| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 04/10/2008 | US20080083425 Method for Non-Contact Cleaning of a Surface |
| 04/10/2008 | DE4448052B4 Mask for projecting structure onto semiconductor wafer - has steps which correspond to step structure on semiconductor wafer, e.g. formed using transparent layer structure |
| 04/10/2008 | DE202007015136U1 Anordnung zur Aufzeichnung eines computergespeicherten Rasterbildes auf einen ebenen lichtempfindlichen Aufzeichnungsträger Arrangement for recording a computer-stored raster image on a flat photosensitive carrier |
| 04/10/2008 | DE19937742B4 Übertragung eines Musters hoher Strukturdichte durch multiple Belichtung weniger dichter Teilmuster Transferring a pattern of high structural density by multiple exposure less dense partial pattern |
| 04/10/2008 | DE10304674B4 Verfahren zum Belichten eines Substrates mit einem den optischen Proximity-Effekt ausgleichenden Strukturmuster A method for exposing a substrate with an optical proximity effect equalizing structure pattern |
| 04/10/2008 | DE10260610B4 Vorrichtung und Verfahren zum Ausbilden von Mustern Apparatus and method for forming patterns |
| 04/10/2008 | DE102005002434B4 Absorbermaske für die lithographische Strukturierung von Beugungsgittern und Verfahren zu ihrer Herstellung Absorber mask for the lithographic structuring of diffraction gratings, and methods for their preparation |
| 04/09/2008 | EP1664936A4 Forming partial-depth features in polymer film |
| 04/09/2008 | CN101159227A Substrate processing apparatus |
| 04/09/2008 | CN101158808A Light shield capable of improving aerial image alignment checking precision degree and photolithography method |
| 04/09/2008 | CN101158807A Method of layout of the fine pattern and apparatus of the same |
| 04/09/2008 | CN101158806A Preparation method of binary optical elements mask |
| 04/09/2008 | CN101158805A Structure and method for partitioned dummy fill shapes for reduced mask bias with alternating phase shift masks |
| 04/09/2008 | CN101158804A Mask for forming fine pattern and method of forming the same |
| 04/09/2008 | CN101158025A Mask, manufacturing method for mask, manufacturing apparatus for mask |
| 04/09/2008 | CN100380583C Method of dividing circuit pattern, method of manufacturing stencil mask, stencil mask and method of exposure |
| 04/09/2008 | CN100380582C Mask and producing method, producing method for semiconductor device with this mask |
| 04/09/2008 | CN100380381C Photomask and method for qualifying the same with a prototype specification |
| 04/09/2008 | CN100380233C Method for raising processing range with eliminating auxiliary characteristic |
| 04/09/2008 | CN100380231C Optical etching method |
| 04/08/2008 | US7356374 Comprehensive front end method and system for automatically generating and processing photomask orders |
| 04/08/2008 | US7355681 Optical proximity correction using chamfers and rounding at corners |
| 04/08/2008 | US7355673 Method, program product and apparatus of simultaneous optimization for NA-Sigma exposure settings and scattering bars OPC using a device layout |
| 04/08/2008 | US7354860 Manufacturing method of mask blank and manufacturing method of transfer mask |
| 04/08/2008 | US7354684 Test pattern and method of evaluating the transfer properties of a test pattern |
| 04/08/2008 | US7354683 Lithography mask for imaging of convex structures |
| 04/08/2008 | US7354682 Forming features on a substrate; forming suppressors on a substrate, when exposed to light energy, the suppressors substantially reduce an interference generated between adjacent features |
| 04/08/2008 | US7354681 Scattering bar OPC application method for sub-half wavelength lithography patterning |
| 04/03/2008 | US20080082954 Method and apparatus for designing fine pattern |
| 04/03/2008 | US20080082953 Mask for forming fine pattern and method of forming the same |
| 04/03/2008 | US20080081385 Methods and systems for inspection of wafers and reticles using designer intent data |
| 04/03/2008 | US20080081283 Structure for pattern formation, method for pattern formation, and application thereof |
