| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
|---|
| 07/15/2008 | US7401318 Method and apparatus for optimizing fragmentation of boundaries for optical proximity correction (OPC) purposes |
| 07/15/2008 | US7401010 Methods of forming radiation-patterning tools; carrier waves and computer readable media |
| 07/15/2008 | US7400375 Method for designing mask and fabricating panel |
| 07/15/2008 | US7399685 Laser beam pattern mask and crystallization method using the same |
| 07/15/2008 | US7399575 Laminated photosensitive relief printing original plate and method for producing the relief printing plate |
| 07/15/2008 | US7399560 Performing a lyophobic treatment on a surface of a translucent substrate; putting a light-shielding material on that surface in a desired shape by a droplet discharge; and firing the light-shielding material to form the light-shielding pattern |
| 07/15/2008 | US7399559 Optical proximity correction method utilizing phase-edges as sub-resolution assist features |
| 07/15/2008 | US7399558 Mask and manufacturing method thereof and exposure method |
| 07/15/2008 | US7399557 Writing pattern; data processing; etching masking film; removal segments of photoresists |
| 07/10/2008 | WO2007136656A3 Colored masking for forming transparent structures |
| 07/10/2008 | WO2007127197A3 Mask structure for manufacture of trench type semiconductor device |
| 07/10/2008 | US20080168416 determining a bias based on an interaction between a plurality of reference features positioned according to a lithographic parameter of the mask, applying the bias to a plurality of lithographic features of the mask,determining pitch of lithographic features based on interactions between biased features |
| 07/10/2008 | US20080166889 Using alternating phase-shift implementation in lithography; electronic design automation (EDA); computer readable medium |
| 07/10/2008 | US20080166668 Laser mask and method of crystallization using the same |
| 07/10/2008 | US20080166641 Forming black matrix of ink phobic organic materials that prevent inks of different colors from overflowing between adjacent pixels during ink jet application |
| 07/10/2008 | US20080166639 Data preparation for multiple mask printing |
| 07/10/2008 | US20080166638 Comprised of base resin, acrylic acid-3,3-dimethoxypropene copolymer, photoacid generator, organic base and solvent; reducing number of steps to perform etching and hard mask deposition |
| 07/10/2008 | US20080166054 Pattern inspection apparatus |
| 07/10/2008 | US20080165334 Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method |
| 07/10/2008 | US20080164526 Method of trimming a hard mask layer, method for fabricating a gate in a mos transistor, and a stack for fabricating a gate in a mos transistor |
| 07/10/2008 | US20080164524 Thin film transistor liquid crystal display device; region in which wiring is formed in the upper end section of the array substrate at up and down direction |
| 07/10/2008 | DE102007057486A1 Optical component for photo-mask substrate and optical wave guide used in photolithography, has light-incident axis and comprises deuteroxyl-doped silica glass having preset absorption edge |
| 07/10/2008 | DE102004032677B4 Verfahren zum Herstellen einer Maske auf einem Substrat A method for manufacturing a mask on a substrate |
| 07/09/2008 | EP1941321A2 System and method for mask verification using an individual mask error model |
| 07/09/2008 | EP1940968A1 Pigment preparations based on diketopyrrolopyrroles |
| 07/09/2008 | EP1497699A4 Attenuated embedded phase shift photomask blanks |
| 07/09/2008 | CN101216683A Reverse illumination adjacent and contact nanometer lithographic equipment |
| 07/09/2008 | CN101216662A Optical approximation correction model calibration method based on photoresist inclined slope width weighting |
| 07/09/2008 | CN100401113C Anti-glare film and image display device |
| 07/08/2008 | US7398509 Network-based photomask data entry interface and instruction generator for manufacturing photomasks |
| 07/08/2008 | US7398508 Eigen decomposition based OPC model |
| 07/08/2008 | US7396621 Exposure control method and method of manufacturing a semiconductor device |
| 07/08/2008 | US7396617 Photomask reticle having multiple versions of the same mask pattern with different biases |
