| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 10/21/2009 | EP2110847A1 Method for correcting mask pattern and method for manufacturing acceleration sensor and angular velocity sensor by using same |
| 10/21/2009 | EP2110707A1 Flare mapping in lithography |
| 10/21/2009 | CN201331498Y CCD imaging system fine regulating device |
| 10/21/2009 | CN101561633A Method for monitoring photoetching technology and monitoring mark |
| 10/21/2009 | CN100552548C Pellicle for photolithography and pellicle frame |
| 10/21/2009 | CN100552543C Photomask used for color filter technology |
| 10/21/2009 | CN100552542C Patterning layers comprised of spin-on ceramic films |
| 10/21/2009 | CN100552518C Manufacturing method of display device |
| 10/20/2009 | US7605908 Near-field exposure mask, near-field exposure apparatus, and near-field exposure method |
| 10/20/2009 | US7605906 Patterning systems using photomasks including shadowing elements therein |
| 10/20/2009 | US7604927 Methods of patterning using photomasks including shadowing elements therein and related systems |
| 10/20/2009 | US7604925 Exposure apparatus and method |
| 10/20/2009 | US7604921 Black matrix composition, black matrix prepared using the same, method of forming a black matrix pattern using the same and method of manufacturing a color filter substrate using the same |
| 10/20/2009 | US7604912 manufacturing a semiconductor device; quantitatively correction by first calculating a effective numerical aperture to a pattern in the each region based on a light intensity distribution, then adjusting to form a desired pattern |
| 10/20/2009 | US7604910 Exposure mask, method of forming resist pattern and method of forming thin film pattern |
| 10/20/2009 | US7604909 Method for improved manufacturability and patterning of sub-wavelength contact hole mask |
| 10/20/2009 | US7604908 Fine pattern forming method |
| 10/20/2009 | US7604907 improve patterns at the boundaries of first and second exposure regions during a double exposure process; overlap the two exposure regions to offset the boundary between the binary pattern and the second halftone pattern |
| 10/20/2009 | US7604906 Films for prevention of crystal growth on fused silica substrates for semiconductor lithography |
| 10/20/2009 | US7604905 Photomasks |
| 10/20/2009 | US7604904 Pellicle for lithography |
| 10/20/2009 | US7604903 three-dimensional small features; light blocking by the absorbing material SiON; light rays exit a lower surface of the substrate; scaling down device dimensions on semiconductor wafers |
| 10/20/2009 | CA2374207C A process for making a flexographic printing plate and a photosensitive element for use in the process |
| 10/15/2009 | WO2009125529A1 Method of generating mask pattern and method of forming pattern |
| 10/15/2009 | US20090259431 Electron beam writing apparatus and position displacement amount correcting method |
| 10/15/2009 | US20090258446 Pattern verification method, method of manufacturing semiconductor device, and recording media |
| 10/15/2009 | US20090258316 Method for patterning a covering material by using high-power exciting beam |
| 10/15/2009 | US20090258305 Memory medium storing original data generation program, memory medium storing illumination condition determination program, original data generation method, illumination condition determination method, and device manufacturing method |
| 10/15/2009 | US20090258303 Method of Fabricating a Photomask Using Self Assembly Molecule |
| 10/15/2009 | US20090258302 Sub-resolution assist feature of a photomask |
| 10/15/2009 | US20090258301 Fabricating and using hidden features in an image |
| 10/15/2009 | DE102009010855A1 Fotomaskenrohling, Fotomaske und Verfahren zum Herstellen einer Fotomaske Photomask blank, and photomask method for manufacturing a photomask |
| 10/14/2009 | CN101556435A Method for manufacturing mask blank and photomask |
| 10/14/2009 | CN101556432A Photomask blank, photomask, and method for manufacturing photomask |
| 10/14/2009 | CN101556431A Translational symmetrical mark and in-situ detection method of wave aberration of projection objective of photoetching machine |
| 10/14/2009 | CN101556430A Method and system for mask surface chemical treatment |
| 10/14/2009 | CN101556429A Cleaning method for controlling reticle CD value |
| 10/14/2009 | CN101555097A Glass data designing system, method and program |
| 10/14/2009 | CN101554758A Method for producing hot molding die with nano material modified PDMS |
| 10/14/2009 | CN100549831C Substrate possessing multiple circuit patterns and its manufacture method |
| 10/14/2009 | CN100549820C Method for forming dual damascene with improved etch profiles |
| 10/14/2009 | CN100549819C Metal mask plate |
| 10/14/2009 | CN100549818C Substrate for special micro-optical-etching |
| 10/14/2009 | CN100549817C In-situ balancing for phase-shifting mask |
| 10/14/2009 | CN100549737C Method for forming color filter and light emitting element layer, color display device and its producing method |
| 10/13/2009 | US7602961 Reference data generating method, pattern defect checking apparatus, pattern defect checking method, reference data generating program, and semiconductor device manufacturing method |
| 10/13/2009 | US7601485 Negates effect of fine dust causing defects; locating an exposure mask at a predetermined position with respect to a wafer, exposing a resist film, then displacing the exposure mask relative to the wafer by a predetermined dimension, and further exposing the resist film; semiconductors |
| 10/13/2009 | US7601471 the transferred patterns of respective evaluation patterns transferred using the test photo mask are calculated on the basis of the relationship with the opening ratio of the flare generation patterns; enables performing accurate pattern-dimension corrections against local flares |
| 10/13/2009 | US7601469 Plasma etching chamber and method for manufacturing photomask using the same |
