| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 03/25/2008 | US7348104 Performing multilevel alignment; forming resist areas of different thicknesses using varied exposure characteristics; producing large focusing element arrays |
| 03/20/2008 | WO2008033879A2 Method for achieving compliant sub-resolution assist features |
| 03/20/2008 | WO2008032819A1 Mask blank and method for manufacturing transfer mask |
| 03/20/2008 | US20080072208 Mask defect inspecting method, semiconductor device manufacturing method, mask defect inspecting apparatus, defect influence map generating method, and computer program product |
| 03/20/2008 | US20080071479 Method for an automatic optical measuring of an OPC structure |
| 03/20/2008 | US20080070416 Phase shift mask including a substrate with recess |
| 03/20/2008 | US20080070414 Method for designing mask and method for manufacturing semiconductor device employing thereof |
| 03/20/2008 | US20080070381 Semiconductor wafer, method of manufacturing the same, and method of manufacturing a semiconductor device |
| 03/20/2008 | US20080070325 Double-Masking Technique for Increasing Fabrication Yield in Superconducting Electronics |
| 03/20/2008 | US20080070156 Structure for pattern formation, method for pattern formation, and application thereof |
| 03/20/2008 | US20080070132 thin films that form masking patterns, formed on substrates and a chemically amplified photoresist film, having a protective film that prevents movement of substances that inhibits chemical amplification of the photoresist films |
| 03/20/2008 | US20080070131 computer softeware used to form latent images on photoresists |
| 03/20/2008 | US20080070129 Method for manufacturing a mold of a light guide plate |
| 03/20/2008 | US20080070128 Method of etching extreme ultraviolet light (euv) photomasks |
| 03/20/2008 | US20080070127 quartz substrates having opaque multilayer absorbers comprising tantalum nitrides, silicides, oxynitrides or boronitrides, used for to form patterned images in photoresist layers; fabrication of semiconductors, integrated circuits or chips |
| 03/20/2008 | US20080070126 lithography photomasks comprising attenuation segements including an layout of sub-resolution features, used for manufacturing semiconductor devices, by exposing and developing workpiece having a layer of photosensitive materials |
| 03/20/2008 | US20080068611 Method and system for measuring patterned structures |
| 03/20/2008 | US20080068595 Measurement Method, Exposure Method, and Device Manufacturing Method |
| 03/20/2008 | US20080068541 Liquid crystal display panel, color filter and manufacturing methods thereof |
| 03/20/2008 | US20080068540 Liquid crystal display and method for manufacturing the same |
| 03/20/2008 | US20080068393 Computer-readable recording medium recording a mask data generation program, mask data generation method, mask fabrication method, exposure method, and device manufacturing method |
| 03/19/2008 | EP1901122A2 Method and apparatus for performing model-based OPC for pattern decomposed feature |
| 03/19/2008 | EP1901121A2 A method for performing pattern decomposition based on feature pitch |
| 03/19/2008 | EP1901120A1 Method of etching extreme ultraviolet light (EUV) photomasks |
| 03/19/2008 | EP1901119A2 Photomask having self-masking layer and methods of etching same |
| 03/19/2008 | EP1901118A2 Phase shifting photomask and a method of fabricating thereof |
| 03/19/2008 | EP1901117A1 Method for producing photosensitive laminate original printing plate for letterpress printing, photosensitive laminate original printing plate for letterpress printing, and method for producing letterpress printing plate |
| 03/19/2008 | EP1900696A1 Crystallized glass, and method for producing crystallized glass |
| 03/19/2008 | EP1000371A4 Ultra-broadband uv microscope imaging system with wide range zoom capability |
| 03/19/2008 | CN101147148A Method of adding fabrication monitors to integrated circuit chips |
| 03/19/2008 | CN101144977A Mold for nano-imprinting and method of manufacturing the same |
| 03/19/2008 | CN101144976A Photoetching system mask proximity effect correction method |
| 03/19/2008 | CN101144975A Protecting pellicle for photolithography |
