| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 12/18/2008 | US20080311486 Photomask manufacturing method and semiconductor device manufacturing method |
| 12/18/2008 | US20080311485 Photomasks Used to Fabricate Integrated Circuitry, Finished-Construction Binary Photomasks Used to Fabricate Integrated Circuitry, Methods of Forming Photomasks, and Methods of Photolithographically Patterning Substrates |
| 12/18/2008 | US20080309897 Multivariable solver for optical proximity correction |
| 12/18/2008 | US20080309857 Method of adjusting photonic bandgap of photonic crystal, method of manufacturing reflective color filter using the same, and display device including the reflective color filter |
| 12/18/2008 | US20080308900 Electrical fuse with sublithographic dimension |
| 12/18/2008 | DE102007026878A1 Reflection mask's imaging characteristics correcting method, involves changing optical characteristics of reflection mask such that deviations between measured optical characteristics are location-dependently reduced |
| 12/18/2008 | DE102005063469B4 Verfahren zum Untersuchen einer Lithographiemaske sowie Verwendung einer zugehörigen Vorrichtung A method for inspecting a lithography mask and use an associated device |
| 12/17/2008 | EP2003507A1 Scanning exposure apparatus, micro device manufacturing method, mask, projection optical apparatus and mask manufacturing method |
| 12/17/2008 | EP2003498A2 Photomask, method for manufacturing such photomask, pattern forming method using such photomask and mask data creating method |
| 12/17/2008 | CN201166781Y In situ detection system for image difference of photo-etching machine projection objective |
| 12/17/2008 | CN101324750A Light mask for liquid crystal display device and method for making colour filter using the same |
| 12/16/2008 | US7467072 Simulation of objects in imaging using edge domain decomposition |
| 12/16/2008 | US7466854 Size checking method and apparatus |
| 12/16/2008 | US7466413 Marker structure, mask pattern, alignment method and lithographic method and apparatus |
| 12/16/2008 | US7466405 Pattern inspection method, pattern inspection system and pattern inspection program of photomask |
| 12/16/2008 | US7465524 Photomask and method of controlling transmittance and phase of light using the photomask |
| 12/16/2008 | US7465523 stress control layer that suppress stress and cancels a stress change of the thin film layer generated in production processes of a mask; producing photoresists with high position accuracy; lithography for producing a semiconductor |
| 12/16/2008 | US7465522 Photolithographic mask having half tone main features and perpendicular half tone assist features |
| 12/11/2008 | WO2008151185A1 Methods for performing model-based lithography guided layout design |
| 12/11/2008 | WO2008149864A1 Method of polishing glass substrate |
| 12/11/2008 | WO2008149756A1 Exposure method, method of manufacturing plate for flat panel display, and exposure apparatus |
| 12/11/2008 | WO2005076078A3 Mask for use in a microlithographic projection exposure system |
| 12/11/2008 | US20080305441 Hardmask composition having antirelective properties and method of patterning material on susbstrate using the same |
| 12/11/2008 | US20080305436 Plate cutting |
| 12/11/2008 | US20080305413 Covering with a photoresist mask most but not all of a quartz base coated with a phase shifting material coated with chromium; thinning exposed chromium; removing the first mask; forming second thinner photomask patterned over thinned Cr area; transferring pattern from the second mask to main-field area |
| 12/11/2008 | US20080305412 Near-field exposure mask and near-field exposure method |
| 12/11/2008 | US20080305411 Photomask blank, resist pattern forming process, and photomask preparation process |
| 12/11/2008 | US20080305410 Imprinting device, method of fabricating the same. and method of patterning thin film using the same |
| 12/11/2008 | US20080305409 Lithographic mask and method for printing features using the mask |
| 12/11/2008 | US20080305408 Aperture mask, manufacturing method thereof, charge beam lithography apparatus, and charge beam lithography method |
