| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 10/01/2009 | DE10133846B4 Messtechnik für optische Proximity-Korrekturserife Metrology for optical proximity Korrekturserife |
| 09/30/2009 | EP2105792A1 Photosensitive resin composition, light-shielding color filter and production process therefor, and image sensor |
| 09/30/2009 | CN201319112Y Photomask box |
| 09/30/2009 | CN101548238A Substrate for photomask, photomask, and method for manufacturing the same |
| 09/30/2009 | CN101546135A Charged-particle beam writing method and charged-particle beam writing apparatus |
| 09/30/2009 | CN101546134A Electron beam writing apparatus and method |
| 09/30/2009 | CN101546118A Method of forming mask for lithography, method of forming mask data for lithography, method of manufacturing back-illuminated solid-state imaging device, back-illuminated solid-state imaging device an |
| 09/30/2009 | CN101546117A Masstone photomask and pattern transfer method using the same |
| 09/30/2009 | CN101546116A A masstone photomask, a method for manufacturing the same and a pattern transfer method |
| 09/30/2009 | CN101546115A Photomask storage apparatus |
| 09/30/2009 | CN101546114A Exposure system, light shield and method for designing same |
| 09/30/2009 | CN101546113A Feedback control system and feedback control method for polarization power ratio of light source |
| 09/30/2009 | CN101546112A Method for replacing mask |
| 09/30/2009 | CN101546077A Pixel structure of thin film transistor-liquid crystal display and manufacturing method thereof |
| 09/30/2009 | CN100545986C Plasma display panel producing method |
| 09/30/2009 | CN100545748C Substrate for reticle and method of manufacturing the substrate, and mask blank and method of manufacturing the mask blank |
| 09/30/2009 | CN100545747C Method for detecting failure of database patterns of photo mask |
| 09/29/2009 | US7596420 Device manufacturing method and computer program product |
| 09/29/2009 | US7595861 Exposure apparatus and method of manufacturing device |
| 09/29/2009 | US7595146 applying a solvent (e.g.propylene glycol methyl ether acetate, ethyl lactate etc.) to the ARC layer causing it to swell, a photo-resist layer is formed on the swollen ARC layerk a mixing layer is formed by the diffusion of components from the swollen ARC layer to the photo-resist layer and vice versa |
| 09/29/2009 | US7595136 Patterning hard mask film to form trench hard mask pattern on trench circuit area, forming pre-pitting patterns in trench circuit area by anisotropically etching, forming mesa hard mask pattern on circuit area and exposing top surface, and forming phase shift hillock patterns |
| 09/24/2009 | WO2009116348A1 Reflective mask blank for euv lithography |
| 09/24/2009 | WO2009115329A1 Method and apparatus for measuring of masks for the photo-lithography |
| 09/24/2009 | US20090241086 Method of making pattern data, and medium for storing the program for making the pattern data |
| 09/24/2009 | US20090240364 Method and apparatus for designing and integrated circuit |
| 09/24/2009 | US20090240362 Simulation model creating method, mask data creating method and semiconductor device manufacturing method |
| 09/24/2009 | US20090239177 Mask pattern data generation method, mask manufacturing method, semiconductor device manufacturing method, and pattern data generation program |
| 09/24/2009 | US20090239163 Color filter and method of fabricating the same |
| 09/24/2009 | US20090239162 Methods of Forming Reticles |
| 09/24/2009 | US20090239161 Applications of semiconductor nano-sized particles for photolithography |
| 09/24/2009 | US20090239160 Method for preparing data for exposure and method for manufacturing photo mask |
| 09/24/2009 | US20090239159 Photomask, apparatus for manufacturing semiconductor device having the photomask, and method of manufacturing semiconductor device using the photomask |
| 09/24/2009 | US20090239158 Method of maintaining mask for semiconductor process |
| 09/24/2009 | US20090239157 Method for fabricating photomask |
| 09/24/2009 | US20090239156 Apparatus and Method for the Removal of Pellicles from Masks |
| 09/24/2009 | US20090239155 Fluorine-passivated reticles for use in lithography and methods for fabricating the same |
| 09/24/2009 | US20090238443 Pattern measurement methods and pattern measurement equipment |
