| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 02/04/2010 | US20100030545 Pattern shape predicting method and pattern shape predicting apparatus |
| 02/04/2010 | US20100028789 Method of controlling exposure device, method of fabricating semiconductor, and photomask |
| 02/04/2010 | US20100028788 Manufacturing method of photomask for multiple exposure and semiconductor device manufacturing method using above photomask |
| 02/04/2010 | US20100028787 Substrate for euv mask blanks |
| 02/04/2010 | US20100025277 Thin plate storage transport system and reticle case using the same |
| 02/03/2010 | EP2024069B1 Production of micro- and nanopore mass arrangements by self-organization of nanoparticles and sublimation technology |
| 02/03/2010 | CN101639625A Mask and method for manufacturing the same |
| 02/03/2010 | CN101639624A Titania-doped quartz glass member and making method |
| 02/03/2010 | CN101639623A Method and device for detecting photomask |
| 02/03/2010 | CN100587606C Reverse illumination adjacent and contact nanometer lithographic equipment |
| 02/03/2010 | CN100587594C Mask pattern of semiconductor device and method for forming the same |
| 02/03/2010 | CN100587593C Exposing mask and production method and exposing method thereof |
| 02/02/2010 | US7657865 Computer-readable recording medium recording a mask data generation program, mask data generation method, mask fabrication method, exposure method, and device manufacturing method |
| 02/02/2010 | US7657863 Pattern area value calculating method, proximity effect correcting method, and charged particle beam writing method and apparatus |
| 02/02/2010 | US7656516 Pattern inspection apparatus |
| 02/02/2010 | US7656507 Processing unit, exposure apparatus having the processing unit, and protection unit |
| 02/02/2010 | US7656504 Projection exposure apparatus with luminous flux distribution |
| 02/02/2010 | US7655904 Target workpiece inspection apparatus, image alignment method, and computer-readable recording medium with program recorded thereon |
| 02/02/2010 | US7655510 Manufacturing method of display device and exposure system for that |
| 02/02/2010 | US7655390 Has interface structure between negative dielectrics and dielectric; is provided with configuration in which plasmon intensity with respect to microstructure in surface or in vicinity thereof is detected by interface structure and positional relationship between interface and microstructure is detected |
| 02/02/2010 | US7655369 Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device |
| 02/02/2010 | US7655364 formed with resist pattern by electron beam writing and having light-shielding film and etching mask film of inorganic-based material resistant to etching, on transparent substrate |
| 02/02/2010 | US7655363 Photomasks; shielding assembly comprises airtight sealing and gas flow, diffusing, purging; reticle pods for photolithography; reduced electrostatic discharge |
| 02/02/2010 | US7655362 Masks of semiconductor devices and methods of forming mask patterns |
| 02/02/2010 | US7654637 Photoimageable nozzle members and methods relating thereto |
| 01/28/2010 | WO2010010915A1 Optical member for photomask and method for manufacturing the optical member |
| 01/28/2010 | US20100021832 a coloring agent including an anthraquinone-based dye and an organic pigment; a meta-cresol-formaldehyde novolak resin binder, hexakis/methoxymethyl/melamine crosslinker and propylene glycol methyl ether propionate as a solvent, benzophenone photopolymerization initiator; color filter |
| 01/28/2010 | US20100021831 Transparent colourants and colourant compositions, and their use |
| 01/28/2010 | US20100021830 Aromatic ring-containing polymer, polymer mixture, antireflective hardmask composition, and associated methods |
| 01/28/2010 | US20100021829 Deposition mask and method for manufacturing organic light emitting display using the same |
| 01/28/2010 | US20100021828 Halftone mask and method of fabricating the same, and method of fabricating display device using the same |
| 01/28/2010 | US20100021827 Method of Designing Sets of Mask Patterns, Sets of Mask Patterns, and Device Manufacturing Method |
| 01/28/2010 | US20100021826 Reflective mask, manufacturing method for reflective mask, and manufacturing method for semiconductor device |
| 01/28/2010 | US20100021825 Mask pattern data creation method and mask |
| 01/28/2010 | US20100021824 Photo-Mask and Wafer Image Reconstruction |
| 01/28/2010 | US20100019147 Method and apparatus for charged particle beam inspection |
| 01/27/2010 | CN201392450Y Mask plate |
| 01/27/2010 | CN101634813A Apparatus for exposing a substrate, photomask and modified illuminating system of the apparatus, and method of forming a pattern on a substrate using the apparatus |
| 01/27/2010 | CN101634805A Peripheral shading mask structure used for manufacturing semiconductor wafer and manufacturing method thereof |
| 01/27/2010 | CN100585604C Method for changing physical layout data using virtual layer |
| 01/27/2010 | CN100585488C Method for forming pattern |
| 01/26/2010 | US7653890 Modeling resolution enhancement processes in integrated circuit fabrication |
| 01/26/2010 | US7653096 Laser light source device, exposure device, and mask inspection device using this laser light source device |
| 01/26/2010 | US7651823 Optically semitransmissive film, photomask blank and photomask, and method for designing optically semitransmissive film |
| 01/26/2010 | US7651822 Method of manufacturing gray scale mask and microlens, microlens, spatial light modulating apparatus and projector |
| 01/26/2010 | US7651821 Exposure of substrate using mask with gray tone features; forming , trimming pattern; variation of transmission generate various light intensity |
| 01/26/2010 | CA2309738C Method of molecular-scale pattern imprinting at surfaces |
