| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 02/07/2008 | US20080032209 Long length flexible circuits and method of making same |
| 02/07/2008 | US20080032208 Overlay mark and method of forming the same |
| 02/07/2008 | US20080032207 Method for correcting optical proximity effects |
| 02/07/2008 | US20080032206 Photomask registration errors of which have been corrected and method of correcting registration errors of photomask |
| 02/07/2008 | US20080032205 Formed on photomask during integrated circuit processing |
| 02/07/2008 | US20080032204 Methods of optical proximity correction |
| 02/07/2008 | US20080032203 Lithographic method and patterning device |
| 02/07/2008 | US20080030719 Inspection apparatus having two sensors, method for inspecting an object, and a method for manufacturing a photolithography mask |
| 02/07/2008 | US20080030700 Device and method for lithography |
| 02/07/2008 | US20080030658 Color Filter and its Manufacturing Method, and a Liquid Crystal Display Device Using the Color Filter |
| 02/07/2008 | US20080030200 Image defect inspection apparatus |
| 02/07/2008 | US20080029769 Provides two-block laser mask capable of preventing or minimizing a shot mark by sequential irradiation of each block with two different lasers; liquid crystal displays, light emitting diodes; Flat panel displays having a polycrystalline silicon thin film transistor as a switching device |
| 02/07/2008 | DE10245204B4 Maskenrohling Mask blank |
| 02/06/2008 | EP1884832A1 Clean stocker and method of storing articles |
| 02/06/2008 | EP1883858A2 Making relief image using removable film |
| 02/06/2008 | CN101120245A Method for inspecting translucent article |
| 02/06/2008 | CN101118379A Microlenses of cmos image sensor and method for fabricating the same |
| 02/06/2008 | CN101118378A Preparation method of diamond surface graphics |
| 02/06/2008 | CN101118376A High definition mask and manufacturing method of the same |
| 02/06/2008 | CN101118375A Clean stocker and method of storing articles |
| 02/06/2008 | CN100367484C Method and system for measuring width of junction in graph of mask designed |
| 02/06/2008 | CN100367112C Lithographic apparatus, device manufacturing method, device manufactured thereby, and computer program |
| 02/05/2008 | US7328424 Method for determining a matrix of transmission cross coefficients in an optical proximity correction of mask layouts |
| 02/05/2008 | US7327436 Method for evaluating a local flare, correction method for a mask pattern, manufacturing method for a semiconductor device and a computer program product |
| 02/05/2008 | US7327013 Stencil mask with charge-up prevention and method of manufacturing the same |
| 02/05/2008 | US7326502 Ion beam deposition and atomic layer deposition to form alternating stack of thin films; to smooth surface defects; form extreme ultraviolet reflective mask in semiconductor processing; optical ultraviolet system for making semiconductor wafer |
| 02/05/2008 | US7326501 Method for correcting focus-dependent line shifts in printing with sidewall chrome alternating aperture masks (SCAAM) |
| 01/31/2008 | US20080028361 Pattern evaluation method and evaluation apparatus and pattern evaluation program |
| 01/31/2008 | US20080026304 Color filter with colored layer on transparent substrate, plurality of colors formed in a predetermined pattern; light shielding layerformed through a wettability-variable component layer; titanium oxide photocatalyst; printing plates, lithography; polysiloxane or silicone binder |
| 01/31/2008 | US20080026303 thermal imaging process using laser beam; light-to-heat conversion layer; producing a separation rib of a color filter, a black matrix of a liquid crystal display device and a partitioning wall |
| 01/31/2008 | US20080026302 Black matrix compositions and methods of forming the same |
| 01/31/2008 | US20080026301 Method of fabricating liquid crystal dispaly device |
| 01/31/2008 | US20080026300 Photomask manufacturing method and semiconductor device manufacturing method |
| 01/31/2008 | US20080026299 Multi-tone optical mask, method of manufacturing the same and method of manufacturing thin-film transistor substrate by using the same |