| 12/11/2008 | US20080305407 film comprising carrier sheet having transparent layer comprising fluoroelastomer, intermediate layer of poly(vinyl alcohol), barrier layer of poly(cyanoacrylate) and infrared radiation absorbing dye, imageable layer comprising dye and UV-absorbing colorant dispersed in polyurethane binder, and overcoat |
| 12/11/2008 | US20080305406 Photomask Blank, Photomask Manufacturing Method and Semiconductor Device Manufacturing Method |
| 12/11/2008 | US20080304767 Image Processing Method, Image Processor, Drawing System, and Program |
| 12/11/2008 | US20080302979 Working Method by Focused Ion Beam and Focused Ion Beam Working Apparatus |
| 12/11/2008 | US20080302963 Sheet beam-type testing apparatus |
| 12/11/2008 | US20080302390 Cleaning a Mask Substrate |
| 12/11/2008 | DE19942484B4 Verfahren zum Anzeigen, Prüfen und Abwandeln von Mustern für eine Belichtung A method for displaying, testing and modifying patterns for exposure |
| 12/11/2008 | DE10238560B4 Verfahren zur Verbesserung der Abbildungsqualität beim Erfassen von Defekten in Leitungsmustern einer Photomaske sowie Photomaske A method of improving the picture quality when detecting defects in wiring patterns of a photomask and photomask |
| 12/11/2008 | DE102007028172B3 EUV-Maske und Verfahren zur Reparatur einer EUV-Maske EUV mask and method of repairing an EUV mask |
| 12/11/2008 | DE102004030961B4 Verfahren zum Bestimmen einer Matrix von Transmissionskreuzkoeffizienten bei einer optischen Näherungskorrektur von Maskenlayouts A method for determining a matrix of the transmission cross coefficient in an optical proximity correction mask layout |
| 12/10/2008 | EP2001040A2 Machine for removing surfaces of semiconductors and particularly surfaces with integrated circuits |
| 12/10/2008 | EP2000851A1 Photomask blank, resist pattern forming process, and photomask preparation process |
| 12/10/2008 | EP1999512A2 Methods for repairing an alternating phase-shift mask |
| 12/10/2008 | EP1555572B1 Photosensitive resin printing plate original, process for producing the same and process for producing resin relief printing plate therewith |
| 12/10/2008 | CN101322072A Photomask, method for manufacturing such photomask, pattern forming method using such photomask and mask data creating method |
| 12/10/2008 | CN101321727A 肟酯光敏引发剂 Oxime ester photoinitiator |
| 12/10/2008 | CN101320219A Field measurement method and device for optical aberration of imaging optical system |
| 12/10/2008 | CN101320205A Method for producing outer casing of electronic product |
| 12/10/2008 | CN101320203A Mold |
| 12/10/2008 | CN101319314A Thin-layer metal membrane material and method of producing the same |
| 12/10/2008 | CN100442475C Method and structure for manufacturing halftone mask for semiconductor wafer |
| 12/09/2008 | US7463765 System and method for detecting and reporting fabrication defects using a multi-variant image analysis |
| 12/09/2008 | US7463352 Method and apparatus for article inspection including speckle reduction |
| 12/09/2008 | US7463347 Simulator of optical intensity distribution, computer implemented method for simulating the optical intensity distribution, method for collecting mask pattern, and computer program product for the simulator |
| 12/09/2008 | US7463173 Charged particle beam apparatus, abnormality detecting method for DA converter unit, charged particle beam writing method, and mask |
| 12/09/2008 | US7462548 Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured thereby |
| 12/09/2008 | US7462428 Masks dividing patterns of a certain section and placing the parts on a plurality of masks or on different areas of the same mask and able to form the patterns of that section as before division by overlaying the masks or different areas |
| 12/09/2008 | US7462426 Method for producing a phase mask |
| 12/09/2008 | US7461472 Half-tone phase shift mask and patterning method using thereof |
| 12/04/2008 | US20080301622 Method of determining defects in photomask |
| 12/04/2008 | US20080301621 Mask pattern correcting method |
| 12/04/2008 | US20080301620 System and method for model-based sub-resolution assist feature generation |
| 12/04/2008 | US20080299468 Shadow mask and method of fabricating vertically tapered structure using the shadow mask |
