| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 07/18/2007 | CN2924591Y Photomask box |
| 07/18/2007 | CN101002141A Computer-implemented methods for generating input for a simulation program or generating a simulated image of a reticle |
| 07/17/2007 | US7246342 Orientation dependent shielding for use with dipole illumination techniques |
| 07/17/2007 | US7245135 Post and tip design for a probe contact |
| 07/17/2007 | US7244954 Collector having unused region for illumination systems using a wavelength ≦193 nm |
| 07/17/2007 | US7244334 Apparatus used in reshaping a surface of a photoresist |
| 07/12/2007 | WO2006121903A3 Structure and methodology for fabrication and inspection of photomasks |
| 07/12/2007 | US20070162889 Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography |
| 07/12/2007 | US20070162887 Method of fabricating photo mask |
| 07/12/2007 | US20070160936 Adhesion method using gray-scale photolithography |
| 07/12/2007 | US20070160934 Actinic radiation absorbing compound uniformly distributed throughout support layer, with photopolymerizable material deposited thereon, and masking layer; relief imaging |
| 07/12/2007 | US20070160920 Generating a photomask level design of an integrated circuit design of the integrated circuit, designating regions of the photomask level design between adjacent integrated circuit element shapes, placing monitor structure shapes of a monitor structure in designated region |
| 07/12/2007 | US20070160919 Phase-Shift Mask Providing Balanced Light Intensity Through Different Phase-Shift Apertures And Method For Forming Such Phase-Shift Mask |
| 07/12/2007 | US20070160918 irradiating illumination light onto a mask to transfer (offset) mask patterns to a semiconductor substrate; narrow spacing; reduce the dimensional variation of the outmost pattern |
| 07/12/2007 | US20070160917 For inhibiting cholesterol synthesis; anticholesterol agents |
| 07/12/2007 | US20070160916 reflective layer formed over front surface of substrate and chucking layer formed over rear surface positioned to chuck substrate to electrostatic chuck |
| 07/12/2007 | US20070160915 Phase shifting mask having a calibration feature and method therefor |
| 07/12/2007 | US20070160914 forming an anti-aberration pattern on a mask capable of eliminating the aberration influence caused by the photo tools and well controlling the developed critical dimension of the edge features of the dense patterns transferred from the mask |
| 07/12/2007 | US20070160913 protective means are contrived to keep the interfering particles at a distance from the patterns which is greater than or equal to the two values taken by the depth of focus of the device and the height of pattern/interfering particle; patterned masked used in optical lithography |
| 07/12/2007 | US20070160874 A substrate with a conductive film to be used for production of a reflective mask blank for EUV lithography, characterized in that the chief material of the conductive film is at least one member selected from the group consisting of Cr, Ti, Zr, Nb, Ni and V, and the conductive film contains B (boron) |
| 07/12/2007 | US20070159584 Image forming method |
| 07/12/2007 | US20070158636 Detecting and characterizing mask blank defects using angular distribution of scattered light |
| 07/11/2007 | EP1806774A1 Reticle protective member, reticle carrying apparatus, exposure device, and reticle carrying method |
| 07/11/2007 | EP1806767A1 Substrate transfer apparatus, substrate transfer method and exposure apparatus |
| 07/11/2007 | EP1805560A2 Edge cure prevention composition and process for using the same |
| 07/11/2007 | CN1996151A Circuit pattern exposure method and mask |
| 07/11/2007 | CN1996142A Device for the storage and use of at least one photomask for lithographic projection and method for using the device in an exposure installation |
| 07/11/2007 | CN1996141A Impression die with zero film thickness and impression-photoetched pattern transferring method |
| 07/11/2007 | CN1325994C Phase shifting mask without Cr film layer, its mfg. method, and fabricating method for semiconductor |
| 07/11/2007 | CN1325993C Mask correcting method |
| 07/11/2007 | CN1325960C Methods and systems for improved boundary contrast |
| 07/10/2007 | US7243331 Method and system for controlling the quality of a reticle |
| 07/10/2007 | US7242459 Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated Eigen decomposition model |
| 07/10/2007 | US7241648 Array substrates for use in liquid crystal displays and fabrication methods thereof |
| 07/10/2007 | US7241558 Multi-layer semiconductor integrated circuits enabling stabilizing photolithography process parameters, the photomask being used, and the manufacturing method thereof |
| 07/10/2007 | US7241542 Process for controlling the proximity effect correction |
| 07/10/2007 | US7241539 Photomasks including shadowing elements therein and related methods and systems |
| 07/10/2007 | US7241538 Method for providing representative features for use in inspection of photolithography mask and for use in inspection photo-lithographically developed and/or patterned wafer layers, and products of same |
| 07/05/2007 | WO2007075082A1 Inspection apparatus, lithographic system provided with the inspection apparatus and a method for inspecting a sample |
| 07/05/2007 | WO2007074810A1 Mask blank and photomask |
| 07/05/2007 | WO2007074806A1 Photomask blank, photomask manufacturing method and semiconductor device manufacturing method |
| 07/05/2007 | WO2007074778A1 Surface-protective film |
| 07/05/2007 | WO2007074757A1 Reticle carrier, exposure device, reticle carrying method, reticle processing method, device manufacturing method and reticle cover managing method |
| 07/05/2007 | WO2007044827A8 Fast systems and methods for calculating electromagnetic fields near photomasks |
| 07/05/2007 | WO2006137011A3 Methods and devices for characterizing polarization of illumination system |
| 07/05/2007 | US20070157154 Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process |
