| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
|---|
| 09/02/2008 | US7419748 Photomask with reduced electrostatic discharge defects |
| 08/28/2008 | US20080209386 Method for predicting resist pattern shape, computer readable medium storing program for predicting resist pattern shape, and computer for predicting resist pattern shape |
| 08/28/2008 | US20080206915 Connecting material before photolithography; vacuum pumping system; forming pattern of photosensitive polymer; etching; masking; combustion |
| 08/28/2008 | US20080206679 Contrast Enhancing Exposure System and Method For Use In Semiconductor Fabrication |
| 08/28/2008 | US20080206660 Colored photosensitive composition, color filter, and method for making the color filter |
| 08/28/2008 | US20080206659 Color filter and method of manufacturing the same, and solid-state image pickup element |
| 08/28/2008 | US20080206657 Multilayer; substrate with light shielding film; measurement flatness; calibration |
| 08/28/2008 | US20080206656 Scattering bar OPC application method for sub-half wavelength lithography patterning |
| 08/28/2008 | US20080206655 Mask blank, method of manufacturing an exposure mask, and method of manufacturing an imprint template |
| 08/28/2008 | US20080206654 Method for manufacturing semiconductor devices, and method for forming a pattern onto an exposure mask |
| 08/28/2008 | US20080206653 Exposure mask |
| 08/28/2008 | US20080204737 Mask pattern inspection apparatus with koehler illumination system using light source of high spatial coherency |
| 08/28/2008 | US20080204735 Apparatus and method for measuring structures on a mask and or for calculating structures in a photoresist resulting from the structures |
| 08/28/2008 | US20080204723 Mask defect inspection apparatus |
| 08/28/2008 | US20080204686 Mask Structure for Manufacturing an Integrated Circuit by Photolithographic Patterning |
| 08/28/2008 | US20080203518 Photomask patterning; integrated circuits |
| 08/28/2008 | US20080203058 Substrate developing method and developing apparatus |
| 08/28/2008 | DE102007009265A1 Verfahren und Vorrichtung zur photolithographischen Strukturierung in der Halbleitertechnologie Method and apparatus for photolithographic structuring in the semiconductor technology |
| 08/28/2008 | DE102007000981A1 Vorrichtung und Verfahren zum Vermessen von Strukturen auf einer Maske und zur Berechnung der aus den Strukturen resultierenden Strukturen in einem Photoresist Apparatus and method for measuring structures on a mask and the calculation of results from the structures structures in a photoresist |
| 08/27/2008 | EP1962326A1 Reflection-type mask blank for euv lithography, and substrate with electrically conductive film for the mask blank |
| 08/27/2008 | EP1962138A1 Systems and methods for UV lithography |
| 08/27/2008 | EP1961789A1 Modified pigment products, dispersions thereof, and compositions comprising the same |
| 08/27/2008 | EP1960836A1 Method for making a reflection lithographic mask and mask obtained by said method |
| 08/27/2008 | EP1960835A1 Reflection lithography mask and method for making same |
| 08/27/2008 | EP1960834A1 Improved method for etching photolithographic substrates |
| 08/27/2008 | EP1034457B1 Method of fine feature edge tuning with optically-halftoned mask |
| 08/27/2008 | CN101251712A Mask territory verification method in semiconductor fabrication process |
| 08/27/2008 | CN101251698A Liquid crystal display panel and method for making the same |
| 08/27/2008 | CN101249937A Method for processing micron/submicron sized block sample |
| 08/27/2008 | CN100414437C Sun sensor optical mask and manufacturing method therefor |
| 08/27/2008 | CN100414168C Antistatic optical pellicle |
| 08/26/2008 | US7418694 Method for generating test patterns utilized in manufacturing semiconductor device |
| 08/26/2008 | US7418124 Qualifying patterns, patterning processes, or patterning apparatus in the fabrication of microlithographic patterns |
| 08/26/2008 | US7417236 Sheet beam-type testing apparatus |
| 08/26/2008 | US7416820 Pellicle film optimized for immersion lithography systems with NA>1 |
