| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 03/06/2008 | US20080055609 Method and system for measuring patterned structures |
| 03/06/2008 | US20080055606 Apparatus and method for inspecting a pattern and method for manufacturing a semiconductor device |
| 03/06/2008 | US20080054195 Substrate cover, and charged particle beam writing apparatus and method |
| 03/06/2008 | US20080053488 Substrate treatment apparatus and substrate treatment method |
| 03/06/2008 | US20080052947 Substrate processing method and substrate processing apparatus |
| 03/06/2008 | DE112006000716T5 Teildurchlässiger Absorber für Extrem-Ultraviolett-Maske The partly transparent absorbers for extreme ultraviolet mask |
| 03/05/2008 | CN101137989A Image processing method, image processor and image drawing system |
| 03/05/2008 | CN101136320A Substrate treatment apparatus and substrate treatment method |
| 03/05/2008 | CN101136319A Substrate processing method and substrate processing apparatus |
| 03/05/2008 | CN101135842A Method for copying nano autogram formwork |
| 03/05/2008 | CN101135841A Method of manufacturing a broad stamper |
| 03/05/2008 | CN101135840A Method of forming a mask structure and method of forming a minute pattern using the same |
| 03/05/2008 | CN100373590C Layout method of semiconductor integrated circuit, layout structure thereof, and photomask for forming the layout structure |
| 03/05/2008 | CN100373489C Disc original edition making method |
| 03/05/2008 | CN100373260C Fluoropolymer-coated photomasks for photolithography |
| 03/05/2008 | CN100373258C Photomask, method of producing it and pattern forming method using the photomask |
| 03/04/2008 | US7339652 Apparatus for projecting a pattern into an image plane |
| 03/04/2008 | US7338749 Forming image mask; discharging oil-based ink by ink jets; exposure, development |
| 03/04/2008 | US7338736 Method of fabricating a phase shift mask |
| 03/04/2008 | US7338609 Partial edge bead removal to allow improved grounding during e-beam mask writing |
| 02/28/2008 | WO2008023660A1 Mask pattern designing method and semiconductor device manufacturing method using the same |
| 02/28/2008 | US20080052660 Method of correcting a designed pattern of a mask |
| 02/28/2008 | US20080052334 Original data producing method and original data producing program |
| 02/28/2008 | US20080050661 Photomask fabrication utilizing a carbon hard mask |
| 02/28/2008 | US20080050660 Multi-Layer Body Including a Diffractive Relief Structure and Method for Producing the Same |
| 02/28/2008 | US20080050659 Method of Patterning Self-Organizing Material, Patterned Substrate of Self-Organizing Material and Method of Producing the Same, and Photomask Using Patterned Substrate of Self-Organizing Material |
| 02/28/2008 | US20080050582 Multi-level optical structure and method of manufacture |
| 02/28/2008 | US20080050010 Apparatus for correcting defects in a reticle pattern and correcting method for the same |
| 02/28/2008 | US20080050008 Image correction method and apparatus for use in pattern inspection system |
| 02/28/2008 | US20080050007 Pattern inspection apparatus and method with enhanced test image correctability using frequency division scheme |
| 02/28/2008 | US20080049225 Photomask evaluation method and manufacturing method of semiconductor device |
| 02/28/2008 | US20080049203 Exposure apparatus |
| 02/28/2008 | DE102006037433A1 Verfahren zur Herstellung mindestens eines Mehrschichtkörpers sowie Mehrschichtkörper A process for preparing at least one multi-layer body as well as multi-layer body |
| 02/27/2008 | EP1892571A1 Method for managing light exposure mask and light exposure mask |
| 02/27/2008 | EP1892570A2 Method for cleaning photo mask |
| 02/27/2008 | EP1892046A1 Method of cleaning storage case |
| 02/27/2008 | EP1805560A4 Edge cure prevention composition and process for using the same |
| 02/27/2008 | CN101133362A Methods for repairing an alternating phase-shift mask |
| 02/27/2008 | CN101131539A LCD panel, LCD light reflection structure and their manufacturing method |
| 02/27/2008 | CN101131535A Photomask having haze reduction layer |
| 02/27/2008 | CN100372058C Laser beam pattern mask and crystallization method using the same |
| 02/26/2008 | US7337426 Pattern correcting method, mask making method, method of manufacturing semiconductor device, pattern correction system, and computer-readable recording medium having pattern correction program recorded therein |
| 02/26/2008 | US7337423 Mask pattern generating method and mask pattern generating apparatus |
| 02/26/2008 | US7335449 The light-shielding layer is patterned to form a main pattern and a phantom pattern; eliminate optical proximity effects; substrate with the phantom pattern can be narrower; etched to form trenches in the substrate; photolithographic process to make semiconductor wafer |
| 02/21/2008 | WO2008021952A2 Patterning compositions, masks, and methods |
| 02/21/2008 | WO2008021823A1 Method to minimize cd etch bias |
| 02/21/2008 | WO2008020265A1 Method and apparatus for designing an integrated circuit |
| 02/21/2008 | US20080045042 Method for crystalizing amorphous silicon layer and mask therefor |
| 02/21/2008 | US20080045000 Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording medium |
| 02/21/2008 | US20080044768 defocusing into a beam used during production of the mask to image the pattern on the mask; may eliminate the need for a second exposure with a trim mask; alignment problems associated with the second exposure may be avoided; single exposure may be more compatible with high speed manufacturing |
