| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 05/08/2008 | WO2008053719A1 Plate making method, printing plate image output device, image editing device and printing plate image output system |
| 05/08/2008 | WO2008052358A1 Microfluidic device having an array of spots |
| 05/08/2008 | WO2008033879A3 Method for achieving compliant sub-resolution assist features |
| 05/08/2008 | US20080107976 Hardware and software for directing a beam through a mask onto a wafer surface to outline a circuit pattern; photolithography system including an exposure tool, a mask, array of micromechanical mirrors capable of real time configurable imaging, and addressing circuitry |
| 05/08/2008 | US20080107975 Method of Correcting Photomask Defect |
| 05/08/2008 | US20080107974 Photomask, multiphase exposure method, and method of manufacturing semiconductor device including insulating gate-type transistors |
| 05/08/2008 | US20080107973 Comprising a regeneration target film forming a convex part of a formation surface and a light shielding unit that is configured deeper than a bottom of the formation surface and that regenerates the regeneration target film |
| 05/08/2008 | US20080107972 Halftone mask and method for making pattern substrate using the halftone mask |
| 05/08/2008 | US20080107971 Silylphenylene Polymer Composition For The Formation Of Interlayers And Process For The Formation Of Patterns By Using The Same |
| 05/08/2008 | US20080107970 Prevents occurrence of a transfer pattern defect by correcting a recessed defect existing on the surface of the transparent substrate to cause a reduction in transmission light quantity; crystal display device |
| 05/08/2008 | US20080106740 Dual stage defect region identification and defect detection method and apparatus |
| 05/08/2008 | US20080106719 Compensating Masks, Multi-Optical Systems Using the Masks, and Methods of Compensating for 3-D Mask Effect Using the Same |
| 05/08/2008 | US20080106716 Photomask, exposure method and apparatus that use the same, and semiconductor device |
| 05/08/2008 | DE112006001006T5 Bearbeitungsverfahren mit einem fokussierten Ionenstrahl und Einrichtung zur Durchführung des Verfahrens Processing methods using a focused ion beam, and means for carrying out the method |
| 05/08/2008 | DE102007049556A1 Verfahren zum Korrigieren eines Defektes einer Fotomaske A method of correcting a defect of a photomask |
| 05/08/2008 | DE102006040729A1 Layout transferring method for electronic module, involves transferring layout to photo-sensitive foil from plastic material by selective exposure of photo-sensitive foil, and applying selectively exposed foil on surface of substrate |
| 05/08/2008 | DE10136291B4 Photolithographische Maske Photolithographic mask |
| 05/08/2008 | CA2666378A1 Microfluidic device having an array of spots |
| 05/07/2008 | EP1918971A2 Method and apparatus for photomask plasma etching |
| 05/07/2008 | EP1918776A1 Etching of nano-imprint templates using an etch reactor |
| 05/07/2008 | EP1918775A2 Mask etch process |
| 05/07/2008 | CN101176039A Method of making an article bearing a relief image using a removable film |
| 05/07/2008 | CN101174581A Method and system for optimizing intra-field critical dimension uniformity using a sacrificial twin mask |
| 05/07/2008 | CN101174083A Protective film assembly container |
| 05/07/2008 | CN101174082A Endpoint detection for photomask etching |
| 05/07/2008 | CN101174081A Mask etch process |
| 05/07/2008 | CN100386843C Mask protective layer for photoetching and its manufacturing method |
| 05/06/2008 | US7370314 Method and program for generating layout data of a semiconductor integrated circuit and method for manufacturing a semiconductor integrated circuit with optical proximity correction |
| 05/06/2008 | US7369196 Color filter |
| 05/06/2008 | US7368732 Lithographic apparatus, device manufacturing method, device manufactured thereby, and computer program |
| 05/06/2008 | US7368225 Exposing isolated regions in photoresist layer through a second mask different from the first mask using second focus; etching the first layer using the patterned photoresist layer as a mask |
| 05/06/2008 | US7368208 Measuring phase errors on phase shift masks |