| 08/21/2008 | WO2008021952A3 Patterning compositions, masks, and methods |
| 08/21/2008 | US20080201686 Method and apparatus for performing target-image-based optical proximity correction |
| 08/21/2008 | US20080199817 Resist pattern forming method |
| 08/21/2008 | US20080199803 Forming full color diffraction grating image using black ink without gradation expression or high print resolution |
| 08/21/2008 | US20080199788 photo mask has different shapes depending on the desired thickness of the photoresist film to be formed in the translucent areas, it allow different amounts of light to pass through translucent areas, while thickness of the photoresist film that remains after light exposure is constant, reduces cost |
| 08/21/2008 | US20080199787 Reflective mask blank for euv lithography |
| 08/21/2008 | US20080199786 Method for fabricating photomask in semiconductor device |
| 08/21/2008 | US20080199785 Substrate fluorescence mask utilizing a multiple color overlay for embedding information in printed documents |
| 08/21/2008 | US20080199784 depositing a layer of photoresist on the integrated circuit, selectively exposing portions of the photoresist through photolithography mask having a pattern including means for alleviating line end shortening of first and second lines adjacent the gap, developing the photoresist after selective exposure |
| 08/21/2008 | US20080199783 includes a mask substrate having an absorber pattern, and a hard pellicle held against movement with respect to the mask substrate by gas pressure; reduce the propagation of defects in integrated circuits by shielding the mask from particles during photolithography |
| 08/21/2008 | US20080199638 Method for producing reflective layers in LCD display |
| 08/21/2008 | US20080198353 Projection Objective, Projection Exposure Apparatus and Reflective Reticle For Microlithography |
| 08/21/2008 | US20080197862 Proportional Variable Resistor Structures to Electrically Measure Mask Misalignment |
| 08/21/2008 | US20080197394 Methods of manufacturing semiconductor structures |
| 08/21/2008 | US20080196823 Method for forming color filter, method for |
| 08/21/2008 | US20080196515 Contamination analysis unit and method thereof, and reticle cleaning system |
| 08/21/2008 | DE112006002656T5 Größerer Prozesstoleranzbereich unter Verwendung diskreter Hilfsstrukturelemente Large process tolerance using discrete assist features |
| 08/21/2008 | DE10203357B4 Bestrahlungsverfahren unter Verwendung von photolithographischen Masken Irradiation method using photolithographic masks |
| 08/20/2008 | EP1957457A1 Oxime ester photoinitiators |
| 08/20/2008 | CN101246813A Substrate processing apparatus |
| 08/20/2008 | CN101246812A Substrate processing apparatus |
| 08/20/2008 | CN101246312A Recycling of large-size photomask substrate |
| 08/20/2008 | CN101246306A Optical proximity amending method |
| 08/20/2008 | CN101246305A Graphic method |
| 08/20/2008 | CN100413026C Photomask, light spot detector and detecting method |
| 08/19/2008 | US7415694 Graph based phase shift lithography mapping method and apparatus |
| 08/19/2008 | US7415402 Simulation based PSM clear defect repair method and system |
| 08/19/2008 | US7415362 Image defect inspection apparatus |
| 08/19/2008 | US7415150 Photomask image registration in scanning electron microscope imagery |
| 08/19/2008 | US7415149 Pattern inspection apparatus |
| 08/19/2008 | US7414240 Particle remover, exposure apparatus having the same, and device manufacturing method |
| 08/19/2008 | US7413833 Single exposure of mask levels having a lines and spaces array using alternating phase-shift mask |
| 08/19/2008 | US7413831 for extreme ultraviolet light; lithography process for forming a circuit pattern; miniaturization of a transferred image possible |
| 08/19/2008 | US7413608 Crystallization apparatus, crystallization method, and phase shifter |
| 08/19/2008 | US7413586 In-tool and out-of-tool protection of extreme ultraviolet (EUV) reticles |
| 08/14/2008 | WO2008096364A2 Method and system for measurng in patterned structures |