| 03/19/2008 | CN101144974A Photomask having self-masking layer and methods of etching same |
| 03/19/2008 | CN101144973A Method of etching extreme ultraviolet light photomasks |
| 03/19/2008 | CN101144972A 掩模坯板和掩模 Mask blanks and masks |
| 03/19/2008 | CN101144971A Phase shifting photomask and a method of fabricating thereof |
| 03/19/2008 | CN101144864A Method for producing optical member and method for producing molding die for optical member |
| 03/18/2008 | US7346882 Pattern forming method, mask manufacturing method, and LSI manufacturing method |
| 03/18/2008 | US7345789 Image processing apparatus for prepress printing and prepress printing system |
| 03/18/2008 | US7345776 Information processing apparatus and method |
| 03/18/2008 | US7345771 Apparatus and method for measurement of critical dimensions of features and detection of defects in UV, VUV, and EUV lithography masks |
| 03/18/2008 | US7345755 Defect inspecting apparatus and defect inspection method |
| 03/18/2008 | US7344826 Method for forming a capacitor |
| 03/18/2008 | US7344824 Alternating aperture phase shift photomask having light absorption layer |
| 03/18/2008 | US7344808 Method of making photomask blank substrates |
| 03/18/2008 | US7344807 connecting optics having a lithographic structure with frames and pellicles, using inorganic adhesive comprising a potassium silicate solution, to form exposure masks for structuring photoresist layers on substrate wafers |
| 03/18/2008 | US7344806 Sputtering layers of phase shifting mask on substrates; concurrent discharging various targets; reducing defects |
| 03/18/2008 | US7344805 Mask and method for producing thereof and a semiconductor device using the same |
| 03/13/2008 | WO2008030950A2 Method of mask making to prevent phase edge and overlay shift for chrome-less phase shifting mask |
| 03/13/2008 | WO2008029917A1 Mask, exposure apparatus and device manufacturing method |
| 03/13/2008 | WO2008029696A1 Electron beam dimension measuring device and electron beam dimension measuring method |
| 03/13/2008 | WO2008029611A1 Mask pattern design method, mask pattern design device, and semiconductor device manufacturing method |
| 03/13/2008 | WO2008028560A1 Packaging for films which contain active substances, and method for producing it |
| 03/13/2008 | US20080065339 Method and system for measuring patterned structures |
| 03/13/2008 | US20080063988 Exposure method and method for manufacturing semiconductor device |
| 03/13/2008 | US20080063975 Polymer, Positive Resist Composition and Method for Forming Resist Pattern |
| 03/13/2008 | US20080063955 Flame retardancy; halogen free; curing shrinkage and solder resistance; resin comprised of linear polymer containing ethylenic unsaturated compound with carboxyl groups, multifunctional ethylenic unsaturated monomers, photopolymerization initiator and phosphorated epoxy resin |
| 03/13/2008 | US20080063954 Manufacturing method of color filter substrate |
| 03/13/2008 | US20080063953 Process for producing dye-containing negative curable composition, color filter, and color filter production process |
| 03/13/2008 | US20080063952 Soft pressure sensitive adhesive absorbs irregularity of frame; dust protection without affecting flatness of photomask |
| 03/13/2008 | US20080063951 Photo-mask for micro lens of cmos image sensor |
| 03/13/2008 | US20080063950 Photomask Blank and Photomask |
| 03/13/2008 | US20080063949 Functional Substrate |
| 03/13/2008 | US20080063948 Forming a photomask pattern comprising sub-resolution assist features (SRAF); improved techniques for dealing with illegal SRAF by reassigning them to another position without deleting so as not to interfer with optical proximity correction process |
| 03/13/2008 | US20080063947 Notch portion is adapted to allow the hologram recording material to be uniformly spread over in the entire filling space so as to have a recording layer having a substantially uniform thickness |
| 03/13/2008 | US20080063851 Elastomeric mask and use in fabrication of devices |
| 03/13/2008 | US20080063259 Pattern data processing system, pattern data processing method, and pattern data processing program |
