Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor
More topics under "G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor" (169,016)
G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
G03F 3 - Colour separation; Correction of tonal value (5,370)
G03F 5 - Screening processes; Screens therefor (818)
G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
G03F 9 - Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (10,803)
Patents for G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor (531)
02/2015
02/05/2015US20150036113 Apparatus and method for providing fluid for immersion lithography
12/2014
12/04/2014US20140354967 Environmental system including a transport region for an immersion lithography apparatus
11/2014
11/25/2014US8896807 Apparatus and method for providing fluid for immersion lithography
11/18/2014US8893067 System and method for lithography simulation
09/2014
09/09/2014US8830443 Environmental system including a transport region for an immersion lithography apparatus
12/2013
12/12/2013US20130332894 System and method for lithography simulation
11/2013
11/14/2013US20130301018 Wafer table having sensor for immersion lithography
11/14/2013US20130301016 Wafer table having sensor for immersion lithography
11/14/2013US20130301015 Apparatus and method for providing fluid for immersion lithography
09/2013
09/25/2013CN101813892B Immersion lithography apparatus and method for manufacturing microdevice using lithography device
08/2013
08/27/2013US8520187 Apparatus and method for providing fluid for immersion lithography
08/20/2013US8516405 System and method for lithography simulation
08/13/2013US8508718 Wafer table having sensor for immersion lithography
03/2013
03/26/2013US8407627 Method and system for context-specific mask inspection
10/2012
10/25/2012US20120269421 System and Method for Lithography Simulation
08/2012
08/08/2012CN101095082B Dissolution rate modifiers for photoresist compositions
06/2012
06/26/2012US8209640 System and method for lithography simulation
06/20/2012EP2466383A2 Wafer table for immersion lithography
06/20/2012EP2466382A2 Wafer table for immersion lithography
04/2012
04/11/2012EP1586007B1 Electron beam processing for mask repair
03/2012
03/27/2012US8144307 Image forming method and apparatus
02/2012
02/15/2012EP2418544A2 Method and system for determining characteristics of substrates employing fluid geometries
11/2011
11/30/2011CN101055431B 图像形成方法和装置 The image forming method and apparatus
11/17/2011US20110281221 Applications of semiconductor nano-sized particles for photolithography
09/2011
09/29/2011US20110235007 Environmental system including a transport region for an immersion lithography apparatus
08/2011
08/10/2011CN101430508B Device and method for supplying fluid for immersion lithography
06/2011
06/28/2011US7969552 Environmental system including a transport region for an immersion lithography apparatus
06/21/2011US7965376 Environmental system including a transport region for an immersion lithography apparatus
05/2011
05/18/2011EP1446283B1 Providing an image on a flower
04/2011
04/19/2011US7929111 Environmental system including a transport region for an immersion lithography apparatus
04/19/2011US7929110 Environmental system including a transport region for an immersion lithography apparatus
04/07/2011US20110083113 System and Method for Lithography Simulation
03/2011
03/09/2011CN1751270B Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon
03/02/2011EP2290445A2 An image forming method and apparatus
02/2011
02/15/2011US7888301 Resist, barc and gap fill material stripping chemical and method
02/02/2011CN1698011B Lithographic printing with polarized light
01/2011
01/18/2011US7873937 System and method for lithography simulation
10/2010
10/27/2010CN1910517B Adaptive real time control of a reticle/mask system
08/2010
08/25/2010CN101813892A Environmental system including a transport region for an immersion lithography apparatus
08/24/2010US7784016 Method and system for context-specific mask writing
08/11/2010CN1871555B Forming partial-depth features in polymer film
07/2010
07/27/2010CA2330747C Silicate-containing alkaline compositions for cleaning microelectronic substrates
06/2010
06/22/2010US7741227 Process for structuring at least one year as well as electrical component with structures from the layer
06/15/2010US7736819 shading elements attenuate light passing through the regions, so as to compensate for the critical dimensio (CD) variations on the wafer and hence provide and improved CD tolerance wafer; computer program uses a reference calibration list to determine the parameters of the shading elements
06/02/2010CN1739066B Electron beam processing technology for mask repair
06/01/2010US7727681 regeneration transmission to quartz substrate doped with gallium; using etching gas; radiation transparent; controlling thickness; photolithography
12/2009
12/23/2009CN100573330C An image forming method and apparatus
12/03/2009US20090296053 Apparatus and method for providing fluid for immersion lithography
11/2009
11/18/2009CN100561337C Low-activation energy silicon-containing resist system
11/10/2009US7615141 Electrochemical printer head for use in electrolytically depositing material onto substrate, the printing head comprising a plurality of electrodes, a lead connector, an electric power source, and a high electrical resistance means for controlling distribution of electrolyte to electrode channels
