Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
12/2009
12/09/2009CN201359680Y Mask plate cleaning device
12/09/2009CN101598894A Photomask, thin film transistor element and manufacturing method of thin film transistor element
12/09/2009CN101598893A Light mask for preventing electrostatic damage
12/09/2009CN101596694A Masking film chamfering edge edger and machining process thereof
12/09/2009CN100568456C Using of second exposure to assit a PSM exposure in printing tight space adjacent to large feature
12/09/2009CN100568455C Reticle and optical characteristic measuring method
12/09/2009CN100568100C Checking method and element manufacture method
12/09/2009CN100568092C Mask, method of manufacturing mask, device for manufacturing mask, and method of manufacturing film of luminescent material
12/09/2009CN100568091C Translucent stacked film, photomask blank, photomask and fabrication method thereof
12/08/2009US7631288 Optical proximity correction performed with respect to limited area
12/08/2009US7631287 Calculating method, verification method, verification program and verification system for edge deviation quantity, and semiconductor device manufacturing method
12/08/2009US7630068 Method and system of defect inspection for mask blank and method of manufacturing semiconductor device using the same
12/08/2009US7629109 Exposure control for phase shifting photolithographic masks
12/08/2009US7629090 Reticle and method of manufacturing method the same
12/08/2009US7629089 Low-expansion glass substrate for a reflective mask and reflective mask
12/08/2009US7629088 Mask defect repairing method and semiconductor device manufacturing method
12/08/2009US7629087 enhanced resolution; provides selective regional optimization of illumination type according to the type of image being formed using the photomask
12/03/2009WO2009145032A1 Method for producing color filter, method for producing substrate with pattern, and small photomask
12/03/2009WO2009144039A1 Base material for preparing a stencil for screen printing
12/03/2009US20090298205 Pattern verifying method, pattern verifying device, program, and manufacturing method of semiconductor device
12/03/2009US20090297988 Manufacturing method of semiconductor integrated circuit device
12/03/2009US20090297959 large working accuracy tolerance margin of the correction portion of a clear defect in half tone mask; shading portion having a transmissivity of 0 to 2% or 2 to 6% in the removed opaque defect portion; semitransparent portion having a transmissivity larger than shading portion at the peripheral portion
12/03/2009US20090297958 Exposure mask and exposure method using the same
12/03/2009US20090297957 Exposure mask and method for manufacturing semiconductor device using the same
12/03/2009US20090297956 light intensity inside dark area is reduced with non-printable clear cutout inside the feature; mask has same optical pathlength outside the feature adjacent to outer boundary as at the cutout; center portions of rectangular areas protected if corresponding opaque features are modified with clear cutouts
12/03/2009US20090295285 Spontaneous emission display, spontaneous emission display manufacturing method, transparent conductive film, electroluminescence device, solar cell transparent electrode, and electronic paper transparent electrode
12/02/2009EP2128699A1 Base material for preparing a stencil for screen printing
12/02/2009EP2128698A2 method for preparing a composite printing form using a template
12/02/2009EP2126631A1 Method to form a pattern of functional material on a substrate using a stamp having a surface modifying material
12/02/2009EP2126629A1 Device and method for manufacturing a particulate filter with regularly spaced micropores
12/02/2009CN101592871A Manufacturing method of semiconductor integrated circuit device
12/02/2009CN101592858A Method for amending photoresist pattern error
12/02/2009CN101592827A Liquid crystal display and manufacturing method thereof
12/02/2009CN100565347C Pattern forming method, semiconductor device manufacturing method and exposure mask set
12/02/2009CN100565345C Method for manufacturing lithographic pringting apparatus and equipment
12/02/2009CN100565339C Image recording material and planographic printing plate
12/02/2009CN100565195C Method of inspecting an mura defect in a pattern and apparatus used for the same
12/02/2009CN100564196C Stencil-carrying container
12/01/2009US7627165 Pattern inspection method and apparatus using linear predictive model-based image correction technique
12/01/2009US7627164 Pattern inspection method and apparatus with high-accuracy pattern image correction capability
12/01/2009US7626711 Method and system for measuring patterned structures
12/01/2009US7626710 Method and system for measuring patterned structures
12/01/2009US7626185 Patterning compositions, masks, and methods
12/01/2009US7625694 Selective provision of a diblock copolymer material
12/01/2009US7625693 Method of fabricating one-way transparent optical system
12/01/2009US7625678 Mask data creation method
12/01/2009US7625677 Half-tone stacked film, photomask-blank, photomask and fabrication method thereof
