| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 05/31/2007 | US20070122754 Radiating vacuum-ultraviolet light through a photomask to a pattern forming substrate, varying a surface property by the vacuum-ultraviolet light, and forming a property varied pattern with the property varied on a surface of the pattern forming substrate to form a pattern formed body; removing |
| 05/31/2007 | US20070122751 Methods of Patterning Using Photomasks Including Shadowing Elements Therein and Related Systems |
| 05/31/2007 | US20070122720 Polarized reticle, photolithography system, and method of fabricating a polarized reticle |
| 05/31/2007 | US20070122719 Method and apparatus for generating OPC rules for placement of scattering bar features utilizing interface mapping technology |
| 05/31/2007 | US20070122718 distribution of the light transmittance is determined so that the resist layer having been exposed in accordance with a first resist shape would be used to form a second resist shape with an aspect ratio higher than the aspect ratio of the first resist shape; gray scale mask; microlens |
| 05/30/2007 | EP1791168A1 Reflective mask blank for euv lithography and method for producing same |
| 05/30/2007 | EP1261752B1 Method for repairing lithography masks using a charged particle beam system |
| 05/30/2007 | CN1973244A Levenson type phase shift mask and production method therefor |
| 05/30/2007 | CN1971417A Photomask and its manufacturing method and micro-image method |
| 05/30/2007 | CN1971416A Printing plate, method of manufacturing of printing plate and liquid crystal display device using the same |
| 05/30/2007 | CN1971415A Manufacturing method of contact hole on surface of silicon chip |
| 05/30/2007 | CN1319120C Pattern-producing method for semiconductor device |
| 05/30/2007 | CN1318912C Self-aligned fabrication technique for tri-tone attenuated phase-shifting masks |
| 05/29/2007 | US7224030 Method and apparatus for producing rectangular contact holes utilizing side lobe formation |
| 05/29/2007 | US7223525 Process for generating a hard mask for the patterning of a layer |
| 05/29/2007 | US7223517 Lithographic antireflective hardmask compositions and uses thereof |
| 05/29/2007 | US7223504 mask includes multiple transmissive areas having a plurality of first slits for adjusting energy of the laser illumination passing through the mask; and an opaque area; for laser illumination to convert amorphous silicon into polysilicon |
| 05/29/2007 | US7223503 Method for repairing opaque defects on semiconductor mask reticles |
| 05/24/2007 | WO2007058240A1 Substrate processing method, photomask manufacturing method, photomask and device manufacturing method |
| 05/24/2007 | WO2007058199A1 Mask blank and photo mask |
| 05/24/2007 | US20070118826 Opc conflict identification and edge priority system |
| 05/24/2007 | US20070117409 Aligner and Semiconductor Device Manufacturing Method Using the Aligner |
| 05/24/2007 | US20070117031 Colored curable composition, color filter and method of producing thereof |
| 05/24/2007 | US20070117030 photolithography mask; generating a known set of functions (calibrated model) defining the performance of an imaging system which are used to correct for optical proximity effects and to improve the printing of mask patterns; computer program |
| 05/24/2007 | US20070117029 Exposure pattern or mask and inspection method and manufacture method for the same |
| 05/24/2007 | US20070117028 Mask handling method, and mask and device or apparatus comprising a gripper therefor, device manufacturing method and device manufactured thereby |
| 05/24/2007 | US20070115471 Wafer, exposure mask, method of detecting mark and method of exposure |
| 05/24/2007 | US20070114450 Mask-making member and its production method, mask and its making method, exposure process, and fabrication method of semiconductor device |
| 05/24/2007 | US20070113866 Placing the photomask contaminated with crystal in a vessel whose environmental conditions were set by supplying energy inducing crystal growth, feeding a gas reactive with the crystal nucleus, growing a crystal from the nucleus, and removing the crystal by contact with a supercritical fluid, such as CO2 |
