Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
11/2008
11/26/2008CN101313235A Color filter and photo mask used for manufacturing the same
11/26/2008CN101311825A Method for correcting optical adjacency effect
11/26/2008CN101311824A Photo mask pattern correction method
11/26/2008CN101311823A Optical close distance correction method, optical mask manufacture method and graphical method
11/26/2008CN101311822A Optical close distance correction method
11/26/2008CN101311821A Method for mending light shield graph with defect
11/26/2008CN101311792A Display substrate and its manufacture method and display device possessing the display substrate
11/26/2008CN100437903C Photomask, pattern formation method using photomask and mask data creation method
11/26/2008CN100437899C Device for reducing the impurity in the processing environment and its method
11/26/2008CN100437360C Pellicle frame and pellicle for photolithography using the same
11/26/2008CN100437353C Preparation method of nano mould in nano-seal technology
11/25/2008USRE40586 Reduced striae extreme ultra violet elements
11/25/2008US7458058 Verifying a process margin of a mask pattern using intermediate stage models
11/25/2008US7458057 Pattern correction method, pattern correction system, mask manufacturing method, semiconductor device manufacturing method, recording medium, and designed pattern
11/25/2008US7457034 High NA system for multiple mode imaging
11/25/2008US7456932 Filter window, lithographic projection apparatus, filter window manufacturing method, device manufacturing method and device manufactured thereby
11/25/2008US7455938 Methods of forming patterns in substrates
11/25/2008US7455937 Back-reflected light entering the reticles is prevented; quartz-containing substrate, an attenuating layer, and an antireflective structure between the attenuating layer and the quartz-containing substrate
11/25/2008US7455785 Method of determining a flatness of an electronic device substrate, method of producing the substrate, method of producing a mask blank, method of producing a transfer mask, polishing method, electronic device substrate, mask blank, transfer mask, and polishing apparatus
11/20/2008WO2008140585A1 Apparatus and method for conformal mask manufacturing
11/20/2008WO2008139904A1 Photomask blank and photomask
11/20/2008WO2008139848A1 Photomask substrate, photomask substrate forming member, photomask substrate manufacturing method, photomask, and exposure method using photomask
11/20/2008WO2008086494A3 Photomask inspection and verification by lithography image reconstruction using imaging pupil filters
11/20/2008WO2008011497A3 Optical diffusers, photomasks and their methods of fabrication
11/20/2008WO2007041602A3 Lithography verification using guard bands
11/20/2008US20080286665 Color filter and method for producing the same
11/20/2008US20080286664 Full Phase Shifting Mask In Damascene Process
11/20/2008US20080286663 includes transparent quartz substrate, and nano inorganic material-polymer complex layer formed on surface of mask layer to adsorb residual contamination source
11/20/2008US20080286662 Photomask producing method and photomask blank
11/20/2008US20080286661 Photomask, Photomask Fabrication Method, Pattern Formation Method Using the Photomask and Mask Data Creation Method
11/20/2008US20080286660 Damascene reticle and method of manufacture thereof
11/20/2008US20080286659 Extensions of Self-Assembled Structures to Increased Dimensions via a "Bootstrap" Self-Templating Method
11/20/2008US20080284996 Optical compensation devices, systems, and methods
11/20/2008US20080283892 Cylinder-Type Capacitor and Storage Device, and Method(s) for Fabricating the Same
11/20/2008DE102008022567A1 Verfahren zum Entwerfen einer Maske A method for designing a mask
11/19/2008EP1992988A1 Photomask, method for manufacturing such photomask and pattern forming method using such photomask
11/19/2008EP1720714B1 Lightweight offset plates, preparation and use thereof
11/19/2008EP0995148B1 Method for producing active or passive components on a polymer basis for integrated optical devices
11/19/2008CN101310221A Photomask, method for manufacturing such photomask and pattern forming method using such photomask
11/19/2008CN101310220A 掩模底板及光掩模 Mask plate and photomask
11/19/2008CN101308325A Manufacturing method of mask blank and manufacturing method of photomask
11/18/2008US7454051 Method of manufacturing photo mask, mask pattern shape evaluation apparatus, method of judging photo mask defect corrected portion, photo mask defect corrected portion judgment apparatus, and method of manufacturing a semiconductor device
11/18/2008US7453549 Reticle protection member, reticle carrying device, exposure device and method for carrying reticle
11/18/2008US7452637 protecting a photomask from particle defects by heating the photomask to initiate a thermophoretic force
11/13/2008WO2008137922A1 Computer-implemented methods, systems, and computer-readable media for determining a model for predicting printability of reticle features on a wafer
11/13/2008WO2008137920A1 Methods for detecting and classifying defects on a reticle
11/13/2008WO2008135810A2 Method and apparatus for designing an integrated circuit
11/13/2008WO2007115105B1 Method for making an improved thin film solar cell interconnect using etch and deposition processes
11/13/2008US20080282218 Method for Designing Mask
11/13/2008US20080280443 Exposure Mask And Method Of Forming A Contact Hole Of A Semiconductor Device Employing The Same
