| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 06/05/2008 | US20080127998 Monitoring structure |
| 06/05/2008 | DE112005003638T5 Verfahren zur Erstellung von Fotomaskenstrukturdaten, mittels der Fotomaskenstrukturdaten erstellte Fotomaske und Verfahren zur Herstellung einer Halbleitervorrichtung mittels der Fotomaske Method for creating photo mask pattern data generated by the photo mask pattern data photomask and method for manufacturing a semiconductor device using the photomask |
| 06/04/2008 | EP1397813B1 Hybrid optical component for x ray applications and method associated therewith |
| 06/04/2008 | CN101192252A Method and apparatus for designing mask |
| 06/04/2008 | CN101192007A Mask plate, mask plate layout design method and defect repairing method |
| 06/04/2008 | CN101192000A Central symmetry continuous microstructure diffraction element mask manufacture method |
| 06/04/2008 | CN101191999A Central symmetry continuous diffraction element mask microstructure graph transfer method |
| 06/04/2008 | CN101191998A Method and system for improving critical dimension proximity control of patterns on a mask or wafer |
| 06/04/2008 | CN101191997A Photomask and its manufacture method and pattern definition method |
| 06/04/2008 | CN101191996A Process for preparing light mask and optical adjacence correction repairing method |
| 06/04/2008 | CN101190723A Vessel for containing protection thin film components |
| 06/04/2008 | CN100392662C Method and system for manufacturing layout and mask, and manufacture of semiconductor device |
| 06/03/2008 | US7383530 System and method for examining mask pattern fidelity |
| 06/03/2008 | US7382912 Method and apparatus for performing target-image-based optical proximity correction |
| 06/03/2008 | US7381502 Apparatus and method to improve the resolution of photolithography systems by improving the temperature stability of the reticle |
| 05/29/2008 | WO2008064155A2 Stencil design and method for cell projection particle beam lithography |
| 05/29/2008 | WO2008062537A1 Sheet storing carrier system and reticle case making use of the same |
| 05/29/2008 | US20080127030 Laser repair system and glass mask used for the same |
| 05/29/2008 | US20080124906 Method for transferring self-assembled dummy pattern to substrate |
| 05/29/2008 | US20080124634 Method of manufacturing liquid crystal display |
| 05/29/2008 | US20080124633 Includes a mask substrate having patterns arranged at a pitch P; and a pellicle which protects the mask substrate; pellicle is configured so that transmittance of incident light of an incident angle theta is higher than transmittance of incident light of an incident angle 0 degrees |
| 05/29/2008 | US20080124632 Method of deriving etching correction values for petterns of photomask and method of fabricating photomask |
| 05/29/2008 | US20080123935 Mask data creation method |
| 05/29/2008 | US20080121251 Substrate processing apparatus and substrate processing method |
| 05/29/2008 | US20080121028 Scanning Probe Microscopy Inspection and Modification System |
| 05/28/2008 | EP1926125A1 Endpoint detection for photomask etching |
| 05/28/2008 | EP1925978A2 A method and a computer program for performing decomposition of a pattern for use in a DPT process and a mask |
| 05/28/2008 | EP1925909A1 Device for cleaning and decontaminating an object with a non-airtight confined environment limited by a flexible membrane wall |
| 05/28/2008 | EP1925020A2 Systems, masks, and methods for photolithography |
| 05/28/2008 | CN101187777A Template for imprint lithography and imprint lithography method using same |
| 05/28/2008 | CN101187776A Method for transferring self-assembled dummy pattern to substrate |
| 05/28/2008 | CN100390931C Substrate processing device and method, and pattern forming method |
| 05/27/2008 | US7379176 Mask defect inspection apparatus |
| 05/27/2008 | US7379154 Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicle |
| 05/27/2008 | US7378654 Processing probe |
| 05/27/2008 | US7378201 Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device |
| 05/27/2008 | US7378198 Photomask |
| 05/27/2008 | US7378197 Antireflective coating; making semiconductors at lower wavelengths using reflective masks that can be effectively inspected at multiple wavelengths; wide bandwidth inspection contrast for extreme ultra-violet reticles |
| 05/27/2008 | US7378196 Method of manufacturing mask for correcting optical proximity effect |
| 05/27/2008 | US7378195 Automatically assigning and changing phase colors as chip circuit designs are being assembled; correct binary colorability of a hierarchical unit is preserved |
| 05/22/2008 | WO2008060465A1 Euv pellicle with increased euv light transmittance |
| 05/22/2008 | WO2007142788A3 Laser ablation resist |
| 05/22/2008 | WO2007135379A3 Method and unit for micro-structuring a moving substrate |
| 05/22/2008 | US20080120589 Mask pattern correction program and system |
| 05/22/2008 | US20080119956 Personalized hardware |
| 05/22/2008 | US20080118850 Opaque film formed on transparent substrate configured to form a pattern with which a wafer is exposed; forming microscopic patterns on electronic device such as a semiconductor or a magnetic element |
| 05/22/2008 | US20080118849 Has at least eight reflecting surfaces for imaging a reflection of a photolithography mask on a wafer; obscuration for an enhanced numerical aperture; projection system; transistors, diodes, resistors, capacitors, and integrated circuit chips |
| 05/22/2008 | US20080117396 Exposure apparatus |
