070127024 Polarization evaluation mask, polarization evaluation method, and polarization determination device |
| 06/07/2007 | US20070126150 Bifurcated contact printing technique |
| 06/07/2007 | US20070125747 Process for polishing glass substrate |
| 06/06/2007 | EP1793279A2 Lithographic apparatus and device manufacturing method |
| 06/06/2007 | EP1478976A4 Critical dimension control using full phase and trim masks |
| 06/06/2007 | CN1977360A Exposure apparatus, exposure method, and exposure mask |
| 06/06/2007 | CN1976021A Multipurpose measurement marking, and method, system and computer program product using the same |
| 06/06/2007 | CN1975569A Method of manufacturing gray scale mask and microlens, microlens, spatial light modulating apparatus and projector |
| 06/06/2007 | CN1975568A Pattern forming method using photomask |
| 06/06/2007 | CN1975567A Phase shift mask |
| 06/06/2007 | CN1320601C Manufacturing method of electron device |
| 06/06/2007 | CN1320405C Light shield processor and method for processing light shield using same |
| 06/06/2007 | CN1320404C Modular optical proximate correction configuration and method thereof applicable for integrated circuit |
| 06/05/2007 | US7228523 Method of automatically correcting mask pattern data and program for the same |
| 06/05/2007 | US7226866 Etching method for making a reticle |
| 06/05/2007 | US7226708 Forming a first layer of attenuating material over a portion of the substrate;forming a another layer of material over a portion of the first layer;forming a second layer of attenuating material over a portion of the another layer of material;forming an opaque layer, etching substrate |
| 06/05/2007 | US7226707 Methods of printing structures |
| 06/05/2007 | US7226706 using a blocker to prevent electron beams from hitting the outer region for an area more than 90 percent of the outer region when patterning a predetermined feature on the substrate; comprising: a non-conductive substrate; and a layer of conductive material on substrate |
| 06/05/2007 | US7226705 Method of manufacturing a mask blank and a mask, the mask blank and the mask, and useless film removing method and apparatus |
| 05/31/2007 | US20070124718 Mask manufacturing system, mask data creating method and manufacturing method of semiconductor device |
| 05/31/2007 | US20070124714 Method for designing semiconductor integrated circuit layout |
| 05/31/2007 | US20070124708 Contrast based resolution enhancement for photolithographic processing |