| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 04/14/2009 | US7519943 Photomask fabrication method |
| 04/14/2009 | US7519942 Pattern specification method and pattern specification apparatus |
| 04/14/2009 | US7518789 Broad band deep ultraviolet/vacuum ultraviolet catadioptric imaging system |
| 04/14/2009 | US7518698 Thin film transistor array substrate, manufacturing method thereof, and mask |
| 04/14/2009 | US7518678 Sub-pixel for transflective LCD panel comprising a second photoresist formed in reflective region and transflective LCD panel using the same |
| 04/14/2009 | US7517621 first point and the second point being symmetric with respect to the center of the illumination, and to a straight line extending through the center of the illumination in a second direction perpendicular to the first direction; patterning the semiconductor |
| 04/14/2009 | US7517618 Mask, exposure method and production method of semiconductor device |
| 04/14/2009 | US7517617 Mask blank for use in EUV lithography and method for its production |
| 04/09/2009 | WO2009044645A1 Photomask blank and method for manufacturing photomask |
| 04/09/2009 | WO2009044483A1 Pellicle pressurization mechanism of pellicle mount system |
| 04/09/2009 | WO2009044434A1 Method for manufacturing semiconductor device, method for manufacturing exposure mask, and program used for manufacture of the same |
| 04/09/2009 | WO2009043885A2 Optical membrane element |
| 04/09/2009 | WO2009020496A8 Method of pre-exposing relief image printing plate |
| 04/09/2009 | WO2008135810A4 Method and apparatus for designing an integrated circuit |
| 04/09/2009 | US20090092932 Mixture of photomasks; controlling incline of pattern; lithography; phase shifting; removal of mask by etching |
| 04/09/2009 | US20090092907 Sensitized photochemical switching for cholesteric liquid crystal displays |
| 04/09/2009 | US20090092906 Method of manufacturing phase shift photomask |
| 04/09/2009 | US20090092905 Photomask defect correction device and photomask defect correction method |
| 04/09/2009 | US20090092770 ketocoumarins; thioxanthones; nematic host, at least one chiral dopant, a photo-reacted compound abd triplet sensitizer |
| 04/09/2009 | US20090091752 Apparatus and a method for inspection of a mask blank, a method for manufacturing a reflective exposure mask, a method for reflective exposure, and a method for manufacturing semiconductor integrated circuits |
| 04/09/2009 | US20090091736 Calculation method, generation method, program, exposure method, and mask fabrication method |
| 04/09/2009 | DE10361875B4 Lithographiemaske, Verwendung der Lithographiemaske und Verfahren zur Herstellung der Lithographiemaske Lithography mask, using the lithography mask and method for producing the lithography mask |
| 04/09/2009 | DE10356699B4 Lithographiesystem für richtungsabhängige Belichtung Lithography system for directional exposure |
| 04/09/2009 | DE102008041436A1 Optisches Membranelement Optical membrane element |
| 04/09/2009 | DE102007047186A1 Aufnahmevorrichtung zur Aufnahme eines Objektes Receiving device for receiving an object |
| 04/09/2009 | DE102005000734B4 Verfahren zum Einstellen einer Abweichung einer kritischen Abmessung von Mustern Method for adjusting a deviation of a critical dimension of patterns |
| 04/09/2009 | DE10048151B4 Verfahren zum lithographischen Strukturieren einer Photoresistschicht A method of lithographic patterning a photoresist layer |
| 04/08/2009 | EP2045663A2 Calculation method, generation method, program, exposure method, and mask fabrication method |
| 04/08/2009 | EP2045659A1 Method of nano-patterning using surface plasmon effect and method of manufacturing nano-imprint master and discrete track magnetic recording media using the nano-patterning method |
| 04/08/2009 | EP2043875A1 Laser-generated ultraviolet radiation mask |
| 04/08/2009 | CN201218899Y Lifting pin used for plasma reaction chamber |
