| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 03/03/2010 | CN101661220A Liquid crystal display panel and mask plate |
| 03/03/2010 | CN101661219A Method and device for correcting mask plate patterns |
| 03/03/2010 | CN101661218A Method for preparing transparent light mask |
| 03/03/2010 | CN101661217A Programmable photomask, using method thereof and application of the photomask |
| 03/02/2010 | US7673281 Pattern evaluation method and evaluation apparatus and pattern evaluation program |
| 03/02/2010 | US7673277 Resolution enhancing technology using phase assignment bridges |
| 03/02/2010 | US7670761 Method of forming a fine pattern of a semiconductor device using a resist reflow measurement key |
| 03/02/2010 | US7670760 Treatment for reduction of line edge roughness |
| 03/02/2010 | US7670759 Micro pattern forming method and semiconductor device manufacturing method |
| 03/02/2010 | US7670756 Pattern forming method, semiconductor device manufacturing method and exposure mask set |
| 03/02/2010 | US7670755 Writing pattern; data processing; etching masking film; removal segments of photoresists; generating method comprising correcting a first pattern data in accordance with a difference between first film pattern and second mask pattern and difference between first resist pattern and first mask pattern |
| 03/02/2010 | US7670728 Form phase shift layer pattern of a molybdenum silicon nitride layer; form light shielding layer pattern of a chromium layer; expose defective pattern; remove defect by dry etch; us etching gas having selectively between the resist layer and light shielding layer |
| 03/02/2010 | US7670727 Illumination compensator for curved surface lithography |
| 03/02/2010 | US7670726 Optical diffusers, photomasks and their methods of fabrication |
| 03/02/2010 | US7670725 Optical masks and methods for measuring aberration of a beam |
| 03/02/2010 | US7670530 Patterning substrates employing multiple chucks |
| 02/25/2010 | WO2010020337A1 Euv reticle substrates with high thermal conductivity |
| 02/25/2010 | US20100050149 Design and Layout of Phase Shifting Photolithographic Masks |
| 02/25/2010 | US20100047699 Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography |
| 02/25/2010 | US20100047698 Hybrid multi-layer mask |
| 02/25/2010 | US20100044817 Photosensitive resin composition, color filter and method of producing the same, and solid-state imaging device |
| 02/24/2010 | EP2156926A1 Method of polishing glass substrate |
| 02/24/2010 | EP2155435A1 Method of polishing glass substrate |
| 02/24/2010 | CN201413817Y Mask plate transfer machine |
| 02/24/2010 | CN101657756A Method and system for dispositioning defects in a photomask |
| 02/24/2010 | CN101655663A Method for correcting size of lug and lug structure therefor |
| 02/24/2010 | CN101655662A Method for selectively correcting layout graph |
| 02/24/2010 | CN101655661A Multilevel gradation photomask and method for repairing same |
| 02/24/2010 | CN100592213C System and method for using a two part cover for protecting a reticle |
| 02/23/2010 | US7669174 Pattern generation method and charged particle beam writing apparatus |
| 02/23/2010 | US7669172 Pattern creation method, mask manufacturing method and semiconductor device manufacturing method |
| 02/23/2010 | US7669169 Shape-based geometry engine to perform smoothing and other layout beautification operations |
| 02/23/2010 | US7667216 Method of achieving CD linearity control for full-chip CPL manufacturing |
| 02/23/2010 | US7666767 Mask for sequential lateral solidification (SLS) process and a method thereof |
| 02/23/2010 | US7666579 blank permafiche substrate comprising archival substrate formed of pure nickel or pure nickel embedded with fine diamond powder, and photoresist layer, exposing, removing photoresist, etching |
| 02/23/2010 | US7666577 Mixture of photomasks; controlling incline of pattern; lithography; phase shifting; removal of mask by etching |
| 02/23/2010 | US7666556 Method for manufacturing photomask |
| 02/23/2010 | US7666555 Pellicle, methods of fabrication and methods of use for extreme ultraviolet lithography |
| 02/23/2010 | US7666554 Method and apparatus for performing model-based layout conversion for use with dipole illumination |
| 02/23/2010 | US7666553 positional accuracy assurance, dimensional accuracy assurance; halftone type phase shift mask; forming a fine pattern in a semiconductor device, a magnetic device |
| 02/23/2010 | US7665330 Heat treating glass comprising lithium oxide, alumina, silica, at temperature range of 650-750 degrees C. for 20-60 hours then further heat treating at temperature range of 700-800 degrees C. for 100-200 hours; provides glass-ceramics having super flat surface roughness and ultra low thermal expansion |
| 02/18/2010 | US20100040965 Exposure control for phase shifting photolithographic masks |
| 02/18/2010 | US20100040963 Color filter and production method thereof, and solid-state image sensor using the same |
| 02/18/2010 | US20100040962 Multi-layer, attenuated phase-shifting mask |
| 02/18/2010 | US20100040961 photomasks; silicon oxynitride upper layer; reduces transmittance for inspecting light by increasing reflectance; for enhancing resolution of transfer patterns |
| 02/18/2010 | US20100040960 Mask plate and manufacturing method thereof |
| 02/18/2010 | US20100040959 Error Diffusion-Derived Sub-Resolutional Grayscale Reticle |
| 02/18/2010 | US20100040958 Sub-Resolutional Grayscale Reticle |
| 02/18/2010 | US20100040957 Method of measuring dimension of pattern and method of forming pattern |
| 02/18/2010 | US20100040718 Template Having a Silicon Nitride, Silicon Carbide or Silicon Oxynitride Film |
