| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 03/15/2007 | US20070059608 Photomask, photomask manufacturing method, and photomask processing device |
| 03/15/2007 | US20070058852 Reference Image Generation From Subject Image For Photolithography Mask Analysis |
| 03/15/2007 | US20070058145 Lithographic apparatus, programmable patterning structure, device manufacturing method, and device manufactured thereby |
| 03/14/2007 | EP1761471A1 Process for polishing glass substrate |
| 03/14/2007 | EP1163552B2 Method of forming a masking pattern on a surface |
| 03/14/2007 | CN1930521A Photomask substrate made of synthetic quartz glass and photomask |
| 03/14/2007 | CN1930520A Method for supporting mask manufacture, method for providing mask blank and mask blank dealing system |
| 03/14/2007 | CN1928722A Testing mark for detecting projection object lens image errors, mask and detection method |
| 03/14/2007 | CN1305120C Metal pattern formation |
| 03/14/2007 | CN1304904C Method of using an amorphous carbon layer for reticle fabrication |
| 03/14/2007 | CN1304903C Photoetching programming system |
| 03/13/2007 | US7190760 Method for adjusting gap between two objects and exposure method using the same, gap adjusting apparatus, and exposure apparatus |
| 03/13/2007 | US7190448 Surface inspecting apparatus |
| 03/13/2007 | US7190443 Reticle and optical characteristic measuring method |
| 03/13/2007 | US7190438 Near-field exposure apparatus and near-field exposure photomask |
| 03/13/2007 | US7189655 Method of correcting amplitude defect in multilayer film of EUVL mask |
| 03/13/2007 | US7189496 Method for the manufacture of an active matrix, corresponding electro-optical display devices and mask |
| 03/13/2007 | US7189495 Method of forming photoresist pattern free from side-lobe phenomenon |
| 03/13/2007 | US7189480 Mask used for layer formation and process of making the mask |
| 03/13/2007 | US7189479 Phototool coating |
| 03/13/2007 | CA2177650C Method for optimized utilization of base material in the manufacture of optoelectronic components with variable-period gratings |
| 03/08/2007 | WO2007026390A1 Scanning exposure apparatus |
| 03/08/2007 | WO2007025746A1 Device and method for the interferometric measurement of phase masks |
| 03/08/2007 | US20070055467 Workpiece inspection apparatus assisting device, workpiece inspection method and computer-readable recording media storing program therefor |
| 03/08/2007 | US20070054204 For forming a fine pattern used for producing a semiconductor integrated circuit device; combination of a desired phase change and a desired transmittance can be selected arbitrarily for the phase shift film |
| 03/08/2007 | US20070054203 Mask, method of producing mask, and method of producing semiconductor device |
| 03/08/2007 | US20070054202 Prevents a drop in pattern alignment accuracy due to the internal stress of the membrane and able to align patterns including complementary patterns at a high accuracy; stencil mask having lattice-shaped struts which are connected to other struts or the silicon wafer around the membrane frame |
| 03/08/2007 | US20070054201 Includes transparent substrate, partially shielded mesa line pattern of first phase formed on substrate, and 100% clear recessed line pattern of second phase etched into substrate and disposed right next to partially shielded mesa line pattern; for equal line/space, small pitched, dense line pattern |
| 03/08/2007 | US20070054200 Binary photomask having a compensation layer and method of manufacturing the same |
| 03/08/2007 | US20070054199 Semiconductor device manufacturing method, wafer and reticle |
| 03/08/2007 | US20070054198 Photomask for double exposure and double exposure method using the same |
| 03/08/2007 | US20070054197 Photolithography; Mask for improving proximity effects; no dummy patterns are formed and the workable area of the wafer is increased |
| 03/08/2007 | US20070054196 Depositing a thin Cr, Ta, or W film as an absorber layer on a Si substrate covered with a multi-layered thin film and capping layer; applying electric field between cantilever tip and multi-layered structure using an atomic force microscope to form oxide structures with fixed height and width; etching |
| 03/08/2007 | US20070053582 Sample inspection apparatus, image alignment method, and program-recorded readable recording medium |
| 03/08/2007 | US20070053581 Defect inspection system |
| 03/08/2007 | US20070053578 Pattern inspection apparatus and method and reticle for use therein |
| 03/08/2007 | US20070053576 Phase shifting test mask patterns for characterizing illumination and mask quality in image forming optical systems |
| 03/08/2007 | US20070052960 Reference image forming apparatus, pattern inspection apparatus, and reference image forming method, and reticle |
| 03/08/2007 | US20070052945 Method and apparatus for protecting a reticle used in chip production from contamination |
| 03/08/2007 | US20070051950 Method for generating test patterns utilized in manufacturing semiconductor device |
| 03/08/2007 | DE10230532B4 Verfahren zum Bestimmen des Aufbaus einer Maske zum Mikrostrukturieren von Halbleitersubstraten mittels Fotolithographie A method for determining the structure of a mask for micro-patterning of semiconductor substrates by means of photolithography, |
| 03/07/2007 | EP1760525A1 Device manufacturing method, mask and device |
| 03/07/2007 | EP1759322A2 Methos and apparatus for designing integrated circuit layouts |
| 03/07/2007 | EP1759321A2 Method and apparatus for designing integrated circuit layouts |
| 03/07/2007 | EP1758962A1 Polishing method for glass substrate, and glass substrate |
| 03/07/2007 | EP1290430A4 Apparatus for inspection of semiconductor wafers and masks using a low energy electron microscope with two illuminating beams |
| 03/07/2007 | CN1924868A Method for narrowing integrated circuit chip area |