| 07/05/2007 | US20070157152 Method and computer program product for detecting potential failures in an integrated circuit design after optical proximity correction |
| 07/05/2007 | US20070157139 Characterization and verification for integrated circuit designs |
| 07/05/2007 | US20070155188 Method of forming photoresist pattern and method of manufacturing perpendicular magnetic recording head |
| 07/05/2007 | US20070155128 Method for forming trench |
| 07/05/2007 | US20070155052 Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light |
| 07/05/2007 | US20070154821 Pringting plates comprising modified pigment products |
| 07/05/2007 | US20070154820 Photosensitive resin composition and black matrix using the same |
| 07/05/2007 | US20070154818 Integrated color filter |
| 07/05/2007 | US20070154817 determining image performance effects due to lithographic processing system aberrations and the image performance due to reticle shadowing effects; production of integrated circuits |
| 07/05/2007 | US20070154816 In fabricating the mask in which a lift-off process is used to accomplish the fabrication of the phase shift layer, the issue of nonuniform thicknes of the layer caused by the etching process for defining the phase shiftlayer is prevented; cost efficiency; accurate pattern; improved yield half-tone |
| 07/05/2007 | US20070152167 Reticle discerning device, exposure equipment comprising the same and exposure method |
| 07/05/2007 | DE102006024959A1 Polymer für eine Hartmaske einer Halbleitervorrichtung und Zusammensetzung enthaltend dieselbe Polymer for a hard mask of a semiconductor device and composition containing the same |
| 07/05/2007 | DE102005062430A1 Optical arrangement used in microlithography comprises photomask and adsorbing substance arranged in intermediate chamber to bind contaminating gases containing hydrocarbons by physical adsorption and/or chemical adsorption |
| 07/04/2007 | EP1804289A2 Non volatile memory electronic device integrated on a semiconductor substrate |
| 07/04/2007 | EP1804123A2 A method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process |
| 07/04/2007 | EP1804119A1 Method for manufacturing attenuated phase- shift masks and devices obtained therefrom |
| 07/04/2007 | EP1803147A2 Method of making a microelectronic and/or optoelectronic circuitry sheet |
| 07/04/2007 | EP1803031A1 Lithography mask structure |
| 07/04/2007 | CN1992193A Method for forming trench |
| 07/04/2007 | CN1991577A Phase shift mask and method for fabricating the same |
| 07/04/2007 | CN1991576A Master mold, master mold fabrication method, and method for fabricating liquid crystal display device using the same |
| 07/04/2007 | CN1324512C Extraction method of dangerous patterns, program and mfg. method of semiconductor |
| 07/04/2007 | CN1324400C Phase shift mask, method for forming pattern using phase shift mask and manufacturing method for electronic device |
| 07/04/2007 | CN1324331C Generation of pattern data free from any overlapping or excessive separation of dot patterns adjacent to each other |
| 07/03/2007 | US7240321 Selective promotion for resolution enhancement techniques |
| 07/03/2007 | US7240307 Pattern size correcting device and pattern size correcting method |
| 07/03/2007 | US7240305 OPC conflict identification and edge priority system |
| 07/03/2007 | US7239439 Communication system using variable pattern acousto-optic modulation |
| 07/03/2007 | US7238454 Thin films which forms optical variations on exposure to light; applying photoresists; baking; lithography |
| 07/03/2007 | US7238294 Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface |
| 06/28/2007 | WO2007072890A1 Glass substrate for mask blank and method of polishing for producing the same |
| 06/28/2007 | WO2007072778A1 Mask blank and mask |
| 06/28/2007 | US20070150850 Photomask evaluation method, photomask evaluation apparatus, and semiconductor device manufacturing method |
| 06/28/2007 | US20070148564 Patterning method and methods for producing electro-optic device, color filter, illuminant, and thin-film tranisistor |
| 06/28/2007 | US20070148562 Method of achieving CD linearity control for full-chip CPL manufacturing |
| 06/28/2007 | US20070148561 Exposure equipment having auxiliary photo mask and exposure method using the same |
| 06/28/2007 | US20070148560 Thin film pattern forming device and method |
| 06/28/2007 | US20070148559 Phase shift mask and method for fabricating the same |
| 06/28/2007 | US20070148558 Double metal collimated photo masks, diffraction gratings, optics system, and method related thereto |
| 06/28/2007 | US20070148557 Composition for forming nitride coating film for hard mask |
| 06/28/2007 | US20070148344 Spin-coating method, determination method for spin-coating condition and mask blank |
| 06/28/2007 | US20070146707 Pattern inspection apparatus and method along with workpiece tested thereby and management method of workpiece under testing |
| 06/28/2007 | US20070146680 Exposure apparatus, exposure method, and exposure mask |
| 06/28/2007 | US20070146662 Method for measuring flare amount, mask for measuring flare amount, and method for manufacturing device |
| 06/28/2007 | US20070144382 Lightened offset plates, preparation and use thereof |
| 06/27/2007 | EP1801647A1 Photomask blank and photomask |
| 06/27/2007 | EP1716450A4 Use of mixed bases to enhance patterned resist profiles on chrome or sensitive substrates |
| 06/27/2007 | CN1987654A Method for semi-penetration semi-reflection liquid crystal display |
| 06/27/2007 | CN1987651A Method for producing printing plate material |
| 06/27/2007 | CN1987643A The photo mask and method of fabricating the array substrate for liquid crystal display device using the same |
| 06/27/2007 | CN1323326C Water soluble negative photoresist and method for forming photoresist pattern |
| 06/27/2007 | CN1323325C System and method for protecting templates by two-piece cover |
| 06/26/2007 | US7236916 Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting mask |
| 06/26/2007 | US7236233 Assembly of a reticle holder and a reticle |