| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 09/24/2008 | CN101271268A Method and system for optimizing lithography focus and/or energy using a specially-designed optical critical dimension pattern |
| 09/24/2008 | CN101271267A Production method of exposure light shield and thin film graphic pattern layer |
| 09/23/2008 | US7427458 System and method for critical dimension reduction and pitch reduction |
| 09/23/2008 | US7427456 tabs having critical dimensions broader than those of the vertical patterns are additionally inserted into the edges of the vertical patterns disposed vertically to the dipole, thereby minimizing the difference in critical dimensions between central and edge portions of the vertical patterns |
| 09/18/2008 | WO2008112888A1 Device and method for manufacturing a particulate filter with regularly spaced micropores |
| 09/18/2008 | WO2008111198A1 Photomask |
| 09/18/2008 | US20080229273 Systems and methods for uv lithography |
| 09/18/2008 | US20080227034 Method of forming pattern of semiconductor device |
| 09/18/2008 | US20080227030 Combination of base additives including a room temperature solid base, and a liquid low vapor pressure base; for chromium-containing layers used in mask-making |
| 09/18/2008 | US20080226994 Negative curable composition, color filter, and method of producing the same |
| 09/18/2008 | US20080226993 Method of fabricating color filter substrate and infrared heating apparatus for the same |
| 09/18/2008 | US20080226992 Mask system design including combination of large and nearby small features; increasing optical flare |
| 09/18/2008 | US20080226991 Fitting Methodology of Etching Times Determination for a Mask to Provide Critical Dimension and Phase Control |
| 09/18/2008 | US20080226990 Maskless lithography; utilizing dark border region comprised of absorbing material, wedged reflective coating or interference grating to remove excess light; accuracy; maximizing active area |
| 09/18/2008 | US20080225254 Photomask, photomask superimposition correcting method, and manufacturing method of semiconductor device |
| 09/18/2008 | US20080224176 Semiconductor integrated circuit |
| 09/17/2008 | EP1642174B1 Exposure method and apparatus, exposure mask, and device manufacturing method |
| 09/17/2008 | CN201117643Y Semiconductor component storage device and light shield storage device |
| 09/17/2008 | CN201117642Y Storage device for semiconductor component or mask |
| 09/17/2008 | CN101268417A Photomask having gray scale and method of manufacturing the same |
| 09/17/2008 | CN101268349A System and method for automatically mounting a pellicle assembly on a photomask |
| 09/17/2008 | CN101266408A Laminating body, grafting film forming method using the same and forming method for grafting pattern |
| 09/17/2008 | CN101266403A Mask with hydrophobic surface |
| 09/17/2008 | CN101266402A Mask pattern and its forming method |
| 09/17/2008 | CN100419986C 衬底处理设备和衬底处理方法 The substrate processing apparatus and a substrate processing method |
| 09/17/2008 | CN100419957C Photomask pattern layout method for pattern transfer and photomask thereof |
| 09/16/2008 | US7426712 Lithography simulation method and recording medium |
| 09/16/2008 | US7426711 Mask pattern data forming method, photomask and method of manufacturing semiconductor device |
| 09/16/2008 | US7426017 Focus test mask, focus measurement method and exposure apparatus |
| 09/16/2008 | US7425393 Phase shift photomask and method for improving printability of a structure on a wafer |
| 09/16/2008 | US7425392 forming radiation transparent conductive layers on the surfaces of transparent substrates, then fomring a silicon carbonitride layer, a patterning layer and a patterned photoresist layer, etching the patterning layer, removing the photoresist layer andconverting the carbonitride to a silica layer |
| 09/16/2008 | US7425391 Highly-corrected mask |
| 09/16/2008 | US7425390 Preparation of halftone phase shift mask blank |
| 09/16/2008 | US7425389 Line photo masks and methods of forming semiconductor devices using the same |
| 09/12/2008 | WO2008107955A1 Mask for multicolumn electron beam exposure, electron beam exposure device and exposure method employing mask for multicolumn electron beam exposure |
| 09/12/2008 | WO2008071269A8 Apparatus and method for mask metrology |
| 09/11/2008 | US20080222597 Photo mask, exposure method using the same, and method of generating data |
| 09/11/2008 | US20080220380 Enhancing photoresist performance using electric fields |
| 09/11/2008 | US20080220377 Row having three or more hole patterns surrounded by a shielding portion or a semitransparent film and arranged along one direction, and an assist pattern surrounded by the shielding portion or semitransparent film and having a longitudinal direction and a latitudinal direction; semiconductors |
| 09/11/2008 | US20080220343 Ink jets; radiation transparent; solidification; LCDs |
| 09/11/2008 | US20080220341 Mask pattern and method for forming the same |
| 09/11/2008 | US20080220340 Apparatus and method for heating a layer carried on a rotating substrate |
| 09/11/2008 | US20080220339 Film Forming Photosensitive Materials for the Light Induced Generation of Optical Anisotrophy |
| 09/11/2008 | US20080220223 Resist cover film forming material, resist pattern forming method, and electronic device and method for manufacturing the same |
| 09/11/2008 | US20080219562 System and Method for Calculating Aerial Image of a Spatial Light Modulator |
| 09/11/2008 | US20080218747 Method and Apparatus for Detecting Surface Characteristics on a Mask Blank |
| 09/11/2008 | US20080218708 Exposure apparatus and method of manufacturing device |
| 09/11/2008 | US20080217786 Semiconductor device and method of manufacturing semiconductor device |
| 09/11/2008 | DE102008010345A1 Kontaminationsanalyseeinheit und -verfahren sowie Retikelreinigungssystem Contamination analysis unit and procedures and Retikelreinigungssystem |
