| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 10/14/2008 | US7435513 Reducing phase conflicts in complex designs |
| 10/14/2008 | US7435512 Using a photomask that can prevent critical dimension biases of pattern images of different pattern densities while forming a circuit pattern |
| 10/09/2008 | WO2008045545A3 Deformation-based contact lithography systems, apparatus and methods |
| 10/09/2008 | US20080250383 Method for designing mask pattern and method for manufacturing semiconductor device |
| 10/09/2008 | US20080250382 Semiconductor device manufacturing method |
| 10/09/2008 | US20080250380 Method of OPC Model Building, Information-Processing Apparatus, and Method of Determining Process Conditions of Semiconductor Device |
| 10/09/2008 | US20080250374 Method of Making an Integrated Circuit |
| 10/09/2008 | US20080248410 Method for forming color filter |
| 10/09/2008 | US20080248409 Photoresists; extreme ultraviolet region and absorber layer for exposure light; semiconductors |
| 10/09/2008 | US20080248408 Providing mask layout file including primitive shape, fracturing the primitive shape to create writeable shapes in mask pattern file, then using and lithography system to image; photoresists; lithography |
| 10/09/2008 | US20080248407 Pellicle |
| 10/09/2008 | US20080248406 Pellicle and method for preparing the same |
| 10/09/2008 | US20080248405 Masking and patterning substrate employing polymer-based liquid toner as pattern mask; toner is deposited on substrate in masking pattern, mask is lifted off substrate after patterning using lift-off technique that breaks a bond between surface of substrate and pattern mask |
| 10/09/2008 | US20080248404 Forming phase shift mask comprising a substrate and a patterned absorber layer and performing a first plasma treatment on the formed mask to reduce the phase angle; for semiconductor manufacture |
| 10/09/2008 | US20080248403 Method and system for improving critical dimension uniformity |
| 10/09/2008 | US20080248264 Material pattern, and mold, metal thin-film pattern, metal pattern using thereof, and methods of forming the same |
| 10/09/2008 | US20080247632 Method for Mask Inspection for Mask Design and Mask Production |
| 10/09/2008 | US20080246939 Exposure apparatus and original |
| 10/08/2008 | EP1978545A1 Reticle carrier, exposure device, reticle carrying method, reticle processing method, device manufacturing method and reticle cover managing method |
| 10/08/2008 | EP1978405A1 Pellicle and method for preparing the same |
| 10/08/2008 | EP1978404A1 Pellicle |
| 10/08/2008 | CN101281376A Gantry type light shield cleaning device |
| 10/08/2008 | CN101281365A Material pattern, and mold, metal thin-film pattern, metal pattern using thereof, and methods of forming the same |
| 10/08/2008 | CN101281363A Pellicle and method for preparing the same |
| 10/08/2008 | CN101281362A Pellicle |
| 10/08/2008 | CN101281361A A photomask with sub-resolution assist feature and manufature method thereof |
| 10/08/2008 | CN101281360A Method for manufacturing mask |
| 10/08/2008 | CN101281359A Method for manufacturing attenuation type phase displacement light shield |
| 10/08/2008 | CN100424806C Original edition for color display tube shadow mask printing |
| 10/07/2008 | US7434196 Renesting interaction map into design for efficient long range calculations |
| 10/07/2008 | US7434195 Method for performing full-chip manufacturing reliability checking and correction |
| 10/07/2008 | US7432043 Distortions of the developed photosensitive film pattern are compensated for; more accurate target photosensitive film pattern; the depth of focus of the photolithography process is increased; uniformity |
| 10/07/2008 | US7432025 Methods of forming reticles |
| 10/07/2008 | US7432024 For semiconductors, microelectronic and microelectromechanical devices, and microfluidic and photonic devices; eliminating image distorting charging effects during electron beam patterning of the template and charging effects during scanning electron microscope inspection |
| 10/07/2008 | US7432023 Method for producing a pellicle for lithography |
| 10/07/2008 | US7432022 Photo mask capable of improving resolution by utilizing polarization of light and method of manufacturing the same |
| 10/07/2008 | US7432021 a test pattern established on the mask substrate having an asymmetrical diffraction grating so as to generate positive first order diffracting light and negative first order diffracting light in different diffraction efficiencies |
| 10/02/2008 | WO2008118341A1 Method to form a pattern of functional material on a substrate using a stamp having a surface modifying material |
| 10/02/2008 | WO2008117677A1 Pressure-sensitive adhesive tape for the protection of photo masks |
| 10/02/2008 | WO2007127407A3 Active mask lithography |
| 10/02/2008 | US20080244503 System for Coloring a Partially Colored Design in an Alternating Phase Shift Mask |
| 10/02/2008 | US20080242104 Semiconductor device, method of manufacturing thereof and mask for dividing exposure |
| 10/02/2008 | US20080241973 Method of correcting a mask pattern and method of manufacturing a semiconductor device |
| 10/02/2008 | US20080241761 Half-tone images; frequency modulation screening |
| 10/02/2008 | US20080241733 Radiation curable thermal transfer elements |
| 10/02/2008 | US20080241713 Colored photocurable composition for solid state image pick-up device, color filter and method for production thereof, and solid state image pick-up device |
| 10/02/2008 | US20080241712 Method and system for patterning a mask layer |
| 10/02/2008 | US20080241711 Removal and prevention of photo-induced defects on photomasks used in photolithography |
| 10/02/2008 | US20080241710 Photomask including contrast enhancement layer and method of making same |
| 10/02/2008 | US20080241709 Computer program for accurate simulated patterns and adjustments |
| 10/02/2008 | US20080241708 Sub-resolution assist feature of a photomask |