| 01/31/2008 | US20080026298 Determining minimum resolvable pitch of spaced, adjacent line elements, wherein each of the line elements are separately resolvable when projected by the lithographic imaging system, and selecting a process monitor grating period; designing a process monitor grating pattern; sensitivity to dose and focus |
| 01/31/2008 | US20080024415 Display panel, mask and method of manufacturing the same |
| 01/31/2008 | US20080023417 Clean stocker and method of storing articles |
| 01/31/2008 | DE19725830B4 Photomaske mit Halbton-Phasenverschiebungsmaterial und einem Chrommuster auf einem transparenten Substrat Photomask having halftone phase shift material and a chromium pattern on a transparent substrate |
| 01/31/2008 | DE10208785B4 Lithografieverfahren zur Fotomaskenherstellung mittels Elektronenstrahllithografie Lithography process for photomask fabrication by electron beam lithography |
| 01/30/2008 | EP1882979A2 Display panel, mask and method of manufacturing the same |
| 01/30/2008 | CN101114657A Display panel, mask and method of manufacturing the same |
| 01/30/2008 | CN101114130A System and method to compensate for critical dimension non-uniformity in a lithography system |
| 01/30/2008 | CN101114119A Multi-tone optical mask, method of manufacturing the same and method of manufacturing thin-film transistor substrate by using the same |
| 01/30/2008 | CN100365507C Template for room temperature, low pressure micro-and nano-imprint lithography |
| 01/29/2008 | US7324930 Method and apparatus for performing OPC using model curvature |
| 01/29/2008 | US7323291 Dual layer workpiece masking and manufacturing process |
| 01/29/2008 | US7323277 Photomask |
| 01/29/2008 | US7323276 Substrate for photomask, photomask blank and photomask |
| 01/24/2008 | WO2008011497A2 Optical diffusers, photomasks and their methods of fabrication |
| 01/24/2008 | WO2008010548A1 Photo mask |
| 01/24/2008 | WO2008010017A1 Method and apparatus for designing an integrated circuit |
| 01/24/2008 | US20080022255 Method for interlayer and yield based optical proximity correction |
| 01/24/2008 | US20080022244 Semiconductor integrated circuit pattern verification method, photomask manufacturing method, semiconductor integrated circuit device manufacturing method, and program for implementing semiconductor integrated circuit pattern verification method |
| 01/24/2008 | US20080022240 Pattern data verification method for semiconductor device, computer-readable recording medium having pattern data verification program for semiconductor device recorded, and semiconductor device manufacturing method |
| 01/24/2008 | US20080022237 Device modeling for proximity effects |
| 01/24/2008 | US20080020565 Dual Damascene Copper Process Using a Selected Mask |
| 01/24/2008 | US20080020329 Method for fabricating semiconductor device and exposure mask |
| 01/24/2008 | US20080020298 Shading area of transmissivity of 0-2% at the center of a clear defect in a wiring pattern of a half tone mask; forming semitransparent areas of transmissivity of 10-25% adjacent to shading extending from inside of the edge of an imaginary pattern with no defect to the outside of the edge; accuracy |
| 01/24/2008 | US20080020297 Mask for photolithography and method of fabricating photoresist pattern using the same |
| 01/24/2008 | US20080020296 by utilizing a dark field in the imaging process, it is possible to eliminate the complications associated with shielding previously imaged features when utilizing a clear field imaging; enabled by a non-transitory computer readable medium |
| 01/24/2008 | US20080020295 Exposure mask and method for manufacturing semiconductor device using the same |
| 01/24/2008 | US20080020294 test photomask includes first mask pattern and second mask pattern formed at center portion of first; first mask pattern is pattern with light condensing effect and nature in which exposure-dose amount to transfer object varies in dependence on focus variation, a two-dimensional Fresnel zone pattern |
| 01/24/2008 | US20080020293 Vortex mask and method for preparing the same and method for preparing a circular pattern using the same |
| 01/24/2008 | US20080020292 photoresists; photomasks |
