Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
10/2007
10/25/2007US20070248895 Method for reduction of photomask defects
10/25/2007US20070248894 Resist material and pattern formation method using the same
10/25/2007US20070248893 Method of forming a mask layout and layout formed by the same
10/25/2007US20070248892 A method of aligning a first article relative to a second article and an apparatus for aligning a first article relative to a second article
10/25/2007US20070248891 Method of manufacturing field emission display (FED) using half tone photomask
10/25/2007US20070248257 Mask defect analysis system
10/25/2007US20070247610 Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated eigen decomposition model
10/24/2007EP1847874A2 Photomask blank
10/24/2007CN200964248Y Location structure for light shield box
10/24/2007CN101061431A Blanks for gray tone mask, gray tone mask using said blanks, and process for producing said blanks
10/24/2007CN101061430A Blanks for gray tone mask, gray tone mask using said blanks, and process for producing said blanks
10/24/2007CN101060769A A method for producing the 3D products suitable for foldable forming
10/24/2007CN101060110A Semiconductor integrated circuit and method for manufacturing same, and mask
10/24/2007CN101059649A Mask pattern generating method
10/24/2007CN100345253C Optic micro distance correcting method
10/24/2007CN100345003C Process for mfg. unidimensional X ray refracted diffraction micro structural component of aluminium material
10/23/2007US7287240 Designing method and device for phase shift mask
10/23/2007US7287239 Performance in model-based OPC engine utilizing efficient polygon pinning method
10/23/2007US7285792 Scratch repairing processing method and scanning probe microscope (SPM) used therefor
10/18/2007WO2007117319A2 Phase shifting mask having a calibration feature and method therefor
10/18/2007WO2007116562A1 Reflective photomask blank, process for producing the same, reflective photomask and process for producing semiconductor device
10/18/2007WO2007115961A1 Extreme ultra-violet photolithography mask, with resonant barrier layer
10/18/2007WO2007097902A3 Multi-dimensional analysis for predicting resolution enhancement technology model accuracy
10/18/2007WO2007097838A3 Grid-based resist simulation
10/18/2007US20070245292 Lithography simulation method, photomask manufacturing method, semiconductor device manufacturing method, and recording medium
10/18/2007US20070245291 Incrementally Resolved Phase-Shift Conflicts In Layouts For Phase-Shifted Features
10/18/2007US20070245290 Method of manufacturing integrated circuits using pre-made and pre-qualified exposure masks for selected blocks of circuitry
10/18/2007US20070243707 Hard Mask Layer Stack And A Method Of Patterning
10/18/2007US20070243342 a photo-reactive chiral compound, capable of undergoing a photochemical reaction resulting in the loss of the chirality of such photo-reactive chiral compound, and a triplet sensitize; photochemical reaction is triplet sensitization resulting in racemization and/or isomerization
10/18/2007US20070241329 Semiconductor integrated circuit and method for manufacturing same, and mask
10/18/2007DE102007015232A1 Ladungspartikelstrahlenvorrichtung, Anomalieerfassungsverfahren für eine DA-Wandlereinheit, Ladungspartikelstrahlenschreibverfahren und Maske Charged particle beam apparatus, anomaly detection method for a DA converter unit, charged particle beam writing method and mask
10/18/2007DE102007010581A1 Testmuster und Verfahren zum Auswerten der Übertragungseigenschaften eines Testmusters Test patterns and procedures for evaluating the transmission properties of a test pattern
10/17/2007EP1152906A4 Local vectorial particle cleaning
10/17/2007EP1132772B1 Halftone phase shift photomask and blank for it, and pattern forming method using this mask
10/17/2007CN101054673A Light shield plasma etching method using protective cover
10/17/2007CN100343971C Substrate retaining tool, mfg. method of electronic instrument, and mfg. method of light mask
10/17/2007CN100343947C Crystallizing device, crystallizing method and phase exchanging mechanism
10/17/2007CN100343759C Mask for projection exposure, projection exposure appts. and used method
10/17/2007CN100343757C Mask and manufacturing method using mask
10/16/2007US7282725 Method of manufacturing semiconductor device, semiconductor manufacturing apparatus, and stencil mask
10/16/2007US7282525 Pellicle, producing method thereof and adhesive
10/16/2007US7282422 Overlay key, method of manufacturing the same and method of measuring an overlay degree using the same
10/16/2007US7282309 Photomask, method for producing the same, and method for forming pattern using the photomask
10/16/2007US7282308 Phase shifter film and process for the same
10/16/2007US7282307 Providing a mask substrate;forming a lower multilayer reflective stack; forming a first embedded layer over the lower multilayer reflective stack; forming a second embedded layer; forming a top multilayer reflective stack; etching an opening through the top multilayer reflective stack
10/16/2007US7282306 May eliminate the need for a second exposure with a trim mask; accordingly, alignment problems associated with the second exposure may be avoided; single exposure may be more compatible with high speed manufacturing
10/16/2007US7282305 Reflective mask blank having a programmed defect and method of producing the same, reflective mask having a programmed defect and method of producing the same, and substrate for use in producing the reflective mask blank or the reflective mask having a programmed defect
10/16/2007US7282240 Elastomeric mask and use in fabrication of devices
10/16/2007US7282121 Manufacturing method and apparatus of phase shift mask blank