| 09/10/2008 | CN201112367Y Light shield case |
| 09/10/2008 | CN201112366Y Transfer container and conducting structure applied for the same |
| 09/10/2008 | CN201112365Y Containing chamber structure for transfer container |
| 09/10/2008 | CN101261454A Method for accomplishing sub-wavelength interference photolithography utilizing multiple layer metal dielectric-coating structure |
| 09/10/2008 | CN101261442A Device manufacturing method, computer program and lithographic apparatus |
| 09/10/2008 | CN101261441A Mask-free photolithography system exposure graph approach effect correction method |
| 09/10/2008 | CN101261440A Photomask substrate and photomask |
| 09/10/2008 | CN101261439A Method for forming photoresist pattern, method for manufacturing display panel, and method for manufacturing display device |
| 09/10/2008 | CN101261410A LCD device including a reflection film having a convex-concave surface |
| 09/09/2008 | US7424145 Device and method for inspecting photomasks and products fabricated using the same |
| 09/09/2008 | US7424144 Method for checking periodic structures on lithography masks |
| 09/09/2008 | US7423805 Ultra-broadband UV microscope imaging system with wide range zoom capability |
| 09/09/2008 | US7423745 Optical inspection apparatus and optical inspection method |
| 09/09/2008 | US7423740 Reticle and optical characteristic measuring method |
| 09/09/2008 | US7423723 Transverse electric-field type liquid crystal display device, process of manufacturing the same, and scan-exposing device |
| 09/09/2008 | US7422841 Exposure control for phase shifting photolithographic masks |
| 09/09/2008 | US7422830 Method for detecting failure of database patterns of photo mask |
| 09/09/2008 | US7422829 Optical proximity correction (OPC) technique to compensate for flare |
| 09/09/2008 | US7422828 Mask CD measurement monitor outside of the pellicle area |
| 09/04/2008 | WO2008105531A1 Pellicle frame apparatus, mask, exposure method, exposure apparatus and device manufacturing method |
| 09/04/2008 | WO2008083114A3 Hybrid mask and method of forming same |
| 09/04/2008 | WO2008024643A3 Patterning non-planar surfaces |
| 09/04/2008 | US20080216047 Intermediate Layout for Resolution Enhancement in Semiconductor Fabrication |
| 09/04/2008 | US20080216046 Pattern management method and pattern management program |
| 09/04/2008 | US20080216045 Mask data processing method for optimizing hierarchical structure |
| 09/04/2008 | US20080214011 Method for Fabricating Dual Damascene Structures |
| 09/04/2008 | US20080213707 Producing composite single layer under photoresist comprised of polymer components having chromophore and transparent moieties |
| 09/04/2008 | US20080213704 Rapid, accurate local flare measuring; ensures sufficient light quantity; increased opening size above sensor; semiconductors |
| 09/04/2008 | US20080213691 Method to print photoresist lines with negative sidewalls |
| 09/04/2008 | US20080213679 Configuration prevents the substrate from conforming to the shape of the frame; photolithography; high precision pattern transfer |
| 09/04/2008 | US20080213678 Laminating a plastic film to the baked, photoresist-laminated substrate, processing one or more electroconductive interconnects, including photolithography, baking, soaking in a liquid, separating film from substrate; complementary metal-oxides semiconductors |
| 09/04/2008 | US20080213677 Obtaining a relationship between the charge dose of the apparatus and the dimensional accuracy of the photomask pattern, determining the charge dose, forming the resist, determining the write condition for each pattern |
| 09/04/2008 | US20080213676 Glass substrate with a surface and a chromium layer; the border of the phase inversion is substantially widened because the first phase section includes a tapered, non-rectangular part |
| 09/04/2008 | US20080213675 Interrogation of a Light-Sensitive Sensor |
| 09/04/2008 | US20080212869 Pattern correcting method of mask for manufacturing a semiconductor device |
| 09/04/2008 | DE102007023034A1 Dummy-blank for fixing illumination parameters of illumination process, has substrate, blank layer or blank layer system, which is suitable for identification of response behavior of given masking layer system |
| 09/04/2008 | DE102005056916B4 Verfahren zum Gestalten einer Überlagerungs-Markierung A method of designing an overlay mark |
| 09/04/2008 | DE102004057180B4 Photomasken mit Schattenelementen in denselben und dazugehörige Verfahren und Systeme Photomasks with shadow elements in the same and related methods and systems |
| 09/03/2008 | EP1965259A2 Measurement apparatus, exposure apparatus, and device fabrication method |
| 09/03/2008 | CN101258442A Pattern copy mask, focal distance fluctuation measuring method and apparatus, manufacture method for semiconductor device |
| 09/03/2008 | CN101256551A Method and system for detecting photo mask, computer readable storage medium |
| 09/03/2008 | CN101256352A Protective film and bracket thereof |
| 09/03/2008 | CN101256350A Method and device for checking defect of grey level mask, method for manufacturing same, optical mask defect checking method and pattern trans-printing method |
| 09/03/2008 | CN101256349A Defect correction method and manufacturing method for grey level mask and grey level mask |
| 09/03/2008 | CN100416232C Light scattering EUVL mask |
| 09/02/2008 | US7421109 Pattern inspection apparatus |
| 09/02/2008 | US7420655 Reticle-carrying container |
| 09/02/2008 | US7420190 Length measurement pattern, semiconductor device, and method of manufacturing a semiconductor device |
| 09/02/2008 | US7419912 Laser patterning of light emitting devices |
| 09/02/2008 | US7419767 Photomasks; suppresses optical proximity effect to improve resolution; photolithography; semiconductors |
| 09/02/2008 | US7419749 Halftone phase shift mask blank, halftone phase shift mask and their preparation |