| 05/06/2008 | US7368204 Includes a transmissive portion defining a crystallization pattern and an alignment pattern, and a shielding portion surrounding the transmissive portion; use making an liquid crystal display (LCD) device where a driving circuit and a pixel thin film transistor are formed on a single substrate |
| 05/02/2008 | WO2008050644A1 Sputtering target used for production of reflective mask blank for euv lithography |
| 05/02/2008 | WO2008049844A1 High resolution imaging process using an in-situ image modifying layer |
| 05/01/2008 | US20080103037 Extreme ultraviolet lithography exposure devices; |
| 05/01/2008 | US20080102385 Substrate is coated with a colored photoresist layer; layer is patterned; curing, descumming to remove the residual pigments without causing significant damage to the remaining color filter array pattern |
| 05/01/2008 | US20080102383 photomasks comprising a non-phase shifting, phase shifting and opaque segemnts, for use in photolithography to produce patterns having a very fine pitch |
| 05/01/2008 | US20080102382 applying photoresists to layers, multilayer stacks, or masking substrates, then exposing , developing and etching |
| 05/01/2008 | US20080102381 analyzing impurities adsorbed on the surfaces of photomasks used for lithography in semiconductor manufacturing |
| 05/01/2008 | US20080102380 High density lithographic process |
| 05/01/2008 | US20080099835 recess is formed by using a recess exposure mask with an isolated light transmitting pattern so that the recess may be formed only on an active region, and an edge of the active region is protected from damage; production time and expense are reduced, yet device productivity is improved |
| 05/01/2008 | US20080099674 Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof |
| 05/01/2008 | US20080099438 Wavefront modulation methods for EUV maskless lithography |
| 04/30/2008 | DE102006050363A1 Photo mask production, with resist materials on a structured substrate surface, illuminates the resist stack at different doses in a single stage |
| 04/30/2008 | CN101171584A Structure and methodology for fabrication and inspection of photomasks |
| 04/30/2008 | CN101171545A Computer readable mask shrink control processor |
| 04/30/2008 | CN101169550A Colorful filter substrate and pattern mask |
| 04/29/2008 | US7367010 Designing method and device for phase shift mask |
| 04/29/2008 | US7367009 Convergence technique for model-based optical and process correction |
| 04/29/2008 | US7366342 Simultaneous computation of multiple points on one or multiple cut lines |
| 04/29/2008 | US7365901 Pattern generator |
| 04/29/2008 | US7365829 Method and apparatus for image formation |
| 04/29/2008 | US7365022 Additive printed mask process and structures produced thereby |
| 04/29/2008 | US7365014 Reticle fabrication using a removable hard mask |
| 04/29/2008 | US7364838 Gray level imaging masks, optical imaging apparatus for gray level imaging masks and methods for encoding mask and use of the masks |
| 04/29/2008 | US7364822 Semiconductors, liquid crystal displays; patterning any size or shape by exposure using only one photomask; the mask pattern has a light-shielding film and a phase shifter |
| 04/29/2008 | US7364821 Laser mask and method of crystallization using the same |
| 04/24/2008 | WO2008047733A1 Near field exposure mask, method of forming resist pattern using the mask, and method of producing device |
| 04/24/2008 | US20080096756 Titania-silica glass |
| 04/24/2008 | US20080096138 Method of reducing critical dimension bias during fabrication of a semiconductor device |
| 04/24/2008 | US20080096114 Neck height equalization in magnetic write pole mold |
| 04/24/2008 | US20080096113 in the second exposure, an exposure light is incident on a region where the inspection mark is projected in the first exposure |
| 04/24/2008 | US20080094591 Mounting a Pellicle to a Frame |
| 04/24/2008 | DE102007049970A1 Titandioxid-Siliziumdioxid-Glas Titania-silica-glass |
| 04/23/2008 | CN100383664C Low cost photo etching technique |
| 04/22/2008 | US7362417 Pellicle frame and pellicle for photolithography using the same |
| 04/22/2008 | US7361609 Mask patterns for semiconductor device fabrication and related methods |
