| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 10/02/2007 | US7277165 Method of characterizing flare |
| 10/02/2007 | US7277159 System and method for automatically mounting a pellicle assembly on a photomask |
| 10/02/2007 | US7277155 Exposure apparatus and method |
| 10/02/2007 | US7276327 Silicon-containing compositions for spin-on arc/hardmask materials |
| 10/02/2007 | US7276317 Polycrystalline silicon thin film having uniform crystallization characteristics |
| 10/02/2007 | US7276316 Providing a phase shift mask substrate having a layer of phase shifting material and a layer of an opaque material, and depositing a first resist layer on the substrate; resist layer is exposed by a direct write electron beam or laser energy source and developed, and the substrate is etched |
| 10/02/2007 | US7276315 Masking; radiation patterning tool |
| 09/27/2007 | WO2007108420A1 Scanning exposure apparatus, micro device manufacturing method, mask, projection optical apparatus and mask manufacturing method |
| 09/27/2007 | US20070226677 Performance in model-based opc engine utilizing efficient polygon pinning method |
| 09/27/2007 | US20070226676 Calculating method, verification method, verification program and verification system for edge deviation quantity, and semiconductor device manufacturing method |
| 09/27/2007 | US20070226675 Method of forming pattern writing data by using charged particle beam |
| 09/27/2007 | US20070224755 Semiconductor device manufacturing method including oblique ion implantation process and reticle pattern forming method |
| 09/27/2007 | US20070224629 Laser exposure of photosensitive masks for dna microarray fabrication |
| 09/27/2007 | US20070224542 Patterning method using photomask |
| 09/27/2007 | US20070224523 a substrate, a reflective layer formed on the substrate, an absorption pattern formed on the reflective layer and over a first portion of the substrate, a compensatory portion which is thinner than pattern, formed over the second portion of the substrate, second portion is adjacent to the first portion |
| 09/27/2007 | US20070224522 Substrate including deformed portions and method of adjusting a curvature of a substrate |
| 09/27/2007 | US20070224521 Photomask for forming a resist pattern and manufacturing method thereof, and resist-pattern forming method using the photomask |
| 09/27/2007 | US20070224519 The sub-resolution assist features improve corner rounding and allow optical proximity correction end features, such as hammerheads and serifs to be reduced in size or eliminated; reducing corner pullback, reticle mask-making critical dimension; microelectronic; micromechanical photolithography |
| 09/27/2007 | US20070224518 Overlay metrology using X-rays |
| 09/27/2007 | US20070224517 Programmable Self-Aligning Liquid Magnetic Nanoparticle Masks and Methods for Their Use |
| 09/27/2007 | US20070222974 Method and system for inspecting surfaces with improved light efficiency |
| 09/26/2007 | CN101044016A Optical element with an opaque chrome coating having an aperture and method of making same |
| 09/26/2007 | CN101042538A Method for changing dimension of photo mask pattern |
| 09/26/2007 | CN101042537A Detecting method for position of photomask graphics |
| 09/26/2007 | CN101042536A Method for reducing critical dimension of photoresist contact hole pattern |
| 09/26/2007 | CN101042528A Pattern dividing method for correcting optical near-field effect |
| 09/26/2007 | CN101042526A Mask data correction method, photomask and optical image prediction method |
| 09/26/2007 | CN100339940C Film electric crystal array substrate and its micro-shadow mfg. method, and light shade designing method |
| 09/26/2007 | CN100339765C Light cover for decreasing optical approaching effect |
| 09/25/2007 | US7275226 Method of performing latch up check on an integrated circuit design |
| 09/25/2007 | US7275006 Workpiece inspection apparatus assisting device, workpiece inspection method and computer-readable recording media storing program therefor |
| 09/25/2007 | US7273761 Box-in-box field-to-field alignment structure |
