| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 02/11/2009 | CN101364559A Structure of photo masked inflating cabinet |
| 02/11/2009 | CN101364558A Cycling airflow structure of load moving container |
| 02/11/2009 | CN101364557A Load moving container and bearing structure applicable to the same |
| 02/11/2009 | CN101364556A Containing chamber structure for transfer container |
| 02/11/2009 | CN101364555A Load moving container and conductive structure applicable to the load moving container |
| 02/11/2009 | CN101364047A Method for detecting light intensity distribution of gradient filter and method for enhancing consistency of line width |
| 02/11/2009 | CN101364044A Minuteness processing method for upper substrate of glass |
| 02/11/2009 | CN101364042A Substrate and mask blank substrate for manufacturing mask blank substrate and mask manufacturing method |
| 02/11/2009 | CN101364041A Method and equipment for wiping and cleaning light shield |
| 02/11/2009 | CN101364040A System for make light shield remaining clean |
| 02/10/2009 | US7488560 enables the pellicle to be removed from an exposure master plate without using a solvent, etc. and without being accompanied by cohesive failure in a pressure-sensitive adhesive |
| 02/05/2009 | US20090037852 Pattern data generation method and pattern data generation program |
| 02/05/2009 | US20090035880 Maunfacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server |
| 02/05/2009 | US20090035667 Method for correcting mask |
| 02/05/2009 | US20090035666 Container for housing a mask blank, method of housing a mask blank, and mask blank package |
| 02/05/2009 | US20090035518 Liquid crystal display panel, color filter and manufacturing method thereof |
| 02/05/2009 | US20090035497 Storage container for photomask-forming synthetic quartz glass substrate |
| 02/05/2009 | US20090034827 Inspection device, inspection method, method of manufacturing color filter, and computer-readable storage medium containing inspection device control program |
| 02/05/2009 | US20090033948 Method of Measuring Shot Shape and Mask |
| 02/05/2009 | US20090033844 Method of producing fine particles of anthraquinone structure-containing pigment, fine particles of anthraquinone structure-containing pigment produced thereby, colored pigment dispersion composition therewith, colored photosensitive resin composition therewith and photosensitive resin transfer material therewith, and color filter and liquid crystal display device using the same |
| 02/05/2009 | US20090033353 Systems and methods for electrical characterization of inter-layer alignment |
| 02/05/2009 | US20090032490 Method of fabricating color filter |
| 02/05/2009 | DE102007049923A1 Photomasken-Layoutmuster Photomask layout pattern |
| 02/04/2009 | EP2020682A1 Storage container for photomask-forming synthetic quartz glass substrate |
| 02/04/2009 | CN101359690A TFT construction and grey level masking plate construction |
| 02/04/2009 | CN101359170A Multivariable solver for optical proximity correction |
| 02/04/2009 | CN101359169A Method for correcting mask pattern |
| 02/04/2009 | CN101359168A Methof for producing graytone mask and graytone mask |
| 02/04/2009 | CN101359167A Mask plate and forming method of the mask plate |
| 02/04/2009 | CN100459039C Shot shape measuring method and mask |
| 02/03/2009 | US7486814 Local bias map using line width measurements |
| 02/03/2009 | US7485856 Scanning probe microscopy inspection and modification system |
| 02/03/2009 | US7485690 Sacrificial film-forming composition, patterning process, sacrificial film and removal method |
| 02/03/2009 | US7485593 8 to 10% by weight of titania and 90 to 92% by weight of silica; photomask in an extreme ultraviolet ray lithography manufacturing process for a semiconductor, a liquid crystal |
| 02/03/2009 | US7485396 Optical proximity correction; modifying mask layout to include scattering bars |
| 01/29/2009 | US20090031262 Mask pattern formation method, mask pattern formation apparatus, and lithography mask |
| 01/29/2009 | US20090029271 Container for housing a mask blank, method of housing a mask blank, and mask blank package |
| 01/29/2009 | US20090029270 Projection exposure device and method of separate exposure |
| 01/29/2009 | US20090029269 Lithographic pellicle |
| 01/29/2009 | US20090029267 Photomask layout pattern |
| 01/29/2009 | US20090028420 Photomask defect-shape recognition apparatus, photomask defect-shape recognition method, and photomask defect correction method |
| 01/29/2009 | US20090027664 Defect inspection apparatus and its method |
| 01/29/2009 | US20090027650 Original plate data generation method, original plate generation method, exposure method, device manufacturing method, and computer-readable storage medium for generating original plate data |
| 01/29/2009 | DE102007035387A1 Verfahren und Vorrichtung zur Herstellung von strukturierten optischen Materialien Method and apparatus for the production of structured optical materials |
| 01/28/2009 | EP2019332A1 Photomask data generation method, photomask generation method, exposure method, and device manufacturing method |
| 01/28/2009 | EP2018597A1 Process for immersion exposure of a substrate |
| 01/28/2009 | EP2018596A2 Colored masking for forming transparent structures |
| 01/28/2009 | CN201188170Y Clamper for photolithography edition |
| 01/28/2009 | CN101355057A Isolating ring substrate, mask plate and forming method thereof |
| 01/28/2009 | CN101355023A Manufacturing method of semiconductor device |
| 01/28/2009 | CN101355015A Method for fabricating photoresist pattern |
