| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 09/05/2007 | CN101030032A Method for crystallizing amorphous silicon into polycrystalline silicon and its photoetching mask |
| 09/05/2007 | CN100336197C Pattern copy mask, manufacturing method of semiconductor device and program for making mask pattern |
| 09/04/2007 | US7266801 Design pattern correction method and mask pattern producing method |
| 09/04/2007 | US7266480 Rapid scattering simulation of objects in imaging using edge domain decomposition |
| 09/04/2007 | US7265818 Method of exposing a wafer to a light, and reticle, reticle assembly and exposing apparatus for performing the same |
| 09/04/2007 | US7264908 Photo mask blank and photo mask |
| 09/04/2007 | US7264907 Photomask having central and peripheral line patterns |
| 09/04/2007 | US7264906 OPC based illumination optimization with mask error constraints |
| 09/04/2007 | US7264905 Shading area at center of a clear defect in a wiring pattern of a half tone mask; accuracy, lithography |
| 09/04/2007 | US7264853 Attaching a pellicle frame to a reticle |
| 09/04/2007 | US7264415 Methods of forming alternating phase shift masks having improved phase-shift tolerance |
| 08/30/2007 | WO2007097902A2 Multi-dimensional analysis for predicting resolution enhancement technology model accuracy |
| 08/30/2007 | WO2007097838A2 Grid-based resist simulation |
| 08/30/2007 | WO2006113146A3 Systems and methods for modifying a reticle's optical properties |
| 08/30/2007 | US20070202442 Method and apparatus for merging a mask and a printing plate |
| 08/30/2007 | US20070202420 Adjustable film frame aligner |
| 08/30/2007 | US20070202419 Method for Producing Phase Shifter Masks |
| 08/30/2007 | US20070202418 Multi layer, attenuated phase shifting mask |
| 08/30/2007 | US20070201044 Method and apparatus for measuring dimension of photomask pattern |
| 08/30/2007 | US20070200174 SOI substrate, mask blank for charged particle beam exposure, and mask for charged particle beam exposure |
| 08/30/2007 | DE19503959B4 Fotomaske zur Herstellung eines Mikromusters einer Halbleitervorrichtung Photo mask for manufacturing a micro-pattern of a semiconductor device |
| 08/30/2007 | DE112005001926T5 Verfahren zur Herstellung von Kontaktöffnungen mit geringem Abstand in einem Flash-Speicher Process for the preparation of contact holes with a small distance in a flash memory |
| 08/30/2007 | DE10246788B4 Schutzvorrichtung für Reflexionsmasken und Verfahren zur Verwendung einer geschützten Reflexionsmaske Protection device for reflection masks and methods for using a protected reflection mask |
| 08/30/2007 | DE102006046000A1 EUV Maskenblank und Verfahren zu dessen Herstellung EUV mask blank and method for its manufacture |
| 08/29/2007 | EP1825327A2 Method for patterning by surface modification |
| 08/29/2007 | EP1373981B1 Lithographic apparatus with a mobile lens for producing digital holograms |
| 08/29/2007 | CN101027607A Mask blank manufacturing method |
| 08/29/2007 | CN101025577A Pattern formation method |
| 08/29/2007 | CN101025576A 激光加工装置及其加工方法 The laser processing apparatus and processing method |
| 08/29/2007 | CN101025571A 器件制造方法和计算机程序产品 Device manufacturing method, and computer program products |
| 08/29/2007 | CN101025566A Pattern forming method and gray-tone mask manufacturing method |
| 08/29/2007 | CN101025565A Method of modifying defect in gray tone mask and gray tone mask |
| 08/29/2007 | CN101025564A Four-gradation photomask manufacturing method and photomask blank for use therein |
| 08/29/2007 | CN101025563A Method of detecting defect in photomask and photomask |
| 08/29/2007 | CN100334687C Method of manufacturing integrated circuit |
| 08/28/2007 | US7262850 Method for inspection of periodic grating structures on lithography masks |
| 08/28/2007 | US7262828 Near-field photomask and near-field exposure apparatus including the photomask |
| 08/28/2007 | US7261984 Exposure pattern or mask and inspection method and manufacture method for the same |
| 08/28/2007 | US7261982 Utilizing photolithographic master and slave mask set; simple, low cost technique for correcting errors; adjusts to varying wafer positions |
| 08/28/2007 | US7261981 Generating simplified layout patterns from the predetermined main shapes of the mask, such layout patterns are generated by eliminating detail of the main shapes which leads to unmanufacturable associated shapes while preserving geometrically relevant shape information, associated shapes are generated |
| 08/28/2007 | US7261980 X-ray mask blank and x-ray mask |
| 08/23/2007 | WO2007094389A1 Mask blank and photomask |
| 08/23/2007 | WO2007094235A1 Exposure method, exposure apparatus, photomask and photomask manufacturing method |
| 08/23/2007 | WO2007094198A1 Projection optical system, exposure device, exposure method, display manufacturing method, mask, and mask manufacturing method |
| 08/23/2007 | WO2007094197A1 Protection device, mask, and exposure device |
| 08/23/2007 | WO2007093194A1 Method of patterning a layer using a pellicle |
| 08/23/2007 | WO2007093193A1 Method of detecting defects in an integrated circuit |
| 08/23/2007 | WO2007030528A3 Photomask and method for forming a non-orthogonal feature on the same |
| 08/23/2007 | US20070198965 Simulation method and semiconductor device fabrication method |
| 08/23/2007 | US20070196747 Grid-based resist simulation |
| 08/23/2007 | US20070196746 Methods and apparatuses for applying wafer-alignment marks |