| 02/18/2010 | US20100038798 Method for correcting mask pattern, photomask, method for fabricating photomask, electron beam writing method for fabricating photomask, exposure method, semiconductor device, and method for fabricating semiconductor device |
| 02/17/2010 | EP2153278A1 Mask film to form relief images and method of use |
| 02/17/2010 | CN101650529A Mask for manufacturing TFT and method for manufacturing source and drain of TFT |
| 02/17/2010 | CN101650528A System and method for using a two part cover for protecting a reticle |
| 02/17/2010 | CN101650527A Gray tone mask blank, gray tone mask and forming method of product machining identification or product information identification |
| 02/17/2010 | CN101650526A Mask and production method thereof |
| 02/17/2010 | CN101650525A Maskplate |
| 02/17/2010 | CN100590524C Ink jet recording sheet for plate-making mask film, and process for producing flexographic printing plate |
| 02/17/2010 | CN100590523C Photomask and its production method, and pattern forming method |
| 02/17/2010 | CN100590522C Method of manufacturing grey mask and grey mask |
| 02/16/2010 | US7664310 Advanced phase shift inspection method |
| 02/16/2010 | US7664309 Reticle inspecting apparatus and reticle inspecting method |
| 02/16/2010 | US7664308 Photomask inspection apparatus comparing optical proximity correction patterns to minimum and maximum limits |
| 02/16/2010 | US7664307 Photomask manufacturing support system |
| 02/16/2010 | US7663768 Method and system for measuring patterned structures |
| 02/16/2010 | US7663156 Method and apparatus for calibrating a metrology tool |
| 02/16/2010 | US7662524 Scanning beam of metallic ions over defect to dope, reducing transparency; implanting gallium atoms to reduce transmission and quartz can be etched |
| 02/16/2010 | US7662523 Photo mask, exposure method using the same, and method of generating data |
| 02/16/2010 | US7662522 Method for manufacturing semiconductor devices, and method for forming a pattern onto an exposure mask |
| 02/16/2010 | US7662521 Method of mask making to prevent phase edge and overlay shift for chrome-less phase shifting mask |
| 02/16/2010 | US7662520 High-transmittance attenuated phase-shift mask blank |
| 02/16/2010 | US7662263 Polishing or otherwise figuring multilayer coating that has been deposited on optical substrate in order to correct for errors in figure of substrate and coating; method such as ion-beam milling can be used to remove material from multilayer coating by amount that varies in specified way across substrate |
| 02/16/2010 | CA2458886C Method for fabricating chirped fiber bragg gratings |
| 02/11/2010 | US20100037199 Recording medium storing original data generation program, original data generation method, original fabricating method, exposure method, and device manufacturing method |
| 02/11/2010 | US20100035168 Pattern predicting method, recording media and method of fabricating semiconductor device |
| 02/11/2010 | US20100035166 Photosensitive composition, partition walls, black matrix and process for producing color filter |
| 02/11/2010 | US20100035165 Reflective mask blank for euv lithography |
| 02/11/2010 | US20100035164 excellent in flatness after having been chucked by a mask stage of an exposure system; at least three of four corner portions of the flatness measurement area have a shape that rises toward the outer peripheral side; position accuracy |
| 02/11/2010 | US20100035028 Mask blank substrate, mask blank, photomask, and methods of manufacturing the same |
| 02/11/2010 | US20100033658 Color filter substrate and fabricating method thereof |
| 02/11/2010 | US20100032588 Writing apparatus and writing method |
| 02/11/2010 | US20100032566 Substrate surface inspection method and inspection apparatus |
| 02/11/2010 | DE102004041921B4 Phasenschiebermaske und Verfahren zu ihrer Herstellung Phase shift mask and process for their preparation |
| 02/10/2010 | EP2151714A2 Original data generation program and original data generation method |
| 02/10/2010 | CN201402365Y 掩模板夹持机构 Mask holding mechanism |
| 02/10/2010 | CN101644890A Optical adjacent correction method suitable for pixel array of image sensor |
| 02/10/2010 | CN101644889A Photoetching scattering strip for improving focal depth and manufacturing method thereof |
| 02/10/2010 | CN101644888A Exposure method, mask plate and method for designing mask plate |
| 02/10/2010 | CN100589030C Method for implementing key size linear control in whole-chip chrome-less photoetching technique production |
| 02/09/2010 | US7660456 Mask fabrication supporting method, mask blank providing method, and mask blank dealing system |
| 02/09/2010 | US7660455 Pattern inspection apparatus, pattern inspection method, and recording medium |
| 02/09/2010 | US7659966 Container and method of transporting substrate using the same |
| 02/09/2010 | US7659042 photomasks; photoresists; for hard-to-etch metal layers such as copper; integrated circuits; improved resolution |
| 02/09/2010 | US7659041 Lithographic method of manufacturing a device |
| 02/09/2010 | US7659040 Exposure mask and method of manufacturing the same, and semiconductor device manufacturing method |
| 02/09/2010 | US7659039 Near-field exposure mask, method of producing that mask, near-field exposure apparatus having that mask, and resist pattern forming method |
| 02/09/2010 | US7659038 Lithographic method for wiring a side surface of a substrate |
| 02/09/2010 | US7658601 Pattern forming apparatus |
| 02/04/2010 | US20100031225 Methods and systems for pattern generation based on multiple forms of design data |
| 02/04/2010 | US20100031224 Pattern verification method, program thereof, and manufacturing method of semiconductor device |