| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 03/19/2009 | WO2009034932A1 Alkaline nonionic surfactant composition |
| 03/19/2009 | US20090077530 Design pattern correcting method, design pattern forming method, process proximity effect correcting method, semiconductor device and design pattern correcting program |
| 03/19/2009 | US20090077529 Design pattern correcting method, design pattern forming method, process proximity effect correcting method, semiconductor device and design pattern correcting program |
| 03/19/2009 | US20090077528 Pattern correction method, pattern correction system, mask manufacturing method, semiconductor device manufacturing method, recording medium, and designed pattern |
| 03/19/2009 | US20090077527 System for Determining Repetitive Work Units |
| 03/19/2009 | US20090075452 Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured thereby |
| 03/19/2009 | US20090075188 Azo compound, curable composition, color filter, and method of producing the same |
| 03/19/2009 | US20090075187 Pattern forming method, semiconductor device manufacturing method and exposure mask set |
| 03/19/2009 | US20090075186 photomasks; photoresists; etching; semiconductors |
| 03/19/2009 | US20090075185 Mask blank and method of manufacturing mask |
| 03/19/2009 | US20090075184 Mask blank for euv exposure and mask for euv exposure |
| 03/19/2009 | US20090075183 Technique for Determining Mask Patterns and Write Patterns |
| 03/19/2009 | US20090075182 Photomask and pattern formation method using the same |
| 03/19/2009 | US20090075181 Method for Fabricating Photomask |
| 03/19/2009 | US20090075180 Method of correcting pattern critical dimension of photomask |
| 03/19/2009 | US20090075179 Extreme ultraviolet (euv) mask protection against inspection laser damage |
| 03/19/2009 | US20090075178 Mask with Registration Marks and Method of Fabricating Integrated Circuits |
| 03/19/2009 | US20090075177 Positive resist composition and resist pattern forming method |
| 03/19/2009 | US20090074356 Waveguide Comprising an Anisotropic Diffracting Layer |
| 03/19/2009 | US20090074287 Mask data generation method, mask fabrication method, exposure method, device fabrication method, and storage medium |
| 03/19/2009 | US20090074286 Data management equipment used to defect review equipment and testing system configurations |
| 03/19/2009 | US20090073430 Inspection apparatus and inspection method |
| 03/19/2009 | US20090073415 Apparatus and method for mounting pellicle |
| 03/19/2009 | US20090073406 Marker structure, mask pattern, alignment method, and lithographic method and apparatus |
| 03/19/2009 | US20090073356 Color filter ink, color filter, image display device, and electronic device |
| 03/19/2009 | US20090070946 Apparatus for and method of processing substrate |
| 03/19/2009 | DE102008046985A1 Maskenrohling und Verfahren zur Herstellung einer Maske Mask blank and process for the preparation of a mask |
| 03/18/2009 | CN101387827A Half-tone mask plate and method for manufacturing same |
| 03/18/2009 | CN101387826A Half-tone mask plate and method for manufacturing same |
| 03/18/2009 | CN101387825A Compensation gray level mask plate structure |
| 03/18/2009 | CN101387714A Shading member, manufacturing method thereof, film and photo mask using the member |
| 03/18/2009 | CN100470721C Orientation dependent on screen by adopting dipole illumination technigue |
| 03/18/2009 | CN100470381C A method of patterning photoresist on a wafer using an attenuated phase shift mask |
| 03/18/2009 | CN100470372C System and method for calculating aerial image of a spatial light modulator |
| 03/17/2009 | US7506301 Method for correcting a mask pattern, system for correcting a mask pattern, program, method for manufacturing a photomask and method for manufacturing a semiconductor device |
| 03/17/2009 | US7506299 Feature optimization using interference mapping lithography |
| 03/17/2009 | US7505204 Crystallization apparatus, crystallization method, and phase shifter |
| 03/17/2009 | US7504645 Method of forming pattern writing data by using charged particle beam |
| 03/17/2009 | US7504619 Energetic neutral particle lithographic apparatus and process |
| 03/17/2009 | US7504192 Soft pellicle for 157 and 193 nm and method of making same |
| 03/17/2009 | US7504186 Photomask, method for producing the same, and method for forming pattern using the photomask |
| 03/17/2009 | US7504185 Method for depositing multi-layer film of mask blank for EUV lithography and method for producing mask blank for EUV lithography |
| 03/17/2009 | US7504184 Includes transparent substrate, partially shielded mesa line pattern of first phase formed on substrate, and 100% clear recessed line pattern of second phase etched into substrate and disposed right next to partially shielded mesa line pattern; for equal line/space, small pitched, dense line pattern |
| 03/17/2009 | US7504183 Chromeless phase-shifting mask for equal line/space dense line patterns |
| 03/17/2009 | US7504182 Scanning beam of metallic ions over defect to dope to reducing transparency; implanting gallium atoms to reduce transmission and quartz can be etched |
| 03/17/2009 | US7503258 Method and apparatus for thermal development with development medium remover |
| 03/12/2009 | US20090068575 Processed pigment, pigment-dispersed composition, colored photosensitive composition, color filter, liquid crystal display element, and solid image pickup element |
| 03/12/2009 | US20090068573 Pellicle frame |