| 07/03/2008 | WO2008079007A1 Patterning device, method of providing a patterning device, photolithographic apparatus and device manufacturing method |
| 07/03/2008 | WO2008078509A1 Mask, mask stage, exposure apparatus, method of exposure and process for manufacturing device |
| 07/03/2008 | WO2008078213A1 A method and system for identifying weak points in an integrated circuit design |
| 07/03/2008 | US20080162061 Pattern Testing Apparatus, Pattern Testing Method, and Pattern Testing Program |
| 07/03/2008 | US20080160870 Method for forming color filter, method for forming light emitting element layer, method for manufacturing color display device comprising them, or color display device |
| 07/03/2008 | US20080160431 Focused ion beam patterning then transferring to second layer; conformal coverage and very fine critical feature control; direct write semiconductor manufacturing |
| 07/03/2008 | US20080160430 Manufacturing Method for Photo Mask |
| 07/03/2008 | US20080160429 Method for manufacturing a photomask |
| 07/03/2008 | US20080160428 Method for repairing bridge in photo mask |
| 07/03/2008 | US20080160427 Transparent substrate; phase shift layer pattern over substrate; light shielding layer pattern; silicon oxide layer or silicon nitride layer ion-reaction preventing layer; light shielding layer pattern |
| 07/03/2008 | US20080160426 Method for manufacturing photomask |
| 07/03/2008 | US20080160425 Mask With Focus Measurement Pattern And Method For Measuring Focus Value In Exposure Process Using The Same |
| 07/03/2008 | US20080160424 Hybrid topography mask; each pattern element defines a surface parallel to the light receiving surface; pattern sides extend between elements and surface; Each side extends perpendicularly between surface and elements;tapered sub-resolution assist element to position mask on semiconductor wafer |
| 07/03/2008 | US20080160423 Expose photosensitive layer using a mask and hyper-numerical aperture optics providing a first exposure pattern; orthogonal second exposure using mask and optics different than the first exposure pattern; form two-dimensional array of features in the layer beneath the photosensitive layer |
| 07/03/2008 | US20080160422 Lithographic mask and methods for fabricating a semiconductor device |
| 07/03/2008 | US20080160235 Clean container having elastic positioning structure |
| 07/03/2008 | US20080158703 Color filter and manufacturing method thereof |
| 07/03/2008 | US20080158535 Pellicle, methods of fabrication & methods of use for extreme ultraviolet lithography |
| 07/03/2008 | US20080157084 Mask device, method of fabricating the same, and method of fabricating organic light emitting display device using the same |
| 07/03/2008 | DE10339992B4 Verfahren zur Herstellung eines Strukturelements kritischer Abmessung bzw. einer Gateelektrode eines Feldeffekttransistors sowie Ätzsteuerung A process for producing a structural element of critical dimension or a gate electrode of a field effect transistor, and etching control |
| 07/03/2008 | DE102007054042A1 Prüfsysteme und -verfahren Test systems and procedures |
| 07/02/2008 | CN101213489A Semiconductor device and its manufacturing method, semiconductor manufacturing mask, and optical proximity processing method |
| 07/02/2008 | CN101213488A System and method for critical dimension reduction and pitch reduction |
| 07/02/2008 | CN101211123A Side lobe image searching method in lithography |
| 07/02/2008 | CN101211119A LCD device preparation method and mask used in the method |
| 07/02/2008 | CN101211118A LCD device preparation method and mask used in the method |
| 07/02/2008 | CN101211108A Method for repairing bridge in photo mask |
| 07/02/2008 | CN101211107A Photo mask for depressing haze and method for fabricating the same |
| 07/02/2008 | CN101211106A Sensitive light shield |
| 07/02/2008 | CN101211105A Mold structure, patterning method using the same, and method of fabricating liquid crystal display device |
| 07/02/2008 | CN101211104A Method for manufacturing photomask and phase shift mask |
| 07/02/2008 | CN101211103A Manufacturing method for photo mask |
| 07/02/2008 | CN101211102A Apparatus for removing haze in photo mask and method for removing haze in a photo mask |
| 07/02/2008 | CN101211101A Method for using three-dimensional function for mask specification institution |