| 04/03/2008 | US20080081270 Photo-curable composition, color filter and method for producing the same, and solid state imager |
| 04/03/2008 | US20080081267 Defect Repair Method for Photomask and Defect-Free Photomask |
| 04/03/2008 | US20080081266 Photo Mask And Method For Fabricating The Same |
| 04/03/2008 | US20080081265 Reticle and method of manufacturing method the same |
| 04/03/2008 | US20080080782 Graphics engine for high precision lithography |
| 04/03/2008 | US20080080068 Microlens, method of manufacturing microlens, and photomask used for manufacturing method |
| 04/03/2008 | US20080079926 Near-field exposure mask, near-field exposure apparatus, and near-field exposure method |
| 04/03/2008 | US20080079922 Pattern generator |
| 04/03/2008 | US20080078741 Method for manufacturing optical element |
| 04/03/2008 | US20080078428 Substrate processing apparatus |
| 04/02/2008 | EP1906257A2 Substrate, method of exposing a subsrate, machine readable medium |
| 04/02/2008 | EP1906229A2 Process for forming a feature by undercutting a printed mask |
| 04/02/2008 | EP1904894A1 Pellicle for use in a microlithographic exposure apparatus |
| 04/02/2008 | CN101154563A Substrate processing method and substrate processing apparatus |
| 04/02/2008 | CN101154560A Substrate processing apparatus and substrate processing method |
| 04/02/2008 | CN101154032A Photo mask blank material, photo mask and manufacture method, photo mask midbody, pattern copy method of the same |
| 04/02/2008 | CN101154031A Method of forming hardmask pattern of semiconductor device |
| 04/02/2008 | CN101154030A Reticle and method of manufacturing method the same |
| 04/02/2008 | CN101154029A Method for repairing photomask pattern defects |
| 04/02/2008 | CN101153927A Method for manufacturing optical element |
| 04/02/2008 | CN101153919A Microlens, method of manufacturing microlens, and photomask used for manufacturing method |
| 04/02/2008 | CN101152919A Mask shell, mask box, pattern trasscription mehod and method for manufacturing display device |
| 04/02/2008 | CN100378577C Slice and frame for slice |
| 04/02/2008 | CN100378565C Gray mask and manufacturing method thereof |
| 04/01/2008 | US7353493 Exposure mask, optical proximity correction device, optical proximity correction method, manufacturing method of semiconductor device, and optical proximity correction program |
| 04/01/2008 | US7353492 Method of IC fabrication, IC mask fabrication and program product therefor |
| 04/01/2008 | US7353145 Method for correcting a mask pattern, a computer program product, a method for producing a photomask, and method for manufacturing a semiconductor device |
| 04/01/2008 | US7351518 Crosslinking a mixture of resin, organic compound that can be crosslinked to form a second electrically conductive substance (thiophene), oxidative or reductive crosslinking agent and solvent on patterned electroconductive layer; producing structures in resist layer with electrically charged particles |
| 04/01/2008 | US7351505 Phase shift mask blank, phase shift mask, and pattern transfer method |
| 04/01/2008 | US7351504 Photomask blank substrate, photomask blank and photomask |
| 04/01/2008 | US7351503 Fused silica pellicle in intimate contact with the surface of a photomask |
| 03/27/2008 | WO2008036519A2 Color electro-optic displays |
| 03/27/2008 | WO2007090535A3 Method for selecting a format for a section to be printed |
| 03/27/2008 | US20080076255 Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating, composition for fine pattern formation, and method of fabricating semiconductor device |
| 03/27/2008 | US20080076044 Compound or its tautomer, metal complex compound, colored photosensitive curing composition, color filter, and production |
| 03/27/2008 | US20080076043 Compound with an ethylenically unsaturated double bond, a photopolymerization initiator , a coloring agent, an alkali-soluble resin, and a compound with an urethane, amide, or urea structure; color filters |
| 03/27/2008 | US20080076042 Design and Layout of Phase Shifting Photolithographic Masks |
