| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
|---|
| 04/10/2007 | US7201853 Applying photoresist polymer to substrate; curing; etching; forming projections |
| 04/05/2007 | WO2007037383A1 Photomask blank and process for producing the same, process for producing photomask, and process for producing semiconductor device |
| 04/05/2007 | WO2006127538A3 Manufacturing aware design and design aware manufacturing |
| 04/05/2007 | WO2006117527A3 An article, and a method for creating the article, with a chemically patterned surface |
| 04/05/2007 | US20070077503 Overlay key, method of forming the overlay key and method of measuring overlay accuracy using the overlay key |
| 04/05/2007 | US20070077501 Stencil masks, method of manufacturing stencil masks, and method of using stencil masks |
| 04/05/2007 | US20070077500 Sub-wavelength diffractive elements to reduce corner rounding |
| 04/05/2007 | US20070077499 Method for depositing multi-layer film of mask blank for EUV lithography and method for producing mask blank for EUV lithography |
| 04/05/2007 | US20070076843 Method for adjusting gap between two objects and exposure method using the same, gap adjusting apparatus, and exposure apparatus |
| 04/05/2007 | US20070076833 Attenuated phase shift mask blank and photomask |
| 04/05/2007 | DE19609297B4 Projektionsbelichtungsverfahren und hierfür verwendbare Maske The projection exposure method and be used for this mask |
| 04/05/2007 | DE102006005634B3 Production method for printing work, involves classification of printed sheet into a running direction and transverse direction in adjacent applications by printed sheet layout |
| 04/04/2007 | EP1770439A1 Alternating phase shift mask |
| 04/04/2007 | CN1942827A Method of producing a relief image |
| 04/04/2007 | CN1941315A 衬底处理设备和衬底处理方法 The substrate processing apparatus and a substrate processing method |
| 04/04/2007 | CN1940718A Photomask for providing uniform CD (critical dimension) in semiconductor device, and method for manufacturing same |
| 04/04/2007 | CN1940717A Method of plasma etching a chromium layer through a carbon hardmask suitable for photomask fabrication |
| 04/04/2007 | CN1940716A Photomask cleaning method |
| 04/04/2007 | CN1940715A Optical mask pattern correcting method and its formation |
| 04/04/2007 | CN1940714A System and method for compensating selective optical graph |
| 04/04/2007 | CN1940671A Electro-optical device, and semi-penetration substrate |
| 04/04/2007 | CN1940546A Check out test set and apparatus for manufacturing same |
| 04/04/2007 | CN1939601A Substrate processing system, coating apparatus, and coating method |
| 04/04/2007 | CN1308707C Reflector for exposure device, reflective mask for exposure device, exposure device and pattern forming method |
| 04/03/2007 | US7200835 Method of locating sub-resolution assist feature(s) |
| 04/03/2007 | US7200834 Exposure pattern forming method and exposure pattern |
| 04/03/2007 | US7200833 Calculating method, verification method, verification program and verification system for edge deviation quantity, and semiconductor device manufacturing method |
| 04/03/2007 | US7199861 Lithographic apparatus and device manufacturing method |
| 04/03/2007 | US7198872 Light scattering EUVL mask |
| 03/29/2007 | WO2007035166A2 Methods and systems for pattern generation based on multiple forms of design data |
| 03/29/2007 | WO2007034930A1 Photomask having gradation sequence and method for manufacturing same |
| 03/29/2007 | US20070074146 Method for designing mask pattern and method for manufacturing semiconductor device |
| 03/29/2007 | US20070074145 Mask pattern design method and manufacturing method of semiconductor device |
| 03/29/2007 | US20070074144 alloy comprising aluminum, titanium, tantalum, niobium, chromium, molybdenum and nickel, used as noncracking turbine engine components having tensile strength |
| 03/29/2007 | US20070074143 Dense OPC |
| 03/29/2007 | US20070072095 Apparatus and method for argon plasma induced ultraviolet light curing step for increasing silicon-containing photoresist selectivity |
| 03/29/2007 | US20070072094 Photomask features with chromeless nonprinting phase shifting window |
| 03/29/2007 | US20070072093 Manufacturing method of pattern formed body, and photomask for vacuum-ultraviolet light |
| 03/29/2007 | US20070072092 Rinse treatment method, developing treatment method and developing apparatus |
| 03/29/2007 | US20070072091 Reference wafer and process for manufacturing same |
| 03/29/2007 | US20070072090 Reticle having a protection layer |
| 03/29/2007 | US20070071308 Workpiece inspection apparatus, workpiece inspection method and computer-readable recording medium storing program |
| 03/29/2007 | US20070071306 Inspection method and photomask |
| 03/29/2007 | US20070070338 Method and device for examination of nonuniformity defects of patterns |
| 03/29/2007 | US20070070334 Defect inspection apparatus |
| 03/29/2007 | US20070068558 Apparatus and methods for mask cleaning |
| 03/28/2007 | EP1768066A1 Method and apparatus for inspecting reticles implementing parallel procesing |
| 03/28/2007 | CN1936706A Water-soluble photopolymer composition for flexographic printing and water-developable photosensitive original printing plate for flexographic printing |
| 03/28/2007 | CN1936703A Grey-regulation mask and producing method |
| 03/28/2007 | CN1936702A Optical near-correction optical mask and colour filter piece mfg. method |
| 03/28/2007 | CN1936701A CPL mask and a method and program product for generating the same |
| 03/28/2007 | CN1307472C Optical device, method for producing same, and electronic device |
| 03/27/2007 | US7197108 Method of fabricating X-ray mask and method of fabricating semiconductor device using the X-ray mask |
