Patents
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
08/2007
08/09/2007US20070184366 Dye containing curable composition, color filter, and process of preparing color filter
08/09/2007US20070184361 Photomask, pattern formation method using the same and mask data creation method
08/09/2007US20070184360 Photomask features with interior nonprinting window using alternating phase shifting
08/09/2007US20070184359 Photomask, pattern formation method using photomask and mask data creation method
08/09/2007US20070184358 Micro-Patterned SiO2/TiO2 Films through Photo and Chemical Reactions
08/09/2007US20070184357 Systems, Masks, and Methods for Photolithography
08/09/2007US20070184356 Apparatus and methods for measuring shape of both sides of a plate
08/09/2007US20070184355 Cross-shaped sub-resolution assist feature
08/09/2007US20070184354 Process for etching photomasks
08/09/2007US20070183581 Focus/detector system of an X-ray apparatus for generating phase contrast recordings
08/09/2007US20070183580 Focus/detector system of an x-ray apparatus for generating phase contrast recordings
08/09/2007US20070183579 X-ray optical transmission grating of a focus-detector arrangement of an X-ray apparatus for generating projective or tomographic phase contrast recordings of a subject
08/09/2007US20070183563 Focus-detector arrangement of an X-ray apparatus for generating projective or tomographic phase contrast recordings
08/09/2007US20070183562 Focus/detector system of an x-ray apparatus for generating phase contrast recordings
08/09/2007US20070182941 Projection exposure mask acceptance decision system, projection exposure mask acceptance decision method, method for manufacturing semiconductor device, and computer program product
08/09/2007DE102006004230A1 Verfahren zur Herstellung einer Maske für die lithografische Projektion eines Musters auf ein Substrat A method of making a mask for the lithographic projection of a pattern on a substrate
08/08/2007EP1816517A2 Photomask, pattern formation method using the same and mask data creation method
08/08/2007EP0976152B1 Pattern film repair using a gas assisted focused particle beam system
08/08/2007CN1331007C Base plate for electrooptical apparatus, producing method of the same base plate and its application, and mask
08/08/2007CN101013705A Thin film transistor substrate and method of manufacturing the same and mask for manufacturing thin film transistor substrate
08/08/2007CN101013259A Photomask, pattern formation method using the same and mask data creation method
08/08/2007CN101013258A A mask set and formed semiconductor device
08/08/2007CN101013173A Chromatic color filter base plate and mask plate for its production and formed organic electroluminescent component
08/08/2007CN101011763A Photo-etched edm electrode
08/07/2007US7254804 Method of verifying corrected photomask-pattern results and device for the same
08/07/2007US7254251 System and method of providing mask defect printability analysis
08/07/2007US7252911 Implanting ions into a mask substrate with pattern-forming material with light-transmissive exposure regions; ions in the regions dissipate electrostatic charges, thus preventing the buildup of electrostatic charges which could otherwise attract image-distorting particles to the mask or damage the mask
08/07/2007US7252910 Fabrication method of semiconductor integrated circuit device and mask fabrication method
08/07/2007US7252909 Method to reduce CD non-uniformity in IC manufacturing
08/02/2007WO2007086169A1 Method for manufacturing substrate for display panel, method for manufacturing display panel and photomask
08/02/2007WO2006114369A3 Means for transferring a pattern to an object
08/02/2007US20070178393 photomask may include a projecting pattern selectively formed on a substrate and a reflective layer on the substrate and the projecting pattern; for extreme ultra-violet light; photolithography
08/02/2007US20070178392 Method for manufacturing attenuated phase-shift masks and devices obtained therefrom
08/02/2007US20070178391 Mask having balance pattern and method of patterning photoresist using the same
08/02/2007US20070178390 Exposure mask, liquid crystal display device using the same, and method of manufacturing liquid crystal display device using the same
08/02/2007US20070178389 Universal photomask
08/02/2007US20070178388 Semiconductor devices and methods of manufacturing thereof
08/02/2007US20070178387 A core having a high refractive index and a cladding layer having a low refractive index and an increment of insertion loss of 0.1 dB or less upon subjecting the waveguide to a 360 degrees bending test at a radius of curvature of 2 mm; high flexing property;heat resistance; radiation transparent
08/02/2007US20070177639 Wavelength converting optical system, laser light source, exposure apparatus, mask examining apparatus, and macromolecular crystal lens machining device
08/01/2007EP1813984A2 Halftone phase shift mask blank, halftone phase shift mask, and pattern transfer method
08/01/2007EP1813983A2 Halftone phase shift mask blank , halftone phase shift mask, and pattern transfer method
08/01/2007CN1329982C Semiconductor device and its manufacturing method and phase-shift mask
08/01/2007CN101010631A Photomask blank, photomask and method for producing those
08/01/2007CN101009208A Substrate treatment apparatus and substrate treatment method
08/01/2007CN101009202A Device for reducing the impurity in the processing environment and its method
08/01/2007CN101008780A Exposure mask, liquid crystal display device, and manufacturing method therefor
07/2007
07/31/2007US7251806 Model-based two-dimensional interpretation filtering
07/31/2007US7250316 Mask and method of manufacturing liquid crystal display device using the same
07/31/2007US7250309 Integrated phase angle and optical critical dimension measurement metrology for feed forward and feedback process control