| 01/21/2010 | WO2010007955A1 Reflective mask blank for euv lithography and reflective mask for euv lithography |
| 01/21/2010 | US20100015535 Fabrication method of lithography mask and formation method of fine pattern using the same |
| 01/21/2010 | US20100015534 Method for monitoring photolithography process and monitor mark |
| 01/20/2010 | EP2146244A1 Photomask substrate, photomask substrate forming member, photomask substrate manufacturing method, photomask, and exposure method using photomask |
| 01/20/2010 | EP2145865A1 Titania-doped quartz glass member and making method |
| 01/20/2010 | CN101630121A Euv magnetic contrast lithography mask and manufacture thereof |
| 01/20/2010 | CN101630120A Adjustable bearing cleaning apparatus for processing hard surface photomask base plate and assembling method thereof |
| 01/20/2010 | CN100582947C Method and device of generating pattern, method of determining the position, measurement device, and lithographic apparatus |
| 01/20/2010 | CN100582717C System for inspecting surfaces with improved light efficiency |
| 01/19/2010 | US7650588 Methods and systems for pattern generation based on multiple forms of design data |
| 01/19/2010 | US7649625 Optical apparatus, photomask inspecting apparatus, and exposure apparatus |
| 01/19/2010 | US7649153 Method for minimizing sample damage during the ablation of material using a focused ultrashort pulsed laser beam |
| 01/19/2010 | US7649031 Modified pigments having improved dispersion properties |
| 01/19/2010 | US7648885 Method for forming misalignment inspection mark and method for manufacturing semiconductor device |
| 01/19/2010 | US7648807 preparing a plate-like substrate with a rectangular main surface, forming a marker for identifying the substrate on each of at least a plurality of end faces among four end faces of the substrate, the four end faces continuous with sides of the main surface, respectively; avoiding defective portion |
| 01/19/2010 | US7648806 Phase shift mask with two-phase clear feature |
| 01/19/2010 | US7648805 Masks and methods of manufacture thereof |
| 01/19/2010 | US7648804 Mask and fabrication method thereof and application thereof |
| 01/19/2010 | US7648803 Diagonal corner-to-corner sub-resolution assist features for photolithography |
| 01/19/2010 | US7648802 Phase shifting test mask patterns for characterizing illumination and mask quality in image forming optical systems |
| 01/19/2010 | US7648738 for photopolymerization; photography, relief imaging; color filters |
| 01/14/2010 | WO2010006058A1 Method and apparatus for determining the effect of process variations |
| 01/14/2010 | US20100009541 Process for Adjusting the Size and Shape of Nanostructures |
| 01/14/2010 | US20100009523 making a high K (dielectric constant) film using an ultra-high purity hafnium containing silicate film in a metal-oxide-semiconductor (CMOS) field effect transistor (FET) or MOSFET |
| 01/14/2010 | US20100009273 Mask and method for manufacturing the same |
| 01/14/2010 | US20100009272 Mask fabrication method, exposure method, device fabrication method, and recording medium |
| 01/14/2010 | US20100009271 Resist patterning process and manufacturing photo mask |
| 01/14/2010 | US20100009270 Method for optimizing the layout of at least one transfer device for production of a direct or indirect structure |
| 01/14/2010 | US20100009140 Lithographic method for wiring a side surface of a substrate |
| 01/14/2010 | US20100009139 Advanced oriented assist features for integrated circuit hole patterns |
| 01/14/2010 | US20100007975 Color filter substrate, electronic apparatus and manufacturing method thereof |
| 01/14/2010 | US20100006550 Method for minimizing sample damage during the ablation of material using a focused ultrashort pulsed laser beam wherein the slope of fluence breakdown is a function of the pulse width |
| 01/14/2010 | US20100006542 Method for Structuring the Surface of a Pressed Sheet or an Endless Strip |
| 01/13/2010 | EP2144119A1 Reticle transport apparatus and reticle transporting method |
| 01/13/2010 | CN101627336A Method to form a pattern of functional material on a substrate using a stamp having a surface modifying material |
| 01/13/2010 | CN101625521A Optical proximity correction method |
| 01/13/2010 | CN100580558C Exposure process |
| 01/13/2010 | CN100580549C Photomask blank and photomask |
| 01/13/2010 | CN100580548C Method for using three-dimensional function for mask specification institution |
| 01/12/2010 | US7646919 Graphics engine for high precision lithography |
| 01/12/2010 | US7646906 Computer-implemented methods for detecting defects in reticle design data |
| 01/12/2010 | US7645989 Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof |
| 01/12/2010 | US7645714 for use in lithography; crack and fracture resistance |
| 01/07/2010 | WO2010001507A1 Semiconductor integrated circuit device |
| 01/07/2010 | US20100003620 Exposure method |
| 01/07/2010 | US20100003609 Titania-doped quartz glass member and making method |
| 01/07/2010 | US20100003608 Method for generating mask pattern data and method for manufacturing mask |
| 01/07/2010 | US20100003607 Method for Correcting Pattern Critical Dimension in Photomask |
| 01/07/2010 | US20100002930 Apparatus for examining pattern defects, a method thereof, and a computer-readable recording medium having recorded therein a program thereof |
| 01/07/2010 | US20100001199 Method of measuring phase of phase shift mask |
| 01/06/2010 | CN101620375A Method for correcting lug photomask pattern |
| 01/06/2010 | CN101620374A Exposure mask using gray-tone pattern, manufacturing method of tft substrate using the same and liquid crystal display device having the tft substrate |
| 01/06/2010 | CN101620373A Light shield repair method and light shield repair device of LED display screens |