| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 06/24/2009 | EP1660941B1 Method of forming multilayer reflective extreme ultraviolet lithography mask blanks |
| 06/24/2009 | CN101464626A Device and method for removal of pellicle of mask plate |
| 06/24/2009 | CN101464625A Precompensation technology for photo-etching mask plate characteristic line width equality |
| 06/24/2009 | CN101464624A Image sensor and method for manufacturing the same |
| 06/24/2009 | CN100505156C Substrate processing apparatus and substrate processing method |
| 06/24/2009 | CN100504604C Mask and device manufacturing methods |
| 06/23/2009 | US7551767 Pattern inspection apparatus |
| 06/23/2009 | US7551273 Mask defect inspection apparatus |
| 06/23/2009 | US7551265 Contact material and system for ultra-clean applications |
| 06/23/2009 | US7550236 Multi wavelength mask for multi layer printing on a process substrate |
| 06/23/2009 | US7550235 Applying optical proximity correction features to mask layouts using an interference map; computer software; applying the phase-balanced scattering bar (SB) features to a mask design based on the interference map associated with the given mask design utilizing a model-based approach |
| 06/18/2009 | US20090155933 Manufacturing Method of Display Device |
| 06/18/2009 | US20090155699 Phase-shift mask and method for forming a pattern |
| 06/18/2009 | US20090155698 Photomask blank and production method thereof, and photomask production method, and semiconductor device production method |
| 06/18/2009 | US20090152661 Image sensor and method for manufacturing the same |
| 06/18/2009 | US20090152660 Photomask, Image Sensor, and Method of Manufacturing the Image Sensor |
| 06/18/2009 | US20090152459 System and Method for Processing an Object |
| 06/17/2009 | CN101460833A Surface inspection device |
| 06/17/2009 | CN101458719A Method for verifying optical approximatino correction |
| 06/17/2009 | CN101458454A Method for simultaneously monitoring photolithography exposure condition and registration photoetching precision |
| 06/17/2009 | CN101458449A Graytone mask blank, method of manufacturing graytone mask and graytone mask, and pattern transfer method |
| 06/17/2009 | CN101458448A Optical close range correction and photo mask production method |
| 06/17/2009 | CN101458447A Optical close range correction, photo mask production and graphic method |
| 06/17/2009 | CN101458446A Optical approaching correction, photo mask production and graphic method |
| 06/17/2009 | CN101458445A Apparatus and method for detecting etching terminal |
| 06/17/2009 | CN101458444A Method for producing photo mask and graphic method |
| 06/17/2009 | CN101458443A Photo mask, method for producing the same and graphic method |
| 06/17/2009 | CN101458442A Production of layout and photo mask and graphic method |
| 06/17/2009 | CN100501929C Method of adjusting deviation of critical dimension of patterns |
| 06/16/2009 | US7549143 Method and device for checking lithography data |
| 06/16/2009 | US7549142 Method and device for checking lithography data |
| 06/16/2009 | US7549140 Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography |
| 06/16/2009 | US7547589 Method for fabricating semiconductor device, and electro-optical device, integrated circuit and electronic apparatus including the semiconductor device |
| 06/16/2009 | US7547504 Forming on a substrate a first layer of viscous polymer having a first pattern with a residual thickness independent of compressive forces employed to form said first layer; and generating into said first layer, a second pattern having a shape inverse to said first pattern; imprint lithography |
| 06/16/2009 | US7547502 Exposure method |
| 06/16/2009 | US7547494 Color filter substrate, manufacturing method thereof and liquid crystal display |
| 06/11/2009 | US20090148783 Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process |
| 06/11/2009 | US20090148782 Exposure method, photo mask, and reticle stage |
| 06/11/2009 | US20090148781 Reflective-type mask |
| 06/11/2009 | US20090148780 Method for correcting mask pattern, and exposure mask |
| 06/11/2009 | US20090148779 Sub-wavelength diffractive elements to reduce corner rounding |
| 06/11/2009 | US20090147345 Pattern generator |
| 06/11/2009 | US20090146259 Sub-Resolution Assist Feature To Improve Symmetry for Contact Hole Lithography |
| 06/10/2009 | EP2068354A2 Method of forming conductive lines and similar features |
| 06/10/2009 | EP1586007A4 Electron beam processing for mask repair |
| 06/10/2009 | EP1478976B1 Critical dimension control using full phase and trim masks |
| 06/10/2009 | EP1350264A4 Method for forming a pattern and a semiconductor device |
| 06/10/2009 | EP1133440A4 Automated opening and closing of ultra clean storage containers |
| 06/10/2009 | CN101454720A 激光烧蚀抗蚀剂 Laser ablation resist |
| 06/10/2009 | CN101454069A Production of micro- and nanopore mass arrangements by self-organization of nanoparticles and sublimation technology |
| 06/10/2009 | CN101452206A Method for forming mask pattern |
| 06/10/2009 | CN101452205A Dispersion strip forming method |
| 06/10/2009 | CN101452204A Weighting type distance-measuring optical approximate correcting method based on regular |
| 06/10/2009 | CN101452203A Method for producing X ray exposure mask based on double-layer gum process |
