| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 03/03/2009 | US7498659 Semiconductor device, method of manufacturing the same, and phase shift mask |
| 03/03/2009 | US7498104 Phase shift photomask |
| 02/26/2009 | WO2009025015A1 Method for forming photomask and method for manufactruring semiconductor device |
| 02/26/2009 | WO2008155951A3 Synthetic quartz glass body, process for producing the same, optical element, and optical apparatus |
| 02/26/2009 | US20090053863 Mask and Manufacturing Method of a Semiconductor Device and a Thin Film Transistor Array Panel Using the Mask |
| 02/26/2009 | US20090053626 Colored photosensitive composition, color filter, and method for manufacturing color filter |
| 02/26/2009 | US20090053625 Substrate provided with bank and substrate provided with color pattern |
| 02/26/2009 | US20090053624 Modifying Merged Sub-Resolution Assist Features of a Photolithographic Mask |
| 02/26/2009 | US20090053623 Mask for semiconductor device and patterning method using the same |
| 02/26/2009 | US20090053622 Fine mask and method of forming mask pattern using the same |
| 02/26/2009 | US20090053621 Source and Mask Optimization by Changing Intensity and Shape of the Illumination Source |
| 02/26/2009 | US20090053620 Blank Mask and Method for Fabricating Photomask Using the Same |
| 02/26/2009 | US20090053619 (1S,4S)-2-(5-(4-methoxyphenoxy)-3-pyridyl)-2,5-diazabicyclo[2.2.1]heptane, capable of modulating nicotinic receptors, neurotransmitter secretion and exhibiting neuroprotective effects, with no appreciable adverse side effects |
| 02/26/2009 | US20090053618 Projection exposure method and projection exposure system therefor |
| 02/26/2009 | US20090050604 Tri-layer plasma etch resist rework |
| 02/26/2009 | US20090050357 Wiring Structure and Electronic Device Designed on Basis of Electron Wave-Particle Duality |
| 02/26/2009 | DE19964580B4 Verfahren zum Überprüfen eines Objektbelichtungsmusters A method for checking an object exposure pattern |
| 02/26/2009 | DE10349087B4 Verfahren zur Herstellung von Halbton-Phasenverschiebungsmasken-Rohlingen A process for the production of halftone phase shift mask blanks |
| 02/26/2009 | DE10165034B4 Halbton-Phasenverschiebungsmaske und -maskenrohling Halftone phase shift mask and -maskenrohling |
| 02/26/2009 | DE10082309B4 Phasenschieberfilm, Phasenschiebermaskenrohling, Phasenschiebermaske, Herstellungsverfahren für dieselben sowie Belichtungsverfahren Phase shifting film phase shift mask blank, phase shift mask manufacturing method for the same and exposure method |
| 02/25/2009 | EP2028681A1 Reflective mask blank for euv lithography |
| 02/25/2009 | EP1384234B1 Euvl multilayer structures |
| 02/25/2009 | CN101375372A Exposure method, exposure apparatus, photomask and photomask manufacturing method |
| 02/25/2009 | CN101373328A Fine mask and method of forming mask pattern using the same |
| 02/25/2009 | CN101373327A Mask for semiconductor device and patterning method using the same |
| 02/25/2009 | CN101373326A Photo mask layout |
| 02/25/2009 | CN101373325A Half-tone mask plate structure and manufacturing method thereof |
| 02/25/2009 | CN101373324A Method for acquiring optical mask information and method for representing quality of optical mask |
| 02/25/2009 | CN101373323A Optical mask and manufacturing method thereof |
| 02/25/2009 | CN101373322A Blank mask and method for fabricating photomask using the same |
| 02/24/2009 | US7496882 Optimization to avoid sidelobe printing |
| 02/24/2009 | US7495782 Method and system for measuring patterned structures |
| 02/24/2009 | US7495779 Level detection apparatus |
| 02/24/2009 | US7495756 Pattern inspection apparatus |
| 02/24/2009 | US7494765 plurality of transmitting nonprinting windows transmitting light in a first phase; a transmitting area transmitting light in a second phase, each transmitting window substantially entirely surrounded by and in contact with the transmitting area with no blocking material intervening |
| 02/24/2009 | US7494750 Back-reflected light entering the reticles is prevented; quartz-containing substrate, an attenuating layer, and an antireflective structure between the attenuating layer and the quartz-containing substrate |
| 02/24/2009 | US7494749 Photolithography using interdependent binary masks |
| 02/24/2009 | US7494748 identifying a stitchable zone around each of the mask defects found on the original mask; identified stitchable zones on the original mask is blocked out such that circuitry within the stitchable zones is not printed out during exposure of the original mask |
| 02/19/2009 | WO2009023489A1 Nanoscale imaging via absorption modulation |
| 02/19/2009 | WO2009023479A1 Masks for microlithography and methods of making and using such masks |
| 02/19/2009 | WO2009022603A1 Method and apparatus for correcting photomask defect |
| 02/19/2009 | WO2009022428A1 Method of removing foreign matter from surface of glass substrate |
| 02/19/2009 | US20090049420 Dummy pattern placement apparatus, method and program and semiconductor device |
| 02/19/2009 | US20090047585 Colored curable composition, color filter and manufacturing method thereof |
| 02/19/2009 | US20090047584 Mask blank and mask |
| 02/19/2009 | US20090047583 Masks for microlithography and methods of making and using such masks |
| 02/19/2009 | US20090046281 Method and System for Automated Inspection System Characterization and Monitoring |
| 02/19/2009 | US20090046280 Mask defect inspection data generating method, mask defect inspection method and mask production method |
| 02/19/2009 | US20090046266 Exposing method, exposing device, and device manufacturing method |
| 02/19/2009 | US20090046113 Uneven streaks evaluation device, uneven streaks evaluation method, storage medium, and color filter manufacturing method |
