| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 07/22/2009 | EP1597631B1 Multiple exposure method for circuit performance improvement and maskset |
| 07/22/2009 | CN101490618A Laser ablation method and tool |
| 07/22/2009 | CN101487973A Dummy pattern injection method and mask |
| 07/22/2009 | CN101487972A Mask plate with adjustable permeation rate, production method and mask method thereof |
| 07/22/2009 | CN101487971A Soft mold and fabrication method thereof |
| 07/22/2009 | CN100517070C Maskless lithography systems and methods utilizing spatial light modulator arrays |
| 07/21/2009 | US7565032 Image density-adapted automatic mode switchable pattern correction scheme for workpiece inspection |
| 07/21/2009 | US7565001 System and method of providing mask defect printability analysis |
| 07/21/2009 | US7564553 Polarization evaluation mask, polarization evaluation method, and polarization determination device |
| 07/21/2009 | US7564544 Method and system for inspecting surfaces with improved light efficiency |
| 07/21/2009 | US7563547 Photomask and method of manufacturing the same |
| 07/21/2009 | US7563546 Process for creating phase edge structures in a phase shift mask |
| 07/21/2009 | US7563389 utilizes the photo-tunable dopant in a cholesteric liquid crystal material comprising a triplet sensitizer and one or more photo-tunable chiral dopants (PTCD) that change chirality upon irradiation of the triplet sensitizer |
| 07/16/2009 | US20090181315 Production of micro- and nanopore mass arrangements by self-organization of nanoparticles and sublimation technology |
| 07/16/2009 | US20090181314 Reverse Dummy Insertion Algorithm |
| 07/16/2009 | US20090180182 Apparatus for exposing a substrate, photomask and modified illuminating system of the apparatus, and method of forming a pattern on a substrate using the apparatus |
| 07/16/2009 | US20090179203 Display substrate |
| 07/15/2009 | CN101482697A Method for reducing OPC model residual error |
| 07/15/2009 | CN101482696A Setting method for photo-etching system NA-sigma |
| 07/15/2009 | CN101482695A Optical mask for exposure |
| 07/15/2009 | CN100514555C Substrate processing apparatus |
| 07/15/2009 | CN100514184C Photomask |
| 07/15/2009 | CN100514162C Large-size substrate |
| 07/14/2009 | US7562337 OPC verification using auto-windowed regions |
| 07/14/2009 | US7562336 Contrast based resolution enhancement for photolithographic processing |
| 07/14/2009 | US7562334 Method for manufacturing a photomask |
| 07/14/2009 | US7562319 Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects |
| 07/14/2009 | US7560200 Overcoming conventional disadvantage, so that dimension correction for gate structures with different conductivity types can be incorporated into optical simulation in generating mask data for semiconductor integrated circuit device including dual gate structures different in conductivity types |
| 07/14/2009 | US7560199 Forming polarization structures on reticle substrate and etching circuit patterns, perpendicular to the polarization structures, on the reticle substrate on a side opposite the polarization structures; cost efficiency |
| 07/14/2009 | US7560198 Exposure blocking pattern is configured to prevent the density correcting pattern from being transcribed to a wafer; provide a photo-mask having a mask pattern whose line width has a high degree of uniformity |
| 07/14/2009 | US7560197 Mask pattern data producing method, patterning method, reticle correcting method, reticle manufacturing method, and semiconductor apparatus manufacturing method |
| 07/14/2009 | US7560196 Mask for exposing an alignment mark, and method and computer program for designing the mask |
| 07/09/2009 | WO2009085090A1 Ultra-thin polymeric adhesion layer |
| 07/09/2009 | WO2009085078A1 Three-dimensional hexagonal matrix memory array and method of manufacturing the same |
| 07/09/2009 | WO2009085077A1 Method of making a pillar pattern using triple or quadruple exposure |
| 07/09/2009 | WO2009084516A1 Mask blank, production method of mask blank and production method of mask |
| 07/09/2009 | WO2009084296A1 Optical member for euvl and surface treatment method thereof |
| 07/09/2009 | WO2009083606A1 Method and apparatus for mapping of line-width size distributions on photomasks |
| 07/09/2009 | US20090176325 Halftone mask, method of manufacturing the same, and method of manufacturing an array substrate using the same |
| 07/09/2009 | US20090176166 Method for manufacturing photomasks and device for its implementation |
| 07/09/2009 | US20090176165 Polymer composition, hardmask composition having antireflective properties, and associated methods |
| 07/09/2009 | US20090176073 Exposure mask |
| 07/09/2009 | US20090176069 Mask for Controlling Line End Shortening and Corner Rounding Arising from Proximity Effects |
| 07/09/2009 | US20090174945 Contiguous microlens array, method of fabricating the same and photomask for defining the same |
| 07/08/2009 | EP2077467A1 Method for manufacturing photo masks and device for implementing same |
| 07/08/2009 | EP2076817A1 High resolution imaging process using an in-situ image modifying layer |
| 07/08/2009 | CN101479666A Method and unit for micro-structuring a moving substrate |
| 07/08/2009 | CN101477307A Photomask blank, resist pattern forming process, and photomask preparation process |
| 07/08/2009 | CN101477303A Mask and method of fabricating the same |
| 07/08/2009 | CN101477302A Phase shift mask and method for forming pattern |
| 07/08/2009 | CN100510957C Method for preparation of X-lay photoetching mask plate |
| 07/08/2009 | CN100510956C Phase-shift mask |
| 07/08/2009 | CN100509413C Image setting apparatus having drum simulating supports |