| 05/22/2008 | US20080116397 Stencil design and method for cell projection particle beam lithography |
| 05/21/2008 | EP1682941B1 Varying feature size in resist |
| 05/21/2008 | EP1454192B1 Method of enhancing clear field phase shift masks by adding parallel line to phase 0 region |
| 05/21/2008 | EP1454191B1 Method of enhancing phase shift masks |
| 05/21/2008 | EP1454190B1 Method of enhancing clear field phase shift masks with border regions around phase 0 and phase 180 regions |
| 05/21/2008 | CN101185032A Image processor |
| 05/21/2008 | CN101183214A Method and system for tone inverting of residual layer tolerant imprint lithography |
| 05/21/2008 | CN101183213A Photo mask and manufacturing method of thin-film transistor substrates |
| 05/21/2008 | CN101183212A Optical tool and method for forming soldering-resistant pattern |
| 05/21/2008 | CN101183211A Method to etch chrome for photomask fabrication |
| 05/21/2008 | CN101183210A Inspection systems and methods |
| 05/20/2008 | US7376931 Method for providing layout design and photo mask |
| 05/20/2008 | US7376930 Method, program product and apparatus for generating assist features utilizing an image field map |
| 05/20/2008 | US7376512 Method for determining an optimal absorber stack geometry of a lithographic reflection mask |
| 05/20/2008 | US7376260 Method for post-OPC multi layer overlay quality inspection |
| 05/20/2008 | US7375805 Reticle and optical characteristic measuring method |
| 05/20/2008 | US7375352 Photomask defect correction method employing a combined device of a focused electron beam device and an atomic force microscope |
| 05/20/2008 | US7375324 Stylus system for modifying small structures |
| 05/20/2008 | US7374869 Lithographic processing method and device manufactured thereby |
| 05/20/2008 | US7374867 treating photoresists with electricity, to reduce the horizontal extent of aggregates and line edge roughness; improving quality of patterns transferred to semiconductor wafers |
| 05/20/2008 | US7374865 Lithography using light sources through optics to project images on layers of photoresists to form contactors on semiconductor substrates |
| 05/20/2008 | US7374844 Photomask for uniform intensity exposure to an optical near-field |
| 05/15/2008 | US20080113491 EUV pellicle with increased EUV light transmittance |
| 05/15/2008 | US20080113304 Pattern formation method |
| 05/15/2008 | US20080113303 Multilayer Coatings For EUV Mask Substrates |
| 05/15/2008 | US20080113282 Ink jets; discharging stability and resolution power for pitch between pixels of identical color forming stripe pattern |
| 05/15/2008 | US20080113281 Filter Device for the Compensation of an Asymmetric Pupil Illumination |
| 05/15/2008 | US20080113280 Creating method of photomask pattern data, photomask created by using the photomask pattern data, and manufacturing method of semiconductor apparatus using the photomask |
| 05/15/2008 | US20080113279 Via computer generated local encoding technique (LET); patterned material comprises transparent and opaque regions; three-dimensional patterns may be formed in photoresist layer of target one step; lithography; semiconductors |
| 05/15/2008 | US20080113278 Photomask layout for a semiconductor device and method of forming a photomask pattern using the photomask layout |
| 05/15/2008 | US20080113277 Tridemensional Structures for an Ink Jet Printhead and Relevant Manufacturing |
| 05/15/2008 | US20080113276 Reticles collectively map circuit arrangement on semiconductor substrate; optics |
| 05/15/2008 | US20080113275 Method to etch chrome for photomask fabrication |
| 05/15/2008 | US20080113274 Method of manufacturing photomask and method of repairing optical proximity correction |
| 05/15/2008 | US20080113273 Photoresists adjust light; lightweight |
| 05/15/2008 | US20080112669 Two-dimensional Planar photonic crystal superprism device and method of manufacturing the same |
| 05/15/2008 | US20080111980 Exposure apparatus equipped with interferometer and exposure apparatus using the same |
| 05/14/2008 | EP1920227A1 Device and method for the interferometric measurement of phase masks |
| 05/14/2008 | CN201060371Y Simple mask plate turnover fixture |
| 05/14/2008 | CN101180576A Leaky absorber for extreme ultraviolet mask |
| 05/14/2008 | CN101179082A The thin fime transistor plate and method for making the same |
| 05/14/2008 | CN101179081A Pixel structure |
| 05/14/2008 | CN101178744A Methods of automatically generating dummy fill having reduced storage size |
| 05/14/2008 | CN101178451A Method for repairing electronic element pattern defect |
| 05/14/2008 | CN100388286C Method and device for designing alternant phase-shifting mask |
| 05/13/2008 | US7371992 Method for non-contact cleaning of a surface |
| 05/13/2008 | US7371592 Manufacturing method of thin film transistor array panel using an optical mask |
| 05/13/2008 | US7371489 Scanning the photomask which has sub-patterns formed inside rectangular region including all the main patterns; scan target range is regulated by inspecting apparatus; every scan target range in the rectangular region includes a main pattern and a sub-pattern; preventing alignment mixup in target range |
| 05/13/2008 | US7371485 Multi-step process for etching photomasks |
| 05/13/2008 | US7371484 Photomask blank and method of fabricating a photomask from the same |
| 05/13/2008 | US7371483 Monitoring apertures in radiation transparent substrate; masking; halftone film; stacks of radiation transparent materials and opacque film ; etching |
| 05/08/2008 | WO2008054954A2 High density lithographic process |