| 09/24/2009 | US20090238441 Pattern inspection apparatus, pattern inspection method, and computer-readable recording medium storing a program |
| 09/24/2009 | US20090236509 Photosensitive resin composition, light-shielding color filter, method of producing the same and solid-state image sensor |
| 09/24/2009 | US20090235833 Housing and method for making the same |
| 09/24/2009 | DE102008015631A1 Verfahren und Vorrichtung zur Vermessung von Masken für die Photolithographie Method and apparatus for measuring masks for photolithography |
| 09/23/2009 | CN101539721A Frequency doubling using a photo-resist template mask |
| 09/23/2009 | CN101539720A Photomask, system for manufacturing semiconductor device, and method of manufacturing semiconductor device |
| 09/23/2009 | CN101539719A Manufacturing method of vibration amplitude mask template used for manufacturing sampling fiber grating |
| 09/23/2009 | CN101538698A Method and apparatus for fabricating vertical deposition mask |
| 09/23/2009 | CN100543588C A method of generating a mask having optical proximity correction features and parts manufacturing method |
| 09/23/2009 | CN100543582C Pattern size correcting device and pattern size correcting method |
| 09/23/2009 | CN100543566C Method for producing display substrate |
| 09/22/2009 | US7594216 Method and system for forming a mask pattern, method of manufacturing a semiconductor device, system forming a mask pattern on data, cell library and method of forming a photomask |
| 09/22/2009 | US7594199 Method of optical proximity correction design for contact hole mask |
| 09/22/2009 | US7593102 Polarization evaluation mask, polarization evaluation method, and polarization determination device |
| 09/22/2009 | US7592610 Mirror for use in a lithographic apparatus, lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 09/22/2009 | US7592130 Illumination improves imaging for hybrid pattern with a sufficient depth of focus by having a mask with a contact hole pattern including a hybrid pattern and using an illumination light that has plural poles and projecting an image of the mask onto a plate through projection optics |
| 09/22/2009 | US7592108 preparing a photomask for near-field exposure, having a light blocking film; position detection; producing a fine metal pattern having a small positional deviation with respect to the Si pattern on the insulating film; high yield |
| 09/22/2009 | US7592107 Polarized reticle, photolithography system, and method of fabricating a polarized reticle |
| 09/22/2009 | US7592106 Halftone type phase shift mask blank and phase shift mask thereof |
| 09/22/2009 | US7592105 Reducing the thickness of a portion of a radiation transparent substrate; the quartz-containing substrate can be protected with a patterned layer while being subjected to a dry etch |
| 09/22/2009 | US7592104 excellent in flatness after having been chucked by a mask stage of an exposure system; at least three of four corner portions of the flatness measurement area have a shape that rises toward the outer peripheral side; position accuracy |
| 09/22/2009 | US7592093 cost effective, industrial scale production of integrated cathode and anode electrode plates have embedded metal layout and improved heat dissipation capability; heat-radiating copper layer; batteries |
| 09/22/2009 | US7591600 Method and system for monitoring photolithography processing based on a batch change in light sensitive material |
| 09/17/2009 | WO2009113149A1 Device for measuring pattern length and method for measuring pattern length |
| 09/17/2009 | WO2009112655A1 Method of fabricating photomasks and device for implementing it |
| 09/17/2009 | US20090233239 Reticle for Use in a Semiconductor Lithographic System and Method for Modifying the Same |
| 09/17/2009 | US20090233193 Pattern prediction method, pattern correction method, method of fabricating semiconductor device, and recording medium |
| 09/17/2009 | US20090233192 Method for finishing surface of preliminary polished glass substrate |
| 09/17/2009 | US20090233191 mask for forming bullet portion of overlay target, comprising first structure on mask formed from first plurality of sub-structures, all oriented along first orientation and second structure on mask, second structure formed from second plurality of sub-structures, oriented along second orientation |
| 09/17/2009 | US20090233190 Mask blank and method for manufacturing transfer mask |
