Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
10/2008
10/30/2008US20080268358 Single layered flexible, belt imaging members; a substrate, a photogenerating pigment, a charge transport component, a metal oxide with a chelating agent of tetrafluorodihydroxyanthraquinone
10/30/2008US20080268356 Supporting substrate, a charge transport layer, photogenerating layer of a polysilsesquioxane modified Type V hydroxygallium phthalocyanine; resistance to cracking, excellent wear resistance, compatibility with a number of toner
10/30/2008US20080268355 Method of fabricating color filter
10/30/2008US20080268353 Stencil mask having main and auxiliary strut and method of forming the same
10/30/2008US20080268352 Obtaining a flatness of a surfaces of a substrate when a mask pattern is formed; forming a conductive film on the another surface of the substrate; removing the conductive film selectively to form openings in the conductive film based on the flatness
10/30/2008US20080268351 Producing superposed layers on a substrate, each layer comprising areas of different materials, patterns in reverse on the substrate, 3D patterns, having height differences; producing a layer of the predetermined material on this multilayer stack; eliminating the substrate; support with features remain
10/30/2008US20080268350 Semiconductor structure
10/30/2008US20080267815 Projects pattern of exposing mask onto substrate with light through an optical element ; using cleaning light to clean contamination such as carbon attached to optical elements installed in projection optical system
10/30/2008US20080265425 Semiconductor Device and Method for Manufacturing the Same
10/30/2008US20080263793 Substrate treatment apparatus
10/30/2008DE102007040406A1 Halbleiterbauelement und Verfahren zu dessen Herstellung Semiconductor device and process for its preparation
10/29/2008EP1986221A1 Exposure method, exposure apparatus, photomask and photomask manufacturing method
10/29/2008EP1986220A1 Projection optical system, exposure device, exposure method, display manufacturing method, mask, and mask manufacturing method
10/29/2008EP1984862A2 Plasmon tomography
10/29/2008EP1718474A4 Combined ablation and exposure system and method
10/29/2008CN101295711A Semiconductor device and method for manufacturing the same
10/29/2008CN101295706A Test substrate, test substrate mask and test substrate forming method
10/29/2008CN101295705A Test substrate, test substrate mask and test substrate forming method
10/29/2008CN101295630A Substrate treatment apparatus
10/29/2008CN101295325A System, method, and computer-readable medium for performing data preparation for a mask design
10/29/2008CN101295138A Photomask haze reduction via ventilation
10/29/2008CN101295130A Light shield detecting method
10/29/2008CN101295129A Optical short distance amending method
10/29/2008CN101295128A Mask plate
10/29/2008CN100429743C Method of making a semiconductor device
10/28/2008US7444616 Method for error reduction in lithography
10/28/2008US7444614 Computer-readable recording medium storing semiconductor designing program for improving both integration and connection of via-contact and metal
10/28/2008US7443498 Method and apparatus for inspecting a mura defect, and method of manufacturing a photomask
10/28/2008US7443487 Exposure apparatus
10/28/2008US7442815 Homo- or copolymerizing 2,2,3,3,4,5-hexafluoro-2,3-dihydrofuran derivative or fluorinated 1,2-didehydrooxetane, or dihydropyran derivative; transmittance and durability against short wavelength light; photolithography using KrF excimer lasers; clarity, radiation transparent
10/28/2008US7442494 Method for forming alignment layer and method for manufacturing liquid crystal display device using the same
10/28/2008US7442473 Method for forming mask pattern of semiconductor device
10/28/2008US7442472 Methods of forming reticles
10/28/2008US7442316 Microcontact printing method using imprinted nanostructure and nanostructure thereof
10/23/2008US20080263483 Optical proximity correction method, optical proximity correction apparatus, and optical proximity correction program, method of manufacturing semiconductor device, design rule formulating method, and optical proximity correction condition calculating method
10/23/2008US20080261395 Semiconductor Device, Method for Manufacturing Semiconductor Devices and Mask Systems Used in the Manufacturing of Semiconductor Devices
10/23/2008US20080261129 Selective surface treatment method using block copolymer, black matrix and method of manufacturing the same, and nozzle plate and method of manufacturing the same
10/23/2008US20080261127 Photomask with detector for optimizing an integrated circuit production process and method of manufacturing an integrated circuit using the same
10/23/2008US20080261126 electrochromic film comprises tungsten oxide can be activated by electric signals to switch from being substantially opaque to substantially transparent and vice versa; prevents unauthorized use and copying of the photomask
10/23/2008US20080261125 Resist pattern and reflow technology
10/23/2008US20080261124 forming a photoresist pattern using a light shield layer over a semiconductor substrate; prevent the thinning of the isolated pattern; restrain the straying-in of light due to diffraction, the thinning of the resist pattern can be restrained more effectively
10/23/2008US20080261123 analyzing the monitored process parameter, and a data storage component; protective device against at unauthorized use and copying; detect optical radiation from a wafer exposure scanner; adjustment or alteration to the integrated circuit production steps
10/23/2008US20080261122 Photolithography mask with protective capping layer
10/23/2008US20080261121 photomask for the manufacture of integrated circuits, having a conformal protective chrome silicide capping layer on top surfaces and sidewalls of the first and second opaque regions; nondiffusion of underlying layers
10/23/2008US20080261120 Photolithography mask with integrally formed protective capping layer