| 03/12/2009 | US20090068572 Gray scale mask |
| 03/12/2009 | US20090068571 Gray scale mask |
| 03/12/2009 | US20090068570 Photolithographic mask exhibiting enhanced light transmission due to utilizing sub-wavelength aperture arrays for imaging patterns in nano-lithography |
| 03/12/2009 | US20090068569 Resin composition for hologram recording material, hologram recording material, and method for producing hologram recording medium |
| 03/11/2009 | EP2034360A1 Pellicle frame |
| 03/11/2009 | EP2034359A2 Non absorbing reticle and method of making same |
| 03/11/2009 | EP1940968B1 Pigment preparations based on diketopyrrolopyrroles |
| 03/11/2009 | CN101385123A Projection optical system, exposure device, exposure method, display manufacturing method, mask, and mask manufacturing method |
| 03/11/2009 | CN101384968A Scanning exposure apparatus, micro device manufacturing method, mask, projection optical apparatus and mask manufacturing method |
| 03/11/2009 | CN101384957A Mask blank and photomask |
| 03/11/2009 | CN101382736A Photo mask verification system and program |
| 03/11/2009 | CN101382732A Method for making pattern material layer |
| 03/11/2009 | CN101382731A Method for repairing black spot like defect on mask plate special for IC |
| 03/11/2009 | CN101382730A Pellicle frame |
| 03/11/2009 | CN101382729A Photomask manufacturing method, pattern copy method, photomask and data base |
| 03/11/2009 | CN101382728A Gray level mask plate structure |
| 03/11/2009 | CN101382715A Method for manufacturing pixel structure, display panel and optoelectronic device |
| 03/11/2009 | CN100468204C Method and apparatus for simulating lithographic process |
| 03/11/2009 | CN100468196C Method and apparatus for providing optical proximity correction features to a reticle pattern for optical lithography |
| 03/11/2009 | CN100468193C Pattern correction method of exposed mask and manufacturing method for semiconductor device |
| 03/11/2009 | CN100468162C Electro-optical device used substrate, and semi-penetration substrate |
| 03/10/2009 | US7503030 Correcting 3D effects in phase shifting masks using sub-resolution features |
| 03/10/2009 | US7502094 Repairing device and repairing method for display device |
| 03/10/2009 | US7501213 Method for forming generating mask data |
| 03/10/2009 | US7501211 Mask having first to fourth blocks on the substrate, each block having a periodic pattern including transmitting regions and a blocking region; used for forming a polycrystalline silicon thin film |
| 03/10/2009 | US7501156 Pattern formation substrate and method for pattern formation |
| 03/05/2009 | WO2008086528A3 Method for detecting lithographically significant defects on reticles |
| 03/05/2009 | US20090064085 Method of creating photo mask layout, computer readable recording medium storing programmed instructions for executing the method, and mask imaging system |
| 03/05/2009 | US20090064083 Computer automated method for designing an integrated circuit, a computer automated system for designing an integrated circuit, and a method of manufacturing an integrated circuit |
| 03/05/2009 | US20090063074 Mask Haze Early Detection |
| 03/05/2009 | US20090061607 Method of manufacturing photomask and method of manufacturing semiconductor device |
| 03/05/2009 | US20090061362 Semiconductor device manufacturing method using double patterning and mask |
| 03/05/2009 | US20090061330 Photomask and pattern formation method using the same |
| 03/05/2009 | US20090061329 Semiconductor device manufacturing method and hard mask |
| 03/05/2009 | US20090061328 Photomask and pattern formation method using the same |
| 03/05/2009 | US20090061327 Removal of ionic residues or oxides and prevention of photo-induced defects, ionic crystal or oxide growth on photolithographic surfaces |
| 03/05/2009 | US20090057143 Film-depositing target and preparation of phase shift mask blank |
| 03/04/2009 | EP2030082A2 Method and unit for micro-structuring a moving substrate |
| 03/04/2009 | EP2030080A2 Digital mask-forming film and method of use |
| 03/04/2009 | EP2030079A1 Method and tool for patterning thin films on moving substrates |
| 03/04/2009 | CN101378009A Semiconductor device manufacturing method using double patterning and mask |
| 03/04/2009 | CN101377625A Apparatus and method for mounting pellicle |
| 03/04/2009 | CN100466220C Method for forming trench |
| 03/04/2009 | CN100466170C Mask and the production method for producing compound semiconductor device with the mask |
| 03/04/2009 | CN100465971C Method for improving optical proximity correction |
| 03/04/2009 | CN100465796C method for calculating the pixel value of the angle formed by the first and the second edge of a polygon |
| 03/04/2009 | CN100465792C Laser drawing device, Laser drawing method and method for preparing optical mask |
| 03/04/2009 | CN100465789C A method and an apparatus thereof for performing placing models of phase-balanced scattering bars by sub-wavelength optical lithography |
| 03/04/2009 | CN100465665C An optical part and a projection type display apparatus using the optical part |
| 03/03/2009 | US7500217 Handling of flat data for phase processing including growing shapes within bins to identify clusters |
| 03/03/2009 | US7499582 Method for inspecting a defect in a photomask, method for manufacturing a semiconductor device and method for producing a photomask |
| 03/03/2009 | US7499149 Holographic mask for lithographic apparatus and device manufacturing method |