| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
|---|
| 01/16/2008 | CN101105624A Photomask and method of exposure |
| 01/16/2008 | CN101105623A Method for manufacturing inclined line at light mask |
| 01/16/2008 | CN101105622A Method for repairing light mask image |
| 01/16/2008 | CN100362628C Self-aligning method for outskirt state phase shifting light shade |
| 01/15/2008 | US7320104 Text grid creation tools |
| 01/15/2008 | US7319507 Apparatus and method for removing contaminant on original, method of manufacturing device, and original |
| 01/10/2008 | US20080010628 Method of manufacturing a mask |
| 01/10/2008 | US20080008942 Prevention of photoresist scumming |
| 01/10/2008 | US20080008941 coating wafer with photoresist film, irradiating; phase shifters containing molybdenum silicides; photolithography; waveguide effect prevention |
| 01/10/2008 | US20080008940 Glass mask used for patterning and manufacturing method and apparatus therefor |
| 01/10/2008 | US20080006302 Substrate treatment method and substrate treatment apparatus |
| 01/10/2008 | US20080006291 Cleaning method and cleaning apparatus |
| 01/10/2008 | DE112006000392T5 Prüfverfahren für lichtdurchlässigen Gegenstand Test method for translucent object |
| 01/09/2008 | EP1876494A1 An improved CPL mask and a method and program product for generating the same |
| 01/09/2008 | EP1875309A2 Method for monitoring a reticle |
| 01/09/2008 | EP1875308A1 Adjustable mask blank structure for an euv phase-shift mask |
| 01/09/2008 | EP1875307A1 Method for mask inspection for mask design and mask production |
| 01/09/2008 | CN101101870A Apparatus and method for crystallization |
| 01/09/2008 | CN101101858A Substrate treatment method and substrate treatment apparatus |
| 01/09/2008 | CN101101440A Glass mask used for patterning and manufacturing method and apparatus therefor |
| 01/09/2008 | CN100361022C Optical mask liquid crystal projection color developing method and its device |
| 01/08/2008 | US7316958 Masks for fabricating semiconductor devices and methods of forming mask patterns |
| 01/08/2008 | US7316934 Personalized hardware |
| 01/08/2008 | US7316872 Etching bias reduction |
| 01/08/2008 | US7316871 Mask pattern with edges having inverted shapes to alleviate the effects of diffraction of laser beams to reduce overlap regions such that crystallization characteristics are improved |
| 01/08/2008 | US7316870 Device manufacturing method, mask set for use in the method, data set for controlling a programmable patterning device, method of generating a mask pattern and a computer program |
| 01/08/2008 | US7316869 Mounting a pellicle to a frame |
| 01/08/2008 | CA2308757C Composite relief image printing plates |
| 01/03/2008 | WO2008001593A1 Exposing method, exposing device, and device manufacturing method |
| 01/03/2008 | WO2008001431A1 Large pellicle forming substrate |
| 01/03/2008 | WO2007084774A3 Patterning substrates employing multiple chucks |
| 01/03/2008 | WO2003019272A3 Exposure mask |
| 01/03/2008 | US20080003511 Resist for soft mold and method for fabricating liquid crystal display using the same |
| 01/03/2008 | US20080003510 Correction method and correction system for design data or mask data, validation method and validation system for design data or mask data, yield estimation method for semiconductor integrated circuit, method for imporving design rule, mask production method, and semiconductor integrated circuit production method |
| 01/03/2008 | US20080003508 A transparent substrate, a peripheral pattern formed on the transparent substrate along a contour of a target pattern to be transferred onto a wafer, and an assist pattern disposed inside the peripheral pattern thereby preventing the assist pattern from being undesirably on the target pattern |
| 01/03/2008 | US20080002194 Optical inspection method and optical inspection apparatus |
| 01/03/2008 | DE4407044B4 Verfahren zur Herstellung einer Maske A process for the production of a mask |
| 01/03/2008 | DE10356035B4 Verfahren zur Herstellung einer Photomaske A process for preparing a photomask |
| 01/02/2008 | EP1803031B1 Reflective lithographic mask and manufacturing method thereof |
| 01/02/2008 | EP1709488A4 Photosensitive printing sleeves and method of forming the same |
| 01/02/2008 | CN101097399A Moulds fabricating method |
| 01/02/2008 | CN100359343C Method for designing phase raster graphics and method for making photomask system containing it |
| 01/01/2008 | US7315999 Method and apparatus for identifying assist feature placement problems |
| 01/01/2008 | US7315994 Method and device for automated layer generation for double-gate FinFET designs |
| 01/01/2008 | US7315641 Pattern correcting method of mask for manufacturing a semiconductor device and recording medium having recorded its pattern correcting method |
| 01/01/2008 | US7315367 Defining a pattern on a substrate |
| 01/01/2008 | US7315354 Near-field exposure method and apparatus, near-field exposure mask, and device manufacturing method |
| 01/01/2008 | US7314690 Suppress the loading effect and achieve a high CD (critical dimension) accuracy when forming a highly accurate pattern by dry etching; photomask blank having, on the light-transmissive substrate, a chromium film, an etching mask film having a resistance against etching of the chromium film, and a resist |
| 01/01/2008 | US7314689 After aligning the mask or reticle substrate with a predetermined reference system, an offset angle of a feature to be processed is determined; substrate is rotated in a predetermined direction by the offset angle; and the feature is processed using the predetermined reference system |
| 01/01/2008 | US7314688 Method of producing a reflection mask blank, method of producing a reflection mask, and method of producing a semiconductor device |
