| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 05/27/2009 | CN101443886A Resist film peeling method, mask blank manufacturing method and transfer mask manufacturing method |
| 05/27/2009 | CN101443703A Method for structuring the surface of a pressed sheet or an endless strip |
| 05/27/2009 | CN101443702A Tri-tone trim mask for alternating phase-shift photolithography |
| 05/27/2009 | CN101442109A Organic electroluminescent device and down-lead structure, mask plate, drive chip thereof |
| 05/27/2009 | CN101442028A Method for manufacturing planar display |
| 05/27/2009 | CN101441408A Photomask, manufacturing method thereof, and pattern transfer print method |
| 05/27/2009 | CN101441407A Photolithography dimension ultra-specification correcting etching method |
| 05/27/2009 | CN101441406A Exposure method and attenuated phase shift mask |
| 05/27/2009 | CN101441405A Protective film component, accommodating container for accommodating protective film component and accommodating method |
| 05/27/2009 | CN101441404A Photomask, semiconductor device, and method for manufacturing semiconductor device |
| 05/27/2009 | CN101441403A Method for detecting mask plate design regulation |
| 05/27/2009 | CN101441402A Method for detecting best focus of exposure machine |
| 05/27/2009 | CN101441381A Method for preparing solvent resistance agent electronic paper micro-cup and material for preparing solvent resistance agent electric paper micro-cup |
| 05/27/2009 | CN100492171C Method for manufacturing liquid crystal display device |
| 05/27/2009 | CN100492094C Graphics engine for high precision lithography |
| 05/26/2009 | US7539970 Method of manufacturing mask |
| 05/26/2009 | US7539962 Pattern data correcting method, photo mask manufacturing method, semiconductor device manufacturing method, program and semiconductor device |
| 05/26/2009 | US7539952 Computer implemented design system, a computer implemented design method, a reticle set, and an integrated circuit |
| 05/26/2009 | US7539350 Image correction method |
| 05/26/2009 | US7538875 Lithographic apparatus and methods for use thereof |
| 05/26/2009 | US7538867 Mura defect inspection mask, apparatus and method of inspecting the mura defect, and method of producing a photomask |
| 05/26/2009 | US7538853 Exposure process and apparatus using glass photomasks |
| 05/26/2009 | US7538052 Extreme ultraviolet lithography exposure devices; |
| 05/26/2009 | US7537884 bonding a patterned photoresist layer having crosslinking structures with a modified polyaniline, to form a conductive/light emitting membrane having high conductivity and transparency; films or layers of light emitting diodes |
| 05/26/2009 | US7537869 Avoiding image macro-flare by determining the variations of lengths of parallel lines of transparency of two patterns adjacent or overlapping the photoresist film; the second has a larger transparent region than the first which has parallel lines of transparent regions of the same length |
| 05/26/2009 | US7537865 Method of adjusting size of photomask pattern |
| 05/26/2009 | US7537864 Hole pattern design method and photomask |
| 05/26/2009 | US7537708 Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface |
| 05/26/2009 | US7537114 System and method for storing and transporting photomasks in fluid |
| 05/22/2009 | WO2009063903A1 Mask case, transfer apparatus, exposure apparatus, mask transfer method and device manufacturing method |
| 05/22/2009 | WO2009062969A1 Device and method for measuring electrostatic charges |
| 05/22/2009 | WO2009062728A1 Method for repairing phase shift masks |
| 05/21/2009 | US20090130865 Method of patterning a layer using a pellicle |
| 05/21/2009 | US20090130857 Method of manufacturing a structure based on anisotropic etching, and silicon substrate with etching mask |
| 05/21/2009 | US20090130609 Colored mask combined with selective area deposition |
| 05/21/2009 | US20090130574 Sputtering target used for production of reflective mask blank for euv lithography |
| 05/21/2009 | US20090130573 Multilayer active mask lithography |
| 05/21/2009 | US20090130572 Reticle for forming microscopic pattern |
| 05/21/2009 | US20090130571 Masking process using photoresist |
| 05/21/2009 | US20090130570 Methods for Inspecting and Optionally Reworking Summed Photolithography Patterns Resulting from Plurally-Overlaid Patterning Steps During Mass Production of Semiconductor Devices |
| 05/21/2009 | US20090130569 Adjustable Mask Blank Structure for an Euv Phase-Shift Mask |
| 05/21/2009 | US20090130486 Color filter substrate and manufacturing method thereof |
| 05/21/2009 | US20090130398 Gradient colored mask |
| 05/21/2009 | US20090130397 Multicolor mask |
| 05/21/2009 | US20090127666 Semiconductor device, method of manufacturing the same, and phase shift mask |
| 05/21/2009 | US20090127596 Photomask, semiconductor device, and method for manufacturing semiconductor device |
| 05/20/2009 | EP2061066A2 System and method for processing an object with a charged particle beam |
| 05/20/2009 | EP2060654A1 Aperture masks for circuit fabrication |
| 05/20/2009 | EP2059455A1 Packaging for films which contain active substances, and method for producing it |
| 05/20/2009 | DE102007054994A1 Verfahren zur Reparatur von Phasenverschiebungsmasken A method for repair of phase shift masks |
| 05/20/2009 | CN201242659Y Acceptance cabinet body structure |