| 04/08/2009 | CN101403852A A type glue and method for mending chromium plate white defect by using the same |
| 04/08/2009 | CN101403851A Printing ink and method for mending dry plate pinhole defect by using the same |
| 04/08/2009 | CN100477177C 半导体器件及其制造方法 Semiconductor device and manufacturing method thereof |
| 04/07/2009 | US7514660 Focusing apparatus, focusing method, and inspection apparatus |
| 04/07/2009 | US7514205 Copolymer of an unsaturated sulfonic acid, particularly vinylsulfonic acid, allylsulfonic acid, or 2-acrylamido-2-methylpropanesulfonic acid and a 3-perfluoroalkyl-2-hydroxypropyl or 2-perfluroalkyl-1-methylolethyl (alk or F)acrylate, e.g., 3-(perfluoro-n-butyl)-2-hydroxypropyl acrylate |
| 04/07/2009 | US7514186 System for electrically connecting a mask to earth, a mask |
| 04/07/2009 | US7514185 Forming a light-absorbing film on a transparent substrate, and irradiating the light-absorbing film with light from a flash lamp; flatness |
| 04/07/2009 | US7514184 Reticle with antistatic coating |
| 04/07/2009 | US7514183 Generating a mask for use in a photolithography process; tuning the transmittance of features in a target mask pattern |
| 04/02/2009 | WO2009041987A1 Improving process model accuracy by modeling mask corner rounding effects |
| 04/02/2009 | WO2009041551A1 Mask blank, and method for production of imprint mold |
| 04/02/2009 | WO2009041388A1 Mask blank, and transferring mask |
| 04/02/2009 | US20090089727 Method for dimension conversion difference prediction, method for manufacturing photomask, method for manufacturing electronic component, and program for dimension conversion difference prediction |
| 04/02/2009 | US20090087759 Oxime Ester Photoinitiators |
| 04/02/2009 | US20090087758 Methods, apparatus and computer program products for fabricating masks and semiconductor devices using model-based optical proximity effect correction and lithography-friendly layout |
| 04/02/2009 | US20090087757 Method for feature prediction, method for manufacturing photomask, method for manufacturing electronic component, and program for feature prediction |
| 04/02/2009 | US20090087756 Structure and method for determining an overlay accuracy |
| 04/02/2009 | US20090087755 Photomask and method of making thereof |
| 04/02/2009 | US20090087619 System and method for making photomasks |
| 04/02/2009 | US20090087082 Pattern inspection apparatus and method |
| 04/02/2009 | US20090087081 Method of manufacturing photo mask, mask pattern shape evaluation apparatus, method of judging photo mask defect corrected portion, photo mask defect corrected portion judgment apparatus, and method of manufacturing a semiconductor device |
| 04/02/2009 | US20090084989 Beam irradiation apparatus with deep ultraviolet light emission device for lithographic pattern inspection system |
| 04/01/2009 | EP2043133A1 Exposing method, exposing device, and device manufacturing method |
| 04/01/2009 | CN201214503Y Light shield box and support member thereof |
| 04/01/2009 | CN101399244A Circuit structure, photo mask for defining the circuit structure |
| 04/01/2009 | CN101398859A Method for introducing light shield partial increment magnification coefficient into optical proximity effect model building |
| 04/01/2009 | CN101398615A Resin composition for laser engraving and resin printing plate precursor for laser engraving |
| 04/01/2009 | CN101398613A Metallic layer circuit board diagram pre-correcting method |
| 04/01/2009 | CN101398612A Photomask, manufacturing method thereof and pattern transfer printing method |
| 04/01/2009 | CN101398611A Graytone mask plate and and graytone mask, and methof for producing the same and pattern copying method |
| 04/01/2009 | CN100474120C Method for computing values related to parts of multi-value picture element of the polygon brims |
| 04/01/2009 | CN100474111C Method for designing phase grating pattern, and method for producing photomask system |