| 10/02/2008 | US20080241707 Reducing production time and cost; exposing imaging layer using radiation energy in writing mode; etching attenuating layer then substrate; forming second imaging layer on attenuating layer; performing second exposure to second imaging layer using light energy and mask; reetching attenuating layer |
| 10/02/2008 | US20080241432 Pocket wallpaper border with printed "Blank Areas or Regions" |
| 10/02/2008 | US20080241429 A substrate; a bank with openings, a bottom surface, and a top surface larger than the bottom surface, color filter films having a curved top surface; improving wetability between a bank and color filter films |
| 10/02/2008 | US20080239290 Reticle defect inspection apparatus and reticle defect inspection method |
| 10/02/2008 | US20080239266 Exposure method, exposure apparatus, light converging pattern formation member, mask, and device manufacturing method |
| 10/02/2008 | US20080239214 Display device and manufacturing method of the same |
| 10/02/2008 | US20080237724 semiconductor thin film on which crystal grains with large diameters are formed over a wide range. A beam pattern including a plurality of recessed patterns is scan-irradiated to amorphous silicon in a first scanning direction (first crystallization step). |
| 10/01/2008 | EP1975725A2 Standard image pattern, developer evaluation method for planographic printing plate using the standard image pattern, and quality control method for planographic printing plate using the standard image pattern |
| 10/01/2008 | EP1975699A2 A method and system for patterning a mask layer |
| 10/01/2008 | EP1974948A2 Image-forming method using heat-sensitive transfer system |
| 10/01/2008 | EP1973719A2 Patterning substrates employing multiple chucks |
| 10/01/2008 | EP1066352B2 Modified pigments having improved dispersing properties |
| 10/01/2008 | CN101278375A Substrate processing method, photomask manufacturing method, photomask, and device manufacturing method |
| 10/01/2008 | CN101278233A Process margin using discrete assist features |
| 10/01/2008 | CN101276783A Method for manufacturing semiconductor integrated circuit device |
| 10/01/2008 | CN101276141A Method and apparatus for performing model-based OPC for pattern decomposed feature |
| 10/01/2008 | CN101276140A Defect modifying method of gray tone mask, manufacturing method of gray tone mask, gray tone mask; and pattern transfer print method |
| 10/01/2008 | CN101275920A Pattern flaw detection method, photo mask manufacturing method and pattern transfer printing method |
| 10/01/2008 | CN100422856C Measuring method and correction method for illumination irregularity of exposure device |
| 09/30/2008 | US7430731 Method for electrochemically fabricating three-dimensional structures including pseudo-rasterization of data |
| 09/30/2008 | US7430037 Reticle cassette and exposure apparatus using reticle cassette |
| 09/30/2008 | US7429546 Forming porous glass body on target quartz glass particles obtained by flame hydrolysis of glass-forming materials; holding in fluorine-containing atmosphere; heating, vitrification, annealilng |
| 09/25/2008 | WO2008096364A3 Method and system for measurng in patterned structures |
| 09/25/2008 | WO2007115105A3 Method for making an improved thin film solar cell interconnect using etch and deposition processes |
| 09/25/2008 | US20080235652 Lithography method for forming a circuit pattern |
| 09/25/2008 | US20080235651 Method and apparatus for determining an optical model that models the effects of optical proximity correction |
| 09/25/2008 | US20080235650 Pattern creation method, mask manufacturing method and semiconductor device manufacturing method |
| 09/25/2008 | US20080233674 Photo mask and method for fabricating image sensor using the same |
| 09/25/2008 | US20080233491 barrier film material includes, in addition to an alkali-soluble polymer, a multivalent carboxylic acid compound having a plurality of carboxyl groups or a multivalent alcohol compound. The multivalent carboxylic acid compound or the multivalent alcohol compound is adhered onto the surface of a resist |
| 09/25/2008 | US20080233490 Mask rework method |
| 09/25/2008 | US20080233489 Method to form a pattern of functional material on a substrate using a stamp having a surface modifying material |
| 09/25/2008 | US20080233488 Mask with hydrophobic surface |
| 09/25/2008 | US20080233487 lithography focus and/or energy using a specially-designed optical critical dimension pattern. A wafer comprising a plurality of photomasks is received. Critical dimension, line-end shortening, and side wall angle of the plurality of photomasks are measured using an integrated metrology equipment. |
| 09/25/2008 | US20080233486 System and Method for Providing Phase Shift Mask Passivation Layer |
| 09/25/2008 | US20080232671 Mask pattern verifying method |
| 09/25/2008 | US20080231862 Device and Method for the Interferometric Measurement of Phase Masks |
| 09/25/2008 | US20080231846 Level detection apparatus |
| 09/25/2008 | US20080231681 Method of manufacturing color filter |
| 09/25/2008 | DE10352740B4 Hilfsstrukturmerkmale mit einer unter der Auflösung liegenden Größe Auxiliary structural features with a sub-resolution size |
| 09/24/2008 | EP1973147A1 Reflective mask blanc for euv lithography |
| 09/24/2008 | EP1971899A2 Photolithographic systems and methods for producing sub-diffraction-limited features |
| 09/24/2008 | EP1971898A2 Reflective-type mask blank for euv lithography |
| 09/24/2008 | EP1678075A4 Etch masks based on template-assembled nanoclusters |
| 09/24/2008 | CN201122229Y Light shield washing device |
| 09/24/2008 | CN101273302A Photomask and exposure method using same |
| 09/24/2008 | CN101271864A Photo mask and method for fabricating image sensor using the same |
| 09/24/2008 | CN101271825A Chip identification production method and light shield |
| 09/24/2008 | CN101271280A Lithography method for forming a circuit pattern |
| 09/24/2008 | CN101271279A Exposure method and photomask for manufacturing plane display device |