| 09/17/2009 | US20090233189 Device and method for obtaining exposure correction information, and manufacturing method of semiconductor device |
| 09/17/2009 | US20090233188 Reflective mask blank, reflective mask, method of inspecting reflective mask, and method for manufacturing the same |
| 09/17/2009 | US20090233187 Designing method of photo-mask and method of manufacturing semiconductor device using the photo-mask |
| 09/17/2009 | US20090233186 Scattering bar opc application method for sub-half wavelength lithography patterning field of the invention |
| 09/17/2009 | US20090233185 Extreme Ultraviolet Mask and Method for Fabricating the Same |
| 09/17/2009 | US20090233184 Manufacturing method of a semiconductor device |
| 09/17/2009 | US20090233183 improve the depth of focus margin to allow for the high integration of a semiconductor device; light blocking pattern having first and second patterns, and an assist feature disposed between the first and second patterns and including a dot pattern |
| 09/17/2009 | US20090233182 Photomask blank and method of producing the same, method of producing photomask, and method of producing semiconductor device |
| 09/17/2009 | US20090231521 Method for producing partition wall for color filter, substrate with partition wall for color filter, color filter for display element, and display device |
| 09/17/2009 | DE112007002735T5 EUV-Pellikel mit erhöhter EUV-Lichtdurchlässigkeit EUV pellicle with increased EUV light transmittance |
| 09/17/2009 | DE102009010276A1 Retikel zur Verwendung bei einem Halbleiterlithografiesystem und Verfahren zum Modifizieren desselben Of the same reticle for use in a semiconductor lithography system and method for modifying |
| 09/16/2009 | CN201311546Y Photo mask |
| 09/16/2009 | CN101533229A Reticle for projection exposure apparatus and exposure method using the same |
| 09/16/2009 | CN101533217A Extreme ultraviolet mask and method for fabricating the same |
| 09/16/2009 | CN101533216A Manufacturing method of a semiconductor device |
| 09/16/2009 | CN101533215A Tools and method for manufacturing integrated circuit mask |
| 09/16/2009 | CN101533176A A manufacturing method of liquid crystal display panel |
| 09/16/2009 | CN100541332C Lithographic apparatus and methods for use thereof |
| 09/15/2009 | US7590966 Data path for high performance pattern generator |
| 09/15/2009 | US7590277 Pattern inspecting method |
| 09/15/2009 | US7589819 Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systems |
| 09/15/2009 | US7588884 Enhancing the shallow alignment marks in a relatively thin layer such as the sensor layer so that subsequent layers such as write head layers can align directly to alignment marks created during the fabrication of the relatively thin layer; forming an oversized trench in the target area; photolithography |
| 09/15/2009 | US7588883 Etching polysilicon conductive layer and oxide dielectric layer using a patterned silicon nitride layer with high hydrogen concentration as a hard mask; removing the patterned silicon nitride layer using a low-temperature phosphoric acid solution without damaging layer structures |
| 09/15/2009 | US7588870 Dual layer workpiece masking and manufacturing process |
| 09/15/2009 | US7588869 Divided exposure method for making a liquid crystal display |
| 09/15/2009 | US7588867 Reflection mask, use of the reflection mask and method for fabricating the reflection mask |
| 09/15/2009 | US7588866 Filter arrays for liquid crystal displays and methods of making the same |
| 09/15/2009 | US7588865 Photo mask and method for manufacturing patterns using the same |
| 09/15/2009 | US7588864 First polarization direction of light transmitted through is unpatterned;second polarization layer is patterned and is to be transferred onto the photoresist layer,wherein the mask is chromium-free; excellent resolution due to the elimination of the transverse magnetic polarization light; semidonductors |
| 09/15/2009 | US7588815 Mask blank for charged particle beam exposure, method of forming mask blank and mask for charged particle beam exposure |
| 09/11/2009 | WO2007110777A3 Lithographic apparatus and patterning device |
| 09/10/2009 | US20090228860 Photomask data processing method, photomask data processing system and manufacturing method |
| 09/10/2009 | US20090228539 Generation of pattern data with no overlapping or excessive distance between adjacent patterns |