07/31/2007US7250248 Method for forming pattern using a photomask
07/31/2007US7250235 Focus monitor method and mask
07/31/2007US7249925 System and method for reticle protection and transport
07/26/2007WO2007084774A2 Patterning substrates employing multiple chucks
07/26/2007WO2006063268B1 Computer-implemented methods for detecting and/or sorting defects in a design pattern of a reticle
07/26/2007US20070174807 Semiconductor device manufacturing method, library used for the same, recording medium, and semiconductor device manufacturing system
07/26/2007US20070174793 Automatic design device, automatic design method, and automatic design program
07/26/2007US20070172969 Additive printed mask process and structures produced thereby
07/26/2007US20070172746 Semiconductor device and manufacturing method thereof
07/26/2007US20070172745 Evanescent wave assist features for microlithography
07/26/2007US20070172744 New aperture design for improving critical dimension accuracy and electron beam lithography throughput
07/26/2007US20070172743 System And Method For Storing And Transporting Photomasks In Fluid
07/26/2007US20070172111 Inspection apparatus of object to be inspected
07/26/2007US20070170617 Patterning Substrates Employing Multiple Chucks
07/26/2007US20070169665 Use of a pigment composition comprising mixed crystals based on ci pigment yellow 74
07/26/2007DE102006060800A1 Verfahren zum Bilden eines Grabens A method of forming a trench
07/26/2007DE102006052140A1 Ladungsteilchenstrahl-Schreibverfahren und -Schreibvorrichtung, Positionsabweichungsmessverfahren und Positionsmessvorrichtung A charged-writing process and writing device, position deviation measurement method and position measuring device
07/25/2007EP1811335A1 Photomask blank, photomask and method for producing those
07/25/2007EP1811331A2 Additive printed mask process and structures produced thereby
07/25/2007EP1810078A1 Method for thermally processing photosensitive printing sleeves
07/25/2007EP1421443B1 Damascene extreme ultraviolet lithography alternative phase shift photomask and method of making
07/25/2007EP1194816B1 Method for producing a digitally imaged screen for use in a screen printing process
07/25/2007CN1328760C Method for distinguishing imperfect graphic spacing to improve microimage process
07/25/2007CN1328627C Photosensitive flexible printing element and method for the production of newspaper flexible printing plates
07/25/2007CN101006573A Substrate transfer apparatus, substrate transfer method and exposure apparatus
07/25/2007CN101006554A Reticle protective member, reticle carrying apparatus, exposure device, and reticle carrying method
07/25/2007CN101006329A Embedded attenuated phase shift mask with tunable transmission
07/25/2007CN101006021A Large-size glass substrate for photomask and making method, computer-readable recording medium, and mother glass exposure method
07/25/2007CN101004550A Optical vicinity correction method, optical mask of optical vicinity correction, and structure of conducting wire
07/24/2007US7249342 Method and system for context-specific mask writing
07/24/2007US7248349 Exposure method for correcting a focal point, and a method for manufacturing a semiconductor device
07/24/2007US7247574 Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography
07/24/2007US7247410 Complementary division mask, method of producing mask, and program
07/19/2007WO2007081059A2 Reflective-type mask blank for euv lithography
07/19/2007US20070168895 Automatic design method of semiconductor integrated circuit, automatic design system of semiconductor integrated circuit, and semiconductor integrated circuit
07/19/2007US20070166646 suitable for reducing forward scattering, backward scattering, and re-scattering in electron beam lithography using the cell masks
07/19/2007US20070166631 Dye-containing negative working curable composition, color filter and method of producing thereof
07/19/2007US20070166630 Photomasks including multi-layered light-shielding and methods of manufacturing the same
07/19/2007US20070166629 White defect repairing method and apparatus of photomask, manufacturing method of photomask, and manufacturing method of semiconductor device
07/19/2007US20070166628 Mask and display substrate manufactured using the mask and display panel having the display substrate
07/19/2007US20070166627 forming a transfer pattern of desired size with high accuracy, by performing multiple exposure using a plurality of masks having different patterns over different mask substrates
07/19/2007US20070166626 Scattering bar OPC application method for mask ESD prevention
07/19/2007US20070165938 Pattern inspection apparatus and method and workpiece tested thereby
07/19/2007US20070165161 Sub-Pixel for Transflective Liquid Crystal Display Panel and Transflective Liquid Crystal Display and Panel Using the Same
07/19/2007US20070164487 Method for imprint lithography at constant temperature
07/19/2007DE102004028849B4 Phasenschiebende Fotomaske für eine fotolithographische Abbildung und Verfahren zu deren Herstellung Phase-shifting photomask for photolithographic imaging and methods for their preparation
07/19/2007DE10131534B4 Verfahren zum Herstellen einer Maske zum Belichten A method of manufacturing a mask for exposing
07/18/2007EP1808883A1 Measurement method, exposure method, and device manufacturing method
07/18/2007EP1808509A1 Ion beam sputtering equipment and method for forming multilayer film for reflective mask blank for euv lithography
07/18/2007EP1808407A1 Method of patterning self-organizing material, patterned substrate of self-organizing material and method of producing the same, and phosomask using patterned substrate of self-organizing material
07/18/2007EP1602007A4 A method of patterning photoresist on a wafer using a reflective mask with a multi-layer arc