Patents
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
07/1977
07/12/1977US4035522 X-ray lithography mask
06/1977
06/07/1977US4028107 Process and apparatus for producing printed matter
05/1977
05/31/1977US4027056 Fabrication of an iron oxide film
05/31/1977US4027052 Fabrication of iron oxide pattern
05/31/1977US4026743 Relief patterns
05/10/1977US4022932 Resist reflow method for making submicron patterned resist masks
05/10/1977US4022927 Coating, radiating, developing
05/03/1977US4021239 Transparent
04/1977
04/26/1977US4020502 Method and apparatus for separating, combining and rearranging colored images
04/19/1977US4018938 Fabrication of high aspect ratio masks
03/1977
03/22/1977US4013829 Method for the production of printing forms
03/22/1977US4013502 Stencil process for high resolution pattern replication
02/1977
02/22/1977US4008967 Device for testing masks for semiconductor components
02/15/1977US4008084 Metallic image forming material
01/1977
01/25/1977US4004925 Production of photomasks by forming complex of silver and diazonium or pyrylium salts
01/11/1977US4002829 Autosynchronous optical scanning and recording laser system with fiber optic light detection
12/1976
12/14/1976US3997828 Copy-repeater arrangement and method of adjusting the same
11/1976
11/09/1976US3991231 Process for the production of circuit boards by a photo-etching method
10/1976
10/19/1976US3986876 Gold, etching, microelectronics
10/12/1976US3985439 Device for the light-optical, computer-controlled drawing of masks for semiconductor components
09/1976
09/28/1976US3982743 Method of manufacturing books
09/14/1976US3980478 Method of making an ultraviolet light image recording using a visible-light reflective intermediate element
08/1976
08/24/1976US3976524 Planarization of integrated circuit surfaces through selective photoresist masking
08/17/1976US3975252 High-resolution sputter etching
08/10/1976US3973847 Production of graphic patterns
08/03/1976US3972616 Apparatus for detecting the defects of the mask pattern using spatial filtering
06/1976
06/29/1976US3967026 Camouflage sheet and method for manufacturing the same
06/29/1976US3966473 Method for producing a photomask
06/22/1976US3964910 Printing of deep drawn containers with images reflected from inside of cylinder
06/15/1976US3963528 Hydrogen peroxide, permanganate
06/15/1976US3963489 Method of precisely aligning pattern-defining masks
06/15/1976US3963354 Inspection of masks and wafers by image dissection
06/08/1976US3961962 Thin film of aluminum oxide, silver halide filled pores
06/01/1976US3960560 Silver halide emulsion
04/1976
04/20/1976US3951709 "cold" plasma etching
04/20/1976US3951659 Boiling in trichloroethylene
04/20/1976US3951547 Chromium oxide photomask material and the production thereof
04/20/1976US3951534 Short throw, oblique incidence, visual transparency projector
04/06/1976US3949131 Photomasks with antistatic control
04/06/1976US3949116 Method of developing an electrostatic latent image in which shear stress is employed
03/1976
03/23/1976US3945827 Copper-clad laminate
03/16/1976US3944417 Vinyl oxazole
02/1976
02/24/1976US3940273 Sequential peeling for mask preparation for fabrication of microwave circuits
02/03/1976US3936301 Process for contact photolithography utilizing a photomask having indented channels
01/1976
01/27/1976US3935333 Method for forming a transparent image on a sheet
01/20/1976US3934057 High sensitivity positive resist layers and mask formation process
01/20/1976US3933609 Doping glass with a staining metal
01/06/1976US3930857 Resist process
01/06/1976US3930855 Process for the photographic production of given transparency or density distributions