| 05/24/2007 | DE112005001588T5 Fotomaskenrohling, Fotomaskenherstellungsverfahren und Halbleiterbausteinherstellungsverfahren Photomask blank photomask manufacturing method and semiconductor device production method |
| 05/23/2007 | CN1969233A Photosensitive composition for use in producing printing plate, and photosensitive printing original plate laminate and printing plate using the photosensitive composition |
| 05/23/2007 | CN1967382A A shared light shield layout method and manufacturing method of semiconductor element using same |
| 05/23/2007 | CN1967381A Light shield improving joining effect and exposal method used the same |
| 05/23/2007 | CN1317603C Light shade and its making method |
| 05/22/2007 | US7222328 Semiconductor integrated circuit design tool, computer implemented method for designing semiconductor integrated circuit, and method for manufacturing semiconductor integrated circuit |
| 05/22/2007 | US7222327 Photo mask, method of manufacturing photo mask, and method of generating mask data |
| 05/22/2007 | US7220975 Mask-making member and its production method, mask and its making method, exposure process, and fabrication method of semiconductor device |
| 05/22/2007 | US7220969 Mask blanks inspection tool |
| 05/22/2007 | US7220664 Fabrication method for semiconductor structure in a substrate, the semiconductor structure having at least two regions that are to be patterned differently |
| 05/22/2007 | US7220606 Integrated circuit identification |
| 05/22/2007 | US7220531 Resist for electron beam lithography and a process for producing photomasks using electron beam lithography |
| 05/18/2007 | WO2007055401A1 Method for depositing reflective multilayer film of reflective mask blank for euv lithography and method for producing reflective mask blank for euv lithography |
| 05/18/2007 | WO2007054643A1 Method of forming supports bearing features, such as lithography masks |
| 05/17/2007 | US20070111490 Mask blank, mask blank manufacturing method, transfer mask manufacturing method, and semiconductor device manufacturing method |
| 05/17/2007 | US20070111465 Mask, mask blank, and methods of producing these |
| 05/17/2007 | US20070111115 Light reflective structure, method for producing the same and display |
| 05/17/2007 | US20070111114 Silicon thin film in which an opening for selectively irradiating charged particles to a semiconductor substrate is provided and whose irradiation surface on which the charged particles are irradiated is implanted with an impurity, and selectively irradiating charged particles to semiconductor substrate |
| 05/17/2007 | US20070111113 Photo mask for mitigating stitching effect and exposing method using the same |
| 05/17/2007 | US20070111112 Systems and methods for fabricating photo masks |
| 05/17/2007 | US20070111111 Light measurement apparatus and light measurement method |
| 05/17/2007 | US20070111110 In-situ plasma treatment of advanced resists in fine pattern definition |
| 05/17/2007 | US20070111109 Photolithography scattering bar structure and method |
| 05/17/2007 | US20070109523 Reticle cassette and exposure apparatus using reticle cassette |
| 05/16/2007 | EP1786248A1 Low cost antenna array fabrication technology |
| 05/16/2007 | EP1786024A1 Method of optical lithography using phase shift masking |
| 05/16/2007 | EP1730477A4 Embedded attenuated phase shift mask with tunable transmission |
| 05/16/2007 | EP1642169B1 Exposure station for film webs |
| 05/16/2007 | CN1964923A Method for forming quartz glass |
| 05/16/2007 | CN1964848A Method for making tools for micro replication |
| 05/16/2007 | CN1963672A Method and device for manufacturing reconfiguration mask of integrate circuit by micro electromechanical system |
| 05/16/2007 | CN1316596C Method of generating wiring pattern |
| 05/16/2007 | CN1316316C Method of simulating patterns |
| 05/16/2007 | CN1315817C Ultraviolet transmitting fluoropolymer and pellicle comprising said polymer |
| 05/15/2007 | US7218985 Semiconductor manufacturing apparatus |
| 05/15/2007 | US7218383 Holding system, exposure apparatus, and device manufacturing method |
| 05/15/2007 | US7217504 high-density colour or monochrome images; especially on a transparent support; receiver having at least one radiation absorbing component having pre-determined spectral absorbance properties susceptible to alteration to form an altered radiation absorbing component |