10/11/2007US20070240089 Apparatus and method for correcting layout pattern data
10/11/2007US20070238033 Photolithography using extreme ultraviolet radiation especially light having wavelength in a soft X-ray region, a reflection type photomask and a reflection type photomask blank
10/11/2007US20070238032 transparent substrate, half-tone film provided on a part on which light-shielding pattern is to be formed and a part on which semi-light shielding pattern is to be formed, where semi-light shielding pattern includes first and second light shielding patterns, second having smaller dimensions than first
10/11/2007US20070238031 Method for forming minute pattern and method for forming semiconductor memory device using the same
10/11/2007US20070238030 Pellicle for lithography
10/11/2007US20070238028 Substrate Treatment Method and Substrate Treatment Apparatus
10/11/2007US20070238027 Method for generating alignment marks and related masks thereof
10/11/2007US20070237384 Mask defect analysis system
10/11/2007DE10305618B4 Verfahren zum Belichten eines fotoempfindlichen Lackes auf einem Halbleiterwafer A method of exposing a photosensitive resist on a semiconductor wafer
10/10/2007EP1843202A2 Method and apparatus for performing dark field double dipole lithography
10/10/2007EP1843201A1 Pellicle for lithographiy
10/10/2007EP1842098A1 Method for removing defective material from a lithography mask
10/10/2007EP1454193B1 Method of manufacturing a phase shifting mask and wafer exposure method using such a phase shifting mask
10/10/2007CN101053077A Method of forming narrowly spaced flash memory contact openings
10/10/2007CN101052917A Photomask blank and photomask
10/10/2007CN101051620A Method for producing semiconductor device and mask film for said method
10/10/2007CN100342490C Correction system and method of correcting deflection distortion, method for manufacturing a semiconductor device
10/09/2007US7281234 Short edge smoothing for enhanced scatter bar placement
10/09/2007US7281226 Incrementally resolved phase-shift conflicts in layouts for phase-shifted features
10/09/2007US7279259 Method for correcting pattern data and method for manufacturing semiconductor device using same
10/09/2007US7279257 Pattern forming method, method of manufacturing thin film transistor substrate, method of manufacturing liquid crystal display and exposure mask
10/09/2007US7279254 Imageable film that contains at least a mask substrate and an imageable material is imagewise exposed to imaging radiation to form an imaged film; imaged film is transferred to an imageable article, such as a flexographic printing plate precursor; exposure to curing radiation, removing, developing
10/09/2007US7279253 Near-field light generating structure, near-field exposure mask, and near-field generating method
10/09/2007US7279252 Substrate for the micro-lithography and process of manufacturing thereof
10/09/2007US7278299 Method of processing vertical cross-section using atomic force microscope
10/04/2007US20070233419 Method and System for Context-Specific Mask Inspection
10/04/2007US20070231716 Plasma etching chamber and method for manufacturing photomask using the same
10/04/2007US20070231715 Photomask using separated exposure technique, method of fabricating photomask, and apparatus for fabricating photomask by using the method
10/04/2007US20070231714 Photomask making method and semiconductor device manufacturing method
10/04/2007US20070231713 Anti-reflective coating for out-of-band illumination with lithography optical systems
10/04/2007US20070231712 Alternating phase shift masking
10/04/2007US20070231711 System and method for making photomasks
10/04/2007US20070231710 Method and system for forming a photomask pattern
10/04/2007US20070231709 Lithographic apparatus and patterning device
10/04/2007US20070230768 Method and apparatus for inspecting a substrate
10/04/2007US20070229927 Method of recording an exposure pattern in a recording layer of a holographic mask, method of forming an exposure pattern in a photosensitive material film, method of manufacturing a semiconductor device and method of manufacturing an electro-optic device
10/04/2007US20070229814 Pattern defect inspection method, photomask manufacturing method, and display device substrate manufacturing method
10/04/2007US20070229337 Charged particle beam apparatus, abnormality detecting method for da converter unit, charged particle beam writing method, and mask
10/04/2007US20070227566 Substrate processing apparatus and substrate processing method
10/04/2007US20070227032 Substrate processing apparatus
10/03/2007EP1840649A2 Device for holding an imprint lithography template
10/03/2007EP1840647A1 Phase shift mask, phase shift mask manufacturing method, and semiconductor element manufacturing method
10/03/2007CN101047116A Substrate processing apparatus
10/03/2007CN101047110A Substrate processing apparatus and substrate processing method
10/03/2007CN101047109A Critical dimension (CD) control method by spectrum metrology
10/03/2007CN101047090A Image correction device and coating unit thereof
10/03/2007CN101046634A Method for etching quartz on photomask plasma
10/03/2007CN101046626A Method for etching molybdenum when manufacturing photomask
10/03/2007CN101046625A Pattern defect inspection method, photomask manufacturing method, and display device substrate manufacturing method
10/03/2007CN101046624A Pattern defect detection device, pattern defect detection method and manufacturing method for photomask
10/02/2007US7278125 Semiconductor integrated circuit pattern verification method, photomask manufacturing method, semiconductor integrated circuit device manufacturing method, and program for implementing semiconductor integrated circuit pattern verification method
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