| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 01/15/2009 | US20090017257 Processing method of glass substrate, and highly flat and highly smooth glass substrate |
| 01/15/2009 | US20090016596 Removal of relatively unimportant shapes from a set of shapes |
| 01/15/2009 | US20090015957 Color filter and photomask to be employed for the manufacture of color filter |
| 01/15/2009 | US20090015765 Ink for use in a color filter, color filter, method of manufacturing a color filter, image display apparatus, electronic apparatus |
| 01/15/2009 | US20090014788 Semiconductor device and method for manufacturing the same |
| 01/15/2009 | DE102007033243A1 Verfahren und Anordnung zur Analyse einer Gruppe von Photolithographiemasken Method and apparatus for analyzing a group of photolithography masks |
| 01/15/2009 | DE102007032958A1 Verfahren zur Ermittlung lithographisch relevanter Maskendefekte Method for determining lithographically relevant mask defects |
| 01/14/2009 | EP2015139A1 Reflective photomask blank, process for producing the same, reflective photomask and process for producing semiconductor device |
| 01/14/2009 | CN201182036Y 气体注入喷嘴 Gas injection nozzle |
| 01/14/2009 | CN101346665A Surface-protective film |
| 01/14/2009 | CN101346664A Mask blank and photomask |
| 01/14/2009 | CN101344732A Maskless lithography systems and methods utilizing spatial light modulator arrays |
| 01/14/2009 | CN101344720A Gray level mask, defect correcting method, manufacturing method and design transfer method |
| 01/14/2009 | CN101344719A Fehling light shield repair glue and repair method |
| 01/14/2009 | CN101344718A Light shield mending method |
| 01/14/2009 | CN101344717A Light shield repair glue |
| 01/14/2009 | CN101344716A Halftone mask, manufacturing method and active matrix type display apparatus |
| 01/14/2009 | CN101344715A Photomask detection method and on-line immediate photomask detection method |
| 01/14/2009 | CN100452057C System and method for lithography simulation |
| 01/14/2009 | CN100451841C Method of producing semiconductor integrated circuit device and method of producing multi-chip module |
| 01/14/2009 | CN100451839C Alignment method of exposure mask and manufacturing method of thin film element substrate |
| 01/13/2009 | US7477406 Photomask evaluation method and manufacturing method of semiconductor device |
| 01/13/2009 | US7477405 Method and system for measuring patterned structures |
| 01/13/2009 | US7477357 Exposure apparatus and device manufacturing method |
| 01/13/2009 | US7476475 Transmission region and a semi-transmission region having first opening pattern and second patern with openings that form a desired shape through which less than all of the laser beam is transmitted; since the line width of silicon crystal grains is larger, the overlap between lines is improved |
| 01/13/2009 | US7476474 Method for making a photomask assembly incorporating a porous frame |
| 01/13/2009 | US7476473 Process control method, a method for forming monitor marks, a mask for process control, and a semiconductor device manufacturing method |
| 01/13/2009 | US7476472 Providing a shift feature to an end of a strip pattern in the main pattern. so that a critical dimension at the end of the strip pattern is smaller than 0.255 microns; optical phase difference between the mask substrate and the shift feature is 60 -100 degrees; optical transmission is 60%-100%. |
| 01/13/2009 | US7476471 Based on extreme ultraviolet radiation energies; lithography; semiconductors |
| 01/13/2009 | US7476470 Method for manufacturing thin film semiconductor device and method for forming resist pattern thereof |
| 01/08/2009 | WO2009005581A1 Multi-layer masking film |
| 01/08/2009 | WO2009004852A1 Method for removing foreign matter from glass substrate surface and method for processing glass substrate surface |
| 01/08/2009 | US20090011343 Microstructure and manufacturing method thereof |
| 01/08/2009 | US20090011342 Determining minimum resolvable pitch of spaced, adjacent line elements, wherein each of the line elements are separately resolvable when projected by the lithographic imaging system, and selecting a process monitor grating period; designing a process monitor grating pattern; sensitivity to dose and focus |
| 01/08/2009 | US20090011341 Reflective mask blank for euv lithography |
| 01/08/2009 | US20090009775 Reticle, apparatus for monitoring optical system, method for monitoring optical system, and method for manufacturing reticle |
| 01/08/2009 | US20090009737 Lithography Mask, Rewritable Mask, Process for Manufacturing a Mask, Device for Processing a Substrate, Lithographic System and a Semiconductor Device |
| 01/08/2009 | US20090007939 Method of cleaning storage case |
| 01/07/2009 | EP2010963A1 Reflective mask blank for euv lithography |
| 01/07/2009 | EP1954472A4 Technique for separating a mold from solidified imprinting material |
| 01/07/2009 | CN201177730Y Technical processing cabin of photo mask cleaning machine |
| 01/07/2009 | CN101339362A Fault correcting method for gray tone mask, gray tone mask and manufacturing method thereof |
| 01/07/2009 | CN101339361A Frequency doubling using spacer mask |
| 01/07/2009 | CN101339360A Pattern defect inspecting method, and pattern defect inspecting device |
| 01/07/2009 | CN101338416A Shading member, manufacturing method thereof, film and photo mask using the member |
| 01/06/2009 | US7475383 Method of fabricating photo mask |
| 01/06/2009 | US7475380 Generating mask patterns for alternating phase-shift mask lithography |
| 01/06/2009 | US7475379 Methods and systems for layout and routing using alternating aperture phase shift masks |
| 01/06/2009 | US7473518 Method of manufacturing a device using a near-field photomask and near-field light |
| 01/06/2009 | US7473501 Method for reducing photo-mask distortion |
| 01/06/2009 | US7473500 Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same |
| 01/06/2009 | US7473498 Mask and method of manufacturing a poly-silicon layer using the same |
