| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 01/06/2010 | CN101620372A Photomask cleaning methods |
| 01/06/2010 | CN100578355C Mask for depositing method of fabricating the mask |
| 01/06/2010 | CN100578354C Method and apparatus for correction of defects in lithography masks |
| 01/05/2010 | US7644389 Method for producing a mask for the lithographic projection of a pattern onto a substrate |
| 01/05/2010 | US7644387 Semiconductor mask correcting device and semiconductor mask correcting method |
| 01/05/2010 | US7643668 Workpiece inspection apparatus, workpiece inspection method and computer-readable recording medium storing program |
| 01/05/2010 | US7643188 Method of recording an exposure pattern in a recording layer of a holographic mask, method of forming an exposure pattern in a photosensitive material film, method of manufacturing a semiconductor device and method of manufacturing an electro-optic device |
| 01/05/2010 | US7642103 Method of fabricating semiconductor device |
| 01/05/2010 | US7642043 Rework process for photoresist film |
| 01/05/2010 | US7642035 Sensitized photochemical switching for cholesteric liquid crystal displays |
| 01/05/2010 | US7642017 Reflective photomask, method of fabricating the same, and reflective blank photomask |
| 01/05/2010 | US7642016 allows the lithographic measurement of the effective phase of an attenuated phase test structure at similar sensitivity to the lithography used for phase measurement of alternating aperture phase masks; capable of testing for 180 degrees phase differential in small-pitch attenuated phase-shift gratings |
| 01/05/2010 | US7641806 Manufacturing method for membrane member |
| 12/31/2009 | US20090325085 Stencil design and method for improving character density for cell projection charged particle beam lithography |
| 12/31/2009 | US20090325084 Photomask blank, photomask, and methods of manufacturing the same |
| 12/31/2009 | US20090325083 Photomask manufacturing method |
| 12/31/2009 | US20090325082 Method for fabricating patterns using a photomask |
| 12/31/2009 | US20090325081 Exposure mask and manufacturing method of a semiconductor using the same |
| 12/31/2009 | US20090325080 Method and Structure for Fabricating Dark-Periphery Mask for the Manufacture of Semicondutor Wafers |
| 12/31/2009 | US20090324450 Nanometer Scale Instrument for Biochemically, Chemically, or Catalytically Interacting with a Sample Material |
| 12/31/2009 | US20090322757 Generation of pattern data with no overlapping or excessive distance between adjacent dot patterns |
| 12/31/2009 | US20090321891 Method and apparatus for generating reticle data |
| 12/31/2009 | DE102009030299A1 Fotomaskenherstellungsverfahren Photomask manufacturing process |
| 12/31/2009 | DE102009025011A1 Maskenrohlingglassubstrat, Maskenrohlingglassubstratherstellungsverfahren, Maskenrohlingherstellungsverfahren und Maskenherstellungsverfahren Mask blank glass substrate, mask blank glass substrate manufacturing method, mask blank manufacturing processes and mask manufacturing process |
| 12/31/2009 | DE102008016266B4 Verfahren zum Optimieren des Layouts wenigstens einer Transfereinrichtung zum Herstellen direkter und indirekter Strukturen A method for optimizing the layout of at least one transfer means for establishing direct and indirect structures |
| 12/30/2009 | WO2009157506A1 Phase shift mask blank and phase shift mask |
| 12/30/2009 | WO2009157058A1 Method for designing photomask, equipment for designing photomask, program, recording medium, and method for manufacturing semiconductor device |
| 12/30/2009 | EP2139026A1 Reflective mask blank for euv lithography |
| 12/30/2009 | EP1361478B1 Method of manufacturing phase shift mask and phase shift mask |
| 12/30/2009 | CN101614953A Method and system for evaluating an object that has a repetitive pattern |
| 12/30/2009 | CN101614952A Exposure mask and manufacturing method of a semiconductor using the same |
| 12/30/2009 | CN101614924A Pixel structure, manufacturing method thereof and display panel |