| 01/28/2009 | CN101354530A Contraposition scale on mask and method for affirming shield part position using the same |
| 01/28/2009 | CN101354529A Photomask data generation method, photomask generation method, exposure method, and device manufacturing method |
| 01/28/2009 | CN101354528A Mask and related photo-etching method |
| 01/28/2009 | CN101354527A Photomask protective film system and method for manufacturing integrated circuit |
| 01/27/2009 | US7483123 Substrate conveyor apparatus, substrate conveyance method and exposure apparatus |
| 01/27/2009 | US7482661 Pattern forming method and semiconductor device manufactured by using said pattern forming method |
| 01/27/2009 | US7482102 Monitoring pattern configured to obtain information required for adjusting optical system; asymmetrical diffraction grating generates positive first order diffracted light and negative first order diffracted light; probing phase shifters |
| 01/27/2009 | US7481880 Mask and method for crystallizing amorphous silicon |
| 01/22/2009 | WO2009010214A1 Method for determining lithographically relevant mask defects |
| 01/22/2009 | US20090024968 Method of designing semiconductor integrated circuit and mask data generation program |
| 01/22/2009 | US20090023085 Photosensitive Compositions, Curable Compositions, Novel Compounds, Photopolymerizable Compositions, Color Filters, and Planographic Printing Plate Precursors |
| 01/22/2009 | US20090023084 Photosensitive resin composition and color filter |
| 01/22/2009 | US20090023083 fabrication of dual damascene structures using imprint lithographic techniques; fabrication of dual damascene relief structures in imprint lithography molds |
| 01/22/2009 | US20090023082 Pellicle frame |
| 01/22/2009 | US20090023081 exposure method of illuminating a mask with polarized light and projecting an image of a pattern of the mask onto a substrate so as to expose the substrate |
| 01/22/2009 | US20090023079 Photomask and Method of Forming Overlay Vernier of Semiconductor Device Using the Same |
| 01/22/2009 | US20090023078 Lithography Masks and Methods of Manufacture Thereof |
| 01/22/2009 | US20090021712 Projection optical system, exposure apparatus, exposure method, display manufacturing method, mask, and mask manufacturing method |
| 01/22/2009 | US20090021711 Method of inspecting exposure system and exposure system |
| 01/22/2009 | US20090020137 Cleaning apparatus and method, exposure apparatus having the cleaning apparatus, and device manufacturing method |
| 01/22/2009 | DE102005047475B4 Verfahren zum Herstellen eines Maskensatzes und Maskensatz zum Definieren eines Musters A method of producing a set of masks and mask set to define a pattern |
| 01/21/2009 | EP2017673A1 Pellicle frame |
| 01/21/2009 | EP2017672A2 Pellicle frame |
| 01/21/2009 | EP2017671A1 Lithographic pellicle |
| 01/21/2009 | EP2017670A1 Phase shift mask |
| 01/21/2009 | EP1307513B1 Modified pigment products, dispersions thereof, and compositions comprising the same |
| 01/21/2009 | CN101349875A Pellicle frame |
| 01/21/2009 | CN101349874A Pellicle frame |
| 01/21/2009 | CN101349873A Lithographic pellicle |
| 01/21/2009 | CN101349864A Photomask, manufacturing method thereof and pattern transfer printing method |
| 01/21/2009 | CN101349863A Method for correcting optical approach effect of polygon rim dynamic cutting by configuration sampling |
| 01/21/2009 | CN101349862A Method for calibrating optical approach correcting model based on multi-photoresist active diffusion length |
| 01/21/2009 | CN101349861A Method of smoothing regulation type optical approach correcting light mask pattern |
| 01/21/2009 | CN101349860A Photo-etching mask plate for Damascus process |
| 01/21/2009 | CN100454511C Apparatus and method of inspecting mura-defect and method of fabricating photomask |
| 01/21/2009 | CN100454485C Reflective photomask blank, reflective photomask, and method for manufacturing semiconductor device using same |
| 01/20/2009 | US7480890 Method for correcting and configuring optical mask pattern |
| 01/20/2009 | US7479366 Mixture of photomasks; controlling incline of pattern; lithography; phase shifting; removal of mask by etching |
| 01/20/2009 | US7479365 Semiconductor device manufacturing method |
| 01/20/2009 | US7479355 For use in patterning underlying layer comprising opaque regions and transparent regions with slit extending laterally through the end of the line |
| 01/20/2009 | US7479233 Mask blank for charged particle beam exposure, method of forming mask blank and mask for charged particle beam exposure |
| 01/20/2009 | US7478454 Manipulating device for photomasks that provides possibilities for cleaning and inspection of photomasks |
| 01/20/2009 | CA2387606C Laser imaged printing plates comprising a multi-layer slip film |
| 01/15/2009 | WO2009008294A1 Frame of large pellicle and grasping method of frame |
| 01/15/2009 | WO2009007931A1 Wafer, reticle and method for manufacturing integrated circuits on a wafer |
| 01/15/2009 | WO2009007128A1 Method and apparatus for analyzing a group of photolithographic masks |
| 01/15/2009 | US20090019418 Lithography simulation method, mask pattern preparation method, semiconductor device manufacturing method and recording medium |
| 01/15/2009 | US20090017388 Substrate structure for color filter and color filter having the same |
| 01/15/2009 | US20090017387 Reflective mask blank for exposure, reflective mask for exposure, method of producing a semiconductor device, and substrate provided with multilayer reflective film |