| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 05/03/2007 | US20070100591 Parameter extracting device and parameter extracting method in simulation, photomask created from parameter extracting method, and semiconductor device |
| 05/03/2007 | US20070099097 Multi-purpose measurement marks for semiconductor devices, and methods, systems and computer program products for using same |
| 05/03/2007 | US20070099096 Dye-containing curable composition, color filter and method of producing thereof |
| 05/03/2007 | US20070099095 Applying colour elements and busbars to a display substrate |
| 05/03/2007 | US20070099093 Method for providing representative features for use in inspection of photolithography mask and for use in inspection of photo-lithographically developed and/or patterned wafer layers, and products of same |
| 05/03/2007 | US20070099092 electrochemistry reaction; forming silicide oxide, silicide nitride, silicide oxynitride, silicide oxycarbide, silicide nitride carbide or silicide oxide nitride carbide; resistance to chemicals, especially to alkaline chemicals; for use in microfabrication of semiconductor integrated circuits |
| 05/03/2007 | US20070099091 Method of the adjustable matching map system in lithography |
| 05/03/2007 | US20070098249 Pattern shape evaluation apparatus, pattern shape evaluation method, method of manufacturing semiconductor device, and program |
| 05/03/2007 | US20070097355 Reticle and optical characteristic measuring method |
| 05/03/2007 | US20070096158 Pattern layout and layout data generation method |
| 05/03/2007 | DE10310136B4 Maskensatz zur Projektion von jeweils auf den Masken des Satzes angeordneten und aufeinander abgestimmten Strukturmustern auf einen Halbleiterwafer Arranged set of masks for the projection of each of the masks of the sentence and concerted structural patterns on a semiconductor wafer |
| 05/03/2007 | DE102005052046A1 Lithographic projection photo-mask, useful e.g. in structuring semiconductor wafers to form integrated circuits, includes absorber in purging gas volume above substrate to inhibit crystal formation |
| 05/03/2007 | DE102004014482B4 Verfahren zum Erweitern von Limitierungen für Strukturweiten beim Herstellungsprozess von Fotomasken Method for upgrading of limitations for feature sizes in the manufacturing process of photomasks |
| 05/02/2007 | EP1780182A1 Glass ceramics and a method for manufacturing the same |
| 05/02/2007 | EP1779198A1 Photosensitive composition for use in producing printing plate, and photosensitive printing original plate laminate and printing plate using the photosensitive composition |
| 05/02/2007 | CN1955841A Laser induced thermal imaging mask and fabrication method for organic electroluminescent device |
| 05/02/2007 | CN1955840A Fabrication method of photomask-blank |
| 05/02/2007 | CN1955131A Glass-ceramics and a method for manufacturing the same |
| 05/02/2007 | CN1314079C Photomask, pattern formation method using photomask and mask data creation method for photomask |
| 05/01/2007 | US7213226 Pattern dimension correction method and verification method using OPC, mask and semiconductor device fabricated by using the correction method, and system and software product for executing the correction method |
| 05/01/2007 | US7212282 Method for characterizing mask defects using image reconstruction from X-ray diffraction patterns |
| 05/01/2007 | US7211815 Masking; printing a pattern using; determination, calibration, adjustment |
| 05/01/2007 | US7211453 Method and apparatus for personalization of semiconductor |
| 05/01/2007 | US7211369 VLSI-based system for durable high-density information storage |
| 05/01/2007 | US7211355 Producing and processing an organic coating on the phase shifter mask using an electron beam for repairing a defect of the phase shifter mask, allowing efficient production of very small structures, even for 157 nm lithography. |
| 05/01/2007 | US7211354 Mask substrate and its manufacturing method |
| 05/01/2007 | CA2228986C Material and process for covering the edges of photopolymerizable printing plates for flexographic printing |
| 04/26/2007 | WO2007046454A1 Mask blank and method for manufacturing transfer mask |
| 04/26/2007 | WO2007045311A1 Pigment preparations based on diketopyrrolopyrroles |
