Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
03/2010
03/30/2010US7687206 Mask pattern and method for forming the same
03/30/2010US7687205 photoresists; ink jet printing
03/25/2010WO2010033433A1 Generation of contact masks for inkjet printing on solar cell substrates
03/25/2010WO2010031566A1 Method and apparatus for measuring structures on photolithography masks
03/25/2010US20100075236 Photomask blank, photomask, and methods of manufacturing the same
03/25/2010US20100075235 Writing pattern producing method, photomask manufacturing method, and semiconductor device manufacturing method
03/25/2010US20100075234 Generation Of Contact Masks For Inkjet Printing On Solar Cell Substrates
03/25/2010US20100074512 Photomask inspection method
03/25/2010US20100074511 Mask inspection apparatus, and exposure method and mask inspection method using the same
03/25/2010US20100073658 Laser light source device, exposure device, and mask inspection device using this laser light source device
03/25/2010US20100072454 Exposure method, and semiconductor device
03/25/2010DE102009039571A1 Maske und Verfahren zur Herstellung eines Halbleiterbauelements unter Verwendung derselben Mask and method for manufacturing a semiconductor device using the same
03/25/2010DE102009036618A1 Maskenrohlingsubstrat, Maskenrohling, Photomaske und Verfahren zu ihrer Herstellung Mask blank substrate, mask blank, photomask and process for their preparation
03/25/2010DE102008048660A1 Verfahren und Vorrichtung zur Vermessung von Strukturen auf Photolithographiemasken Method and apparatus for measuring structures on photolithography masks
03/24/2010CN101681093A Methods for performing model-based lithography guided layout design
03/24/2010CN101681092A Photomask substrate, photomask substrate forming member, photomask substrate manufacturing method, photomask, and exposure method using photomask
03/24/2010CN101681091A Mask film to form relief images and method of use
03/24/2010CN100595681C Full phase shifting mask in damascene process
03/24/2010CN100595671C Mask blank manufacturing method
03/24/2010CN100595670C Mask pattern and its forming method, method for manufacturing coating composition, and method for manufacturing semiconductor device
03/23/2010US7685556 Mask data correction method, photomask manufacturing method, computer program, optical image prediction method, resist pattern shape prediction method, and semiconductor device manufacturing method
03/23/2010US7685551 Semiconductor integrated circuit, standard cell, standard cell library, semiconductor integrated circuit designing method, and semiconductor integrated circuit designing equipment
03/23/2010US7685266 Management of tools that process data to describe a physical layout of a circuit
03/23/2010US7683402 Semiconductor device and manufacturing method thereof
03/23/2010US7682984 Interferometer endpoint monitoring device
03/23/2010US7682775 Process for preparing a flexographic printing plate
03/23/2010US7682761 Method of fabricating a grayscale mask using a wafer bonding process
03/23/2010US7682760 Pattern formation method using Levenson-type mask and method of manufacturing Levenson-type mask
03/23/2010US7682759 Methods and system for determining pitch of lithographic features
03/23/2010US7682758 Reflection mask for EUV photolithography and method of fabricating the reflection mask
03/23/2010US7682757 first device pattern including a line and a space alternately arrayed on a fixed pitch having regular intervals in a first direction; second device pattern having a pattern width an odd-number times larger than the regular intervals of the fixed pitch, an auxiliary pattern disposed on the fixed pitch
03/23/2010US7682756 Anti-aberration pattern and method for manufacturing the same
03/23/2010US7682755 surface plasmon resonance as a result of coupling surface plasmon with light; a pattern having a dimension smaller than a half or less of a wavelength of light can be transferred to a resist without requiring closely contact of the resist with the mask
03/18/2010WO2010029997A1 Pellicle frame, pellicle and method for using pellicle frame
03/18/2010WO2010029836A1 Method for smoothing optical member for euvl and optical member for euvl having smoothed optical surface
03/18/2010US20100068633 bridging the mask gap between the first feature and the second feature; design of a microelectronic device; printing patterns for integrated circuits on semiconductor wafers; computer program product comprising instructions for data processing apparatus to perform operations
03/18/2010US20100068632 Optical component for euvl and smoothing method thereof
03/18/2010US20100068631 Photomask including ion trapping layer and method of manufacturing semiconductor device using the photomask
03/18/2010US20100068630 Method for manufacturing photo mask
03/18/2010US20100068418 Sensitized Photochemical Switching for Cholesteric Liquid Crystal Displays
03/18/2010US20100067778 Apparatus and method for pattern inspection
03/18/2010US20100067777 Evaluation pattern generating method, computer program product, and pattern verifying method
03/18/2010DE102004058967B4 Verfahren zur Belichtung eines Substrats mit einem Strahl A method for exposing a substrate with a beam
03/17/2010EP2162795A1 Solvent-assisted layer formation for imprint lithography
03/17/2010EP1336130B1 Mitigation of multilayer defects on a reticle
03/17/2010CN101675385A Improving process model accuracy by modeling mask corner rounding effects
03/17/2010CN101673709A Method of forming pattern in semiconductor device
03/17/2010CN101673050A Method for compensating critical dimension
03/17/2010CN101673049A Gray tone mask and method for manufacturing gray tone mask