| 09/25/2007 | US7273684 Using ultraviolet radiation; masking; forming profiles; interference zones; semiconductor wafers |
| 09/20/2007 | WO2007105567A1 Color filter and photomask used for manufacturing same |
| 09/20/2007 | WO2007081813A3 Photolithographic systems and methods for producing sub-diffraction-limited features |
| 09/20/2007 | WO2007044630A3 Method and manufacture of multiple photomask patterns and computer readable medium |
| 09/20/2007 | US20070220477 Circuit-pattern-data correction method and semiconductor-device manufacturing method |
| 09/20/2007 | US20070218673 Manufacturing method of semiconductor device, reticle correcting method, and reticle pattern data correcting method |
| 09/20/2007 | US20070218373 Low-defect microparticle pattern, dot array pattern, or hole array pattern with less processing steps (no rinsing of by-products) using a silane having a secondary amino group protected by an o-nitrobenzyloxycarbonyl group; quantum dot laser; photonic crystal optical devices; single-electron devices |
| 09/20/2007 | US20070218372 Method For Production Of Micro-Optics Structures |
| 09/20/2007 | DE10318105B4 Verfahren zur Herstellung von Mikrostrukturen A process for the fabrication of microstructures |
| 09/19/2007 | CN101040367A Shot shape measuring method, mask |
| 09/19/2007 | CN101038445A Pattern forming method and gray-tone mask manufacturing method |
| 09/19/2007 | CN101038435A Wafer lithography mask, its manufacturing method and wafer photolithography method |
| 09/19/2007 | CN100338730C Crystallizer, crystalline method, film transitior and display device |
| 09/19/2007 | CN100338528C Method and apparatus for porforming rule-based gate shrink utilizing dipole illumination |
| 09/18/2007 | US7271950 Apparatus and method for optimizing a pellicle for off-axis transmission of light |
| 09/18/2007 | US7271492 Photo mask set for forming multi-layered interconnection lines and semiconductor device fabricated using the same |
| 09/18/2007 | US7271490 Semiconductor device having dummy wiring layers and a method for manufacturing the same |
| 09/18/2007 | US7270931 Silicon-containing compositions for spin-on ARC/hardmask materials |
| 09/18/2007 | US7270917 Forming a first hard mask layer over a substrate;forming an acid layer over the first hard mask layer;depositing a photoresist layer over the acid layer; patterning the photoresist layer to form a pattern; transferring the pattern to the first hard mask layer below the acid layer |
| 09/18/2007 | US7270478 X-ray alignment system for fabricating electronic chips |
| 09/13/2007 | WO2007102338A1 Photomask, method for manufacturing such photomask and pattern forming method using such photomask |
| 09/13/2007 | WO2007102337A1 Photomask, method for manufacturing such photomask, pattern forming method using such photomask and mask data creating method |
| 09/13/2007 | WO2007044827A3 Fast systems and methods for calculating electromagnetic fields near photomasks |
| 09/13/2007 | US20070214448 Orientation dependent shielding for use with dipole illumination techniques |
| 09/13/2007 | US20070213962 Simulation of objects in imaging using edge domain decomposition |
| 09/13/2007 | US20070212647 Photosensitive Original Printing Plate for Relief Printing, Method for Producing Relief Printing Plate, and Light-Shielding Ink for Performing the Method |
| 09/13/2007 | US20070212623 Dye-containing negative working curable composition, color filter and production method thereof |
| 09/13/2007 | US20070212622 Filters for electronic display devices |
| 09/13/2007 | US20070212620 Mask data generation method and mask |
| 09/13/2007 | US20070212619 A transparent substrate having a light-shielding film of a metal dry-etchable by fluorine and an etching mask film deposited on the light-shielding film of another resistant to fluorine dry etching; pattern size variation arising from density dependency reduced so high accuracy; microstructure |
| 09/13/2007 | US20070212618 Photomask blank and photomask |
| 09/13/2007 | US20070212617 For exposure of semiconductor wafer with dipole illumination light; photoresists |