| 03/13/2008 | US20080062406 Method and system for measuring patterned structures |
| 03/13/2008 | US20080062389 Method and apparatus for personalization of semiconductor |
| 03/13/2008 | DE102007041160A1 Substratabdeckung, und Einrichtung und Verfahren zum Schreiben mit einem Strahl geladener Teilchen Substrate cover, and device and method for writing with a beam of charged particles |
| 03/13/2008 | DE102007009661A1 Verfahren und Vorrichtung zur ortsaufgelösten Bestimmung der Phase und Amplitude des elektromagnetischen Feldes in der Bildebene einer Abbildung eines Objektes Method and device for the spatially resolved determination of the phase and amplitude of the electromagnetic field in the image plane of an image of an object |
| 03/13/2008 | CA2662771A1 Packaging for films which contain active substances, and method for producing it |
| 03/12/2008 | EP1898261A1 Pellicle for photolithography |
| 03/12/2008 | EP1896899A2 Methods and devices for characterizing polarization of illumination system |
| 03/12/2008 | EP1759322A4 Methos and apparatus for designing integrated circuit layouts |
| 03/12/2008 | CN101140853A Crystallization method of amorphous silicon layer and photo mask thereof |
| 03/12/2008 | CN101140417A Semiconductor device with a bulb-type recess gate |
| 03/12/2008 | CN101140416A 光掩模坯 Photomask blank |
| 03/12/2008 | CN100375267C Method for manufacturing semiconductor devices |
| 03/12/2008 | CN100375097C Personalized hardware |
| 03/11/2008 | US7343271 Incorporation of a phase map into fast model-based optical proximity correction simulation kernels to account for near and mid-range flare |
| 03/11/2008 | US7342646 Method of manufacturing reliability checking and verification for lithography process using a calibrated eigen decomposition model |
| 03/11/2008 | US7342620 Color filter array panel comprising a blue pixel contrast ratio greater than twice the red pixel contrast ratio and liquid crystal display including the same |
| 03/11/2008 | US7341809 Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation |
| 03/06/2008 | WO2008025433A2 Method and apparatus for the spatially resolved determination of the phase and amplitude of the electromagnetic field in the image plane of an image of an object |
| 03/06/2008 | US20080059939 Performance in model-based opc engine utilizing efficient polygon pinning method |
| 03/06/2008 | US20080059141 Method and system for measuring patterned structures |
| 03/06/2008 | US20080059129 Method and system for measuring patterned structures |
| 03/06/2008 | US20080057417 Azobarbituric mono-cation salt and azobarbituric di-cation saltis reacted with a nickel compound and melamine; metallization, complexing; photoresists, color filters, liquidcrystal displays, ink jet printers |
| 03/06/2008 | US20080057415 Method of manufacturing an ultrathin optical element |
| 03/06/2008 | US20080057414 Hybrid photomask and method of fabricating the same |
| 03/06/2008 | US20080057413 Photomask for forming micro-patterns of semiconductor devices and method for manufacturing the same |
| 03/06/2008 | US20080057412 Reflecting mask, apparatus for fixing the reflecting mask and method of fixing the reflecting mask |
| 03/06/2008 | US20080057411 Purification by removing sulfur, carbon and oxygen compounds by contact with excited oxygen; photoresist layer is removed with a sulfur hexafluoride; etching; binary, attenuated phase shift masks (APSMs) and high transmission attenuated photomasks; molybdenum-doped silicon oxynitride and chrome layers |
| 03/06/2008 | US20080057410 Repairing a defect by forming a phase voxel cavity in the photolithographic mask to compensate; microelectronics, semiconductors |
| 03/06/2008 | US20080057409 Method of Mask Making to Prevent Phase Edge and Overlay Shift For Chrome-Less Phase Shifting Mask |
| 03/06/2008 | US20080057408 Photomask and pattern forming method employing the same |
| 03/06/2008 | US20080057186 Treating insulating film by HexaMethylDiSilazine (HMDS) gas thereby modifying a surface of the insulating film into a state of hydrophobicity, and forming silane ions on the surface of the insulating film |
| 03/06/2008 | US20080055715 High-index uv optical materials for immersion lithography |