| 10/13/2009 | US7601468 Providing a target containing a metal and silicon, and carrying out reactive sputtering in an atmosphere containing a reactive gas ( nitrogen, oxygen, fluorine) to form half-tone film on said transparent substrate |
| 10/13/2009 | US7601467 forming a 180 degrees phase-shift region by etching a first portion of reflective region, changing the physical structure of a second portion of the reflective region such that the second portion reflects extreme ultra-violet (EUV) light with the same intensity as the first portion |
| 10/13/2009 | US7601466 single mask with two or more focus planes to accommodate different exposures |
| 10/08/2009 | WO2009123172A1 Photomask blank, photomask, and method of manufacturing photomask blank |
| 10/08/2009 | WO2009123171A1 Photomask blank, photomask, and method for manufacturing photomask blank |
| 10/08/2009 | WO2009123170A1 Photomask blank, photomask, and method for manufacturing photomask blank |
| 10/08/2009 | WO2009123167A1 Photomask blank and method for manufacturing the same |
| 10/08/2009 | WO2009123166A1 Photomask blank and method for manufacturing the same |
| 10/08/2009 | WO2009122972A1 Reflection type mask blank, reflection type mask, and method for manufacturing the same |
| 10/08/2009 | WO2009122529A1 Alignment device for planar element, manufacturing equipment for the same, alignment method for the same, and manufacturing method for the same |
| 10/08/2009 | US20090253055 Reflective mask blank for euv lithography, and substrate with functional film for the mask blank |
| 10/08/2009 | US20090253054 Phase shift mask blank and method of manufacturing phase shift mask |
| 10/08/2009 | US20090253053 Method of Fabricating Halftone Phase Shift Mask |
| 10/08/2009 | US20090253052 Photomask and Method of Fabricating the Same |
| 10/08/2009 | US20090253051 Phase shift mask and method of fabricating the same |
| 10/08/2009 | DE102008016266A1 Transfer sample producing method for transfer mechanism i.e. photolithographic mask, involves optimizing transfer sample such that deviation of structure i.e. integrated circuit, is reduced by reference structure |
| 10/07/2009 | EP2107421A2 Lithographic pellicle |
| 10/07/2009 | EP1012779B1 Method and system for lithographic mask inspection |
| 10/07/2009 | CN101551587A Lithographic pellicle |
| 10/07/2009 | CN100547729C Method for fabricating semiconductor device using tungsten as sacrificial hard mask |
| 10/06/2009 | US7600213 Pattern data verification method, pattern data creation method, exposure mask manufacturing method, semiconductor device manufacturing method, and computer program product |
| 10/06/2009 | US7599053 Pattern defect inspection method, photomask manufacturing method, and display device substrate manufacturing method |
| 10/06/2009 | US7598020 Forming image with high resolving power; producing extremely fine circuit pattern; utilizing excimer laser light emitted from annular shaped source passed through mask having phase shifter |
| 10/06/2009 | US7598007 Pattern transfer mask, focus variation measuring method and apparatus, and semiconductor device manufacturing method |
| 10/06/2009 | US7598005 An approximated curve to the curve of the actual pattern, mask pattern can be formed based on an individual and specific polygonal approximation in accordance with the shapes |
| 10/06/2009 | US7598004 Film-depositing target and preparation of phase shift mask blank |
| 10/06/2009 | US7597491 Apparatus for and method of processing substrate |
| 10/01/2009 | US20090249266 Displacing Edge Segments On A Fabrication Layout Based On Proximity Effects Model Amplitudes For Correcting Proximity Effects |
| 10/01/2009 | US20090246891 Mark forming method and method for manufacturing semiconductor device |
| 10/01/2009 | US20090246718 Method of creating a graded anti-reflective coating |
| 10/01/2009 | US20090246655 Electron beam writing apparatus and method |
| 10/01/2009 | US20090246652 Color filter and method of fabricating the same |
| 10/01/2009 | US20090246651 Photosensitive resin composition, light-shielding color filter and production process therefor, and image sensor |
| 10/01/2009 | US20090246650 Photosensitive resin composition, light-shielding color filter and production process therefor, and image sensor |
| 10/01/2009 | US20090246649 Green curable composition, color filter and method of producing same |
| 10/01/2009 | US20090246648 Photolithography Scattering Bar Structure And Method |
| 10/01/2009 | US20090246647 Photomask blank, photomask, and methods of manufacturing the same |
| 10/01/2009 | US20090246646 Lithographic pellicle |
| 10/01/2009 | US20090246645 Photomask blank, photomask, and methods of manufacturing the same |
| 10/01/2009 | US20090246644 Low stress pellicle frames and reticle pellicle assemblies |
| 10/01/2009 | US20090245621 System And Method Of Providing Mask Defect Printability Analysis |
| 10/01/2009 | US20090245619 Image density-adapted automatic mode switchable pattern correction scheme for workpiece inspection |
| 10/01/2009 | US20090244531 Optical apparatus, photomask inspecting apparatus, and exposure apparatus |
| 10/01/2009 | US20090244530 Mask inspection apparatus |
| 10/01/2009 | US20090244502 Methods of Compensating Lens Heating, Lithographic Projection System and Photo Mask |
| 10/01/2009 | US20090244134 Liquid droplet discharging apparatus, liquid discharging method, color filter producing method, and organic el device producing method |
| 10/01/2009 | US20090243022 Method of forming mask for lithography, method of forming mask data for lithography, method of manufacturing back-illuminated solid-state imaging device, back-illuminated solid-state imaging device and electronic device |
| 10/01/2009 | US20090242800 Electron-beam dimension measuring apparatus and electron-beam dimension measuring method |
| 10/01/2009 | US20090242787 Charged-particle beam writing method and charged-particle beam writing apparatus |
| 10/01/2009 | US20090241274 Method of removing particles on photomask |
| 10/01/2009 | DE102009014610A1 Fotomaskenrohling, Fotomaske und Verfahren zu ihrer Herstellung Photomask blank, and photomask processes for their preparation |