| 03/27/2007 | US7195847 Exposing, through a photo mask( having at least two light transmittable pattern), a substrate, on which a first and second negative photosensitive resin layers are formed and the photosensitivity ratio of resin layer is greater then 1 |
| 03/27/2007 | US7195846 Methods of manufacturing photomask blank and photomask |
| 03/27/2007 | US7195845 Spin-coating method, determination method for spin-coating condition and mask blank |
| 03/22/2007 | WO2007033362A2 Systems, masks, and methods for photolithography |
| 03/22/2007 | WO2007033324A2 Secondary process for radioactive chloride deweaponization and storage |
| 03/22/2007 | WO2007032504A1 Photomask, photomask manufacturing method, and photomask processing device |
| 03/22/2007 | US20070067752 Method for verifying optical proximity correction using layer versus layer comparison |
| 03/22/2007 | US20070066066 Polishing method for glass substrate, and glass substrate |
| 03/22/2007 | US20070066025 Pattern forming method, computer program thereof, and semiconductor device manufacturing method using the computer program |
| 03/22/2007 | US20070066006 Method and Structure for Electrostatic Discharge Protection of Photomasks |
| 03/22/2007 | US20070065734 Exposure method, exposure mask, and exposure apparatus |
| 03/22/2007 | US20070065733 CPL mask and a method and program product for generating the same |
| 03/22/2007 | US20070065732 Photomask providing uniform critical dimension on semiconductor device and method of manufacturing the same |
| 03/22/2007 | US20070065731 Photomask, method for fabricating photomask, and method for fabricating semiconductor device |
| 03/22/2007 | US20070065730 Photomask and pattern formation method and mask data generation method using the same |
| 03/22/2007 | US20070065729 shading elements attenuate light passing through the regions, so as to compensate for the critical dimensio (CD) variations on the wafer and hence provide and improved CD tolerance wafer; computer program uses a reference calibration list to determine the parameters of the shading elements |
| 03/22/2007 | US20070064998 Pattern inspection apparatus, pattern inspection method, and inspection sample |
| 03/22/2007 | US20070064997 Mask defect inspecting method, mask defect inspecting apparatus, and semiconductor device manufacturing method |
| 03/22/2007 | US20070064996 Pattern inspection method and apparatus using linear predictive model-based image correction technique |
| 03/22/2007 | US20070064995 Image density-adapted automatic mode switchable pattern correction scheme for workpiece inspection |
| 03/22/2007 | US20070064994 Pattern inspection method and apparatus with high-accuracy pattern image correction capability |
| 03/22/2007 | US20070064223 Pattern inspection apparatus |
| 03/22/2007 | US20070063223 Semiconductor device having pattern-dummy and method for manufacturing the same using pattern-dummy |
| 03/22/2007 | DE102004021415B4 Verfahren zum Strukturbelichten einer photoreaktiven Schicht und zugehörige Be lichtungsvorrichtung A method for exposing a photo-reactive layer structure and related Be clearing device |
| 03/22/2007 | DE10151724B4 Verfahren und Vorrichtung zum Korrigieren eines Musterfilms auf einem Halbleitersubstrat Method and apparatus for correcting a pattern film on a semiconductor substrate |
| 03/21/2007 | EP1616222B1 Arrangement for inspecting masks in microlithography |
| 03/21/2007 | CN1933700A Wiring forming system and method |
| 03/21/2007 | CN1933100A Apparatus for and method of processing substrate subjected to exposure process |
| 03/21/2007 | CN1932651A Method and system for manufacturing semiconductor, base and recording medium used therefor |
| 03/21/2007 | CN1932642A Method for reticle shapes analysis and correction |
| 03/20/2007 | US7194704 Design layout preparing method |
| 03/20/2007 | US7193684 Pattern mask and exposure for photoresists for patterns and reflection |
| 03/20/2007 | US7193240 Sequential lateral solidification mask with stripe-shaped portions for transmitting laser light |
| 03/20/2007 | US7191618 Large-sized substrate and method of producing the same |
| 03/15/2007 | WO2007030704A2 System and method for mask verification using an individual mask error model |
| 03/15/2007 | WO2007030476A2 Apparatus and methods for mask cleaning |
| 03/15/2007 | WO2007029826A1 Photomask blank and production method thereof, and photomask production method, and semiconductor device production method |
| 03/15/2007 | WO2007029315A1 Pattern transfer mask, focus error measurement method and apparatus, and method of fabricating semiconductor device |
| 03/15/2007 | WO2007029303A1 One-to-one x-ray exposure method and one-to-one x-ray exposure apparatus |
| 03/15/2007 | US20070061773 Method for selecting and optimizing exposure tool using an individual mask error model |
| 03/15/2007 | US20070061772 System and method for mask verification using an individual mask error model |
| 03/15/2007 | US20070061609 Holding system, exposure apparatus, and device manufacturing method |
| 03/15/2007 | US20070059648 Method for forming a capacitor |
| 03/15/2007 | US20070059647 Capacitor for a semiconductor device |
| 03/15/2007 | US20070059611 forming the transmitting layer from a transparent substrate having three regions; forming a phase shift (halftone) mask with reduce cost; avoid uneven thickness induced by etching process by using a lift-off process in the manufacturing process of transmitting layers |
| 03/15/2007 | US20070059610 Method of making and designing dummy patterns for semiconductor devices and semiconductor devices having dummy patterns |
| 03/15/2007 | US20070059609 Optical proximity correction mask and method of fabricating color filter |