10/23/2008US20080261119 Large-Size Glass Substrate For Photomask and Making Method, Computer-Readable Recording Medium, and Mother Glass Exposure Method
10/23/2008US20080261118 an unsaturate ester bicyclic cyclopropane derivatives as recording monomer and a thermosetting polyurethane resin; irradiation polymerization while recording information with laser; large storage capacity, high-sensitivity, ultrahigh-density recording, shrinkage inhibition; thick recording layer
10/23/2008US20080260235 System And Method Of Providing Mask Defect Printability Analysis
10/23/2008US20080260234 Pattern inspection apparatus, corrected image generation method, and computer-readable recording medium storing program
10/23/2008US20080259328 Reticle defect inspection apparatus and inspection method using thereof
10/23/2008US20080259323 Reticle defect inspection apparatus and reticle defect inspection method
10/23/2008US20080257779 Supporting Member For Thin-Film-Coated Boards, Storage Container For Thin-Film-Coated Boards, Mask-Blank-Storing Body, Transfer-Mask-Storing Body, and Method For Transporting Thin-Film-Coated Boards
10/23/2008DE112006003495T5 Maskenrohling und Maske Mask blank and mask
10/23/2008DE112006003221T5 Glassubstrat für eine Maskenvorform und Polierverfahren zur Herstellung desselben Of the same glass substrate for mask blank, and polishing method for producing
10/22/2008EP1983370A1 Pellicle for high numerical aperture exposure device
10/22/2008EP1981713A2 Method for selecting a format for a section to be printed
10/22/2008CN101290923A Test base, test base mask and forming method of test base
10/22/2008CN101290468A Mask preparation method
10/22/2008CN101290416A Contact window
10/22/2008CN101289000A Guard film module housing container and production method thereof
10/22/2008CN100428408C Electrostatic discharge protection method and structure for photomask
10/22/2008CN100428055C Photolithographic process, photomask and manufacturing thereof
10/22/2008CN100427994C Optical element, optical system, laser device, exposure device, mask testing device and high polymer crystal processing device
10/22/2008CN100427879C Corrugation flaw inspection mask, corrugation flaw inspection device and method and method for manufacturing photo mask
10/21/2008US7441226 Method, system, apparatus and program for programming defect data for evaluation of reticle inspection apparatus
10/21/2008US7440104 Exposure system, test mask for monitoring polarization, and method for monitoring polarization
10/21/2008US7440082 Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated eigen decomposition model
10/21/2008US7438998 Wiring pattern (mask layout) in the form of a line including angled portions with a local difference in line width is divided into rectangular patterns each having a large area and node portions interconnecting the rectangular patterns; high correction accuracy
10/21/2008US7438997 Imaging and devices in lithography
10/21/2008US7438996 Decreasing error of line width on coarse/dense pattern; adjusting numerical aperture and/or coherence factor
10/21/2008US7438995 Use of partially fluorinated polymers in applications requiring transparency in the ultraviolet and vacuum ultraviolet
10/16/2008WO2008122338A1 Apparatus and method for measuring the positions of marks on a mask
10/16/2008WO2008122335A2 Apparatus for measurement of substrates
10/16/2008US20080256504 Mask pattern design method and semiconductor manufacturing method and semiconductor design program
10/16/2008US20080256500 Integrated opc verification tool
10/16/2008US20080254383 Heat sensitive transfer image receiver sheet and heat sensitive transfer sheet on support; dye receiver layer; heat insulation layer containing hollow polymer particles and hydrophilic polymer
10/16/2008US20080254377 Metal photomask pod and filter device thereof
10/16/2008US20080254376 Using two separate exposure process; substrate with device pattern zone; multilayer; substrate, phase shift layer, masking and attenuation layer; etching
10/16/2008US20080254211 Filter window manufacturing method
10/16/2008US20080252868 Mask-less method and structure for patterning photosensitive material using optical fibers
10/16/2008US20080251951 Use of a dual tone resist to form photomasks and intermediate semiconductor device structures
10/16/2008US20080251100 Method for cleaning photo mask
10/16/2008DE102007034942A1 Vorrichtung zur Vermessung von Substraten Device for measurement of substrates
10/15/2008EP1980909A1 Improved method for etching photolithograhic substrates
10/15/2008CN201134423Y Load moving container and bearing structure applicable to the same
10/15/2008CN201134422Y Circular airflow structure of load moving container
10/15/2008CN201134421Y Structure of photo masked inflating cabinet
10/15/2008CN201134420Y System for keeping light shield clean
10/15/2008CN101286013A Method of forming a substrate for use in calibrating a metrology tool, calibration substrate and metrology tool calibration method
10/15/2008CN101286009A Phase-shifting mask and method of fabricating same
10/15/2008CN101286008A Mask layout measurement method
10/15/2008CN101286007A Manufacturing method of mask blank and manufacturing method of photomask
10/15/2008CN101286001A Focusing evaluation method
10/15/2008CN100426141C Electro-optic device, substrate for electro-optic device and method for manufacturing the same, photomask, and electronic device
10/15/2008CN100426140C Silicon-containing compositions for spin-on arc/hardmask materials
10/14/2008US7436555 Systems and methods for verifying scanning mode selection
10/14/2008US7436423 Apparatus and method of making a grayscale photo mask and an optical grayscale element
10/14/2008US7435609 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server
10/14/2008US7435533 Method of forming a semiconductor layer using a photomask reticle having multiple versions of the same mask pattern with different biases
10/14/2008US7435514 Active mask lithography
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