| 09/13/2007 | US20070212616 Method of adjusting size of photomask pattern |
| 09/13/2007 | US20070209682 Cleaning of photolithography masks |
| 09/13/2007 | DE10319370B4 Verfahren zum Erfassen und Kompensieren von Lageverschiebungen bei photolithographischen Maskeneinheiten A method for detecting and compensating for positional shifts in photolithographic mask units |
| 09/13/2007 | DE10223113B4 Verfahren zur Herstellung einer photolithographischen Maske A process for preparing a photolithographic mask |
| 09/13/2007 | DE102005002533B4 Verfahren zum Erzeugen eines Abbildungsfehler vermeidenden Maskenlayouts für eine Maske A method for generating a mapping error-avoiding mask layout for a mask |
| 09/12/2007 | EP1833080A1 Reflective photomask blank, reflective photomask, and method for manufacturing semiconductor device using same |
| 09/12/2007 | EP1832927A1 A test pattern and a method of evaluating the transfer properties of a test pattern |
| 09/12/2007 | EP1832926A2 Photomask blank and photomask making method |
| 09/12/2007 | EP1832925A2 Photomask blank and photomask |
| 09/12/2007 | EP1832924A1 Process sensitometric strip and recording method |
| 09/12/2007 | EP1832353A2 Photolithography mask cleaning |
| 09/12/2007 | CN101034255A 光掩模和曝光方法 Photomask and exposure method |
| 09/12/2007 | CN101034254A Method and system for enhanced lithographic patterning |
| 09/12/2007 | CN101034171A Method of manufacturing color filter array panel and liquid crystal display |
| 09/12/2007 | CN100337306C Method for producing grey mask and grey mask |
| 09/12/2007 | CN100336671C Photosensitive resin composition for original printing plate capable of being carved by laser |
| 09/11/2007 | USRE39835 Producing direct-imaged flexographic printing elements having light-attenuating support layers such that both the front and back exposure times are economically efficient |
| 09/11/2007 | US7269817 Lithographic process window optimization under complex constraints on edge placement |
| 09/11/2007 | US7269315 Apparatus for writing Bragg gratings and reflection unit used in the apparatus |
| 09/11/2007 | US7268945 Short wavelength metrology imaging system |
| 09/11/2007 | US7268357 Immersion lithography apparatus and method |
| 09/11/2007 | US7267912 Exposure mask and pattern exposure method |
| 09/11/2007 | US7267911 Stencil mask and its manufacturing method |
| 09/11/2007 | US7267727 Using separate pressurized vessels; sealing; heating |
| 09/07/2007 | WO2007099910A1 Photomask blank and photomask, and their manufacturing method |
| 09/06/2007 | US20070207394 Photomask is provided with the test pattern and an image of the pattern is obtained; edges of the image are determined and, therefrom, a set of edge position data are obtained; ddge position data are fitted to a straight line to determine edge position residuals; amplitude spectrum is calculated |
| 09/06/2007 | US20070207393 Photomask formation method, photomask, and semiconductor device fabrication method |
| 09/06/2007 | US20070207392 Manufacturing method of photo mask and manufacturing method of semiconductor device |
| 09/06/2007 | US20070207391 Multiple resist layer phase shift mask (PSM) blank and PSM formation method |
| 09/06/2007 | US20070206173 Reticle protection member, reticle carrying device, exposure device and method for carrying reticle |
| 09/06/2007 | DE10337509B4 Gerät zur Herstellung von Halbleitern Apparatus for production of semiconductors |
| 09/06/2007 | DE10260755B4 Verfahren zur Bildung eines Strukturelementes auf einem Wafer mittels einer Maske und einer ihr zugeordneten Trim-Maske A method for forming a structural element on a wafer with a mask and a trim mask assigned |
| 09/05/2007 | EP1829836A1 Large glass substrate for photomask and method for producing same, computer readable recording medium, and method for exposing mother glass |
| 09/05/2007 | CN101031997A Measurement method, exposure method, and device manufacturing method |
| 09/05/2007 | CN101030039A Lampshade seat |
| 09/05/2007 | CN101030034A Method and apparatus for separating a stamper from a patterned substrate |