03/17/2010CN101673048A Mask pattern inspection method, exposure condition verification method, and manufacturing method of semiconductor device
03/17/2010CN101673047A Mask plate and manufacturing method thereof and manufacturing method of TFT base plate
03/17/2010CN101673046A Photomask storage device and method for keeping photomask clean and dry
03/17/2010CN100594424C Picture dimension correcting unit and method, photomask and test used photomask
03/16/2010US7681173 Mask data generation method and mask
03/16/2010US7681172 Method and apparatus for modeling an apodization effect in an optical lithography system
03/16/2010US7679731 Detecting and characterizing mask blank defects using angular distribution of scattered light
03/16/2010US7678720 Glass ceramics comprising beta-quartz or beta-quartz solid solution
03/16/2010US7678693 Exposure method for upper layer of hole of semiconductor device
03/16/2010US7678513 phase shift masks; lithography
03/16/2010US7678512 Producing image sensor having nearly complete fill factor; using silicon rich oxide (SRO) partially transmitting layer; controlling exposure of photoresist by varying thickness
03/16/2010US7678511 reflective layer formed over front surface of substrate and chucking layer formed over rear surface positioned to chuck substrate to electrostatic chuck
03/16/2010US7678510 photomasks; phase shifting
03/16/2010US7678509 Method of producing phase shift masks
03/16/2010US7678508 water-soluble dust-free protective film; photomasks; photoresists
03/16/2010US7678426 Composition and process using fluorinated diols with amide and phosphonate groups with reduced contamination for articles with adhesion do substrates
03/11/2010WO2010026998A1 Reflective mask blank for euv lithography and method for producing the same
03/11/2010WO2010026938A1 Semiconductor product manufacturing method
03/11/2010US20100062549 Pattern correcting method, method of manufacturing semiconductor device, and pattern correcting program
03/11/2010US20100062350 Photomask substrate, photomask substrate forming member, photomask substrate fabrication method, photomask, and exposing method that uses the photomask
03/11/2010US20100062349 Stencil, Stencil Design System and Method for Cell Projection Particle Beam Lithography
03/11/2010US20100062348 Method and Apparatus for Gating Photomask Contamination
03/11/2010US20100060890 Apparatus and method for pattern inspection
03/10/2010EP1344110B1 Mitigation of radiation induced surface contamination
03/10/2010CN101666972A Photomask and method for detecting contamination
03/10/2010CN101666971A Mask and method for fabricating semiconductor device using the same
03/10/2010CN100593755C Phase-shift photomask-blank, phase-shift photomask and fabrication method thereof
03/09/2010US7675663 Apparatus for producing a hologram mask
03/09/2010US7675057 Photoactive component with organic layers
03/09/2010US7674570 Irradiating the sample of the pattern in an electrically conductive state with an electron beam to detect a secondary electron, a reflected electron and a backscattered electron generated from the surface of the sample; acquiring an image of the sample surface and inspecting the mask pattern image
03/09/2010US7674563 Pattern forming method and phase shift mask manufacturing method
03/09/2010US7674562 Angled-wedge chrome-face wall for intensity balance of alternating phase shift mask
03/09/2010US7674561 Mask blanks and method of producing the same
03/04/2010WO2010025031A2 Method for optical proximity correction, design and manufacturing of a reticle using character projection lithography
03/04/2010WO2009153335A3 Optical functional surfaces
03/04/2010US20100058282 Method and system for design of a reticle to be manufactured using character projection lithography
03/04/2010US20100058281 Method for optical proximity correction of a reticle to be manufactured using character projection lithography
03/04/2010US20100055900 Mask and method for fabricating semiconductor device using the same
03/04/2010US20100055583 Method for fabicating color filter substrate
03/04/2010US20100055582 Colored curable composition, color filter and method of producing the same, and dipyrromethene metal complex compound and tautomer thereof
03/04/2010US20100055581 Method for design and manufacture of a reticle using variable shaped beam lithography
03/04/2010US20100055580 Method for fracturing circular patterns and for manufacturing a semiconductor device
03/04/2010US20100055579 Method for Fabricating Chromeless Phase Shift Mask
03/04/2010US20100055578 plurality of variable shaped beam (VSB) shots is used to form a desired pattern on a surface; shots within plurality of shots are allowed to overlap each other; dosages of the shots may also be allowed to vary; method may be used in manufacturing an integrated circuit using direct write
03/04/2010US20100055577 Process of patterning small scale devices
03/04/2010US20100054577 Photomask inspection method, semiconductor device inspection method, and pattern inspection apparatus
03/04/2010US20100053579 A method for manufacturing a surface having a multiplicity of slightly different patterns comprising the steps of writing a surface with a set of characters for forming the patterns on the surface and reducing shot count or total write time by use of a character varying techniques; stencil masks
03/04/2010US20100051056 Foreign object removal method and method for manufacturing semiconductor device
03/03/2010EP2159299A2 Mask for thin film deposition and method of manufacturing OLED using the same
03/03/2010CN101661223A Photomask blank and photomask
03/03/2010CN101661221A Mask plate for exposure of the same layer and multi-exposure method thereof
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