| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 05/06/2009 | EP2056161A1 Photo mask |
| 05/06/2009 | CN101424882A Exposing device, methods for forming pattern, channel, and hole by using the same, and liquid crystal display device therewith and method for fabricating the same |
| 05/06/2009 | CN101424875A Mask and method for forming a semiconductor device using the same |
| 05/06/2009 | CN101424874A Exposure mask and method for fabricating thin-film transistor |
| 05/06/2009 | CN101424873A Photo mask using soda-lime glass as substrate and method for manufacturing same |
| 05/06/2009 | CN101424844A Method for manufacturing LCD array substrate |
| 05/06/2009 | CN101424837A Method for manufacturing LCD array substrate |
| 05/06/2009 | CN100485524C Method for producing quartz/AZ photoresist ultraviolet photoetched mask |
| 05/05/2009 | US7530049 Mask manufacturing system, mask data creating method and manufacturing method of semiconductor device |
| 05/05/2009 | US7527901 Exposing upper and side surfaces of phase shift pattern of mask, selectively forming a passivation layer, cleaning phase shift mask; repairing is carried out in the midst of a series of photolithographic exposure; photomask can be cleaned without damaging the phase shift pattern of the mask |
| 05/05/2009 | US7527900 Includes a primary mask having a primary pattern, and an assist mask having a correction pattern substantially complementary to the primary pattern; cost efficiency; improve the flexibility of lithography |
| 04/30/2009 | US20090111251 Exposure mask and method for fabricating thin-film transistor |
| 04/30/2009 | US20090111036 Scanning beam of metallic ions over defect to dope, reducing transparency; implanting gallium atoms to reduce transmission and quartz can be etched |
| 04/30/2009 | US20090111035 Binary mask, method for fabricating the binary mask, and method for fabricating fine pattern of semiconductor device using binary mask |
| 04/30/2009 | US20090111034 Method for Fabricating RIM Type Photomask |
| 04/30/2009 | US20090111033 Method of fabricating photomask |
| 04/30/2009 | US20090111032 EUVL Mask, Method of Fabricating the EUVL Mask, and Wafer Exposure Method Using the EUVL Mask |
| 04/30/2009 | US20090110895 polytetrafluoroethylene, FEP resins, PFA resins; semiconductor lithography; increased transparency |
| 04/30/2009 | US20090109417 Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
| 04/30/2009 | US20090109364 Exposing device, methods for forming pattern, channel, and hole by using the same, and liquid crystal display device therewith and method for fabricating the same |
| 04/30/2009 | US20090108215 Mask and method for forming a semiconductor device using the same |
| 04/30/2009 | US20090107964 Debris minimization and improved spatial resolution in pulsed laser ablation of materials |
| 04/29/2009 | EP2053460A2 Multivariable solver for optical proximity correction |
| 04/29/2009 | EP1023640A4 Data hierarchy layout correction and verification method and apparatus |
| 04/29/2009 | EP1023639A4 Method and apparatus for data hierarchy maintenance in a system for mask description |
| 04/29/2009 | CN201229932Y Pressure stabilizing valve group construction |
| 04/29/2009 | CN101419411A System and method for lithography simulation |
| 04/29/2009 | CN101419402A Method for making cemented carbide punching mold |
| 04/29/2009 | CN101419400A Dry method etching method by chrome metal mask |
| 04/29/2009 | CN101419399A Method for modifying white defect of photomask |
| 04/29/2009 | CN101419398A Method for manufacturing mask blank and mehtod for manufacturing photomask |
| 04/29/2009 | CN101419397A Method of fabricating halftone phase shift mask |
| 04/29/2009 | CN100483723C Pixel structure |
| 04/29/2009 | CN100483623C Multilayer semiconductor integrated circuit, light shield used therefor and manufacturing method thereof |
| 04/29/2009 | CN100483334C Method for executing model-based optical proximity correction |
| 04/29/2009 | CN100482607C Ultra low thermal expansion transparent glass ceramics |
| 04/29/2009 | CN100482358C Substrate processing system, coating apparatus, and coating method |
| 04/28/2009 | US7526748 Design pattern data preparing method, mask pattern data preparing method, mask manufacturing method, semiconductor device manufacturing method, and program recording medium |
| 04/28/2009 | US7525115 Arrangement for inspecting objects, especially masks in microlithography |
| 04/28/2009 | US7524620 For forming a fine pattern in fabrication of semiconductor integrated circuit devices |
| 04/28/2009 | US7524616 semiconductor nano-sized particle containing materials as highly refractive medium in immersion lithography, as anti-reflection coating in optics, as pellicle in lithography and as sensitizer in UV photoresists |
| 04/28/2009 | US7524593 semi-transparent film, capable of forming a resist in which a convex portion is not formed in an end portion and the end portion has gentle shape |
| 04/28/2009 | US7524592 Optical proximity correction mask and method of fabricating color filter |
| 04/28/2009 | US7524591 Photomask and manufacturing method thereof, fabrication process of an electron device |