| 07/07/2009 | US7559044 Automatic design method of semiconductor integrated circuit, automatic design system of semiconductor integrated circuit, and semiconductor integrated circuit |
| 07/07/2009 | US7556900 Measuring the effect of flare on line width |
| 07/07/2009 | US7556897 Methods of forming reticles |
| 07/07/2009 | US7556896 Inspection method and photomask |
| 07/07/2009 | US7556895 Prevents a drop in pattern alignment accuracy due to the internal stress of the membrane and able to align patterns including complementary patterns at a high accuracy; stencil mask having lattice-shaped struts which are connected to other struts or the silicon wafer around the membrane frame |
| 07/07/2009 | US7556894 silicon nitride antireflective coatings on EUV light absorber layer; defect inspection of mask with DUV light; eliminate the interference effect may cause reflectance oscillation near the absorber edges, increase the defect inspection sensitivity |
| 07/07/2009 | US7556893 reticle used to form alignment targets on a wafer; four fine alignment targets per stepper shot for compensating rotational error in the making of integrated circuits; saving time and reducing processing, increase precision |
| 07/07/2009 | US7556892 Halftone phase shift mask blank, halftone phase shift mask, and pattern transfer method |
| 07/02/2009 | US20090170330 Method of forming a micro pattern of a semiconductor device |
| 07/02/2009 | US20090170015 Dye-containing negative curable composition, color filter, method of producing the same, and solid-state image sensor |
| 07/02/2009 | US20090170014 Mask, exposure apparatus and device manufacturing method |
| 07/02/2009 | US20090170013 Mask and Method of Fabricating the Same |
| 07/02/2009 | US20090170012 Phase-shifting masks with sub-wavelength diffractive opical elements |
| 07/02/2009 | US20090170011 Reflective photomask and method of determining layer thicknesses of the same |
| 07/02/2009 | US20090170010 includes electron-absorption substrate for absorbing electrons from e-beam during exposure by e-beam lithography process and suppressing backscattering of electrons based on electron-backscattering-suppressing atomic number associated with constituent atomic species of electron-absorption substrate |
| 07/02/2009 | US20090169835 Low cost antenna array fabrication technology |
| 07/02/2009 | US20090169832 Simplified double mask patterning system |
| 07/02/2009 | US20090168044 Lithography apparatus and lithography method |
| 07/02/2009 | US20090168033 Manufacturing method of pattern formed body and pattern formed body manufacturing apparatus |
| 07/02/2009 | US20090166745 Semiconductor device and photomask |
| 07/02/2009 | US20090166682 Methods and apparatus for forming memory lines and vias in three dimensional memory arrays using dual damascene process and imprint lithography |
| 07/02/2009 | US20090166679 Integrated circuit and manufacturing process facilitating selective configuration for electromagnetic compatibility |
| 07/01/2009 | CN101471345A Semiconductor device and photomask |
| 07/01/2009 | CN101471231A Method of forming a micro pattern of a semiconductor device |
| 07/01/2009 | CN101470344A Method for performing pattern decomposition for a full chip design |
| 07/01/2009 | CN101470343A Mask blank manufacturing method and coater |
| 07/01/2009 | CN101470342A Method for making pattern on curved metal surface |
| 07/01/2009 | CN100507715C Exposure mask pattern forming method, exposure mask pattern, and semiconductor device manufacturing method |
| 07/01/2009 | CN100507714C Laser mask and crystallization method using the same and manufacture method of displayer |
| 07/01/2009 | CN100507713C Photomask, photomask manufacturing method and semiconductor device manufacturing method using photomask |
| 07/01/2009 | CN100507529C Optical type appearance testing method and optical type appearance testing device |
| 06/30/2009 | US7554788 Capacitor for a semiconductor device |
| 06/30/2009 | US7554164 Semiconductor device having a gap between a gate electrode and a dummy gate electrode |
| 06/30/2009 | US7553608 Photomask uniform control of optical near field intensity distribution |
| 06/30/2009 | US7553366 Laser beam pattern mask and crystallization method using the same |
| 06/25/2009 | WO2009078190A1 Pattern forming method and pattern formed body |
| 06/25/2009 | WO2009043885A3 Optical membrane element |
| 06/25/2009 | US20090164960 Semiconductor integrated circuit design system, semiconductor integrated circuit design method, and computer readable medium |
| 06/25/2009 | US20090162758 Photomask having code pattern formed by coding data conversion process information, photomask formation method, and semiconductor device fabrication method |
| 06/25/2009 | US20090162757 Phase shift mask and method for manufacturing the same |
| 06/25/2009 | US20090161189 Method of manufacturing a structure based on anisotropic etching, and silicon substrate with etching mask |
| 06/25/2009 | US20090161188 Holographic gratings and method for fabricating the same |
| 06/25/2009 | US20090161123 Method and system for measuring patterned structures |
| 06/25/2009 | US20090161098 Photomask mounting/housing device and resist inspection method and resist inspection apparatus using same |
| 06/25/2009 | US20090160062 Semiconductor Devices and Methods of Manufacturing Thereof |
| 06/25/2009 | DE102007063383A1 Pellicle ejecting device for photolithographic purposes, has heating device provided for heating adhesive, and extractor provided for pellicles from masks, where extractor comprises mask fixing unit and pellicle extracting unit |
| 06/25/2009 | DE102007060186A1 Unit cell for test mask for testing sensitivity of device e.g. photomask, has adjacent base body with angular base surface, where set of linear structures comprises ends extending from base body normal to boundary line of base surface |