| 03/07/2007 | CN1924699A Infrared-sensitive planographic printing plate precursor |
| 03/07/2007 | CN1924698A Binary photomask having a compensation layer and method of manufacturing the same |
| 03/07/2007 | CN1924697A Halftone phase shift mask blank, halftone phase shift mask, and manufacturing method thereof |
| 03/07/2007 | CN1924617A Optical part and projection type display apparatus using same |
| 03/07/2007 | CN1303475C Optical mask with illuminance polarization control |
| 03/07/2007 | CN1303474C Optical proximity correction for phase shifting photolithographic masks |
| 03/06/2007 | US7187432 Holding system, exposure apparatus, and device manufacturing method |
| 03/06/2007 | US7186485 Inspection method and a photomask |
| 03/06/2007 | US7186481 Flare measuring mask and flare measuring method of semiconductor aligner |
| 03/06/2007 | US7186480 Subjecting the chrome-containing layer of a photomask to a wet etch process using deionized water and ozone; length of exposure is directly proportional to the degree of adjustment desired |
| 03/06/2007 | US7186301 by first using an acid, then heated hydrogen peroxide and ozone water, then by aqueous solution of ammonia and hydrogen peroxide; heat treatment is conducted after a cleaning process to remove residual ions; prevents haze |
| 03/01/2007 | WO2007002856A9 Software sequencer to dynamically adjust wafer transfer decision |
| 03/01/2007 | WO2006011977A3 Method of making grayscale mask for grayscale doe production by using an absorber layer |
| 03/01/2007 | WO2005101255A3 Intermediate layout for resolution enhancement in semiconductor fabrication |
| 03/01/2007 | US20070050741 Pattern verification method, program thereof, and manufacturing method of semiconductor device |
| 03/01/2007 | US20070048632 Photomask and method for exposing chip pattern |
| 03/01/2007 | US20070048631 Mask defect repairing method and semiconductor device manufacturing method |
| 03/01/2007 | US20070048630 Methods of forming capacitors |
| 03/01/2007 | US20070048629 Overlay target for polarized light lithography |
| 03/01/2007 | US20070048628 Plasmonic array for maskless lithography |
| 03/01/2007 | US20070048627 Systems and methods for implementing and manufacturing reticles for use in photolithography tools |
| 03/01/2007 | US20070048625 Lithographic template and method of formation and use |
| 03/01/2007 | US20070048436 Mask for LITI and LITI method using the same |
| 03/01/2007 | US20070047798 Pattern inspection apparatus, pattern inspection method, and program-recorded readable recording medium |
| 03/01/2007 | US20070046912 Interferometric measuring device and projection exposure installation comprising such measuring device |
| 03/01/2007 | DE10352639B4 Verfahren zur dynamischen Kontrolle eines Reticles A method for dynamic control of a reticle |
| 03/01/2007 | DE102005041203A1 Device for interferometric measurement of phase masks used for e.g. lithography, produces phase shifting interferogram to be applied over phase mask by translating coherence mask and/or diffraction grating in X-Y direction |
| 03/01/2007 | DE102004012240B4 Verfahren zur Herstellung einer Lochmaske zur lithographischen Strukturierung mittels geladener Teilchen A method of manufacturing a shadow mask for lithographic patterning by means of charged particles |
| 02/28/2007 | EP1757978A2 Mask for laser induced thermal imaging (LITI) and LITI method using the same |
| 02/28/2007 | EP1520208B1 Mask and manufacturing method using mask |
| 02/28/2007 | EP1303790B1 Method for determining the possibility to assign images of integrated semiconductor circuits to alternating phase shifting masks |
| 02/28/2007 | EP1164629B1 Exposure apparatus and proces for producing it |
| 02/28/2007 | CN1922027A Edge cure prevention process |
| 02/28/2007 | CN1302338C Method for preventing industrial photoresisting residual |
| 02/28/2007 | CN1302337C Mask for use in lithography, method of making a mask, lithographic apparatus, and device manufacturing method |
| 02/28/2007 | CN1302297C Method for forming color filter, method for forming light lkight emitting element layer, method for manufacturing color display device comprising them, or color dispaly device |
| 02/27/2007 | US7185312 Exposure method for correcting line width variation in a photomask |
| 02/27/2007 | US7185311 Mask evaluating method, mask evaluating system, method of manufacturing mask and computer program product |
| 02/27/2007 | US7184192 Pattern generator diffractive mirror methods and systems |
| 02/27/2007 | US7183128 Photo mask and semiconductor device manufacturing method |
| 02/27/2007 | US7183043 Shadow mask and method for producing a shadow mask |
| 02/27/2007 | US7183025 Phase difference specifying method |
| 02/27/2007 | US7183022 Providing a sharp imaging, improves the imaging of closely adjacent structures, with at least two masks, strongly coupled structures, simultaneous imaging; semiconductors |
| 02/22/2007 | WO2006113859A3 Photomask assembly incorporating a metal/scavenger pellicle frame |
| 02/22/2007 | US20070042279 Method of manufacturing liquid crystal display device and the liquid crystal display device |
| 02/22/2007 | US20070042277 Method and apparatus for performing model-based layout conversion for use with dipole illumination |
| 02/22/2007 | US20070042276 Lithography apparatus and method for using the same |
| 02/22/2007 | DE102005056916A9 Verfahren zum Gestalten einer Überlagerungs-Markierung A method of designing an overlay mark |
| 02/21/2007 | EP1754109A2 Cleaning a mask substrate |
| 02/21/2007 | EP1753609A2 Light scattering euvl mask |
| 02/21/2007 | CN1918513A Mask inspection apparatus and method |
| 02/21/2007 | CN1917982A Photomask and method for conveying information associated with a photomask substrate |
| 02/21/2007 | CN1916758A Method for photo mask, and correcting exposure machine |