| 02/18/2009 | EP2024987A1 Temperature control method for photolithographic substrate |
| 02/18/2009 | EP2024789A1 Reflective mask blank for euv lithograhy and substrate with functional film for the same |
| 02/18/2009 | EP2024069A1 Production of micro- and nanopore mass arrangements by self-organization of nanoparticles and sublimation technology |
| 02/18/2009 | EP1658647B1 Integrated circuit comprising an organic semiconductor, and method for the production of an integrated circuit |
| 02/18/2009 | CN201196950Y Inflation equipment and air inlet apparatus |
| 02/18/2009 | CN101371193A Photolithographic systems and methods for producing sub-diffraction-limited features |
| 02/18/2009 | CN101369524A Manufacturing method for semiconductor device |
| 02/18/2009 | CN101369096A Plug-pull type vibration amplitude mask plate for producing arbitrary refractive index modulation optical fiber optical grating |
| 02/18/2009 | CN101369095A Exposure manufacture process, production method of image element structure and semi-modulation type photomask using the same |
| 02/18/2009 | CN100462667C 原版 Original edition |
| 02/17/2009 | US7493590 Process window optical proximity correction |
| 02/17/2009 | US7493589 Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process |
| 02/17/2009 | US7493582 Pattern layout and layout data generation method |
| 02/17/2009 | US7492941 Mask defect analysis system |
| 02/17/2009 | US7492940 Mask defect analysis system |
| 02/17/2009 | US7492443 Device manufacturing method, device manufactured thereby and a mask for use in the method |
| 02/17/2009 | US7491959 Defect inspection apparatus |
| 02/17/2009 | US7491476 Semiconductor wafers; integrated circuits; lithography |
| 02/17/2009 | US7491475 Photomask substrate made of synthetic quartz glass and photomask |
| 02/17/2009 | US7491474 Photomasks having transparent and opaque, phase-shifting sections formed by trenches; photosenstivity; photoresists; etching; semiconductors |
| 02/17/2009 | US7491473 Photo mask and method for controlling the same |
| 02/17/2009 | US7491422 Direct-write nanolithography method of transporting ink with an elastomeric polymer coated nanoscopic tip to form a structure having internal hollows on a substrate |
| 02/17/2009 | US7491107 Plasma display panel producing method, and plasma display panel |
| 02/12/2009 | WO2009020662A1 Apparatus and method for modifying optical material properties |
| 02/12/2009 | WO2009020496A1 Method of pre-exposing relief image printing plate |
| 02/12/2009 | WO2009018911A1 Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate |
| 02/12/2009 | WO2009018846A1 Method of structuring a photosensitive material |
| 02/12/2009 | WO2008154180A3 Method of electroplating a conversion electron emitting source on implant |
| 02/12/2009 | WO2008135810A3 Method and apparatus for designing an integrated circuit |
| 02/12/2009 | WO2008114148A3 Device for sorting and concentrating electromagnetic energy and apparatus comprising at least one such device |
| 02/12/2009 | US20090044167 Process-model generation method, computer program product, and pattern correction method |
| 02/12/2009 | US20090044166 Exposing mask and production method therefor and exposing method |
| 02/12/2009 | US20090042141 Anti-reflective polymer, anti-reflective composition containing the same, and method for forming pattern using the same |
| 02/12/2009 | US20090042140 composition with a base resin capable of absorbing light, a thermal acid generator, and an organic solvent; high refractive index; photoresist pattern by an ArF immersion lithography process in manufacturing a semiconductor device; poly(3,3,-dithioethylpropene) polymer from polyacrolein and ethanethiol |
| 02/12/2009 | US20090042138 Photosensitivity; flexography |
| 02/12/2009 | US20090042112 Magnetic recording media |
| 02/12/2009 | US20090042111 producing a microelectronic device by modulating an intensity and a phase of the zero diffraction order of a radiation with a device including subwavelength features having a pitch dimension smaller than one wavelength of the radiation |
| 02/12/2009 | US20090042110 Reflection type photomask blank, manufacturing method thereof, reflection type photomask, and manufacturing method of semiconductor device |
| 02/12/2009 | US20090042109 Mask blank substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, and mask blank substrate |
| 02/12/2009 | US20090042108 Pattern forming method and mask |
| 02/12/2009 | US20090042107 Pellicle for high numerical aperture exposure device |
| 02/12/2009 | US20090042106 Photomask, and method and apparatus for producing the same |
| 02/12/2009 | US20090041382 Simulation method of optical image intensity distribution, program, and method of manufacturing semiconductor device |
| 02/12/2009 | US20090040441 Liquid crystal display and manufacturing method thereof |
| 02/12/2009 | US20090039519 Semiconductor device, photomask, semiconductor device production method, and pattern layout method |
| 02/12/2009 | US20090039261 Pattern Inspection Method and Pattern Inspection System |
| 02/12/2009 | US20090038383 Photomask defect correction device and photomask defect correction method |
| 02/12/2009 | DE102008036471A1 Fertigungsverfahren für Maskenrohlingssubstrat, Fertigungsverfahren für Maskenrohling, Maskenfertigungsverfahren und Maskenrohlingssubstrat Manufacturing processes for mask blank substrate manufacturing method for mask blank, mask manufacturing process and mask blank substrate |
| 02/11/2009 | CN201194222Y Container having idiot-proof device |
| 02/11/2009 | CN101364702A Organic-inorganic composite erbium doping flat optical waveguide amplifier and preparing method thereof |