| 02/21/2008 | US20080044745 Process for production of pattern-forming body |
| 02/21/2008 | US20080044744 Improved energy efficiency with simplified manufacturing process; a dielectric layer is formed over a light absorbing layer, selective exposure, forming a conductive film; televisions, video cameras, cellular phones, computers |
| 02/21/2008 | US20080044741 Metrology systems and methods for lithography processes |
| 02/21/2008 | US20080044740 Photomask having haze reduction layer |
| 02/21/2008 | US20080044739 Correction Of Resist Critical Dimension Variations In Lithography Processes |
| 02/21/2008 | US20080043909 X-Ray Alignment System For Fabricating Electronic Chips |
| 02/21/2008 | US20080043318 Color electro-optic displays, and processes for the production thereof |
| 02/20/2008 | EP1889125A2 Printing element with an integral printing surface |
| 02/20/2008 | EP1888455A2 An article, and a method for creating the article, with a chemically patterned surface |
| 02/20/2008 | EP1292361B1 Methods utilizing scanning probe microscope tips and products therefor or produced thereby |
| 02/20/2008 | CN101127354A Integrated circuit and mask set for forming integrated circuit |
| 02/20/2008 | CN101127056A Method for changing physical layout data using virtual layer |
| 02/20/2008 | CN101126906A Secondary exposure method using two photomasks in semiconductor production process |
| 02/20/2008 | CN101126903A Holographic eliminating aberration method and its projection lithography system |
| 02/20/2008 | CN101126897A Continuous surface micro-structure forming method based on microlens array |
| 02/20/2008 | CN101126893A Forming method for protecting image |
| 02/20/2008 | CN101126892A Mask for forming contact hole |
| 02/20/2008 | CN100370347C Transverse electric-field type liquid crystal display device, its making method and scanning exposure device |
| 02/19/2008 | USRE40084 Utilizing halftoning structures to manipulate the relative magnitudes of diffraction orders to ultimately construct the desired projected-image |
| 02/19/2008 | US7334212 Method for interlayer and yield based optical proximity correction |
| 02/19/2008 | US7332734 Lithography apparatus and pattern forming method using the same having an liquid crystal panel for a photo mask function |
| 02/19/2008 | US7332252 Method of forming a mask layout and layout formed by the same |
| 02/19/2008 | US7332250 Photomask |
| 02/19/2008 | US7332098 Phase shift mask and fabricating method thereof |
| 02/14/2008 | WO2008017426A1 Method for producing at least one multilayer body, and multilayer body |
| 02/14/2008 | US20080037860 Pattern inspection apparatus, image alignment method, displacement amount estimation method, and computer-readable recording medium with program recorded thereon |
| 02/14/2008 | US20080037858 Simultaneous computation of multiple points on one or multiple cut lines |
| 02/14/2008 | US20080036987 Manufacturing method of display device and exposure system for that |
| 02/14/2008 | US20080036986 Photomask, method and apparatus that uses the same, photomask pattern production method, pattern formation method, and semiconductor device |
| 02/14/2008 | US20080036899 Target workpiece inspection apparatus, image alignment method, and computer-readable recording medium with program recorded thereon |
| 02/14/2008 | US20080035980 Mask for forming contact hole |
| 02/13/2008 | EP1887615A1 Sensor calibration method, exposure method, exposure device, device fabrication method, and reflection type mask |
| 02/13/2008 | EP1540665A4 Photolithography mask repair |
| 02/13/2008 | CN201021972Y Roller special for emulating PVC yarn product |
| 02/13/2008 | CN101122739A Sub-wavelength continuous surface micro-structure preparation method based on negative refractive rate lens |
| 02/13/2008 | CN101122737A Photomask registration errors of which have been corrected and method of correcting registration errors of photomask |
| 02/13/2008 | CN101122736A An improved CPL mask and a method and program product for generating the same |
| 02/13/2008 | CN101122735A Photomask, exposing method and instrument, image manufacturing and forming method, and semiconductor device |
| 02/12/2008 | US7331025 Data storage method and data storage device |
| 02/12/2008 | US7330202 Method for correcting skewed recording when exposing printing originals |
| 02/12/2008 | US7329881 Charged-particle beam system |
| 02/12/2008 | US7329475 which are quadrangular; substrate in which the difference between the maximum and minimum values for the height among all the measurement points is less than 0.5 mu m is selected |
| 02/12/2008 | US7329474 For use in the microfabrication of semiconductor integrated circuits |
| 02/07/2008 | US20080032437 Exposure method for upper layer of hole of semiconductor device |
| 02/07/2008 | US20080032231 acid generator is added to a resist lower layer material whereby the acid does not volatize even during baking, and in a resist pattern process, the amine contaminant from the substrate can be neutralized; possible to reduce a harmful effect such as trailing skirts of the upper layer resist |
| 02/07/2008 | US20080032214 Photoresist trimming process |
| 02/07/2008 | US20080032213 Mask blanks |
| 02/07/2008 | US20080032212 High Definition Mask and Manufacturing Method of the Same |
| 02/07/2008 | US20080032211 photomasks; photolithography; semiconductors; prevent line-end shortening |
| 02/07/2008 | US20080032210 Method for fabricating mask and device isolation film |