| 01/24/2008 | US20080020291 large mask with random apertures formed by forming smaller mask with random pattern of transmissive apertures created by perturbing; uniformity |
| 01/24/2008 | US20080020290 Negative resist composition and patterning process using the same |
| 01/24/2008 | US20080020289 Novel polymer, positive resist composition and patterning process using the same |
| 01/24/2008 | US20080019585 Removal of relatively unimportant shapes from a set of shapes |
| 01/24/2008 | US20080019002 Crystallization apparatus, crystallization method, and phase shifter |
| 01/24/2008 | US20080017797 Pattern inspection and measurement apparatus |
| 01/24/2008 | DE10330795B4 Kohlenstoff-Hartmaske mit einer Stickstoff-dotierten Kohlenstoffschicht als haftfähiger Schicht zur Haftung auf Metall oder metallhaltigen anorganischen Materialien und Verfahren zu deren Herstellung The carbon hard mask with a nitrogen-doped carbon layer as an adhesion layer capable of adhesion to metal or metal-containing inorganic materials and processes for their preparation |
| 01/23/2008 | EP1751683A4 Intermediate layout for resolution enhancement in semiconductor fabrication |
| 01/23/2008 | CN101111802A Macrotype light shield protective film accepting container |
| 01/23/2008 | CN101110395A 半导体器件及其制造方法 Semiconductor device and manufacturing method thereof |
| 01/23/2008 | CN101109911A Pattern decomposition method for double exposure |
| 01/23/2008 | CN101109897A A mask pattern of a semiconductor device and a method for forming the same |
| 01/23/2008 | CN101109896A Mask and manufacturing method of microlens using thereof |
| 01/23/2008 | CN101109711A Apparatus and method for inspecting a pattern and method for manufacturing a semiconductor device |
| 01/23/2008 | CN100364095C CMOS device, method for fabricating the same and method for generating mask data |
| 01/23/2008 | CN100363838C Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting mask |
| 01/22/2008 | US7320946 Method for generating dynamic mask pattern |
| 01/22/2008 | US7320856 Manufacturing method of pattern formed body |
| 01/17/2008 | WO2008007521A1 Reticle holding member, reticle stage, exposure apparatus, projection exposure method and device manufacturing method |
| 01/17/2008 | US20080014535 photoresists; Scanning Electron Microscope, Charge-Coupled Device camera, image analysis device |
| 01/17/2008 | US20080014533 Semiconductor device fabrication and dry develop process suitable for critical dimension tunability and profile control |
| 01/17/2008 | US20080014511 Photomask with overlay mark and method of fabricating semiconductor device |
| 01/17/2008 | US20080014510 Photomask designing apparatus, photomask, photomask designing method, photomask designing program and computer-readable storage medium on which the photomask designing program is stored |
| 01/17/2008 | US20080014509 applying optical proximity correction features to a mask having a target pattern; producing a computer program product; applying SBs which allows for the benefits associated with IM but which reduces the SB count and the overall complexity of the mask design; photolithography |
| 01/17/2008 | US20080014508 Lithographic apparatus and device manufacturing method |
| 01/17/2008 | US20080013824 Defect inspection method, defect inspection apparatus, and semiconductor device manufacturing method |
| 01/17/2008 | US20080013680 Collector configured of mirror shells |
| 01/17/2008 | US20080013072 Pattern inspection apparatus |
| 01/17/2008 | US20080013061 Exposure method, exposure apparatus, photomask and method for manufacturing photomask |
| 01/17/2008 | US20080013019 Color filter, process of producing the color filter, and liquid crystal display device employing the color filter |
| 01/17/2008 | US20080011718 Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface |
| 01/16/2008 | EP1879072A2 Original data producing method and original data producing program |
| 01/16/2008 | EP1527373B1 Method for producing flexo printing forms by means of laser direct engraving |
| 01/16/2008 | CN101105637A System and method for using a two part cover for protecting a reticle |
| 01/16/2008 | CN101105636A System and method for using a two part cover for protecting a reticle |
| 01/16/2008 | CN101105633A Optical approximate correction method and its photomask pattern |