| 03/27/2008 | US20080076041 Transparent substrate, square mask cells having a side shorter than a resolution limit of an exposing device; cell includes a light transmitting region and a light shielding region; a planar region; cells transmitting lights greater than or equal to zero and less than the second light intensity |
| 03/27/2008 | US20080076040 Method of fabricating photomask blank |
| 03/27/2008 | US20080076039 Light-blocking portion, a light-transmitting portion, a phase shift portion and an auxiliary pattern portion; width of the auxiliary pattern portion in a radius direction is less than a width of the light-transmitting portion and a width of the phase shift portion in a radius direction |
| 03/27/2008 | US20080076038 Surface switchable photoresist |
| 03/27/2008 | US20080076037 Inter-scribe lane pattern, extra-scribe lane pattern, inter-scribe lane pattern is sited between the main patterns; extra-scribe lane pattern is sited on the tree edges of the photomask; improving the mask area use efficiency |
| 03/27/2008 | US20080076036 Irradiating the resist layer through a mask to expose an upper surface of the wafer |
| 03/27/2008 | US20080076035 Includes multilayer stack having peripheral region rendered opaque by heating |
| 03/27/2008 | US20080076034 Photoresists; radiation transparent; lithography; latent images |
| 03/27/2008 | US20080074700 Graphics engine for high precision lithography |
| 03/27/2008 | US20080074656 Defining a pattern on a substrate |
| 03/27/2008 | US20080074633 Near-field exposure method and apparatus, near-field exposure mask, and device manufacturing method |
| 03/27/2008 | US20080074590 Color filter substrate and liquid crystal display apparatus having the same |
| 03/27/2008 | US20080073728 Semiconductor device and manufacturing method thereof |
| 03/27/2008 | US20080073522 Method of correcting opaque defect of chrome mask, in which atomic force microscope fine working apparatus has been used |
| 03/27/2008 | DE10318847B4 Verfahren zur Herstellung einer integrierten Schaltung mit zwei Schaltungsteilen A method of fabricating an integrated circuit having two circuit parts |
| 03/27/2008 | DE102006043895A1 Elektronenmikroskop zum Inspizieren und Bearbeiten eines Objekts mit miniaturisierten Strukturen und zugehöriges Verfahren Electron microscope for inspecting and editing of an object with miniaturized structures and associated method |
| 03/27/2008 | DE102006041921A1 Verpackung für wirkstoffhaltige Filme und Verfahren für deren Herstellung Packaging for active substance-containing films, and methods for their preparation |
| 03/26/2008 | EP1903596A2 Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof |
| 03/26/2008 | EP1903390A2 Mask data generation program, mask data generation method, mask fabrication method, exposure method, and device manufacturing method |
| 03/26/2008 | EP1903389A1 Mask data generation program, mask data generation method, mask fabrication method, exposure method, and device manufacturing method |
| 03/26/2008 | EP1903388A1 Method of fabricating photomask blank |
| 03/26/2008 | EP1280664B1 Chemical imaging of a lithographic printing plate |
| 03/26/2008 | CN100377304C Method for improving the critical dimension uniformity of patterned features on wafers |
| 03/25/2008 | US7350183 Method for improving optical proximity correction |
| 03/25/2008 | US7350182 Methods of forming patterned reticles |
| 03/25/2008 | US7350181 Set of masks, method of generating mask data and method for forming a pattern |
| 03/25/2008 | US7348109 increases the number of semiconductor dice obtained from one semiconductor; dicing line is not formed through the Test Element Group die pattern |
| 03/25/2008 | US7348108 Design and layout of phase shifting photolithographic masks |
| 03/25/2008 | US7348107 Reticle, semiconductor exposure apparatus and method, and semiconductor device manufacturing method |
| 03/25/2008 | US7348106 after forming a predetermined mask pattern through an energy beam resist layer, mask is inspected for at least one missing pattern; mask is repaired in defect area; missing pattern is reformed; mask pattern is transferred in the shift layer material |
| 03/25/2008 | US7348105 Reflective maskblanks |