| 06/10/2009 | CN101452202A PSM, exposure focus calibrating method by utilizing PSM and system thereof |
| 06/10/2009 | CN101452201A Method for detecting mask printing plate |
| 06/10/2009 | CN101451963A Method and system for defect detection |
| 06/10/2009 | CN100498550C Pattern formation method |
| 06/10/2009 | CN100498545C Detecting method for position of photomask graphics |
| 06/10/2009 | CN100498544C Method for reducing critical dimension of photoresist contact hole pattern |
| 06/10/2009 | CN100498532C Method for imaging member to wafer and mask group for imaging chip |
| 06/10/2009 | CN100498524C Non-scribing metal mask and use thereof |
| 06/10/2009 | CN100498523C Original plate of planographic printing plate |
| 06/09/2009 | US7546564 Method for verifying optical proximity correction using layer versus layer comparison |
| 06/09/2009 | US7546397 Systems and methods for allowing multiple devices to share the same serial lines |
| 06/09/2009 | US7544446 Masks of semiconductor devices and methods of forming patterns thereof |
| 06/04/2009 | US20090142706 Method of manufacturing semiconductor device |
| 06/04/2009 | US20090142675 Reticle for optical proximity correction test pattern and method of manufacturing the same |
| 06/04/2009 | US20090142674 Photo Mask and Method for Manufacturing Semiconductor Device Using the Same |
| 06/04/2009 | US20090142673 Semi-transparent film grayscale mask |
| 06/04/2009 | US20090141218 Methods and apparatus for curing pixel matrix filter materials |
| 06/04/2009 | US20090139449 Silicon thin film in which an opening for selectively irradiating charged particles to a semiconductor substrate is provided and whose irradiation surface on which the charged particles are irradiated is implanted with an impurity, and selectively irradiating charged particles to semiconductor substrate |
| 06/03/2009 | EP1141776B1 Method for patterning thin films |
| 06/03/2009 | CN101447000A Autoplacement method and device of photomask framework |
| 06/03/2009 | CN101446761A Pattern formation method |
| 06/03/2009 | CN101446756A Photo mask and method for manufacturing semiconductor device using same |
| 06/03/2009 | CN101446755A Method for preparing photo-mask and method for patterning |
| 06/03/2009 | CN101446754A Photo-mask, method for preparing photo-mask and method for exposure |
| 06/03/2009 | CN101446753A Photomask and detecting device, detecting method, manufacturing method and pattern transferring method for the same |
| 06/03/2009 | CN100495204C Artistic light shield made through laser annealing and method for forming polycrystalline films by utilizing laser annealing |
| 06/02/2009 | US7543260 Design supporting system of semiconductor integrated circuit, method of designing semiconductor integrated circuit, and computer readable medium for supporting design of semiconductor integrated circuit |
| 06/02/2009 | US7542599 Reducing number of relatively unimportant shapes from a set of shapes |
| 06/02/2009 | US7541136 Transparent film configured to give a predetermined phase difference to exposure light passing through that part of the second opening area in which the transparent film is provided relative to exposure light passing through the second surrounding area; focus monitor masks; photolithography; efficiency |
| 06/02/2009 | US7541121 Calibration of optical line shortening measurements |
| 06/02/2009 | US7541118 photomasks comprising a non-phase shifting, phase shifting and opaque segemnts, for use in photolithography to produce patterns having a very fine pitch |
| 06/02/2009 | US7541117 Shifter pattern image transferred to the photoresist film in the shifter pattern image light exposure step does not overlap the trim pattern image transferred to the film in the trim pattern image light exposure step; photoresist film is patterned with a photoresist material remaining in the dark part |
| 06/02/2009 | US7541116 Amplitude patterns of molybenem silicideon a surface and phase patterns of quartz on a second surface, all having different vertical thicknesses to change amplitude and phase of exposing light, respectively; Fourier transform of circuit layout; optimal depth of focus; simplification; miniaturization |
| 06/02/2009 | US7541115 Use of calcium fluoride substrate for lithography masks |
| 06/02/2009 | US7540931 Method of producing ceramic green sheet and method of producing electronic component using this ceramic green sheet |
| 05/28/2009 | WO2009067147A1 Integrated color mask |
| 05/28/2009 | WO2008122335A3 Apparatus for measurement of substrates |
| 05/28/2009 | US20090136857 Correcting 3D Effects In Phase Shifting Masks Using Sub-Resolution Features |
| 05/28/2009 | US20090136856 Photo-mask and thin-film transistor substrate |
| 05/28/2009 | US20090136116 Method and apparatus for inspecting reticle |
| 05/28/2009 | US20090134343 Tracking control method and electron beam writing system |
| 05/27/2009 | EP2063221A1 Electron beam dimension measuring device and electron beam dimension measuring method |
| 05/27/2009 | EP2063002A2 Method for depositing and patterning carbon nanotubes using chemical self-assembly process |
| 05/27/2009 | EP2062019A2 Method and apparatus for the spatially resolved determination of the phase and amplitude of the electromagnetic field in the image plane of an image of an object |
| 05/27/2009 | EP1737676A4 Edge cure prevention process |
| 05/27/2009 | CN201245277Y Photomask box |