G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
11/2009
11/18/2009	CN100561715C Isolating ring substrate, mask plate and forming method thereof
11/18/2009	CN100561358C Pattern decomposition method for double exposure
11/18/2009	CN100561350C Optical approximate correction method and its photomask pattern
11/18/2009	CN100561349C Method for producing COB DRAM bit line for preventing it from collapse
11/18/2009	CN100561348C Feature optimization using interference mapping lithography
11/18/2009	CN100561340C Optical short distance amending method
11/18/2009	CN100561339C Photo mask and manufacturing method of thin-film transistor substrates
11/18/2009	CN100561338C Method for repairing light mask image
11/18/2009	CN100560351C Optical element with an opaque chrome coating having an aperture and method of making same
11/17/2009	US7620930 Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography
11/17/2009	US7619718 Method and system for active purging of pellicle volumes
11/17/2009	US7618877 Semiconductor wafer, method of manufacturing the same, and method of manufacturing a semiconductor device
11/17/2009	US7618754 Multilayer; radiation transparent substrate; shielded zones; exposure to light
11/17/2009	US7618753 Photoresists; etching; semiconductor integrated circuit, charge-coupled device, color fiter, liquid crystal display device, magnetic head
11/17/2009	US7618752 of a contact lithography module, a pattern tool and a substrate to prevent pattern misalignment
11/17/2009	US7618751 RET for optical maskless lithography
11/12/2009	WO2009136564A1 Reflective mask, reflective mask blank and method for manufacturing reflective mask
11/12/2009	US20090281778 Method and system for identifying weak points in an integrated circuit design
11/12/2009	US20090280416 Black photosensitive resin composition, and color filter and method of producing the same
11/12/2009	US20090280415 Transparent substrate for mask blank and mask blank
11/12/2009	US20090278569 Semiconductor Device and its Manufacturing Method, Semiconductor Manufacturing Mask, and Optical Proximity Processing Method
11/12/2009	DE102008015806A1 Method for calibrating simulation method for simulating manufacturing step of component, involves producing preliminary structure during predetermined condition, and structure by preliminary structure
11/11/2009	EP2117035A1 Mask for multicolumn electron beam exposure, electron beam exposure device and exposure method employing mask for multicolumn electron beam exposure
11/11/2009	CN201345031Y Film convenient for examination of photolithographic mask plate picture
11/11/2009	CN101576714A Alignment datum plate of photoetching device and manufacturing method thereof
11/11/2009	CN101576709A Light shield and manufacturing method thereof
11/11/2009	CN101576708A Method of photolithographic patterning
11/11/2009	CN100559270C Grey mask
11/11/2009	CN100559269C Photomasks including shadowing elements therein and related methods and systems
11/11/2009	CN100559267C Light shield positioning device
11/11/2009	CN100558735C Perfluoropolyether amide-linked phosphonates, phosphates, and derivatives thereof
11/10/2009	US7617477 Method for selecting and optimizing exposure tool using an individual mask error model
11/10/2009	US7615738 Scanning probe microscope assembly and method for making spectrophotometric, near-field, and scanning probe measurements
11/10/2009	US7615337 forming an anisotropic cap over a photoresist feature by forming a first photoactive cap over said photoresist feature that extends vertically and not laterally beyond the edges of such photoresist feature; thickness of the photoresist feature may be enhanced without increasing the width of the pattern
11/10/2009	US7615336 a shielding pattern partially formed on a transparent substrate; a first halftone transmission pattern partially formed on the transparent substrate; and a second halftone transmission pattern formed on the first halftone transmission layer
11/10/2009	US7615319 Quick and accurate modeling of transmitted field
11/10/2009	US7615318 Printing of design features using alternating PSM technology with double mask exposure strategy
11/05/2009	WO2009106903A3 A photomask and devices with nano-sized elements
11/05/2009	WO2009106288A3 Method for processing an object with miniaturized structures
11/05/2009	US20090274981 Method of detecting repeating defects in lithography masks on the basis of test substrates exposed under varying conditions
11/05/2009	US20090274962 Pellicle and method for producing pellicle
11/05/2009	US20090273772 Light reflecting mask, exposure apparatus, and measuring method
11/05/2009	US20090273100 Integrated circuit having interleaved gridded features, mask set and method for printing
11/04/2009	EP2113809A1 Pellicle and method for fabrication thereof
11/04/2009	EP2113109A1 Simulation site placement for lithographic process models
11/03/2009	US7614034 Method and apparatus for generating OPC rules for placement of scattering bar features utilizing interface mapping technology
11/03/2009	US7614033 Mask data preparation
11/03/2009	US7614027 Methods for forming a MRAM with non-orthogonal wiring
11/03/2009	US7614026 Pattern forming method, computer program thereof, and semiconductor device manufacturing method using the computer program
11/03/2009	US7612980 Method and structure for electrostatic discharge protection of photomasks