| 08/23/2007 | US20070196745 comprising a slit-shaped main transmission region and three pairs of slit-shaped auxiliary transmission regions; improving resolution, high light intensity contrast, narrow the exposed width of the resist film with a small uniform width |
| 08/23/2007 | US20070196744 Method for producing a mask for the lithographic projection of a pattern onto a substrate |
| 08/23/2007 | US20070196743 Method for crystallizing amorphous silicon into polysilicon and mask used therefor |
| 08/23/2007 | US20070196742 Mask-Patterns Including Intentional Breaks |
| 08/23/2007 | US20070196741 Phase Calibration for Attenuating Phase-Shift Masks |
| 08/23/2007 | US20070195295 Mask pattern data forming method, photomask and method of manufacturing semiconductor device |
| 08/23/2007 | DE10340611B4 Lithografiemaske zur Abbildung von konvexen Strukturen Lithography mask for imaging of convex structures |
| 08/22/2007 | EP1821146A1 Deposition of a protective layer by charged particle beam sputtering and processing of the layer by a charged particle beam |
| 08/22/2007 | EP1820066A2 Computer-implemented methods for detecting and/or sorting defects in a design pattern of a reticle |
| 08/22/2007 | CN1333306C Light shield for contacting window making process and making process thereof |
| 08/22/2007 | CN1332879C Method for forming pattern film of surface modified carbon nano tube |
| 08/22/2007 | CN101021681A Production method for graving gravure on-machine plate |
| 08/22/2007 | CN101021680A Material for forming exposure light-blocking film, multilayer interconnection structure and manufacturing method thereof, and semiconductor device |
| 08/21/2007 | US7260812 Method and apparatus for expediting convergence in model-based OPC |
| 08/21/2007 | US7260810 Method of extracting properties of back end of line (BEOL) chip architecture |
| 08/21/2007 | US7259835 Reticle-processing system |
| 08/21/2007 | US7259372 Processing method using probe of scanning probe microscope |
| 08/21/2007 | US7258966 Multilayer; radiation transparent substrate, overcoating with photoresists; masking; exposure; development |
| 08/21/2007 | US7258957 Using hologram masks on which alignment marks are formed; reduces needed area on a object to be exposed for alignment marks while keeping minimum permissible intervals among alignment marks on a same exposure mask |
| 08/21/2007 | US7258954 Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect |
| 08/16/2007 | WO2007090535A2 Method for selecting a format for a section to be printed |
| 08/16/2007 | US20070190459 e.g.Brominated epoxy phenol novolk resins in propylene glycol, monomethyl ether solvent; curable; chemically-amplified type resist coating |
| 08/16/2007 | US20070190438 Method and apparatus for controlling light intensity and for exposing a semiconductor substrate |
| 08/16/2007 | US20070190435 Dye-containing photosensitive composition, color filter using the same, and production method thereof |
| 08/16/2007 | US20070190434 Pattern forming method and phase shift mask manufacturing method |
| 08/16/2007 | US20070190433 Mask and exposure apparatus |
| 08/16/2007 | US20070190432 uses the die area outside of traditionally focused reticle to fabricate components, instead of avoiding this area of reduced precision, uses this area to layout structures with features that are coarser than what can be achieved within high-resolution region of the reticle |
| 08/16/2007 | US20070190431 Photomask structure |
| 08/16/2007 | US20070190430 Photo-mask stage |
| 08/16/2007 | US20070190241 Method for repairing errors of patterns embodied in thin layers |
| 08/16/2007 | US20070188743 Method and system of defect inspection for mask blank and method of manufacturing semiconductor device using the same |
| 08/16/2007 | US20070187361 forming photoresist coating, etching, inspecting for defects, forming repairing photoresist coating, etching |
| 08/16/2007 | US20070187228 Manufacturing Method and Apparatus of Phase Shift Mask Blank |
| 08/16/2007 | US20070186804 Violet colorant for colour filters, inks for ink-jet electrophotographic toners and developers and e-inks |
| 08/16/2007 | DE10345525B4 Verfahren zum Bilden eines Musters von Strukturelementen auf einer Photomaske A method for forming a pattern of structural elements on a photomask |
| 08/15/2007 | CN101017322A Manufacture method of sidewall chromium attenuation type phase-shifting mask used in 193nm optical lithography |
| 08/15/2007 | CN101017301A Method for producing display base plate |
| 08/14/2007 | US7257790 Layout structure of semiconductor integrated circuit and method for forming the same |
| 08/14/2007 | US7257247 Mask defect analysis system |
| 08/14/2007 | US7256872 Purging gas from a photolithography enclosure between a mask protective device and a patterned mask |
| 08/14/2007 | US7256405 Sample repairing apparatus, a sample repairing method and a device manufacturing method using the same method |
| 08/14/2007 | US7255981 Mask, substrate with light reflective film, method for manufacturing light reflective film, liquid crystal display device, and electronic apparatus |
| 08/14/2007 | US7255978 Multi-level optical structure and method of manufacture |
| 08/14/2007 | US7255968 Alignment method of exposure mask and manufacturing method of thin film element substrate |
| 08/09/2007 | WO2007088862A1 Pellicle for high numerical aperture exposure device |
| 08/09/2007 | US20070186208 Mask-Pattern Determination Using Topology Types |
| 08/09/2007 | US20070186206 System, Masks, and Methods for Photomasks Optimized with Approximate and Accurate Merit Functions |
| 08/09/2007 | US20070184390 Exposure method |
| 08/09/2007 | US20070184369 Lithography Verification Using Guard Bands |