| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 09/10/2009 | US20090227112 Exposure mask manufacturing method, drawing apparatus, semiconductor device manufacturing method, and mask blanks product |
| 09/10/2009 | US20090226826 Photomask blank, photomask, and photomask manufacturing method |
| 09/10/2009 | US20090226825 Method for fabricating EUVL mask |
| 09/10/2009 | US20090226824 Hardmask composition and associated methods |
| 09/10/2009 | US20090226823 Reticles including assistant structures, methods of forming such reticles, and methods of utilizing such reticles |
| 09/10/2009 | US20090225398 Electro-optic displays |
| 09/10/2009 | US20090225294 Reticle for projection exposure apparatus and exposure method using the same |
| 09/10/2009 | DE19724245B4 Flüssigkristallanzeige und Herstellungsverfahren dafür Liquid crystal display and manufacturing method thereof |
| 09/10/2009 | DE102009008429A1 Mask for use in exposing system, has light-shielding area comprising photonic crystals with lattice constant, where ratio of lattice constant to wavelength of light is specific value within band gap of photonic crystal |
| 09/10/2009 | DE102008011531A1 Method for processing object e.g. quartz substrate with miniaturized molybdenum structure, involves integrating detected interaction products of electron beam to form total signal to detect whether to continue or terminate process |
| 09/10/2009 | DE102008002780A1 Mask structure position determining method for use during semiconductor manufacturing, involves indicating structure on detector, and calculating position of structure from image of structure on detector |
| 09/10/2009 | DE102004057759B4 Verfahren zur Reduzierung von Streulicht bedingten CD-Schwankungen A method for reducing stray light caused by CD variations |
| 09/09/2009 | EP2098490A1 Method for finishing surface of preliminary polished glass substrate |
| 09/09/2009 | EP2097788A1 A method and system for identifying weak points in an integrated circuit design |
| 09/09/2009 | EP1368708B1 Self-aligned fabrication technique for tri-tone attenuated phase-shifting masks |
| 09/09/2009 | CN101527255A Ultraviolet irradiation set and ultraviolet irradiation processing unit |
| 09/09/2009 | CN101526749A Photolithographic system and method for measuring deviation between variable gap of photolithographic system and center of mask stage |
| 09/09/2009 | CN101526735A Designing method of photo-mask and method of manufacturing semiconductor device using the photo-mask |
| 09/09/2009 | CN101526734A Photo mask material, photo mask and photo mask preparing method |
| 09/09/2009 | CN101526733A Multicolor photo mask and pattern transfer printing method using same |
| 09/09/2009 | CN101526732A Repair solution and method for manufacturing same |
| 09/09/2009 | CN101526731A Method for repairing mask plate |
| 09/09/2009 | CN100539119C Test base, test base mask and forming method of test base |
| 09/09/2009 | CN100538529C Secondary exposure method using two photomasks in semiconductor production process |
| 09/09/2009 | CN100538513C Method for manufacturing inclined line at light mask |
| 09/09/2009 | CN100538409C Method for repairing electronic element pattern defect |
| 09/09/2009 | CN100537053C Mask blanks and method of producing the same |
| 09/08/2009 | US7587704 System and method for mask verification using an individual mask error model |
| 09/08/2009 | US7585600 using computers and/or software for adjustment photomasks during fabrication integrated circuits |
| 09/08/2009 | US7585599 Photomask, and method and apparatus for producing the same |
| 09/08/2009 | US7585598 Titania-doped quartz glass and making method, EUV lithographic member and photomask substrate |
| 09/08/2009 | US7585597 Mask pattern data generating method, photo mask manufacturing method, and semiconductor device manufacturing method |
| 09/08/2009 | US7585596 Micro-sculpting using phase masks for projection lithography |
| 09/08/2009 | US7585595 Automatic mapping the phase shifting regions by photolithographic masking, resolving phase conflicts, applying subresolution; miniaturization; high-density integrated circuits; opaque and complementary binary phases |
| 09/08/2009 | US7585418 Lithographic mask and manufacturing method thereof |
| 09/08/2009 | US7584760 Substrate processing apparatus |
| 09/03/2009 | WO2009106903A2 A photomask and devices with nano-sized elements |
| 09/03/2009 | WO2009106288A2 Method for processing an object with miniaturized structures |
| 09/03/2009 | US20090220894 Semiconductor device manufacturing method |
| 09/03/2009 | US20090220870 Printing on the substrate a composite mask pattern based on features of dark-field mask and clear-field mask;developing printed patterns, obtaining measurements and determining the flare effect including line shortening; photolithography; semiconductors; transistors |
| 09/03/2009 | US20090220869 Reflection-type mask and method of making the reflection-type mask |
| 09/03/2009 | US20090220868 Mask and design method thereof |
| 09/03/2009 | US20090220867 Gradated photomask and its fabrication process |
| 09/03/2009 | US20090220866 Pre-alignment marking and inspection to improve mask substrate defect tolerance |
| 09/03/2009 | US20090220865 Method and apparatus for source field shaping in a plasma etch reactor |
| 09/03/2009 | US20090220864 Inspection method for transparent article |
| 09/03/2009 | US20090219504 Substrate conveyor apparatus, substrate conveyance method and exposure apparatus |
| 09/03/2009 | DE102009007319A1 Verfahren zum Herstellen einer Halbleitervorrichtung oder Photomaske A method of manufacturing a semiconductor device or a photomask |
| 09/02/2009 | CN101523288A Optical diffusers, photomasks and their methods of fabrication |
| 09/02/2009 | CN101521182A Method for manufacturing display device |
