| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 08/19/2009 | CN101510047A Method and system for evaluating an object that has a repetitive pattern |
| 08/19/2009 | CN100530654C Integrated circuit and mask set for forming integrated circuit |
| 08/19/2009 | CN100530535C Substrate treatment method and substrate treatment apparatus |
| 08/18/2009 | US7577556 Method and equipment for simulation |
| 08/18/2009 | US7577288 Sample inspection apparatus, image alignment method, and program-recorded readable recording medium |
| 08/18/2009 | US7577287 Early error detection during fabrication of reticles |
| 08/18/2009 | US7575855 Etching photomasks, photoresists; photolithography; depth of focus |
| 08/18/2009 | US7575854 Method for manufacturing microlens |
| 08/18/2009 | US7575852 Method of optically transferring a pattern from a mask having advanced oriented assist features for integrated circuit hole patterns |
| 08/18/2009 | US7575835 Exposure method, exposure quantity calculating system using the exposure method and semiconductor device manufacturing method using the exposure method |
| 08/18/2009 | US7575834 Which prevents sticking of particles; semiconductors |
| 08/18/2009 | US7575692 Method for etching chromium thin film and method for producing photomask |
| 08/13/2009 | US20090202926 Exposure mask and pattern forming method therefor |
| 08/13/2009 | US20090202925 Photomask defect correction method, photomask manufacturing method, phase shift mask manufacturing method, photomask, phase shift mask, photomask set, and pattern transfer method |
| 08/13/2009 | US20090202924 Method of evaluating a photo mask and method of manufacturing a semiconductor device |
| 08/13/2009 | US20090202923 Photomask manufacturing method, photomask manufacturing apparatus and photomask |
| 08/13/2009 | US20090202922 photomasks, photoplates; for production of organic light emitting diode display panels |
| 08/13/2009 | US20090201474 Semiconductor Devices and Methods of Manufacture Thereof |
| 08/13/2009 | US20090200546 Test Structures and Methods |
| 08/13/2009 | DE102004037009B4 Verfahren zum Herstellen einer Flüssigkristalldisplay-Vorrichtung A method of manufacturing a liquid crystal display device |
| 08/12/2009 | EP1856575A4 Merging sub-resolution assist features of a photolithographic mask |
| 08/12/2009 | CN101504934A Optic mask and manufacturing method of thin film transistor array panel using the same |
| 08/12/2009 | CN101504501A Silica-based liquid crystal display panel and electronic device using the same |
| 08/12/2009 | CN100526997C Exposure apparatus inspection method |
| 08/12/2009 | CN100526991C Method for changing dimension of photo mask pattern |
| 08/11/2009 | US7572656 Mask and method of manufacturing liquid crystal display device using the same |
| 08/11/2009 | US7572558 Photomask and exposure method |
| 08/11/2009 | US7572557 Photolithography; semiconductors |
| 08/11/2009 | US7572556 Photomasks; decreased apodization |
| 08/11/2009 | US7571639 Method of correcting opaque defect of photomask using atomic force microscope fine processing device |
| 08/06/2009 | WO2009096480A1 Composition and method for removing hard mask |
| 08/06/2009 | US20090199153 Exposure condition setting method and program for setting exposure conditions |
| 08/06/2009 | US20090199152 Methods and apparatuses for reducing mura effects in generated patterns |
| 08/06/2009 | US20090199148 Pattern-producing method for semiconductor device |
| 08/06/2009 | US20090198468 Calibration of Optical Line Shortening Measurements |
| 08/06/2009 | US20090195779 System for scatterometric measurements and applications |
| 08/05/2009 | EP2085820A2 Apparatus and method for preparing relief printing form |
| 08/05/2009 | EP2085325A1 Sheet storing carrier system and reticle case making use of the same |
| 08/05/2009 | EP2085220A2 Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method of producing the same |
| 08/05/2009 | EP1875307B1 Method for mask inspection for mask design and mask production |
| 08/05/2009 | EP1690883B1 Pellicle and novel fluorinated polymer |
| 08/05/2009 | EP1606670A4 Applications of semiconductor nano-sized particles for photolithography |
| 08/05/2009 | CN101501568A Method to minimize CD etch bias |
| 08/05/2009 | CN101499447A Circuit structure and photomask used for defining the same |
| 08/05/2009 | CN101498893A OPC method for mask preparation course in semiconductor manufacturing process |
| 08/05/2009 | CN101498892A Photomask defect correction method, photomask manufacturing method, and photomask |
| 08/05/2009 | CN101498858A Production method of colorful optical filtering substrate and LCD panel |
| 08/05/2009 | CN100524618C Resistless lithography method for producing fine structures |
| 08/05/2009 | CN100524032C Method of generating writing pattern, method of forming resist pattern, method of controlling exposure tool |
| 08/04/2009 | US7571417 Method and system for correcting a mask pattern design |
| 08/04/2009 | US7571416 Automatic design device, method, and program for semiconductor integrated circuits |
| 08/04/2009 | US7569842 Method for correcting electron beam exposure data |
| 08/04/2009 | US7569403 Pattern evaluation method, manufacturing method of semiconductor device, correction method of mask pattern and manufacturing method of exposure mask |
| 08/04/2009 | US7569314 Method for quartz bump defect repair with less substrate damage |
| 08/04/2009 | US7569313 White defect repairing method and apparatus of photomask, manufacturing method of photomask, and manufacturing method of semiconductor device |