11/13/2008US20080280217 Patterning A Single Integrated Circuit Layer Using Multiple Masks And Multiple Masking Layers
11/13/2008US20080280216 Method of forming a hard mask pattern in a semiconductor device
11/13/2008US20080280215 Method of forming photomask of semiconductor device
11/13/2008US20080280214 Method for Fabricating Photo Mask
11/13/2008US20080280213 Method of fabricating a mask for a semiconductor device
11/13/2008US20080280212 Depositing a carbon layer on an optically transparent substrate having a chromium layer;depositing and patterning a photoresist layer on the carbon layer; etching the carbon layer through the photoresist layer to form a patterned hard mask; etching chromium using chlorine and carbon monoxide
11/13/2008US20080278700 Sub-resolution assist devices and methods
11/13/2008DE102004031079B4 Verfahren zur Herstellung einer Reflexionsmaske A method of manufacturing a reflection mask
11/12/2008CN101305323A Methods and systems for pattern generation based on multiple forms of design data
11/12/2008CN101305320A System and method for mask verification using an individual mask error model
11/12/2008CN101305319A Photomask and method for forming a non-orthogonal feature on the same
11/12/2008CN101304026A Layout method for mask, semiconductor device and method for manufacturing the same
11/12/2008CN101304025A Mask layout method, and semiconductor device and method for fabricating the same
11/12/2008CN101303521A Method for designing mask
11/12/2008CN101303520A Protective film assembly container
11/12/2008CN101303274A Contamination analyzing apparatus, its method, and reticle washing system using it
11/12/2008CN100433252C Apparatus for and method of processing substrate subjected to exposure process
11/12/2008CN100433025C Evaluation pattern generating method and computer program product
11/12/2008CN100432809C Gray mask and method for manufacturing gray mask
11/11/2008US7451429 Computer automated method for optimizing an integrated circuit pattern in a layout verification process
11/11/2008US7451068 Method and apparatus for generating an OPC segmentation based on modeled intensity gradients
11/11/2008US7450219 Reticle-carrying container
11/11/2008US7449691 Detecting apparatus and device manufacturing method
11/11/2008US7449689 Dimension measuring SEM system, method of evaluating shape of circuit pattern and a system for carrying out the method
11/11/2008US7449352 Mask and manufacturing method of a semiconductor device and a thin film transistor array panel using the mask
11/11/2008US7449285 For semiconductor integrated circuits; improved contrast; forming a small pattern under the same exposure conditions without depending on the shape and the density of the pattern
11/11/2008US7449264 Optical path includes an image plane, a reflective reticle mask that causes different shifts in locations at the image plane of best focus of features having different sizes or pitches, and a reflective surface including a spherical aberration to compensate for the shifts in the locations of best focus
11/06/2008US20080276216 Pattern forming method and system, and method of manufacturing a semiconductor device
11/06/2008US20080276215 Mask Pattern Designing Method Using Optical Proximity Correction in Optical Lithography, Designing Device, and Semiconductor Device Manufacturing Method Using the Same
11/06/2008US20080274568 Reticle and method of fabricating semiconductor device
11/06/2008US20080274417 Variable Mask Field Exposure
11/06/2008US20080274416 Layout Method for Mask
11/06/2008US20080274415 Layout Method for Mask
11/06/2008US20080274413 Forming sublithographic nanoscale microchannels using aqueous emulsion of gel forming polymer; etching mask on substrate
11/06/2008US20080273257 Color filter substrate and method of manufacturing the same
11/06/2008US20080273185 Optical System, Exposing Apparatus and Exposing Method
11/06/2008US20080271752 Cleaning method, particle removing method, cleaning apparatus, and cleaning liquid
11/06/2008DE102007043097A1 Ein Layout-Verfahren für eine Maske A layout method for a mask
11/06/2008DE102006004230B4 Verfahren zur Herstellung einer Maske für die lithografische Projektion eines Musters auf ein Substrat A method of making a mask for the lithographic projection of a pattern on a substrate
11/05/2008EP1987395A1 Method for structuring the surface of a pressed sheet or an endless strip
11/05/2008CN101299129A Layout method for mask
11/04/2008US7448018 System and method for employing patterning process statistics for ground rules waivers and optimization
11/04/2008US7446852 Projection exposure mask acceptance decision system, projection exposure mask acceptance decision method, method for manufacturing semiconductor device, and computer program project
11/04/2008US7445875 Mask blank and mask for electron beam exposure
10/2008
10/30/2008WO2008129914A1 Euv mask blank
10/30/2008WO2008129908A1 Reflective mask blank for euv lithography
10/30/2008WO2006060562A3 Method for designing an overlay mark
10/30/2008US20080268378 Method for manufacturing lens forming master and method for manufacturing thin film transistor substrate using the same
10/30/2008US20080268360 Single layered flexible, belt imaging members; a substrate, a photogenerating pigment, a charge transport component, a metal oxide with a chelating agent of tetrafluorodihydroxyanthraquinone
10/30/2008US20080268359 Single layered photoconductors
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