| 04/26/2007 | US20070093406 Novel cleaning process for masks and mask blanks |
| 04/26/2007 | US20070093375 Glass ceramics and a method for manufacturing the same |
| 04/26/2007 | US20070092841 Illumination improves imaging for hybrid pattern with a sufficient depth of focus by having a mask with a contact hole pattern including a hybrid pattern and using an illumination light that has plural poles and projecting an image of the mask onto a plate through a projection optics |
| 04/26/2007 | US20070092839 Polarizing photolithography system |
| 04/26/2007 | US20070092811 for use in a photolithography process which uses a polarized light as an illumination light; inspecting the size of the birefringence of each of the photomask substrate candidates, and selecting a photomask substrate, in which the size of the birefringence satisfies the standard value |
| 04/26/2007 | US20070092809 Fabrication of rear projection surface using reversal emulsion |
| 04/26/2007 | US20070092808 which reduces transmittance for inspecting light by increasing reflectance; for enhancing resolution of transfer patterns; photolithography |
| 04/26/2007 | US20070092807 irradiating an optical film formed on a transparent substrate with flash light; stack structure; phase-shift method; prevent particle-caused defects; semiconductor integrated circuit, a charge-coupled device, a color filter for a liquid crystal device, a magnetic head |
| 04/26/2007 | US20070092806 Amplitude patterns of molybenem silicideon a surface and phase patterns of quartz on a second surface, all having different vertical thicknesses to change amplitude and phase of exposing light, respectively; Fourier transform of circuit layout; optimal depth of focus; simplification; miniaturization |
| 04/26/2007 | US20070092805 Microlithography method using a mask with curved surface |
| 04/26/2007 | US20070091421 Multilayer reflective film coated substrate, manufacturing method thereof, reflective mask blank, and reflective mask |
| 04/26/2007 | US20070091420 Multilayer reflective film coated substrate, manufacturing method thereof, reflective mask blank, and reflective mask |
| 04/26/2007 | US20070090371 Photoactive component with organic layers |
| 04/26/2007 | DE202006018004U1 Vorrichtung zur Aufbewahrung und Benutzung wenigstens einer Photomaske für die lithographische Projektion Device for the storage and use at least a photomask for the lithographic projection |
| 04/25/2007 | EP1777588A2 Fabrication method of photomask-blank |
| 04/25/2007 | EP1777587A1 A method of cleaning a surface of a photomask |
| 04/25/2007 | CN1954262A Imaging and devices in lithography |
| 04/25/2007 | CN1312730C Laser apparatus, laser irradiation method and semiconductor device and its producing method |
| 04/25/2007 | CN1312531C Photolithographic mask fabrication |
| 04/25/2007 | CN1312530C Master mask, exposure monitor method, exposure method and semiconductordevice mfg method |
| 04/25/2007 | CN1312529C Photomask for off-axis illumination and its producing method |
| 04/24/2007 | US7209584 Pattern inspection apparatus |
| 04/24/2007 | US7209220 System for using a two part cover for and a box for protecting a reticle |
| 04/24/2007 | US7208788 Semiconductor device and manufacturing method thereof |
| 04/19/2007 | WO2007044827A2 Fast systems and methods for calculating electromagnetic fields near photomasks |
| 04/19/2007 | WO2007044630A2 Method and manufacture of multiple photomask patterns and computer readable medium |
| 04/19/2007 | WO2007044557A2 System, masks, and methods for photomasks optimized with approximate and accurate merit functions |
| 04/19/2007 | WO2007044132A1 Improved process margin using discrete assist features |
| 04/19/2007 | WO2007043323A1 Photomask and exposure method using same |
| 04/19/2007 | WO2007043217A1 Pellicle storing container |
| 04/19/2007 | WO2006124279A3 Making relief image using removable film |
| 04/19/2007 | US20070089073 Shape-Based Geometry Engine To Perform Smoothing And Other Layout Beautification Operations |
| 04/19/2007 | US20070087578 Ion beam sputtering apparatus and film deposition method for a multilayer for a reflective-type mask blank for EUV lithography |
| 04/19/2007 | US20070087571 Etching bias reduction |
