| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
|---|
| 08/07/2008 | US20080187869 Better exposure profiles for the resulting integrated circuits; improved chip yield; increased throughput by reducing the need to alter settings or switch reticles between exposures |
| 08/07/2008 | US20080187861 Master Substrate and Method of Manufacturing a High-Density Relief Structure |
| 08/07/2008 | US20080187843 Preventing damage of moisture resistant ring pattern by static electricity |
| 08/07/2008 | US20080187841 Phase shift mask with two-phase clear feature |
| 08/07/2008 | US20080186509 Measurement apparatus, exposure apparatus, and device fabrication method |
| 08/07/2008 | US20080186497 Method and Apparatus for Inspecting Defects on Mask |
| 08/07/2008 | US20080186495 Cylindrical waveguide biosensors |
| 08/07/2008 | US20080186476 Inspection apparatus and method, and production method for pattern substrates |
| 08/07/2008 | DE10344645B4 Verfahren zur Durchführung einer Doppel- oder Mehrfachbelichtung A method for performing a double or multiple exposure |
| 08/07/2008 | DE10339514B4 Verfahren zur Belichtung eines Substrates A method for exposing a substrate |
| 08/06/2008 | EP1953806A1 Substrate processing method, photomask manufacturing method, photomask and device manufacturing method |
| 08/06/2008 | EP1953117A1 Scanning jet nanolithograph and the operation method thereof |
| 08/06/2008 | EP1951610A1 Method of forming supports bearing features, such as lithography masks |
| 08/06/2008 | EP1121622B1 Structure for reflection lithography mask and method for making same |
| 08/06/2008 | CN101238412A Exposure mask, its manufacture method, pattern copy method, pattern forming method, and SRAM manufacture method |
| 08/06/2008 | CN101236361A Protective hood for photomask and method for using the photomask |
| 08/06/2008 | CN101236360A Method and apparatus for inspecting defects on mask |
| 08/06/2008 | CN101236355A Pattern transcription device and method of fabricating cliche for the same |
| 08/06/2008 | CN101236164A Method and system for defect detection |
| 08/05/2008 | US7409309 Method of deciding the quality of the measurement value by the edge width |
| 08/05/2008 | US7408646 Method and apparatus for determining local variation of the reflection or transmission behavior over a mask surface |
| 08/05/2008 | US7407730 Inspected by disposing dummy inspection patterns having the same pattern as at least a part of the mask pattern portion, inside and/or outside an area of the mask pattern portion and comparing the portion of the mask pattern portion with the dummy inspection pattern portion |
| 08/05/2008 | US7407729 EUV magnetic contrast lithography mask and manufacture thereof |
| 08/05/2008 | US7406841 Glass-ceramic product with variably adjustable zero crossing of the CTE-T curve |
| 07/31/2008 | WO2008090816A1 Mask pattern designing method and semiconductor device fabrication method |
| 07/31/2008 | WO2008008144A3 Digital mask-forming film and method of use |
| 07/31/2008 | US20080182415 Semiconductor device and method for fabricating the same |
| 07/31/2008 | US20080182184 black matrix, a color filter layer, and a transparent conductive layer are formed on the substrate and the color filter layer is formed in a pixel area defined by the black matrix |
| 07/31/2008 | US20080182183 Reflective mask blank for euv lithography |
| 07/31/2008 | US20080182182 Method for Manufacturing Phase Shift Mask Using Electron Beam Lithography |
| 07/31/2008 | US20080182181 assistance pattern is disposed on at least one of an end portion and a middle portion of each of the main patterns and has a line width greater than that of the main pattern |
| 07/31/2008 | US20080182179 Gray tone mask and method for manufacturing the same |
| 07/31/2008 | US20080182178 Bleachable materials for lithography |
| 07/31/2008 | US20080180647 Focus monitor mark, focus monitoring method, and device production method |
| 07/31/2008 | US20080180646 Imprint reference template for multilayer or multipattern registration and method therefor |
| 07/31/2008 | US20080179705 Interposing a liquid medium between the optics and a surface of a substrate, such as a silicon wafer, replacing the usual air gap. the wavelength in the liquid is reduced by a factor equal to the refractive index |
| 07/31/2008 | DE10252051B4 Verfahren zur Herstellung einer Fotomaske A process for preparing a photomask |
| 07/30/2008 | EP1782456A4 Exposure apparatus, exposure method, and exposure mask |
| 07/30/2008 | CN101231460A Gray tone mask and method for manufacturing the same |
| 07/30/2008 | CN101231459A Light mask pattern for photolithography technique monitoring mark and uses thereof |
| 07/30/2008 | CN101231458A Grey mask and pattern transfer printing method |
| 07/30/2008 | CN100407051C 用于制造半导体器件的标线片 For manufacturing a semiconductor device of a reticle |
| 07/30/2008 | CN100407049C 吸收紫外线的支撑层及包含该支撑层的苯胺印刷元件 The support layer and the ultraviolet absorbing flexographic printing element comprising the support layer, |
| 07/30/2008 | CN100406930C 全息元件 Holographic element |
| 07/29/2008 | US7405807 Method of forming optical images, apparatus for carrying out said method and process for manufacturing a device using said method |
| 07/29/2008 | US7405414 Method and apparatus for patterning a workpiece |
| 07/29/2008 | US7405025 Dicing lines extending longitudinally and transversely, and chip areas surrounded by the dicing lines are formed in a resist mask; critical-dimension patterns are formed in the dicing lines so as to be paired while placing the center line in between; for verification of process accuracy |
| 07/29/2008 | US7405024 Lithographic mask, and method for covering a mask layer |
| 07/24/2008 | US20080178141 Pattern correction apparatus, pattern correction program, pattern correction method and fabrication method for semiconductor device |