| 12/30/2009 | CN101614920A Method for manufacturing liquid crystal display device |
| 12/30/2009 | CN100576528C Test substrate, test substrate mask and test substrate forming method |
| 12/30/2009 | CN100576434C Chip identification production method and light shield |
| 12/30/2009 | CN100576093C Optical proximity correction using chamfers and rounding at corners |
| 12/30/2009 | CN100576088C Exposure device and method for photomask haze reduction via ventilation |
| 12/30/2009 | CN100576066C Method for optimizing pattern intensity outline |
| 12/29/2009 | US7640530 Method for inspecting mask |
| 12/29/2009 | US7640522 Method and system for placing layout objects in a standard-cell layout |
| 12/29/2009 | US7639864 Method, program product and apparatus for optimizing illumination for full-chip layer |
| 12/29/2009 | US7638268 solvent remove the first photoresist film, forming a second photoresist film over the second antireflection silicone resin film which is over the first antireflection silicone resin film; lower cost and provide an excellent resist pattern |
| 12/29/2009 | US7638266 Ultrathin polymeric photoacid generator layer and method of fabricating at least one of a device and a mask by using said layer |
| 12/29/2009 | US7638247 Method for electron beam proximity effect correction |
| 12/29/2009 | US7638245 Mask set for variable mask field exposure |
| 12/29/2009 | US7638244 based on proximity effect; photomasks |
| 12/29/2009 | US7637599 Liquid ejection head, method of manufacturing same, and image forming apparatus |
| 12/24/2009 | US20090317732 Pattern verification-test method, optical image intensity distribution acquisition method, and computer program |
| 12/24/2009 | US20090317731 phase shift (halftone) mask fabricated through a lift-off process to avoid uneven thin film thickness due to an etching process, lower manufacturing cost, simpler; use to make TFT LCDs (thin film transistor liquid crystal displays) |
| 12/24/2009 | US20090317730 System and a method for improved crosshatch nanomachining of small high aspect three dimensional structures by creating alternating superficial surface channels |
| 12/24/2009 | US20090317729 Mask blank glass substrate, mask blank glass substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method |
| 12/24/2009 | US20090317728 Method for Fabricating Extreme Ultraviolet Lithography Mask |
| 12/24/2009 | US20090317727 Means for transferring a pattern to an object |
| 12/24/2009 | US20090315139 Patterning method and semiconductor device |
| 12/24/2009 | US20090314965 Method and System for Manufacturing Openings on Semiconductor Devices |
| 12/23/2009 | WO2009154238A1 Reflective mask blank for euv lithography |
| 12/23/2009 | WO2009153335A2 Optical functional surfaces |
| 12/23/2009 | CN101609787A Method for forming patterns of semiconductor device by using mixed assist feature system |
| 12/23/2009 | CN101609785A Valve block structure with pressure stabilization function |
| 12/23/2009 | CN101609784A Air valve structure for transplanting container |
| 12/23/2009 | CN101609260A Shielded air inlet and outlet structure of transplanting vessel |
| 12/23/2009 | CN101609259A Storage cabinet with pressure stabilization function |
| 12/23/2009 | CN101609257A Pressure-maintaining system applied to transplanting container |
| 12/23/2009 | CN101609253A Method for fabricating extreme ultraviolet lithography mask |
| 12/23/2009 | CN101609252A Pattern repairing method |
| 12/23/2009 | CN100573820C Substrate processing apparatus |
| 12/23/2009 | CN100573317C Continuous-surface shape mask moving photoetching exposure device |
| 12/23/2009 | CN100573042C Method of inspecting unevenness defect of pattern and device therefor |
| 12/22/2009 | US7636910 Photomask quality estimation system and method for use in manufacturing of semiconductor device, and method for manufacturing the semiconductor device |