| 08/04/2009 | US7569312 Mask data creation method |
| 08/04/2009 | US7569311 single reticle photolithography system suitable for exposing regions of the reticle having distinct patterns under different illumination conditions optimal for each respective region |
| 08/04/2009 | US7569310 Sub-resolution assist features for photolithography with trim ends |
| 08/04/2009 | US7569309 Gate critical dimension variation by use of ghost features |
| 08/04/2009 | US7569308 Placing rectangular contacts on a grid in a first direction; placing rectangular contacts unrestrictedly in a second direction perpendicular to the first direction;a first exposure forms periodic dark lines and a second exposure on the period dark lines form the rectangular contacts |
| 08/04/2009 | US7569307 Mask pattern with edges having inverted shapes to alleviate the effects of diffraction of laser beams to reduce overlap regions such that crystallization characteristics are improved |
| 08/04/2009 | US7569165 Black conductive compositions, black electrodes, and methods of forming thereof |
| 07/30/2009 | US20090193386 Semiconductor cell for photomask data verification and semiconductor chip |
| 07/30/2009 | US20090193375 Manufacturing method, manufacturing program and manufacturing system for semiconductor device |
| 07/30/2009 | US20090192652 Substrate processing apparatus and substrate processing method |
| 07/30/2009 | US20090191489 Pattern generator |
| 07/30/2009 | US20090191479 Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method of producing the same |
| 07/30/2009 | US20090191475 Method of manufacturing photomask |
| 07/30/2009 | US20090191474 On-track process for patterning hardmask by multiple dark field exposures |
| 07/30/2009 | US20090191473 Photomask manufacturing method, photomask manufacturing system, and device manufacturing method |
| 07/30/2009 | US20090191472 Blank Mask and Method for Fabricating the Same |
| 07/30/2009 | US20090191471 Composition for cleaning a phase shift mask and associated methods |
| 07/30/2009 | US20090191470 Pellicle frame |
| 07/30/2009 | US20090191469 Reflection photolithography mask, and process for fabricating this mask |
| 07/30/2009 | US20090191468 Contact Level Mask Layouts By Introducing Anisotropic Sub-Resolution Assist Features |
| 07/30/2009 | US20090190118 Exposure apparatus inspection mask, and method of inspecting exposure apparatus using exposure apparatus inspection mask |
| 07/30/2009 | US20090190073 Phthalocyanine-series pigment fine particles, method of producing the same, pigment dispersion photoresist, colored transfer material, color filter and liquid crystal display device |
| 07/29/2009 | EP2083325A2 Method for printing a pattern on a substrate |
| 07/29/2009 | CN101494162A Manufacturing method, manufacturing program and manufacturing system for semiconductor device |
| 07/29/2009 | CN100521204C Semiconductor integrated circuit, standard cell, standard cell library, designing method, and designing equipment |
| 07/29/2009 | CN100521085C Substrate processing apparatus |
| 07/29/2009 | CN100521062C Particle-optical device and detection means |
| 07/29/2009 | CN100520585C Method and apparatus for generating assist features utilizing an image field map |
| 07/29/2009 | CN100520584C Method for reducing nonuniformity of image printed on substrate using light micro-image cover and light micro- image cover |
| 07/29/2009 | CN100520575C Method of enhancing clear field phase shift masks by adding parallel line to phase 0 region |
| 07/28/2009 | US7566525 Method for forming an anti-etching shielding layer of resist patterns in semiconductor fabrication |
| 07/28/2009 | US7566517 Providing reticle having quasi-periodic structure formed thereon, quasi-periodic structure including plurality of elements that each contribute to feature to be printed on wafer, where each element exhibits slight variation in reticle feature characteristic compared to adjacent other element in structure |
| 07/28/2009 | US7566516 Photomask and method of manufacturing the same |
| 07/23/2009 | WO2009091665A1 Spacer double patterning for lithography operations |
| 07/23/2009 | US20090186429 Method for correcting a mask pattern, system for correcting a mask pattern, program, method for manufacturing a photomask and method for manufacturing a semiconductor device |
| 07/23/2009 | US20090186424 Pattern generation method, computer-readable recording medium, and semiconductor device manufacturing method |
| 07/23/2009 | US20090186308 Method for printing a pattern on a substrate |
| 07/23/2009 | US20090186285 Color filter composition |
| 07/23/2009 | US20090186284 Reticle, and method of laying out wirings and vias |
| 07/23/2009 | US20090186283 Photomasks and Methods Of Forming Photomasks |
| 07/23/2009 | US20090186282 Contamination prevention in extreme ultraviolet lithography |
| 07/23/2009 | US20090185115 Active matrix type liquid crystal display device and manufacturing process for the same |
| 07/23/2009 | US20090185059 Colored negative photoresist composition, colored pattern comprising the same, and method for producing the colored pattern |
| 07/23/2009 | DE112007002165T5 Maskenrohling und Verfahren zum Herstellen einer Übertragungsmaske Mask blank and method for producing a transmission mask |
| 07/23/2009 | DE102008043819A1 Nachführsteuerverfahren und Elektronenstrahlschreibsystem Nachführsteuerverfahren and electron beam writing system |