| 07/02/2008 | CN100399508C Semiconductor manufacturing method and an exposure mask |
| 07/02/2008 | CN100399193C 掩模 Mask |
| 07/02/2008 | CN100398413C Container box for framed pellicle |
| 07/01/2008 | US7394584 System and method for calculating aerial image of a spatial light modulator |
| 07/01/2008 | US7394068 Mask inspection apparatus, mask inspection method, and electron beam exposure system |
| 07/01/2008 | US7393619 Method and lithographic structure for measuring lengths of lines and spaces |
| 07/01/2008 | US7393617 Opaque material replaces defects/pinholes on radiation transparent/patterned substrate; semiconductors; integrated circuits; photolithography |
| 07/01/2008 | US7393616 Line end spacing measurement |
| 07/01/2008 | US7393615 Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flare |
| 07/01/2008 | US7393614 Set of masks including a first mask and a second trimming mask with a semitransparent region having a transparency between 20% and 80% to control diffraction effects and obtain maximum depth of focus for the projection of structure patterns onto a semiconductor wafer |
| 07/01/2008 | US7393613 photoresists for semiconductors; photolithography |
| 07/01/2008 | US7393409 Method for making large-volume CaF2 single cystals with reduced scattering and improved laser stability, the crystals made by the method and uses thereof |
| 07/01/2008 | US7393404 Color filter, image display device and information communication equipment; pigment dispersing ability, transparency, fluidity and storage stability |
| 06/26/2008 | WO2008075841A1 Device for generating haze on a photomask |
| 06/26/2008 | US20080153301 Set of masks, method of generating mask data and method for forming a pattern |
| 06/26/2008 | US20080153277 Recess gate pattern having a sufficient margin between an edge of an active region and a neighboring recess region, to prevent damage generated in the edge of the active region when the recess region is formed to improve the characteristics of a device |
| 06/26/2008 | US20080153239 Mask set for making a butting contact between two field effect transistors (FET); involves use of a heavily doped region of a second conductivity type that overrides the lightly doped region of a first conductivity type, and divides the heavily doped region of the first conductivity type into two areas |
| 06/26/2008 | US20080153014 Additive Printed Mask Process And Structures Produced Thereby |
| 06/26/2008 | US20080153011 Pattern transfer mask, focus variation measuring method and apparatus, and semiconductor device manufacturing method |
| 06/26/2008 | US20080153010 Method for depositing reflective multilayer film of reflective mask blank for euv lithography and method for producing reflective mask blank for euv lithography |
| 06/26/2008 | US20080153009 Exposure mask, optical proximity correction device, optical proximity correction method, manufacturing method of semiconductor device, and optical proximity correction program |
| 06/26/2008 | US20080153008 Optical Element, Method for Production Thereof and Display Device |
| 06/26/2008 | US20080152873 EUV pellicle and method for fabricating semiconductor dies using same |
| 06/26/2008 | US20080151215 Patterning device, method of providing a patterning device, photolithographic apparatus and device manufacturing method |
| 06/26/2008 | US20080149859 Irradiation Pattern Data Generation Method, Mask Fabrication Method, and Plotting System |
| 06/26/2008 | DE10321680B4 Verfahren zur Bestimmung der Güte eines Pellicles Method for determining the quality of a pellicle |
| 06/25/2008 | EP1936437A2 Photomask blank, photomask and fabrication method thereof |
| 06/25/2008 | EP1935620A2 Optical modeling apparatus |
| 06/25/2008 | EP1934655A1 Dynamic uv-exposure and thermal development of relief image printing elements |
| 06/25/2008 | CN101206406A Photolithography detection pattern and photolithography edition territory |
| 06/25/2008 | CN101206395A Image sensor and fabricating method thereof |
| 06/25/2008 | CN101206394A Exposure mask and method for fabricating semiconductor device using the same |
| 06/25/2008 | CN101206393A Optical mask employed for manufacturing array substrate, array substrate and method for manufacturing the same |