| 12/22/2009 | US7635547 Preparing a composite layer; forming a trench by etching the composite layer in the non-pattern areas from the second side of the membrane forming thin layer; forming an auxiliary strut by filling a support layer inside the trench; forming a main strut by removing sections of the substrate |
| 12/22/2009 | US7635546 patterned film stacks formed on radiation transparent substrates, used in the semiconductor industry to manufacture integrated circuits or chips |
| 12/22/2009 | US7635545 Photomask features with interior nonprinting window using alternating phase shifting |
| 12/22/2009 | US7635544 Transparent substrate for mask blank and mask blank |
| 12/17/2009 | US20090311613 Mask for multi-column electron beam exposure, and electron beam exposure apparatus and exposure method using the same |
| 12/17/2009 | US20090311612 Photomask |
| 12/17/2009 | DE102009014609A1 Fotomaskenrohling, Fotomaske und Verfahren zu ihrer Herstellung Photomask blank, and photomask processes for their preparation |
| 12/16/2009 | EP2133746A2 Method and system for evaluating an object that has a repetitive pattern |
| 12/16/2009 | EP2133742A1 Exposure method using pattern dependant dose control |
| 12/16/2009 | EP2132556A2 Device for sorting and concentrating electromagnetic energy and apparatus comprising at least one such device |
| 12/16/2009 | CN100570497C Production of automatic optical approximate correcting regulation |
| 12/16/2009 | CN100570490C Lithographic apparatus, reticle exchange unit and device manufacturing method |
| 12/16/2009 | CN100570480C Method for mask design |
| 12/16/2009 | CN100570479C Optical near-correction optical mask and colour filter piece manufacturing method |
| 12/15/2009 | US7634754 Simulation of aerial images |
| 12/15/2009 | US7632627 Photomask apparatus, photomask manufacturing method, and mask pattern forming method |
| 12/15/2009 | US7632621 Mask |
| 12/15/2009 | US7632614 Circuit pattern exposure method and mask |
| 12/15/2009 | US7632613 comprising light shielding portions and openings formed on a transparent substrate; bias correction which expands the light shielding portions pattern to both sides; used for manufacturing a semiconductor; improve a pattern resolution quality |
| 12/15/2009 | US7632612 Halftone phase shift mask blank, halftone phase shift mask, and method of producing the same |
| 12/15/2009 | US7632611 simple method to provide the border of the 0 degrees -phase shift region has a uniform width; prevents a chrome pattern formed in the 0 degrees -phase shift region of the mask substrate from being irregular; cost efficiency |
| 12/15/2009 | US7632610 Sub-resolution assist features |
| 12/15/2009 | US7632609 irradiating an optical film formed on a transparent substrate with flash light; stack structure; phase-shift method; prevent particle-caused defects; semiconductor integrated circuit, a charge-coupled device, a color filter for a liquid crystal device, a magnetic head |
| 12/10/2009 | WO2009148303A1 Method for manufacturing a stencil for screen printing |
| 12/10/2009 | WO2009147014A1 Multilayer mirror and lithographic apparatus |
| 12/10/2009 | US20090305439 Method for correcting mask pattern and method for manufacturing acceleration sensor and angular velocity sensor by using the method for correcting the mask pattern |
| 12/10/2009 | US20090305172 Lithography simulation method, computer program product, and pattern forming method |
| 12/10/2009 | US20090305153 Substrate processing method and mask manufacturing method |
| 12/10/2009 | US20090305149 Dummy light-exposed substrate, method of manufacturing the same, immersion exposure apparatus, and device manufacturing method |
| 12/10/2009 | US20090305148 Pattern data creating method, photomask fabricating method, and method of manufacturing semiconductor device |
| 12/10/2009 | US20090305147 masks comprise lower mirror covering substrate, and two types of reflecting zones Z1 and Z2 in order to form phase shift mask; an etch stop layer is interposed between lower mirror and an upper reflective structure, this layer having a thickness such that it behaves like a reflective resonant cavity |