| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
|---|
| 03/05/2015 | WO2015030159A1 Reflective mask blank, method for manufacturing reflective mask blank, reflective mask, and method for manufacturing semiconductor device |
| 03/05/2015 | WO2015029693A1 Mask blank, method for manufacturing mask blank, and method for manufacturing mask for transfer |
| 03/05/2015 | US20150064857 Mask for exposure, method of fabricating the same, and method of fabricating display panel using the mask |
| 03/05/2015 | US20150064612 Hardmask |
| 03/05/2015 | US20150064611 Extreme Ultraviolet (Euv) Mask And Method Of Fabricating The Euv Mask |
| 03/05/2015 | US20150062550 Photomask, photomask set, exposure apparatus and exposure method |
| 03/03/2015 | US8972909 OPC method with higher degree of freedom |
| 03/03/2015 | US8972229 Fast 3D mask model based on implicit countors |
| 03/03/2015 | US8970951 Mask inspection microscope with variable illumination setting |
| 03/03/2015 | US8970819 Microlithography projection optical system, tool and method of production |
| 03/03/2015 | US8969870 Pattern for ultra-high voltage semiconductor device manufacturing and process monitoring |
| 03/03/2015 | US8968988 Resist pattern forming method, resist pattern, crosslinkable negative resist composition, nanoimprint mold and photomask |
| 03/03/2015 | US8968972 Photomask blank, process for production of photomask, and chromium-containing material film |
| 03/03/2015 | US8968971 Pellicles with reduced particulates |
| 03/03/2015 | US8968970 Phase shift masks and methods of forming phase shift masks |
| 03/03/2015 | US8968969 Reflective extreme ultraviolet mask and method of manufacturing the same |
| 03/03/2015 | US8967608 Glass substrate-holding tool and method for producing an EUV mask blank by employing the same |
| 02/26/2015 | WO2015025922A1 Mask blank, mask blank with negative resist film, phase shift mask, and method for producing patterned body using same |
| 02/26/2015 | WO2015025584A1 Gas purge device and gas purge method |
| 02/26/2015 | US20150056541 Blank masks for extreme ultra violet lithography, methods of fabricating the same, and methods of correcting registration errors thereof |
| 02/26/2015 | US20150056540 Method of Forming Metal Oxide Hardmask |
| 02/26/2015 | US20150056539 Phase shift mask blank and phase shift mask |
| 02/26/2015 | US20150055127 Particulate Contamination Measurement Method and Apparatus |
| 02/26/2015 | DE102014112044A1 Reperaturvorrichtung Repair device |
| 02/25/2015 | EP2839341A1 Silicon hardmask layer for directed self-assembly |
| 02/24/2015 | US8966410 Semiconductor structure and method for fabricating semiconductor layout |
| 02/24/2015 | US8962224 Methods for controlling defects for extreme ultraviolet lithography (EUVL) photomask substrate |
| 02/24/2015 | US8962223 Mask blank, reflective mask blank, photomask, reflective mask, photomask set and method of manufacturing a semiconductor device |
| 02/24/2015 | US8962222 Photomask and method for forming the same |
| 02/24/2015 | US8962221 Mask and method of forming pattern by using the same |
| 02/24/2015 | US8962220 Reflective photomask and reflective photomask blank |
| 02/24/2015 | US8961837 Photosensitive resin composition for color filter and color filter using same |
| 02/24/2015 | US8961804 Etch rate detection for photomask etching |
| 02/24/2015 | US8960928 Pellicle frame |
| 02/19/2015 | WO2015023610A1 An edge-based full chip mask topography modeling |
| 02/19/2015 | WO2015021717A1 Total pitch adjustment method and apparatus for substrate |
| 02/19/2015 | US20150050584 Methods of Reducing Registration Errors of Photomasks and Photomasks Formed Using the Methods |
| 02/19/2015 | US20150049324 Adaptive photomasks and methods for using the same |
| 02/19/2015 | US20150049318 Optical element, optical system, capturing apparatus, optical equipment, and original recording and manufacturing method therefor |
| 02/18/2015 | EP2836874A1 Arrangement of reticle positioning device for actinic inspection of euv reticles |
| 02/17/2015 | US8959465 Techniques for phase tuning for process optimization |
| 02/17/2015 | US8959462 Mask design method, program, and mask design system |
| 02/17/2015 | US8959461 Pattern measurement device and pattern measurement method |
| 02/17/2015 | US8958035 Mask for photoaligning an alignement layer, photoalignment method using the same, and liquid crystal display having the photoaligned alignement layer |
| 02/17/2015 | US8956809 Apparatus and methods for etching quartz substrate in photomask manufacturing applications |
| 02/17/2015 | US8956788 Pellicle for lithography and a method of making thereof |
| 02/17/2015 | US8956787 Reflective mask blank for EUV lithography and process for producing the same |
| 02/17/2015 | US8956463 Method for cleaning photomask-related substrate, cleaning method, and cleaning fluid supplying apparatus |
| 02/12/2015 | WO2015018672A1 Method of producing a resist structure with undercut sidewall |
| 02/12/2015 | WO2015018163A1 Organic electroluminescent display panel, manufacturing method therefor and display device |
| 02/12/2015 | US20150044875 Method of forming pattern |
| 02/12/2015 | US20150044600 Double-exposure mask structure and photolithography method thereof |