| 04/01/2009 | CN100474108C Critical dimension control using full phase and trim masks |
| 04/01/2009 | CN100474106C Printed board material |
| 04/01/2009 | CN100474105C Damascene extreme ultraviolet lithography alternative phase shift photomask and method of making the same |
| 03/31/2009 | US7512229 Key unit, method for marking key top, and method for manufacturing key unit using the same |
| 03/31/2009 | US7511830 System for scatterometric measurements and applications |
| 03/31/2009 | US7511817 Reticle, reticle inspection method and reticle inspection apparatus |
| 03/31/2009 | US7510668 etchable substrate having a non-etchable mask formed by transferring a printed image from a transfer paper onto the etchable surface of the substrate |
| 03/26/2009 | WO2009039268A1 Spin-on antireflective coating for integration of patternable dielectric materials and interconnect structures |
| 03/26/2009 | US20090081882 Method for manufacturing semiconductor device and method for designing photomask pattern |
| 03/26/2009 | US20090081594 semiconductor nano-sized particle containing materials as highly refractive medium in immersion lithography, as anti-reflection coating in optics, as pellicle in lithography and as sensitizer in UV photoresists |
| 03/26/2009 | US20090081567 Soft pellicle and method of making same |
| 03/26/2009 | US20090081566 Wafer having scribe lanes suitable for sawing process, reticle used in manufacturing the same, and method of manufacturing the same |
| 03/26/2009 | US20090081565 Method for forming etching mask, control program and program storage medium |
| 03/26/2009 | US20090081564 Exposure mask, pattern formation method, and exposure mask fabrication method |
| 03/26/2009 | US20090081563 Integrated Circuits and Methods of Design and Manufacture Thereof |
| 03/26/2009 | US20090081562 Photolithographic method and mask devices utilized for multiple exposures in the field of a feature |
| 03/26/2009 | US20090080065 Ultra-broadband UV microscope imaging system with wide range zoom capability |
| 03/26/2009 | US20090079983 Surface inspection device |
| 03/25/2009 | EP2040120A1 Mask data generation method, mask fabrication method, exposure method, device fabrication method, and program |
| 03/25/2009 | EP1646913B1 Methods for inspection of wafers and reticles using designer intent data |
| 03/25/2009 | CN101393911A 半导体集成电路 The semiconductor integrated circuit |
| 03/25/2009 | CN101393867A Substrate processing apparatus |
| 03/25/2009 | CN101393389A Method for forming etching mask, control program and program storage medium |
| 03/25/2009 | CN101393387A Mask and method for manufacturing same |
| 03/25/2009 | CN101393386A Reticle mask making method by FPD mask making equipment |
| 03/25/2009 | CN101393385A Transmittance-adjustable half tone mask and method for manufacturing same |
| 03/25/2009 | CN100472326C Method and device for producing analogue exposure tool imaging performance model and program product |
| 03/25/2009 | CN100471685C Edge cure prevention process |
| 03/24/2009 | US7509623 Manufacturing method of semiconductor device |
| 03/24/2009 | US7509239 Optimized method for LID biosensor resonance detection |
| 03/24/2009 | US7508526 Defect inspecting apparatus |
| 03/24/2009 | US7507661 Method of forming narrowly spaced flash memory contact openings and lithography masks |
| 03/24/2009 | US7507506 Uses a low cost high speed laser writer to print less critical chiplets and structures on a reticle, and applies a high cost and low throughput electron beam writer to print the most critical chips; total number photomask susbstrates required to produce integrated circuits is be reduced |
| 03/24/2009 | US7507505 Fabrication method of extreme ultraviolet radiation mask mirror using atomic force microscope lithography |
| 03/24/2009 | US7507264 Transport apparatus |
| 03/19/2009 | WO2009036364A1 Technique for determining mask patterns and write patterns |
| 03/19/2009 | WO2009036133A1 Fracture shot count reduction |