| 04/22/2008 | US7361530 Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light |
| 04/22/2008 | US7361454 Exposing a resist film formed on semiconductor substrate to a light using photomask in which patterns are arranged two-dimensionally at a predetermined altitude; development; reducing an opening size; setting a reflow start temperature, heating; coating with water soluble resin; crosslinking; etching |
| 04/22/2008 | US7361436 Light shield zones; chromium film and phase shifting mask on radiation transparent substrate; design masking pattern |
| 04/22/2008 | US7361435 Alternating phase shifting masking; generating destructive interference |
| 04/22/2008 | US7361434 for projection of patterns onto substrate such as semiconductor wafers |
| 04/22/2008 | US7361433 Photomask for forming photoresist patterns repeating in two dimensions and method of fabricating the same |
| 04/22/2008 | US7361248 Method for forming color filter, method for forming light emitting element layer, method for manufacturing color display device comprising them, or color display device |
| 04/17/2008 | US20080090182 Method for manufacturing microlens |
| 04/17/2008 | US20080090159 photomask blank comprising a multilayer film including at least four layers of different compositions, wherein the interface between the layers is moderately graded in composition; a phase shift mask blank comprising a phase shift film of at least two layers including a surface layer of a composition |
| 04/17/2008 | US20080090158 designing an index profile suitable for encoding into a phase mask for manufacturing a complex optical grating is provided. The optical grating corresponds to a target index profile defining a target spectral response. A modified index profile is set equal to the target index profile |
| 04/17/2008 | US20080090157 Photo mask with improved contrast and method of fabricating the same |
| 04/17/2008 | US20080090156 Photo mask having assist pattern and method of fabricating the same |
| 04/17/2008 | US20080090155 of a contact lithography module, a pattern tool and a substrate to prevent pattern misalignment |
| 04/17/2008 | DE10346561B4 Verfahren zur Herstellung einer Photomaske mit einer Transparenzeinstellschicht A method for producing a photomask having a Transparenzeinstellschicht |
| 04/16/2008 | CN101164070A Locating sub-resolution assist features in semiconductor device fabrication |
| 04/16/2008 | CN101162363A Alternating phase shift mask inspection using biased inspection data |
| 04/16/2008 | CN100382250C Device for fabricating a mask by plasma etching a semiconductor substrate |
| 04/15/2008 | USRE40239 Illumination device for projection system and method for fabricating |
| 04/15/2008 | US7359546 Defect inspection apparatus and defect inspection method |
| 04/15/2008 | US7359091 Multi-bit output sampled threshold array halftoner |
| 04/10/2008 | WO2008025433A3 Method and apparatus for the spatially resolved determination of the phase and amplitude of the electromagnetic field in the image plane of an image of an object |
| 04/10/2008 | WO2008008159A3 Electron induced chemical etching and deposition for circuit repair |
| 04/10/2008 | WO2005036600A3 System and method for automatically mounting a pellicle assembly on a photomask |
| 04/10/2008 | US20080086715 Method for interlayer and yield based optical proximity correction |
| 04/10/2008 | US20080086712 Method of designing a pattern |
| 04/10/2008 | US20080085477 Method and apparatus for processing a wafer |
| 04/10/2008 | US20080085458 alkylsulfonyloximes are reactive nonionic photoacid generators; thermally stable at high bake temp; chemically stable; high photosensitivity not only at Deep-UV range but longer wavelengths such as i-line (365 nm); acid catalyst in chemically amplified photoresist; sulfonylation of oximes; color filter |
| 04/10/2008 | US20080085457 Exposure mask and method of manufacturing a film pattern |
| 04/10/2008 | US20080085456 Radiation mask with spatially variable transmissivity |
| 04/10/2008 | US20080084728 Semiconductor device |
| 04/10/2008 | US20080084567 System for Scatterometric Measurements and Applications |
| 04/10/2008 | US20080084563 Polarization evaluation mask, polarization evaluation method, and polarization determination device |