| 09/02/2009 | CN101520609A Method, inspection system, computer program and reference substrate for detecting mask defects |
| 09/02/2009 | CN101520599A Mask, design method thereof, as well as method for manufacturing array substrates thereby |
| 09/02/2009 | CN100535745C Phase conflict resolution for photolithographic masks |
| 09/02/2009 | CN100535744C Mask and manufacturing method of a semiconductor device and a thin film transistor array panel using the mask |
| 09/01/2009 | US7583376 Method and device for examination of nonuniformity defects of patterns |
| 09/01/2009 | US7582921 Semiconductor device and method for patterning |
| 09/01/2009 | US7582896 applying a crosslinkable polyvinyllphenol homo or copolymer, a bishydroxymethylbenze or naphthalene a crosslinking compound, a triphenylsulfonium hexaflate photoacid generator and propylene glycol/1,2-/, 1-methyl ether 2-acetate solvent on a substrate having prestructure gate electrode, photocrosslinking |
| 09/01/2009 | US7582397 Photomask, and method and apparatus for producing the same |
| 09/01/2009 | US7582396 Hybrid phase-shift mask and manufacturing method thereof |
| 09/01/2009 | US7582394 Photomask and method for forming pattern |
| 09/01/2009 | US7582393 Charged-particle beam, X-ray, and extreme ultraviolet beam lithography masks |
| 08/27/2009 | WO2009104803A1 Optical component for euvl and smoothing method thereof |
| 08/27/2009 | US20090217218 Opc simulation model using socs decomposition of edge fragments |
| 08/27/2009 | US20090216450 Apparatus and method for inspecting overlapping figure, and charged particle beam writing apparatus |
| 08/27/2009 | US20090215352 Electroluminescent display device |
| 08/27/2009 | US20090214980 Melts |
| 08/27/2009 | US20090214961 Photomask blank, photomask, and methods of manufacturing the same |
| 08/27/2009 | US20090214960 Resist composition and patterning process |
| 08/27/2009 | US20090214959 Photoresist compositions and methods related to near field masks |
| 08/27/2009 | US20090213389 Wavefront aberration measuring method, mask, wavefront aberration measuring device, exposure apparatus, and device manufacturing method |
| 08/27/2009 | US20090213388 Measurement method and measurement reticle |
| 08/27/2009 | US20090212212 Scanning Electron Microscope system and Method for Measuring Dimensions of Patterns Formed on Semiconductor Device By Using the System |
| 08/27/2009 | US20090211940 Closed container and control system for closed container |
| 08/27/2009 | DE102008011501A1 Verfahren zum Betreiben eines Beleuchtungssystems einer mikrolithographischen Projektionsbelichtungsanlage A method of operating an illumination system of a microlithographic projection exposure apparatus |
| 08/26/2009 | EP2093616A1 Split and design guidelines for double patterning |
| 08/26/2009 | EP2093614A1 Split and design guidelines for double patterning |
| 08/26/2009 | EP2093611A2 Particle inspection apparatus, exposure apparatus, and device manufacturing method |
| 08/26/2009 | CN101517483A Mask blank and method for manufacturing transfer mask |
| 08/26/2009 | CN101515110A Photoetching mask structure for aeration of X-ray and method for preparing same |
| 08/25/2009 | US7581203 Method and apparatus for manufacturing multiple circuit patterns using a multiple project mask |
| 08/25/2009 | US7580124 Dual stage defect region identification and defect detection method and apparatus |
| 08/25/2009 | US7579246 Semiconductor device manufacturing method including oblique ion implantation process and reticle pattern forming method |
| 08/25/2009 | US7579123 Method for crystallizing amorphous silicon into polysilicon and mask used therefor |
| 08/25/2009 | US7579122 attenuated type phase shift mask has a reference area allowing a light radiated from a light source (high pressure mercury lamp) to pass through and an amplitude and phase modulation area allowing a part of such light to pass through |
| 08/25/2009 | US7579121 Optical proximity correction photomasks |
| 08/25/2009 | US7579120 Substrate for reticle and method of manufacturing the substrate, and mask blank and method of manufacturing the mask blank |
| 08/20/2009 | US20090210851 Lithography simulation method and computer program product |
| 08/20/2009 | US20090209105 Pattern forming method, semiconductor device manufacturing method and semiconductor device manufacturing apparatus |
| 08/20/2009 | US20090208852 Pattern forming method, semiconductor device manufacturing method and semiconductor device manufacturing apparatus |
| 08/20/2009 | US20090208851 Photomask, Fabrication Method for the Same and Pattern Formation Method Using the Same |
| 08/20/2009 | US20090208850 Near-Field Exposure Mask, Method of Producing that Mask, Near-Field Exposure Apparatus Having that Mask, and Resist Pattern Forming Method |
| 08/20/2009 | US20090207406 Particle inspection apparatus, exposure apparatus, and device manufacturing method |
| 08/20/2009 | US20090207398 Near Field Exposure That Reduces Scatter of a Surface Plasmon Polariton Wave Going Around a Light Blocking Member |
| 08/20/2009 | US20090207287 Colored photosensitive composition, and color filter array and solid image pickup device using the same |
| 08/20/2009 | US20090207286 Colored photosensitive composition, and color filter array and solid image pickup device using the same |
| 08/20/2009 | US20090206282 Method for manufacturing semiconductor device or photomask |
| 08/19/2009 | CN101512731A Planarization of metal layer over photoresist |
| 08/19/2009 | CN101512309A Method and apparatus for the spatially resolved determination of the phase and amplitude of the electromagnetic field in the image plane of an image of an object |
| 08/19/2009 | CN101511695A Packaging for films which contain active substances, and method for producing it. |
| 08/19/2009 | CN101510048A Method to improve mask critical dimension uniformity (cdu) |