| 08/14/2008 | US20080193864 Masks for performing in-situ synthesis on probes, comprising light-transmitting regions and light-blocking regions, and a proportion of the light-transmitting regions is equal to or greater than 5% of a total proportion of the light-transmitting and light-blocking regions in each mask |
| 08/14/2008 | US20080193863 Mask having light-transmitting regions and light-blocking regions, each probe cell corresponding to a light-transmitting region or a light-blocking region, and a pattern of each light-transmitting region is corrected for an optical proximity effect |
| 08/14/2008 | US20080193862 Forming a pattern in uppermost layer of an absorber layer; etching the lower layer of the absorber layer using the pattern formed in the uppermost layer as a mask to form a pattern in the lower layer |
| 08/14/2008 | US20080193861 Method for repairing a defect on a photomask |
| 08/14/2008 | US20080193860 Controlling the selective application of halftones to the background image for creation of a differential gloss image when the background image is printed; forming a mask based on the background image, regions of mid-tone gray level are accentuated |
| 08/14/2008 | US20080193858 Acrylic, styryl, methacrylic substituents of benzene rings joined through a ketone |
| 08/14/2008 | US20080193857 Metal oxide of Silicon and Zirconium, coordinated to a beta -dicarbonyl; anda photopolymerizable compound,high refractive index change, flexibility, high sensitivity, low scattering, environment resistance, durability, low dimensional change; green and blue laser |
| 08/14/2008 | DE112006001768T5 Verwendung eines superkritischen Fluids zum Trocknen der Schreiben und zum Reinigen der Linsen in einer Immersionslithographie Using a supercritical fluid to dry the letter and for cleaning the lenses in an immersion lithography |
| 08/14/2008 | DE10355264B4 Verfahren zur Verbesserung eines Simulationsmodells der photolithographischen Projektion A method for improving a simulation model of the photolithographic projection |
| 08/13/2008 | EP1956434A2 Lithographic apparatus and methods for use thereof |
| 08/13/2008 | EP1955110A1 Extreme ultraviolet photolithography mask, with absorbent cavities |
| 08/13/2008 | EP1954472A1 Technique for separating a mold from solidified imprinting material |
| 08/13/2008 | EP1660944B1 Method of forming optical images, apparatus for carrying out said method and process for manufacturing a device using said method |
| 08/13/2008 | EP1444726A4 Method and apparatus for the etching of photomask substrates using pulsed plasma |
| 08/13/2008 | CN101241517A Method, device and system for a pattern layout split |
| 08/13/2008 | CN101241319A Machine vision aligning system possessing mask target hierarchy and its alignment method |
| 08/13/2008 | CN101241312A Photo-etching machine image-forming quality on-site measurement method |
| 08/13/2008 | CN101241309A Method for calibrating sub-nanometer critical dimension using pitch offset |
| 08/13/2008 | CN101241303A Semiconductor device and methods for controlling its patterns |
| 08/13/2008 | CN101241302A Preparation method for improving mask critical size trend |
| 08/13/2008 | CN101241301A Photo mask pattern correction method |
| 08/13/2008 | CN101241300A Method, computer readable medium, device manufacture method and mask for performing decomposition of a pattern |
| 08/12/2008 | US7410733 Making a composite extreme ultraviolet light mask absorber composed of a first mask absorber layer anisotropically etched with minimal etch bias at a relatively fast etch rate, combined with a highly-selective second mask absorber layer; desirable hybrid performance properties |
| 08/12/2008 | US7410732 Process for producing a mask |
| 08/12/2008 | US7410545 Substrate processing method of and substrate processing apparatus for freezing and cleaning substrate |
| 08/07/2008 | WO2008094257A1 Method and system for dispositioning defects in a photomask |
| 08/07/2008 | WO2008093534A1 Reflective mask blank for euv lithography |
| 08/07/2008 | WO2008077012A3 Multi-step photomask etching with chlorine for uniformity control |
| 08/07/2008 | US20080189674 Data Generating Method, Data Generating Device, and Program |