| 12/27/2007 | WO2007147826A1 Layout processing system |
| 12/27/2007 | WO2007147674A2 Method for producing three-dimensionally structured surfaces |
| 12/27/2007 | WO2007147376A1 Method for structuring the surface of a pressed sheet or an endless strip |
| 12/27/2007 | US20070298334 Method of fabricating periodic domain inversion structure |
| 12/27/2007 | US20070298333 Manufacturing process of an organic mask for microelectronic industry |
| 12/27/2007 | US20070298332 Recesses are etched on surface of substrate to change refractive index of incident light; ultrafine patterns formed with decreased impact by proximity effect; photoresists; lithography |
| 12/27/2007 | US20070298331 Gas filling apparatus for photomask box |
| 12/27/2007 | US20070298330 Recticle pattern applied to mix-and-match lithography process and alignment method of thereof |
| 12/27/2007 | US20070298329 Photomask and method for using the same |
| 12/27/2007 | US20070296980 Integrated phase angle and optical critical dimension measurement metrology for feed forward and feedback process control |
| 12/26/2007 | EP1869595A2 Method of adding fabrication monitors to integrated circuit chips |
| 12/26/2007 | CN200996043Y Shielding frame assembly |
| 12/26/2007 | CN100357937C Method of preparing publication, electronic publication using method and dispaying method therefor and network system |
| 12/26/2007 | CN100357830C Method for making lithographic apparatus and device |
| 12/25/2007 | US7313781 Image data correction method, lithography simulation method, image data correction system, program, mask and method of manufacturing a semiconductor device |
| 12/25/2007 | US7313508 Process window compliant corrections of design layout |
| 12/25/2007 | US7312021 Creating a holographic representation of an image using a computer generated local encoding technique (LET); patterned material comprises transparent and opaque regions; three-dimensional patterns may be formed in photoresist layer of target one step; lithography; semiconductors |
| 12/25/2007 | US7312020 Lithography method |
| 12/25/2007 | US7312004 Exposed regions of a substrate are etched to a predetermined depth; Additional regions are exposed and trimmed to a predetermined thickness to provide desired attenuation amount; final etched depth compensating for the change of relative phase shift caused by trimming |
| 12/25/2007 | US7312003 Computer data signal embodied in electromagnetic waveform; manufacturing small dimension features of integrated circuit complex layouts; reduced phase conflicts |
| 12/20/2007 | US20070293386 Crystallized glass, and method for producing crystallized glass |
| 12/20/2007 | US20070292777 Method and apparatus for determining whether a sub-resolution assist feature will print |
| 12/20/2007 | US20070292775 Pellicle |
| 12/20/2007 | US20070292774 Method and system for optimizing intra-field critical dimension uniformity using a sacrificial twin mask |
| 12/20/2007 | US20070292773 Nano imprint master and method of manufacturing the same |
| 12/20/2007 | US20070292772 Structure Of A Lithography Mask |
| 12/20/2007 | US20070292771 Method and system for optimizing intra-field critical dimension uniformity using a sacrificial twin mask |
| 12/20/2007 | US20070292770 Photolithographic method and apparatus employing a polychromatic mask |
| 12/20/2007 | US20070292769 Method of Manufacturing Photomask Blank |
| 12/20/2007 | US20070292017 System And Method Of Providing Mask Defect Printablity Analysis |
| 12/20/2007 | US20070292014 Pattern inspection apparatus and method with local critical dimension error detectability |
| 12/20/2007 | US20070291261 Exposure apparatus, exposure method, and device manufacturing method |
| 12/20/2007 | US20070289943 Block copolymer mask for defining nanometer-scale structures |
| 12/20/2007 | DE10207131B4 Verfahren zur Bildung einer Hartmaske in einer Schicht auf einer flachen Scheibe A method of forming a hard mask in a layer on a flat disc |
| 12/20/2007 | DE102007017803A1 Vorrichtung und Verfahren zur Korrektur einer Halbleiterelement-Maske Apparatus and method for correcting a semiconductor element mask |
| 12/19/2007 | EP1868033A2 Pellicle |
| 12/19/2007 | CN101089729A Pellicle |
| 12/19/2007 | CN101089579A System for inspecting surfaces with improved light efficiency |
| 12/19/2007 | CN100356520C System and method for identifying dummy features on a mask layer |
| 12/19/2007 | CN100355587C Method for producing a partially metallised film-type element |
| 12/18/2007 | US7310129 Method for carrying out a double or multiple exposure |
| 12/18/2007 | US7309549 a maintenance system for locating a bump defect, depositing two layers of a protective coating, etching the first layer of protective coating and removing the bump defect; integrated circuits |
| 12/13/2007 | WO2007143572A1 Temperature control method for photolithographic substrate |
| 12/13/2007 | WO2007142365A1 Reflective mask blank for euv lithograhy and substrate with functional film for the same |
| 12/13/2007 | US20070287079 photoresists |
| 12/13/2007 | US20070287078 Reticle, semiconductor die and method of manufacturing semiconductor device |
| 12/13/2007 | US20070287077 Photomask and exposure method |
| 12/13/2007 | US20070287076 Extreme Ultraviolet; stress compensation layer between substrate and reflection layer; for fine semiconductor device photolithography; precision; molybdenum and silicon films; silicon wafers |
| 12/13/2007 | US20070287075 Mask arrangement, optical projection system and method for obtaining grating parameters and absorption properties of a diffractive optical element |
| 12/13/2007 | US20070287074 Controlled ambient reticle frame |