| 01/06/2009 | US7473497 Phase shifting mask for manufacturing semiconductor device and method of fabricating the same |
| 01/06/2009 | US7473496 Covering a metal (chromium) mask with a layer of carbon (focused ion beam), covering entire mask with a photoresist, etching away portions of the resist to expose the defect, etching away the defect while the carbon layer protects the adjacent areas, and removing remaining carbon and photoresist |
| 01/06/2009 | US7473495 Computer program product configured to store program instructions for execution on a computer system enabling the computer system to perform: inputting a step and managing the step |
| 01/06/2009 | US7473494 Exposure mask and mask pattern production method |
| 01/01/2009 | US20090007030 Design-based monitoring |
| 01/01/2009 | US20090004578 Radiation-sensitive composition for forming color filter for solid-state image sensing device, color filter, and solid-state image sensing device |
| 01/01/2009 | US20090004577 Mask for semiconductor device and manufacturing method thereof |
| 01/01/2009 | US20090004576 Photomask and method for forming a resist pattern |
| 01/01/2009 | US20090004575 Exposure mask with double patterning technology and method for fabricating semiconductor device using the same |
| 01/01/2009 | US20090004574 Method for fabricating photomask |
| 01/01/2009 | US20090004573 System and method for making photomasks |
| 01/01/2009 | US20090004572 Method of monitoring focus in lithographic processes |
| 01/01/2009 | US20090004419 Multi-layer masking film |
| 12/31/2008 | WO2009001834A1 Optical characteristic measurement method, optical characteristic adjusting method, exposure device, exposure method, and exposure device manufacturing method |
| 12/31/2008 | EP2007691A1 Processing method of glass substrate, and highly flat and highly smooth glass substrate |
| 12/31/2008 | EP1953117A4 Scanning jet nanolithograph and the operation method thereof |
| 12/31/2008 | EP1556737B1 Methods for fabrication of nanometer-scale engineered structures for mask repair application |
| 12/31/2008 | CN101336394A Reflective photomask blank, process for producing the same, reflective photomask and process for producing semiconductor device |
| 12/31/2008 | CN101334586A Method of manufacturing mask for semiconductor device |
| 12/31/2008 | CN100447673C Method for aligning exposure mask and method for manufacturing thin film device substrate |
| 12/30/2008 | US7470490 vinyl acetate-vinyl chloride copolymers or polyurethane layers containing carbon black nanoparticles, that is impervious to ultraviolet light and exhibits excellent wear resistance and bonding strength to substrate films, used for preparation of flexographic printing plate |
| 12/30/2008 | US7470489 Method for designing alternating phase shift masks |
| 12/25/2008 | US20080320434 Photomask management method and photomask wash limit generating method |
| 12/25/2008 | US20080318140 Reflective mask blank for euv lithography and substrate with functional film for the same |
| 12/25/2008 | US20080318139 Mask Blank, Photomask and Method of Manufacturing a Photomask |
| 12/25/2008 | US20080318138 EUV Mask and Method for Repairing an EUV Mask |
| 12/25/2008 | US20080318137 Lithography masks for improved line-end patterning |
| 12/25/2008 | US20080315365 Method for designing dummy pattern, exposure mask, semiconductor device, method for manufacturing semiconductor device, and storage medium |
| 12/25/2008 | US20080315323 photomask; capable of controlling a line width of an outermost line pattern with different sizes; patterning and transferring the layout on a wafer |
| 12/25/2008 | US20080315192 Integrated Circuit Comprising an Organic Semiconductor, and Method for the Production of an Integrated Circuit |
| 12/25/2008 | US20080315092 Scanning probe microscopy inspection and modification system |
| 12/24/2008 | WO2008156750A1 Solvent-assisted layer formation for imprint lithography |
| 12/24/2008 | WO2008155951A2 Synthetic quartz glass body, process for producing the same, optical element, and optical apparatus |
| 12/24/2008 | EP2005245A1 Extreme ultra-violet photolithography mask, with resonant barrier layer |
| 12/24/2008 | DE102007028800A1 Maskensubstrat, Photomaske und Verfahren zur Herstellung einer Photomaske Mask substrate, photomask and method for producing a photomask |
| 12/24/2008 | CN101331431A Improved method for etching photolithograhic substrates |
| 12/24/2008 | CN101329506A Optical close distance correcting method, photo mask making method and graphic method |
| 12/24/2008 | CN101329505A Layout for reducing aberration sensitiveness, light shield manufacture and graphic method |
| 12/24/2008 | CN100446011C Method for generating pattern, method for manufacturing and control semiconductor device, and semiconductor device |
| 12/24/2008 | CN100445870C System and method for processing masks with oblique features |
| 12/23/2008 | US7468240 Pattern exposure with oblique incidence illumination using a photomask having a light-shielding pattern formed from a film region and phase shift region having a phase difference with respect to a light-transmitting region of the substrate which has no light-shielding pattern |
| 12/23/2008 | US7468239 Photomask for semi-transmission film is formed in one step process; large-scale |
| 12/23/2008 | US7468141 Method for decorating die surface as well as die |
| 12/18/2008 | WO2008154108A1 Photomasks used to fabricate integrated circuitry, finished-construction binary photomasks used to fabricate integrated circuitry, methods of forming photomasks, and methods of photolithographically patterning substrates |
| 12/18/2008 | WO2008153850A1 Mask film to form relief images and method of use |
| 12/18/2008 | WO2008152883A1 Method of polishing glass substrate |
| 12/18/2008 | US20080311488 Color Photoresist with Gold Nanoparticles and Color Filters Made Thereby |
| 12/18/2008 | US20080311487 Glass substrate for mask blank and method of polishing for producing the same |