12/01/2009US7625676 photomask technique used in micromachining of a semiconductor integrated circuit, a charge-coupled device (CCD), a color filter for a liquid crystal display (LCD) element, a magnetic head; chromium-based fluorine dry-etchable light shielding film, and another antireflective silicon-based shielding film
12/01/2009US7625675 Method for producing masks for photolithography and the use of such masks
11/2009
11/26/2009WO2009142152A1 Non-inspection region restriction verifying method, correcting method, program, and device
11/26/2009US20090293039 Method for manufacturing a photomask
11/26/2009US20090293038 Method and correction apparatus for correcting process proximity effect and computer program product
11/26/2009US20090291512 Semiconductor device pattern verification method, semiconductor device pattern verification program, and semiconductor device manufacturing method
11/26/2009US20090291373 Green Photoresist and Color Filter Substrate using the same
11/26/2009US20090291372 Pellicle and method for producing pellicle
11/26/2009US20090289257 Exposure mask using gray-tone pattern, manufacturing method of tft substrate using the same and liquid crystal display device having the tft substrate
11/26/2009US20090289246 Method for producing at least one multilayer body, and multilayer body
11/26/2009US20090288867 Circuit structure and photomask for defining the same
11/26/2009US20090288448 Titania-doped quartz glass and making method, euv lithographic member and photomask substrate
11/25/2009EP2124102A2 Pellicle and method for producing pellicle
11/25/2009CN201352302Y Photomask box
11/25/2009CN101589340A Pressure-sensitive adhesive tape for the protection of photo masks
11/25/2009CN101587823A Inflation equipment
11/25/2009CN101587297A Preparation for titanium dioxide based organic-inorganic composite film and method for preparing micro-optic device by adopting film
11/25/2009CN101587294A Pellicle and method for producing pellicle
11/25/2009CN101587293A Light shield, hole arrangement and method for reducing dishing of metal plug
11/25/2009CN101587292A Method for manufacturing micro optical device by mobile digital mask
11/25/2009CN101587291A Method of screen printing fine mask on silicon chip surface based on UV curing process
11/25/2009CN101587200A Colorful optical filter substrate and patterned mask
11/25/2009CN100562803C Gray mask and method for manufacturing gray mask
11/25/2009CN100562802C Method of manufacturing photomask
11/25/2009CN100562801C Raster polarization photomask plate and its application in projection photoetching system
11/24/2009US7623620 Reflective X-ray microscope and inspection system for examining objects with wavelengths <100 nm
11/24/2009US7623557 Wavelength converting optical system, laser light source, exposure apparatus, mask examining apparatus, and macromolecular crystal lens machining device
11/24/2009US7622244 Method for contaminant removal
11/24/2009US7622228 Halftone phase shift mask blank, and method of manufacture
11/24/2009US7622227 Phase-shift photomask-blank, phase-shift photomask and fabrication method thereof
11/24/2009US7622050 Polished glass substrate is applied with surface treatment by first-step gas-cluster ion beam etching to improve flatness, substrate is applied with surface treatment by second-step gas-cluster ion beam etching under different irradiation conditions to improve surface roughness, finish-polished; flatness
11/19/2009WO2009139063A1 Pattern generating method and pattern generating program
11/19/2009WO2009138835A1 Method for the real-time monitoring of integrated circuit manufacture through localized monitoring structures in opc model space
11/19/2009WO2002073310A3 Binary and phase-shift photomasks
11/19/2009US20090286358 Method of fabricating integrated circuits, integrated circuit component mask layout set, and component photomask set
11/19/2009US20090286171 Lithographic mask and manufacturing method thereof
11/19/2009US20090286170 Pellicle
11/19/2009US20090286169 Pellicle for use in semiconductor lithography
11/19/2009US20090286168 Method for stripping pellicle and stripping apparatus used therein
11/19/2009US20090286167 Cross technology reticles
11/19/2009US20090286166 Process for smoothing surface of glass substrate
11/19/2009US20090284591 Reticle defect inspection apparatus and reticle defect inspection method
11/19/2009US20090283440 Packaging for active substance-containing films and method for producing them
11/19/2009DE102009021434A1 Maskendefekt-Überprüfungsvorrichtung und Maskendefekt-Überprüfungsverfahren Mask defect inspection apparatus and mask defect inspection method
11/18/2009EP2120093A1 Pellicle for use in semiconductor lithography
11/18/2009EP2120092A1 Pellicle
11/18/2009EP2120091A2 Method for stripping pellicle and stripping apparatus used therein
11/18/2009CN201348719Y Lifting pin for plasma reaction chamber
11/18/2009CN101583906A EUV pellicle with increased EUV light transmittance
11/18/2009CN101582373A Gas charging equipment and gas inlet port device
11/18/2009CN101581877A Method for stripping pellicle and stripping apparatus used therein
11/18/2009CN101581876A Pellicle for use in semiconductor lithography
11/18/2009CN101581875A Protective film component
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