| 02/12/2015 | DE102014111372A1 Iridium-spitze, gasfeld-ionenquelle, einrichtung eines fokussierten ionenstrahls, elektronenquelle, elektronenmikroskop, einrichtung zur analyse unter anwendung eines elektronenstrahls, ionen-elektronen- mehrfachstrahl-einrichtung, abtastsondenmikroskop und masken- reparatureinrichtung Iridium-top, gas field-ion source, a focused ion beam device, electron source, electron microscope, device for analysis under an electron beam, ion-electron multiple-jet device, scanning probe and mask-repair facility |
| 02/11/2015 | EP2835687A1 Method of producing a resist structure with undercut sidewall |
| 02/11/2015 | EP2834708A1 System and method for cleaning surfaces and components of mask and wafer inspection systems based on the positive column of a glow discharge plasma |
| 02/11/2015 | CN104347679A Oled显示基板、oled显示装置和掩膜板 Oled display substrate, oled display device and the mask plate |
| 02/11/2015 | CN104345548A 亚微米级掩模版的制造方法 Submicron reticle manufacturing method |
| 02/11/2015 | CN104345547A 使用蚀刻察觉印刷回避增进安全次解析辅助特征印刷的制程 Etching aware printing times evasive resolve assist features to enhance security printing process |
| 02/11/2015 | CN104345546A 光刻掩膜版及其制作方法 Photolithographic mask and manufacturing method thereof |
| 02/11/2015 | CN104345545A 掩膜版及其制造方法 Mask and its manufacturing method |
| 02/11/2015 | CN104345544A 掩膜板 Mask |
| 02/11/2015 | CN103019029B 降低光掩模板条纹的方法及装置 Reduce the light stripe mask method and apparatus |
| 02/10/2015 | US8951699 Adjustable photo-mask |
| 02/10/2015 | US8951698 Method for forming pattern and method for producing original lithography mask |
| 02/10/2015 | US8951386 Treatment of synthetic quartz glass substrate |
| 02/05/2015 | WO2015016686A1 Exposure apparatus |
| 02/05/2015 | WO2015014071A1 Mask plate |
| 02/05/2015 | US20150037714 Photolithographic masks and fabrication method thereof |
| 02/05/2015 | US20150037713 Method for designing mask set, recording medium, template, and method for manufacturing template |
| 02/05/2015 | US20150037712 Extreme Ultraviolet (EUV) Mask, Method Of Fabricating The EUV Mask And Method Of Inspecting The EUV Mask |
| 02/05/2015 | US20150037544 Reflective photomask blank, reflective photomask, and integrated circuit device manufactured by using reflective photomask |
| 02/04/2015 | EP2831673A1 Apparatus and methods for reticle handling in an euv reticle inspection tool |
| 02/04/2015 | EP2831672A2 Printing form precursor having elastomeric cap layer and a method of preparing a printing form from the precursor |
| 02/04/2015 | CN204143152U 掩膜版及液晶显示模组 Mask and LCD Module |
| 02/04/2015 | CN104332420A 用于多晶硅层的失效点定位的方法 Failure point positioning method for polycrystalline silicon layer |
| 02/04/2015 | CN104330954A 掩膜版、掩膜版组、像素的制作方法及像素结构 Production methods mask, mask group of pixels and pixel structure |
| 02/04/2015 | CN104330926A 显示基板及其制作方法、显示面板 Display substrate and its production method, the display panel |
| 02/04/2015 | CN101382730B 防护薄膜框架 Pellicle frame |
| 02/03/2015 | US8949748 Recording medium recording program for generating mask data, method for manufacturing mask, and exposure method |
| 02/03/2015 | US8947641 Lithographic apparatus and method |
| 02/03/2015 | US8946080 Pattern transfer method |
| 02/03/2015 | US8945802 Flare-measuring mask, flare-measuring method, and exposure method |
| 02/03/2015 | US8945801 Method for creating mask data, program, information processing apparatus, and method for manufacturing mask |
| 02/03/2015 | US8945800 Method of preparing a pattern, method of forming a mask set, device manufacturing method and computer program |
| 02/03/2015 | US8945799 Pellicle and mask adhesive agent for use in same |
| 02/03/2015 | US8945798 Near-field exposure mask and pattern forming method |
| 02/03/2015 | US8945797 Mask, pattern disposing method thereof and exposing method thereof |
| 02/03/2015 | US8945316 Method for shaping and slicing ingots using an aqueous phosphate solution |
| 01/29/2015 | WO2015013621A1 Reflection symmetric scatterometry overlay targets and methods |
| 01/29/2015 | WO2015012151A1 Substrate with multilayered reflective film, reflective mask blank for euv lithography, reflective mask for euv lithography, process for producing same, and process for producing semiconductor device |
| 01/29/2015 | WO2015011457A1 Method of forming a desired pattern on a substrate |
| 01/29/2015 | WO2015010428A1 Mask plate and liquid crystal panel |
| 01/29/2015 | US20150030971 Process for controlling the period characterizing the morphology obtained from a blend of block copolymers and of co(polymers) of one of the blocks |
| 01/29/2015 | US20150030970 Method Of Manufacturing An Extreme Ultraviolet (EUV) Mask And The Mask Manufactured Therefrom |
| 01/29/2015 | US20150028203 Inspection of a lithographic mask that is protected by a pellicle |
| 01/29/2015 | DE112012006295T5 Maske und Reparaturverfahren dafür Mask and repair procedures for |
| 01/28/2015 | CN104317160A 掩膜版、利用其形成的隔垫物及利用其制备隔垫物的方法 Mask, use of spacer material which is formed by the method of its preparation and spacer material |
| 01/28/2015 | CN104317159A 一种掩膜图形缺陷的检测方法及系统 One kind of mask pattern defect detection method and system |
| 01/28/2015 | CN104317158A 一种掩膜板、掩膜板组、彩膜基板及显示装置 One kind of mask, mask group, color filter substrate and display device |
| 01/28/2015 | CN103149793B 一种智能光刻版及其实现方法 An intelligent lithograph and its implementation |