| 04/28/2009 | US7524072 Optical component, comprising a material with a predetermined homogeneity of thermal expansion |
| 04/23/2009 | WO2009051059A1 Adhesive tape for protecting photomask |
| 04/23/2009 | WO2009050141A1 High-resolution lithography mask, apparatus and process for manufacture thereof, and lithography apparatus and process using such a mask |
| 04/23/2009 | WO2009049826A1 Measuring system and measuring method |
| 04/23/2009 | WO2007041600A3 Mask-pattern determination using topology types |
| 04/23/2009 | WO2007035761A3 Planarization of metal layer over photoresist |
| 04/23/2009 | WO2007001725A3 Display device having improved properties |
| 04/23/2009 | US20090106727 Methods and systems for layout and routing using alternating aperture phase shift masks |
| 04/23/2009 | US20090104557 Negative imaging method for providing a patterned metal layer having high conductivity |
| 04/23/2009 | US20090104549 Method for error reduction in lithography |
| 04/23/2009 | US20090104546 Fabricating methods of multi-domain vertical alignment display panel and color filter substrate |
| 04/23/2009 | US20090104545 Color filter and fabrication method thereof |
| 04/23/2009 | US20090104544 Pellicle and method for manufacturing the same |
| 04/23/2009 | US20090104543 Method of fabricating halftone phase shift mask |
| 04/23/2009 | US20090104542 Use of chromeless phase shift masks to pattern contacts |
| 04/23/2009 | US20090104541 Plasma surface treatment to prevent pattern collapse in immersion lithography |
| 04/23/2009 | US20090104540 Graded lithographic mask |
| 04/23/2009 | US20090103061 Reticle Protection Member, Reticle Carrying Device, Exposure Device and Method for Carrying Reticle |
| 04/23/2009 | US20090103020 Multi-domain vertical alignment display panel and color filter substrate |
| 04/23/2009 | US20090102005 Wafer level package and mask for fabricating the same |
| 04/23/2009 | DE102007051521A1 Dynamische Wellenformereinheit Dynamic Wellenformereinheit |
| 04/23/2009 | DE102006060800B4 Verfahren zum Bilden eines Grabens A method of forming a trench |
| 04/22/2009 | EP2051139A1 Pellicle and method for manufacturing the same |
| 04/22/2009 | EP2050150A1 Method for producing at least one multilayer body, and multilayer body |
| 04/22/2009 | EP2049948A1 Method to minimize cd etch bias |
| 04/22/2009 | EP2003498A9 Photomask, method for manufacturing such photomask, pattern forming method using such photomask and mask data creating method |
| 04/22/2009 | EP1548014B1 Ultraviolet-permeable fluoropolymers and pellicles made by using the same |
| 04/22/2009 | EP1023641A4 Design rule checking system and method |
| 04/22/2009 | CN101414613A Wafer level package and mask for fabricating the same |
| 04/22/2009 | CN101414118A Pellicle and method for manufacturing the same |
| 04/22/2009 | CN101414117A Method for cleaning photo mask by wet method |
| 04/22/2009 | CN100481434C Semiconductor integrated circuit and method for manufacturing the same, and mask |
| 04/22/2009 | CN100480865C Method for adjusting the geometric pictures in the grating images |
| 04/22/2009 | CN100480860C Improved scattering bar OPC application method for sub-half wavelength lithography patterning |
| 04/22/2009 | CN100480851C Method for fabricating soft mold |
| 04/21/2009 | US7523438 Method for improved lithographic patterning utilizing optimized illumination conditions and high transmission attenuated PSM |
| 04/21/2009 | US7523437 Pattern-producing method for semiconductor device |
| 04/21/2009 | US7523027 Visual inspection and verification system |
| 04/21/2009 | US7521157 Cross-shaped sub-resolution assist feature |
| 04/21/2009 | US7521156 Photo mask and method of correcting the transmissivity of a photo mask |
| 04/16/2009 | WO2009048089A1 Process for producing gray tone mask |
| 04/16/2009 | WO2005098686A3 Modeling resolution enhancement processes in integrated circuit fabrication |
| 04/16/2009 | WO2005036264A3 Photomask having an internal substantially transparent etch stop layer |
| 04/16/2009 | US20090098473 Photomask, method of lithography, and method for manufacturing the photomask |
| 04/16/2009 | US20090098472 Pattern Evaluation Method |
| 04/16/2009 | US20090098471 Mask for sequential lateral solidification laser crystallization |
| 04/16/2009 | US20090098470 Method of Correcting Defect in Photomask |
| 04/16/2009 | US20090098469 Process for fabrication of alternating phase shift masks |
| 04/16/2009 | US20090098468 Photo-masks and methods of fabricating photonic crystal devices |
| 04/16/2009 | US20090097004 Lithography Apparatus, Masks for Non-Telecentric Exposure and Methods of Manufacturing Integrated Circuits |
| 04/16/2009 | US20090096090 Photolithography Process and Photomask Structure Implemented in a Photolithography Process |
| 04/15/2009 | EP1503403B1 Reticle and optical characteristic measuring method |
| 04/15/2009 | CN201222166Y Adjustable apparatus for processing, bearing and cleaning hard-face photo mask substrate |
| 04/15/2009 | CN101408725A Method for manufacturing grey mask, grey mask and pattern transfer print method |
| 04/15/2009 | CN101408724A Half-tone mask plate and manufacture method thereof |
| 04/15/2009 | CN101408723A Light shield capable of improving yield |