09/2009
09/24/2009US20090239161 Applications of semiconductor nano-sized particles for photolithography
08/2009
08/27/2009US20090214689 Imprint Lithography Templates Having Alignment Marks
08/12/2009CN100526052C Imprint lithography with improved monitoring and control and apparatus therefor
08/05/2009EP1606670A4 Applications of semiconductor nano-sized particles for photolithography
07/2009
07/08/2009EP1105778B1 Silicate-containing alkaline compositions for cleaning microelectronic substrates
07/08/2009CN100511603C Method for structuring at least one layer and electric component with structures from said layer
06/2009
06/10/2009EP1586007A4 Electron beam processing for mask repair
05/2009
05/13/2009CN101430508A Device and method for supplying fluid for immersion lithography
05/12/2009US7531025 Method of creating a turbulent flow of fluid between a mold and a substrate
05/06/2009CN100485350C Method and system for determining characteristics of substrates employing fluid geometries
04/2009
04/30/2009US20090109418 Wafer table for immersion lithography
04/29/2009CN100482307C Single phase fluid imprint lithography method
04/28/2009US7524616 semiconductor nano-sized particle containing materials as highly refractive medium in immersion lithography, as anti-reflection coating in optics, as pellicle in lithography and as sensitizer in UV photoresists
04/22/2009EP1667778A4 Single phase fluid imprint lithography method
04/22/2009CN100481418C ARC layer for semiconductor device and manufacturing method thereof
04/16/2009WO2005036264A3 Photomask having an internal substantially transparent etch stop layer
04/15/2009EP1642170A4 Systems for magnification and distortion correction for imprint lithography processes
04/02/2009WO2005088395A3 Systems and methods for sub-wavelength imaging
04/01/2009EP1552344A4 A method for the removal of an imaging layer from a semiconductor substrate stack
03/2009
03/26/2009US20090081594 semiconductor nano-sized particle containing materials as highly refractive medium in immersion lithography, as anti-reflection coating in optics, as pellicle in lithography and as sensitizer in UV photoresists
03/25/2009EP1614004A4 Positive tone bi-layer imprint lithography method and compositions therefor
03/19/2009US20090075203 Photoresist compositions comprising diamondoid derivatives
03/12/2009US20090066926 Image forming method and apparatus
02/2009
02/10/2009US7488957 Pattern generation methods and apparatuses
02/10/2009US7488565 Photoresist compositions comprising diamondoid derivatives
02/03/2009US7486380 Wafer table for immersion lithography
01/2009
01/13/2009US7476474 Method for making a photomask assembly incorporating a porous frame
01/01/2009US20090004444 Novel Photosensitive Resin Compositions
11/2008
11/19/2008EP0995148B1 Method for producing active or passive components on a polymer basis for integrated optical devices
11/04/2008US7446857 Image forming method and apparatus
11/04/2008US7445883 Custom polarization, such as a combination of radial and tangential polarization; Forbidden pitch is avoided; patterning the polarized beam of radiation; projecting the patterned beam of radiation onto a target portion of the wafer
10/2008
10/28/2008US7442486 Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon
10/22/2008EP1611486A4 Environmental system including a transport region for an immersion lithography apparatus
10/15/2008EP1660925A4 Apparatus and method for providing fluid for immersion lithography
10/08/2008EP1687877A4 Laser thin film poly-silicon annealing system
10/07/2008US7432039 Method for simultaneous patterning of features with nanometer scales gaps
09/2008
09/17/2008EP1969424A2 Apparatus for cooling
09/09/2008US7422836 Dissolution rate modifiers for photoresist compositions
08/2008
08/26/2008US7418124 Qualifying patterns, patterning processes, or patterning apparatus in the fabrication of microlithographic patterns
08/26/2008US7416830 positive-working, aqueous base developable photosensitive polybenzoxazole (PBO) precursor compositions of polyamides where the hydroxyl groups of the dihydroxydiamine monomer unit may be sulfonated with a quinonediazide, a diazonaphthoquinone photoactive compound, and a solvent; relief images
07/2008
07/09/2008CN101215421A Radiation-sensitive resin composition
05/2008
05/27/2008US7378456 Directly photodefinable polymer compositions and methods thereof
05/20/2008US7374864 Combined nanoimprinting and photolithography for micro and nano devices fabrication
04/2008
04/09/2008EP1664936A4 Forming partial-depth features in polymer film
04/09/2008EP1556896B1 Anti-reflective compositions comprising triazine compounds
04/09/2008CN100380381C Photomask and method for qualifying the same with a prototype specification
04/03/2008US20080078960 Pattern generation methods and apparatuses
04/01/2008US7352453 Method for process optimization and control by comparison between 2 or more measured scatterometry signals
03/2008
03/18/2008US7345742 Environmental system including a transport region for an immersion lithography apparatus
03/18/2008US7344824 Alternating aperture phase shift photomask having light absorption layer
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