| 05/15/2007 | US7217503 Illuminating photomasks to resolve patterning via projection optical system; for fabricating semiconductor chips, integrated circuits, and liquid crystal displays |
| 05/15/2007 | US7217502 Nanopastes for use as patterning compositions |
| 05/15/2007 | US7217481 Thin films; sputtering target in vacuum; multilayer construction; crhromium nitride; chromium carbide and chromium oxynitride overcoating transparent substrate; photolithography |
| 05/10/2007 | WO2007051274A1 Scanning jet nanolithograph and the operation method thereof |
| 05/10/2007 | WO2007030704A3 System and method for mask verification using an individual mask error model |
| 05/10/2007 | US20070106972 Method For Fabricating Integrated Circuit Features |
| 05/10/2007 | US20070105276 Mask, mask blank, and methods of producing these |
| 05/10/2007 | US20070105058 Dual Layer Workpiece Masking and Manufacturing Process |
| 05/10/2007 | US20070105053 Method of manufacturing semiconductor device |
| 05/10/2007 | US20070105028 Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device |
| 05/10/2007 | US20070105027 first protective material layer covering top surface of one bump defect, wherein a portion of side surfaces of bump defect remains uncovered by any protective material layer; second protective material layer covering areas of mask adjacent at least one bump defect; minimizing damage of surrounding area |
| 05/10/2007 | US20070105026 Mask, mask blank, and methods of producing these |
| 05/10/2007 | US20070105025 Mask, mask blank, and methods of producing these |
| 05/10/2007 | US20070105024 A single machine methodology for photomasks having regionsthat repeat and do not repeat; placing copies of clear and opaqueregions within the clear bar regions of a photomask disposed withinan opaque frame surrounding the cell region; copies' clear andopaque regions compared to the corresponding ones |
| 05/10/2007 | US20070105023 Reticle and optical proximity correction method |
| 05/10/2007 | US20070103733 Method and device for creating print data, program for creating print data, and computer-readable recording medium containing the program |
| 05/10/2007 | US20070102398 Low cost antenna array fabrication technology |
| 05/10/2007 | CA2565648A1 Low cost antenna array fabrication technology |
| 05/09/2007 | EP1783546A1 Semitransmitting film, photomask blank, photomask, and semitransmitting film designing method |
| 05/09/2007 | EP1783103A1 Method for forming quartz glass |
| 05/09/2007 | EP1782456A1 Exposure apparatus, exposure method, and exposure mask |
| 05/09/2007 | CN1961258A Cleaning a mask substrate |
| 05/09/2007 | CN1959977A Semiconductor device, method of forming wiring pattern, and method of generating mask wiring data |
| 05/09/2007 | CN1959528A Micro-image light cover, manufacturing method thereof and semiconductor element manufactured by the same |
| 05/09/2007 | CN1959527A Phase shift type mask and preparation method, and method for manufacturing semiconductor elements |
| 05/09/2007 | CN1958177A Acid-free cleaning process for substrates, in particular masks and mask blanks |
| 05/09/2007 | CN1315165C Method for manufacturing semiconductor, electro-optical device, integrated circuit and electronic device |
| 05/08/2007 | US7216331 Resolving phase-shift conflicts in layouts using weighted links between phase shifters |
| 05/08/2007 | US7214453 Mask and its manufacturing method, exposure, and device fabrication method |
| 05/08/2007 | US7214452 Using perfluoropoly-ethers to form pellicles |
| 05/03/2007 | WO2007048442A1 Method for forming a semiconductor device using optical proximity correction for the optical lithography |
| 05/03/2007 | US20070101310 Model of sensitivity of a simulated layout to a change in original layout, and use of model in proximity correction |
| 05/03/2007 | US20070101307 Design supporting system of semiconductor integrated circuit, method of designing semiconductor integrated circuit, and computer readable medium for supporting design of semiconductor integrated circuit |
| 05/03/2007 | US20070101303 Method and apparatus for integrated circuit layout optimization |