11/03/2009	US7612865 Pattern writing apparatus and pattern writing method
11/03/2009	US7612847 Generation of pattern data with no overlapping or excessive distance between adjacent patterns
11/03/2009	US7611809 Multi-layer, attenuated phase-shifting mask
11/03/2009	US7611808 Halftone type phase shift mask blank and halftone type phase shift mask
11/03/2009	US7611807 Method for forming poly-silicon film
11/03/2009	US7611806 mask containing first, second and third regions, each comprising an element, first and second element transparent to light while third element opaque to the light, and each having a side that is smaller than a wavelength of such light; each is spherical in shape; chrome-on-glass (COG) mask
11/03/2009	US7611572 Copper pentadecabromophthalocyanine sulfonate; copper hexadecabromophthalocyanine green pigments; red/green/blue color filter for liquid crystal displays; superb light transmission properties;discoloration inhibition; excellent spectral curve characteristics/durability; light fastness;heat resistance
10/2009
10/29/2009	WO2009131660A1 Image mask and image mask assembly
10/29/2009	WO2009130956A1 Reflective mask blank for euv lithography, and reflective mask for euv lithography
10/29/2009	WO2009129858A1 High aspect ratio microstructures
10/29/2009	US20090271759 Contrast-based resolution enhancement for photolithographic processing
10/29/2009	US20090270007 Method of manufacturing liquid crystal display
10/29/2009	US20090269683 Radiation-sensitive resin composition and color filters
10/29/2009	US20090269682 Method of forming etching mask, etching method using the etching mask, and method of fabricating semiconductor device including the etching method
10/29/2009	US20090269681 Method of detecting exposure boundary position, and method of fabricating semiconductor device
10/29/2009	US20090269680 Image mask and image mask assembly
10/29/2009	US20090269679 Phase Shift Mask for Double Patterning and Method for Exposing Wafer Using the Same
10/29/2009	US20090269678 Method for making a reflection lithographic mask and mask obtained by said method
10/29/2009	US20090268189 Masks, lithography device and semiconductor component
10/29/2009	US20090268131 Touch panel, color filter substrate and fabricating method thereof
10/28/2009	CN101566791A Light shield with antistatic damage
10/28/2009	CN101566790A Mask plate for producing liquid crystal display panel
10/28/2009	CN101566789A Mask combination with scattering strip and photoetching method
10/28/2009	CN101566788A Repairing method of photoresist pattern
10/28/2009	CN101566787A Method for washing mask
10/28/2009	CN101566786A Method for repairing phase shift mask defect
10/28/2009	CN100555327C Method and system for detecting defects
10/27/2009	US7610574 Method and apparatus for designing fine pattern
10/27/2009	US7608528 Substrate cover, and charged particle beam writing apparatus and method
10/27/2009	US7608370 Exposure mask and method for manufacturing semiconductor device using the same
10/27/2009	US7608369 Photomask to which phase shift is applied and exposure apparatus
10/27/2009	US7608368 Pattern forming method, photomask manufacturing method, semiconductor device manufacturing method, and computer program product
10/27/2009	US7608367 Electrodeposition; photoresists; semiconductors; microelectromechanical systems
10/22/2009	WO2009128560A1 Tio2-containing silica glass for optical member for euv lithography
10/22/2009	WO2009128327A1 Cleaning water for electronic material, method of cleaning electronic material, and system for supplying water containing dissolved gases
10/22/2009	US20090265680 Method and system for correcting a mask pattern design
10/22/2009	US20090263978 Laser mask and crystallization method using the same
10/22/2009	US20090263735 Exposure apparatus
10/22/2009	US20090263733 Photo mask, focus measuring method using the mask, and method of manufacturing semiconductor device
10/22/2009	US20090263732 Mask patterns including gel layers for semiconductor device fabrication
10/22/2009	US20090263731 Method for Fabricating Fine Pattern in Photomask
10/22/2009	US20090263730 Extreme ultra violet lithography mask and method for fabricating the same
10/22/2009	US20090263729 Templates for imprint lithography and methods of fabricating and using such templates
10/22/2009	US20090262398 Halftone image generation method, threshold matrix generation method, threshold matrix, prinitng plate manufacturing method, and printing plate
10/22/2009	US20090262340 Optical exterior inspection apparatus and method
10/22/2009	US20090262327 Mask transport system configured to transport a mask into and out of a lithographic apparatus
10/22/2009	DE102009015589A1 Phasenverschiebungsmaskenrohling und Verfahren zum Herstellen einer Phasenverschiebungsmaske Phase shift mask blank and method of manufacturing a phase shifting mask
10/22/2009	DE102009010854A1 Fotomaskenrohling, Fotomaske und Verfahren zu ihrer Herstellung Photomask blank, and photomask processes for their preparation
10/22/2009	DE102008019341A1 Verfahren zur Analyse von Masken für die Photolithographie A method for analyzing masks for photolithography
10/21/2009	EP2111033A1 Halftone image generation method, threshold matrix generation method, threshold matrix, printing plate manufacturing method, and printing plate

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