| 07/24/2008 | US20080176172 Suction; rotation; sealing |
| 07/24/2008 | US20080176152 Mask Patterns for Semiconductor Device Fabrication and Related Methods and Structures |
| 07/24/2008 | US20080176150 Exposure mask and method of forming pattern |
| 07/24/2008 | US20080176149 Endpoint detection for photomask etching |
| 07/24/2008 | US20080176148 Producing image sensor having nearly complete fill factor; using silicon rich oxide (SRO) partially transmitting layer; controlling exposure of photoresist by varying thickness |
| 07/24/2008 | US20080176147 Changing polarization direction during photomask treatment |
| 07/24/2008 | US20080175466 Inspection apparatus and inspection method |
| 07/24/2008 | US20080174772 Circuit-pattern inspection apparatus |
| 07/24/2008 | US20080174749 In-tool and Out-of-Tool Protection of Extreme Ultraviolet (EUV) Reticles |
| 07/24/2008 | US20080173560 Glass Substrate Storage Case, Glass Substrate Transfer Apparatus, Glass Substrate Management Apparatus, Glass Substrate Distribution Method , Sealing Member, And Sealing Structure |
| 07/24/2008 | US20080173339 Method for cleaning semiconductor device |
| 07/24/2008 | DE102008004817A1 Entwicklungsbearbeitungsvorrichtung Development processing device |
| 07/24/2008 | DE102004013482B4 Systeme und Verfahren zum Verifizieren einer Abtastmodusauswahl Systems and methods for verifying a Abtastmodusauswahl |
| 07/23/2008 | EP1947509A2 Pattern formation method |
| 07/23/2008 | EP1947508A1 Multi-step photomask etching with chlorine for uniformity control |
| 07/23/2008 | EP1945829A1 Method for depositing reflective multilayer film of reflective mask blank for euv lithography and method for producing reflective mask blank for euv lithography |
| 07/23/2008 | EP0968458B1 Optical proximity correction method for intermediate-pitch features using sub-resolution scattering bars |
| 07/23/2008 | CN201091030Y Mask box and mask conveying box and supporting piece thereof |
| 07/23/2008 | CN101228527A Manufacturing aware design and design aware manufacturing |
| 07/23/2008 | CN101228478A Method for generating photo mask graphic data, photo mask generated by the data and manufacturing method of semiconductor device using the photo mask |
| 07/23/2008 | CN101226337A Device and method for removing impurity on mask covered by protective membrane |
| 07/23/2008 | CN101226326A Verifying mask layout printability using simulation with adjustable accuracy |
| 07/23/2008 | CN101224457A Method for coating bonding adhesive on protecting film framework |
| 07/23/2008 | CN101224456A Method for coating bonding adhesive on protecting film framework inner surface |
| 07/23/2008 | CN100405221C Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography |
| 07/22/2008 | US7404173 Intermediate layout for resolution enhancement in semiconductor fabrication |
| 07/22/2008 | US7404167 Method for improving design window |
| 07/22/2008 | US7403649 System and method of providing mask defect printability analysis |
| 07/22/2008 | US7403266 Maskless lithography systems and methods utilizing spatial light modulator arrays |
| 07/22/2008 | US7403228 Solid-state camera device and method of manufacturing the same, and method of making mask for manufacturing the device |
| 07/22/2008 | US7402486 Cylinder-type capacitor and storage device, and method(s) for fabricating the same |
| 07/22/2008 | US7402378 Illuminating a phase shift mask including a pattern and a cyclic dummy pattern overlaid onto the pattern by making a part of the pattern to be resolved by effects of the dummy pattern thicker than the line width using light having a peak near an optical axis in an intensity distribution |
| 07/22/2008 | US7402364 A mask for defining gate patterns on dynamic random access memory (DRAM) chips with open bit-line architecture; no unwanted images; only one exposure is needed to achieve high resolution |
| 07/22/2008 | US7402363 Pattern forming method and system, and method of manufacturing a semiconductor device |
| 07/22/2008 | US7402228 Manufacturing method and apparatus of phase shift mask blank |
| 07/17/2008 | WO2008086528A2 Method for detecting lithographically significant defects on reticles |
| 07/17/2008 | WO2008084825A1 Liquid crystal photomask for exposure apparatus, exposure apparatus and exposure method |
| 07/17/2008 | WO2008084680A1 Reflective mask blanc for euv lithography |
| 07/17/2008 | US20080171272 Curable composition, color filter using the same and manufactuirng method therefor, and solid image pickup element |
| 07/17/2008 | US20080171270 Polymers Useful in Photoresist Compositions and Compositions Thereof |
| 07/17/2008 | US20080171269 Method of patterning an organic planarization layer |
| 07/17/2008 | US20080170229 Method of selecting crystalline quartz material for use in an optical apparatus |
| 07/17/2008 | US20080169587 Optical modeling apparatus |
| 07/16/2008 | EP1190434B1 Real-time prediction of proximity resist heating and correction of raster scan electron beam lithography |
| 07/16/2008 | CN101221902A Mask used for continuous side direction crystal growing technology and laser crystallization method |
| 07/16/2008 | CN101221371A Device and method for detecting pattern positioning precision |
| 07/16/2008 | CN101221356A Mask etch plasma reactor with backside optical sensors and multiple frequency control of etch distribution |
| 07/16/2008 | CN101221355A Cleaning method and device for photo-etching mask plate in manufacture process of organic electroluminescence device |
| 07/16/2008 | CN100403166C Photomask and method for forming pattern |
| 07/16/2008 | CN100403097C Large size substrate and its producing method |
| 07/15/2008 | US7401319 Method and system for reticle-wide hierarchy management for representational and computational reuse in integrated circuit layout design |