| 12/04/2008 | US20080299467 Mask mold, manufacturing method thereof, and method for forming large-sized micro pattern using mask mold |
| 12/04/2008 | US20080299466 Alternative phase-shifting mask and manufacturing method thereof |
| 12/04/2008 | US20080299465 Frequency tripling using spacer mask having interposed regions |
| 12/04/2008 | US20080297779 Inspection device and inspection method |
| 12/04/2008 | US20080297756 Transverse electric-field type liquid crystal display device, process of manufacturing the same, and scan-exposing device |
| 12/04/2008 | US20080297752 Focus sensitive lithographic apparatus, systems, and methods |
| 12/04/2008 | US20080296665 Mask for manufacturing tft, tft, and manufacturing thereof |
| 12/04/2008 | DE102005002529B4 Verfahren zum Erzeugen eines Abbildungsfehler vermeidenden Maskenlayouts für eine Maske A method for generating a mapping error-avoiding mask layout for a mask |
| 12/03/2008 | EP1998362A2 Frequency Tripling Using Spacer Mask Having Interposed Regions |
| 12/03/2008 | CN101315518A Photomask testing method, photomask manufacture method, electronic component manufacture method, testing mask and testing mask set |
| 12/03/2008 | CN101315517A Mask plate of image element groove section and thin-film transistor using the same |
| 12/03/2008 | CN101315516A Alternative phase-shifting mask and manufacturing method thereof |
| 12/03/2008 | CN101315515A Frequency tripling using spacer mask having interposed regions |
| 12/03/2008 | CN101315514A Mask plate and matching method of photo-etching machine nesting precision using mask plate |
| 12/03/2008 | CN100440430C Method for producing alternating phase-shift mask |
| 12/03/2008 | CN100440038C Half-tone type phase shift mask blank, half-tone type phase shift mask and process for producing same |
| 12/02/2008 | US7460962 Method for an automatic optical measuring of an OPC structure |
| 12/02/2008 | US7460212 Collector configured of mirror shells |
| 12/02/2008 | US7460209 Advanced mask patterning with patterning layer |
| 12/02/2008 | US7459265 Pattern forming method, semiconductor device manufacturing method and exposure mask set |
| 12/02/2008 | US7459246 Method for manufacturing a semiconductor device, stencil mask and method for manufacturing a the same |
| 12/02/2008 | US7459244 Mask, method for forming a pattern, and method for evaluating pattern line width |
| 12/02/2008 | US7459243 A before-correction pattern edge defining step, a deviated position setting step, an edge selecting step, a correcting step, after-correction pattern edge defining step |
| 12/02/2008 | US7459242 Method and system for repairing defected photomasks |
| 11/27/2008 | WO2008144138A2 Reticles, and methods of treating reticles, configuring reticles and using reticles |
| 11/27/2008 | WO2008142916A1 Measuring system, measuring method and program |
| 11/27/2008 | US20080295060 Method for Forming a Semiconductor Device Using Optical Proximity Correction for the Optical Lithography |
| 11/27/2008 | US20080295049 Pattern designing method, pattern designing program and pattern designing apparatus |
| 11/27/2008 | US20080292992 Writing pattern; data processing; etching masking film; removal segments of photoresists; generating method comprising correcting a first pattern data in accordance with a difference between first film pattern and second mask pattern and difference between first resist pattern and first mask pattern |
| 11/27/2008 | US20080292976 Pattern forming method, pattern formed thereby, mold, processing apparatus, and processing method |
| 11/27/2008 | US20080292975 Device manufacturing method, method of making a mask, and mask |
| 11/27/2008 | US20080292973 Method for etching using a multi-layer mask |
| 11/27/2008 | US20080292892 Manufacturing method of metal structure in multi-layer substrate and structure thereof |
| 11/27/2008 | US20080292535 small refractive index differences and few small angle grain boundaries have a bi-directional scattering distribution function value (BSDF) of less than 1.5*10-6 or 5*10-7. |
| 11/27/2008 | US20080289365 Method for manufacturing glass-ceramics |
| 11/26/2008 | CN201156532Y Storage apparatus for storing semi-conductor component |
| 11/26/2008 | CN201156161Y Light shield clip |