| 05/20/2009 | CN101438207A Method for making an improved thin film solar cell interconnect using etch and deposition processes |
| 05/20/2009 | CN101436564A Substrate processing apparatus |
| 05/20/2009 | CN101436216A Method and system for evaluating an evaluated pattern of a mask |
| 05/20/2009 | CN101435990A Mask plate and manufacturing method thereof |
| 05/20/2009 | CN100490177C Semiconductor device, method of fabricating the same, and patterning mask utilizied by the method |
| 05/20/2009 | CN100489663C Method for producing COB-DRAM bit line with nitrogen-oxygen-nitrogen SAC structure |
| 05/20/2009 | CN100489146C Mask-retaining device |
| 05/19/2009 | US7536671 Mask for forming fine pattern and method of forming the same |
| 05/19/2009 | US7536660 OPC simulation model using SOCS decomposition of edge fragments |
| 05/19/2009 | US7535817 Nanometer scale data storage device and associated positioning system |
| 05/19/2009 | US7534555 Plating using copolymer |
| 05/19/2009 | US7534531 Full phase shifting mask in damascene process |
| 05/19/2009 | US7534412 Large-volume CaF2 single crystals with reduced scattering and improved laser stability, and uses thereof |
| 05/19/2009 | CA2283403C Diffraction grating-fabricating phase mask, and its fabrication method |
| 05/14/2009 | WO2009061527A1 Method and system for obtaining bounds on process parameters for opc-verification |
| 05/14/2009 | WO2009060781A1 Method for correcting mask pattern and method for manufacturing acceleration sensor and angular velocity sensor by using same |
| 05/14/2009 | WO2009060511A1 Substrate for photomask, photomask, and method for manufacturing the same |
| 05/14/2009 | WO2008144138A3 Reticles, and methods of treating reticles, configuring reticles and using reticles |
| 05/14/2009 | US20090123853 Aligning apparatus, aligning method, exposure apparatus, exposure method, and device manufacturing method |
| 05/14/2009 | US20090123058 Mask pattern dimensional inspection apparatus and method |
| 05/14/2009 | US20090122281 Silica glass containing tio2 and process for its production |
| 05/14/2009 | US20090120472 Substrate cleaning and processing apparatus with magnetically controlled spin chuck holding pins |
| 05/14/2009 | DE102007054073A1 System und Verfahren zum Bearbeiten eines Objekts System and method for processing an object |
| 05/14/2009 | DE102007052052A1 Defects e.g. crystal growth defect, detecting method for photo-lithography mask i.e. reticle, to produce microstructure e.g. integrated circuit, involves inspecting defect on set of images to evaluate presence of repeating defects in images |
| 05/13/2009 | EP1474542B1 Method of CIRCUIT FABRICATION using an aperture mask |
| 05/13/2009 | CN201237695Y Mask |
| 05/13/2009 | CN201236018Y Light shield box and limitation member thereof |
| 05/13/2009 | CN101430506A Photo-curing resin composition, design of cured composition and printed circuit board |
| 05/13/2009 | CN101430502A Method of correcting mask pattern, photo mask, method of manufacturing semiconductor device, and semiconductor device |
| 05/13/2009 | CN101430501A Method for correcting photo resist graphics |
| 05/13/2009 | CN101430500A OPC correcting method for forming auxiliary through hole |
| 05/13/2009 | CN101430499A Storage container for photomask-forming synthetic quartz glass substrate |
| 05/13/2009 | CN100487586C Method of manufacturing semiconductor device |
| 05/13/2009 | CN100487583C Method and system for lithographic process window optimization |
| 05/13/2009 | CN100487578C Lighographic processing method and device made therefrom |
| 05/13/2009 | CN100487573C Method for detemining photoetching projection parameter, device producing method and device |
| 05/12/2009 | US7532328 Circuit-pattern inspection apparatus |
| 05/12/2009 | US7531294 Forming film pattern over a substrate, forming a second film pattern which is curved on the surface of first film pattern or substrate, and forming film pattern by irradiating the first film pattern with light with second film pattern and modifying part of the second film pattern; cost efficiency |
| 05/12/2009 | US7531275 A molecular sieve that prevents airborne molecular contaminants generated during a lithography process from contaminating the photomask is associated with the pellicle frame. |
| 05/07/2009 | WO2009057660A1 Half-tone mask, half-tone mask blank and method for manufacturing half-tone mask |
| 05/07/2009 | WO2006060504A3 Tri-tone trim mask for alternating phase-shift photolithography |
| 05/07/2009 | US20090119635 Mask pattern correction method for manufacture of semiconductor integrated circuit device |
| 05/07/2009 | US20090117737 Polyconductor line end formation and related mask |
| 05/07/2009 | US20090117475 Multilayer active mask lithography |
| 05/07/2009 | US20090117474 Methods of manufacturing mask blank and transfer mask |
| 05/07/2009 | US20090117344 Method of correcting mask pattern, photo mask, method of manufacturing semiconductor device, and semiconductor device |
| 05/07/2009 | US20090116068 Method for selecting a format for a section to be printed |
| 05/07/2009 | US20090114912 Mask design elements to aid circuit editing and mask redesign |
| 05/07/2009 | DE102007051990A1 Fotoplott-Verfahren und Anordnung zur Aufzeichnung eines computergespeicherten Rasterbildes auf einen ebenen lichtempfindlichen Aufzeichnungsträger Fotoplott-Method and apparatus for recording a computer-stored raster image on a flat photosensitive carrier |