| 04/19/2007 | US20070087274 Wiring correction method |
| 04/19/2007 | US20070087273 Alternating phase shift mask |
| 04/19/2007 | US20070087272 Method for preparing a phase-shifting mask and method for preparing a semiconductor device using the phase-shifting mask |
| 04/19/2007 | US20070087271 Phase-shifting mask |
| 04/18/2007 | EP1430343A4 Method for fabricating chirped fiber bragg gratings |
| 04/18/2007 | CN1950749A Photosensitive original printing plate for relief printing, method for producing relief printing plate, and light-shielding ink for performing the method |
| 04/18/2007 | CN1950680A 光散射euvl掩模 Light scattering euvl mask |
| 04/18/2007 | CN1311293C Original plate of lithographic plate galley |
| 04/18/2007 | CN1311292C Attenuating embedded phase shift photomask blanks |
| 04/17/2007 | US7207030 Method for improving a simulation model of photolithographic projection |
| 04/17/2007 | US7207028 System for evaluating a design of a mask, exposure system, method for evaluating a design of a mask, method for manufacturing a semiconductor device and mask |
| 04/17/2007 | US7205222 Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light |
| 04/17/2007 | US7205092 Photosensitive layer contains a water-soluble or -dispersible resin and an ultraviolet-curable monomer; adhesion-adjusting layer; water-insoluble heat-sensitive mask layer containing an infrared-absorbing material; peel assist layer, and a protective layer; mass transfer between layers prevented |
| 04/17/2007 | US7205077 Able to form any pattern feature with any dimension including a dimension equal to or smaller than the resolution to be formed by exposure using a single mask implementing a phase shift effect. |
| 04/17/2007 | US7205076 Shaping laser beams; surface with aperture and reflection layer; liquid crystal display |
| 04/17/2007 | US7205075 Method of forming a vertical memory device with a rectangular trench |
| 04/17/2007 | US7205074 Venting of pellicle cavity for a mask |
| 04/12/2007 | WO2007041602A2 Lithography verification using guard bands |
| 04/12/2007 | WO2007041600A2 Mask-pattern determination using topology types |
| 04/12/2007 | WO2007041135A1 Model-based sraf insertion |
| 04/12/2007 | WO2007040544A1 Dense opc |
| 04/12/2007 | WO2007039161A1 Mask blanc and photomasks having antireflective properties |
| 04/12/2007 | WO2007038972A1 Method of making an integrated circuit |
| 04/12/2007 | US20070082278 For use in short-wavelength exposure light source/excimer laser; silicon oxynitrides film can be etched by dry etching (RIE: Reactive Ion Etching) using CHF3, or cl2; improving contrast at a boundary portion of an exposure pattern |
| 04/12/2007 | US20070082277 Process margin using discrete assist features |
| 04/12/2007 | US20070082276 dual exposure to form circuits on an integrated circuit, minimize line end widening; generate features on a wafer; cost efficiency |
| 04/12/2007 | US20070082275 A transparent substrate having a first transmitivity disposed and an assist feature having a second transmitivity disposed to each side of the main feature and on the transparent substrate, where the first transmitivity is not equal to the second transmitivity; semiconductors; photolithography |
| 04/12/2007 | US20070082274 High-transmittance attenuated phase-shift mask blank |
| 04/12/2007 | US20070082273 Photomask and image device manufacturing method |
| 04/12/2007 | US20070082272 Masks, lithography device and semiconductor component |
| 04/12/2007 | DE10305617B4 Maske und Verfahren zum Strukturieren eines Halbleiterwafers Mask and method of patterning a semiconductor wafer |
| 04/12/2007 | DE102005003905B4 Anordnung zur Projektion eines Musters in eine Bildebene Arrangement for projecting a pattern in an image plane |
| 04/11/2007 | CN1945438A Method of producing semiconductor integrated circuit device and method of producing multi-chip module |
| 04/11/2007 | CN1310025C Manufacturing method for test apparatus and parts |
| 04/10/2007 | US7203275 Multilayer film reflector and X-ray exposure system |
| 04/10/2007 | US7202488 Correction system, method of correcting deflection distortion, program and method for manufacturing a semiconductor device |
| 04/10/2007 | US7202148 Method utilizing compensation features in semiconductor processing |